公开(公告)号：US20050039600A1

公开(公告)日：2005-02-24

申请号：US10920404

申请日：2004-08-18

申请人： Chang-Su Lim ,  Yo-Han Ahn ,  Suk-Hee Im ,  Sun-Wook Park

发明人： Chang-Su Lim ,  Yo-Han Ahn ,  Suk-Hee Im ,  Sun-Wook Park

IPC分类号： F24F7/06 ,  B01D46/00 ,  B01D46/10 ,  B01D46/52 ,  B01D53/04

CPC分类号： B01D46/521 ,  B01D46/002 ,  B01D46/10 ,  B01D53/0407 ,  B01D2256/26 ,  B01D2259/4508 ,  B01D2277/20 ,  B01D2279/51

摘要： An apparatus for cleaning air, and a method for cleaning air using the apparatus, includes a housing including an air inlet through which air to be cleaned flows into the housing and an air outlet through which air that has been cleaned is exhausted from the housing, the housing isolating an interior thereof from external surroundings. A first filtering unit is disposed adjacent to the air inlet and includes a plurality of first filters for removing a first group of contaminants from the air to be cleaned. Each of the plurality of first filters is disposed substantially parallel to each other. A fan for drawing the air to be cleaned into the housing from the external surroundings is disposed in the housing.

摘要翻译： 一种用于清洁空气的装置以及使用该装置清洁空气的方法，包括壳体，该壳体包括空气入口，待清洁空气流过该进气口的空气出口和已经被清洁的空气从壳体排出的空气出口， 壳体将其内部与外部环境隔离。 第一过滤单元邻近空气入口设置，并且包括多个第一过滤器，用于从待清洁的空气中去除第一组污染物。 多个第一滤光器中的每一个基本上彼此平行地设置。 用于从外部环境将待清洁的空气吸入壳体的风扇设置在壳体中。

公开(公告)号：US07258728B2

公开(公告)日：2007-08-21

申请号：US10920404

申请日：2004-08-18

申请人： Chang-Su Lim ,  Yo-Han Ahn ,  Suk-Hee Im ,  Sun-Wook Park

发明人： Chang-Su Lim ,  Yo-Han Ahn ,  Suk-Hee Im ,  Sun-Wook Park

IPC分类号： B01D46/00

CPC分类号： B01D46/521 ,  B01D46/002 ,  B01D46/10 ,  B01D53/0407 ,  B01D2256/26 ,  B01D2259/4508 ,  B01D2277/20 ,  B01D2279/51

摘要： An apparatus for cleaning air, and a method for cleaning air using the apparatus, includes a housing including an air inlet through which air to be cleaned flows into the housing and an air outlet through which air that has been cleaned is exhausted from the housing, the housing isolating an interior thereof from external surroundings. A first filtering unit is disposed adjacent to the air inlet and includes a plurality of first filters for removing a first group of contaminants from the air to be cleaned. Each of the plurality of first filters is disposed substantially parallel to each other. A fan for drawing the air to be cleaned into the housing from the external surroundings is disposed in the housing.

摘要翻译： 一种用于清洁空气的装置以及使用该装置清洁空气的方法，包括壳体，该壳体包括空气入口，待清洁空气流过该进气口的空气出口和已经被清洁的空气从壳体排出的空气出口， 壳体将其内部与外部环境隔离。 第一过滤单元邻近空气入口设置，并且包括多个第一过滤器，用于从待清洁的空气中去除第一组污染物。 多个第一滤光器中的每一个基本上彼此平行地设置。 用于从外部环境将待清洁的空气吸入壳体的风扇设置在壳体中。

公开(公告)号：US20080137046A1

公开(公告)日：2008-06-12

申请号：US11999526

申请日：2007-12-06

申请人： Ju-A Ryu ,  Chang-Su Lim ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Kyung-Log Moon

发明人： Ju-A Ryu ,  Chang-Su Lim ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Kyung-Log Moon

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A substrate exposing apparatus includes an immersion exposure unit, disposed between a projection optical system and a substrate, including a vessel disposed on an optical path and filled with a liquid, a supply line connected to one side of the vessel to supply the liquid to the vessel, a first drain line connected to the other side of the vessel to drain the liquid from the vessel, and a monitoring unit including at least one first measuring unit connected to the first drain line to detect a property of the liquid flowing through the first drain line. The monitoring unit can include a collection line connected to the first drain line to collect the liquid, a first bath storing the collected liquid, and a first distribution line through which the liquid in the first bath can flow. The first measuring unit is installed on the first distribution line.

摘要翻译： 基板曝光装置包括设置在投影光学系统和基板之间的浸没曝光单元，包括设置在光路上并填充有液体的容器，连接到容器的一侧以将液体供应到 容器，连接到容器的另一侧的第一排出管线，以从容器排出液体;以及监测单元，其包括连接到第一排泄管线的至少一个第一测量单元，以检测流过第一流体的液体的性质 排水管线。 监视单元可以包括连接到第一排水管线以收集液体的收集管线，存储收集的液体的第一浴槽和第一浴液中的液体可以流过的第一分配管线。 第一个测量单元安装在第一个配线上。

公开(公告)号：US08027017B2

公开(公告)日：2011-09-27

申请号：US12321102

申请日：2009-01-15

申请人： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

发明人： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

IPC分类号： G03B27/52

CPC分类号： B08B1/007 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67028 ,  H01L21/67057

摘要： The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.

摘要翻译： 本发明构思提供了一种基板处理装置和曝光装置，其中，卡盘构件，包括清除卡盘构件的基板装载表面上的异物的清洁工具的清洁构件和清洁清洁工具的工具清洁构件 在处理室内彼此相邻。 本发明构思还提供了一种使用工具清洁构件清洁清洁工具的方法。 根据上述装置和方法，可以防止由清洁工具污染卡盘构件，并且可以使在曝光过程中由卡盘构件上的颗粒引起的散焦现象最小化。

公开(公告)号：US07065898B2

公开(公告)日：2006-06-27

申请号：US10763203

申请日：2004-01-26

申请人： Hyun-Joon Kim ,  Yo-Han Ahn ,  Dong-Seok Ham ,  Jae-Bong Kim

发明人： Hyun-Joon Kim ,  Yo-Han Ahn ,  Dong-Seok Ham ,  Jae-Bong Kim

IPC分类号： F26B21/06

CPC分类号： H01L21/67017 ,  H01L21/67772

摘要： A module for transferring a substrate includes a load port for supporting a container to receive a plurality of substrates, a substrate transfer chamber disposed between the load port and a substrate process module, a substrate transfer robot disposed in the substrate transfer chamber for transferring the substrates between the container and the substrate process module, a gas supply unit connected to the substrate transfer chamber for supplying a purge gas into the substrate transfer chamber to purge an interior of the substrate transfer chamber, and a contamination control unit connected to the substrate transfer chamber for circulating the purge gas supplied into the substrate transfer chamber, resupplying the circulated purge gas into the substrate transfer chamber and removing particles and airborne molecular contaminants from the purge gas being circulated. Contamination of a substrate may be prevented and a necessary amount of purge gas may be reduced.

摘要翻译： 用于转印衬底的模块包括用于支撑容器以容纳多个衬底的负载端口，设置在负载端口和衬底处理模块之间的衬底传送室，设置在衬底传送室中用于传送衬底的衬底传送机器人 在所述容器和所述基板处理模块之间，连接到所述基板传送室的气体供应单元，用于将净化气体供应到所述基板传送室中以净化所述基板传送室的内部;以及污染控制单元，连接到所述基板传送室 用于循环供给到基板传送室中的吹扫气体，将循环的净化气体再供给到基板传送室中，并从正在循环的吹扫气体中除去颗粒和空气传播的分子污染物。 可以防止基材的污染，并且可以减少必需量的吹扫气体。

公开(公告)号：US06996453B2

公开(公告)日：2006-02-07

申请号：US10684436

申请日：2003-10-15

申请人： Yo-Han Ahn ,  Ki-Doo Kim ,  Soo-Woong Lee ,  Jung-Sung Hwang ,  Hyeog-Ki Kim

发明人： Yo-Han Ahn ,  Ki-Doo Kim ,  Soo-Woong Lee ,  Jung-Sung Hwang ,  Hyeog-Ki Kim

IPC分类号： G06F7/00

CPC分类号： H01L21/00 ,  H01L21/67017 ,  Y10S414/139

摘要： A substrate processing apparatus for processing substrates prevents the substrates from contaminating as they are transferred. The apparatus includes a container, like a FOUP, for containing substrates, at least one processing chamber where the substrates are processed, a substrate transferring module including a substrate transfer chamber and at least one load port for supporting a container, and a contamination controlling system for the substrate transfer chamber. The contamination controlling system includes a purge gas supply inlet connected to the substrate transfer chamber, and a gas circulating tube for recycling the purging gas to circulate through the chamber. The substrate transfer chamber is purged using the purging gas to remove moisture and contaminating materials from the substrate transfer chamber. The formation of particles on the substrate otherwise caused by a reaction between the moisture and contaminating materials while the substrate is standing by in the container can be prevented.

摘要翻译： 用于处理基板的基板处理装置防止基板在被转印时被污染。 该装置包括用于容纳衬底的容器，如FOUP，用于处理衬底的至少一个处理室，包括衬底传送室的衬底传送模块和用于支撑容器的至少一个负载端口，以及污染控制系统 用于衬底传送室。 污染控制系统包括连接到基板传送室的吹扫气体供给入口和用于使净化气体循环通过室的气体循环管。 使用净化气体清洗基板传送室，以从基板传送室去除水分和污染材料。 可以防止在衬底上的颗粒在容器中待机时由水分和污染物质之间的反应引起的颗粒的形成。

公开(公告)号：US07914594B2

公开(公告)日：2011-03-29

申请号：US12180289

申请日：2008-07-25

申请人： Chang-Min Cho ,  Joo-Young Kim ,  Ji-Young Kim ,  Ju-A Ryu ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Dong-Seok Ham

发明人： Chang-Min Cho ,  Joo-Young Kim ,  Ji-Young Kim ,  Ju-A Ryu ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Dong-Seok Ham

IPC分类号： B01D46/00

CPC分类号： B01D46/0058 ,  B01D46/002 ,  B01D46/24 ,  B01D46/4272 ,  Y10S55/31

摘要： An air filtering device and an air cleaning system of a semiconductor manufacturing apparatus to reduce cost and increase manufacturing productivity. The air filtering device may include a frame having an open aperture coupled to an air supply line. A buffer frame configured to be inserted into the frame may include a plurality of slot parts, each slot part having a plurality of air in/out apertures through which air may flow in or out from the buffer frame. A plurality of filters may be releasably fastened to the plurality of slot parts to filter pollution material contained in air flowing through the air in/out apertures. An air interrupter for interrupting air flowing through the air in/out apertures may be used when replacing the plurality of filters, thereby providing purified air to the semiconductor manufacturing apparatus during the replacement.

摘要翻译： 一种半导体制造装置的空气过滤装置和空气净化系统，以降低成本并提高制造生产率。 空气过滤装置可以包括具有联接到空气供应管线的开口孔的框架。 被构造成插入到框架中的缓冲框架可以包括多个狭槽部分，每个狭槽部分具有多个空气进/出孔，空气可以通过空气进入或离开缓冲器框架。 多个过滤器可以可释放地紧固到多个槽部分，以过滤包含在流过空气进/出孔的空气中的污染物质。 当更换多个过滤器时，可以使用用于中断通过空气入口/出口的空气的空气断路器，从而在更换期间向半导体制造装置提供净化的空气。

公开(公告)号：US07850449B2

公开(公告)日：2010-12-14

申请号：US11775640

申请日：2007-07-10

申请人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Kun-Hyung Lee ,  Gui-Young Cho ,  Hong-Hee Jeong ,  Mi-Ae Kim

发明人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Kun-Hyung Lee ,  Gui-Young Cho ,  Hong-Hee Jeong ,  Mi-Ae Kim

IPC分类号： F27B5/00 ,  F27B5/10

CPC分类号： F27B17/0025 ,  H01L21/67109 ,  H01L21/67253

摘要： In an embodiment, heat treatment equipment comprises a process tube, an exhaust duct connected to the process tube, and, during operation, exhausting gases present within the process tube. The heat treatment equipment also comprises a hollow pressure control member interposed between the process tube and the exhaust duct, the pressure control member being operatively connected to the process tube and the exhaust duct respectively, and including one or a number of openings. Negative pressure is avoided in the process tube during heat treatment processes so that unwanted gas and impurities cannot enter the process tube from outside.

摘要翻译： 在一个实施例中，热处理设备包括处理管，连接到处理管的排气管道，以及在操作期间排出存在于处理管内的气体。 热处理设备还包括插入处理管和排气管之间的中空压力控制构件，压力控制构件分别可操作地连接到处理管和排气管，并且包括一个或多个开口。 在热处理过程中，在处理管中避免负压，使得不需要的气体和杂质不能从外部进入工艺管。

公开(公告)号：US20050091781A1

公开(公告)日：2005-05-05

申请号：US10980020

申请日：2004-11-03

申请人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Tae-Jin Hwang

发明人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Tae-Jin Hwang

IPC分类号： H01L21/027 ,  B08B5/00 ,  B08B5/02 ,  B08B11/00 ,  G03F7/20

CPC分类号： G03F1/66 ,  B08B5/00 ,  B08B5/02 ,  G03F7/70741 ,  G03F7/70933

摘要： The present invention relates to a reticule storage device. After the reticule storage device influxes external airs using a motor and a fan, it provides the external airs filtered by a filter to a reticule storage shelf in a chamber. According to the present invention, a nitrogen gas supply pipe is installed on one end of the chamber. In addition, the nitrogen gas supplier is installed to be connected from the nitrogen gas supplier to the reticule storage shelf. Several nitrogen gas supply nozzles are installed on an end portion of the nitrogen gas supply pipe, so that nitrogen gas is supplied to maintain a regular pressure in the chamber when a motor inflowing external airs is stopped. As a result, in case that an apparatus is stopped due to a problem of the apparatus for many hours, or an external voltage is not supplied due to a problem of the external problem, nitrogen gases may be purged in the apparatus. Accordingly, the purity in the apparatus can be maintained, so that it is possible to prevent a reticule kept in the apparatus from a particle contamination.

摘要翻译： 本发明涉及网状存储装置。 在网状存储装置使用马达和风扇冲入外部空气之后，它将由过滤器过滤的外部空气提供到腔室中的网状物存放架。 根据本发明，氮气供给管安装在室的一端。 此外，氮气供应器安装成从氮气供应器连接到网状物存放架。 在氮气供给管的端部安装有若干个氮气供给喷嘴，在电动机流入外部空气停止时，供给氮气来维持室内的规定的压力。 结果，由于设备由于该设备的问题停止了许多小时，或由于外部问题而不提供外部电压的情况，在设备中可以清除氮气。 因此，可以保持装置中的纯度，使得可以防止保持在装置中的网状物免受颗粒污染。

公开(公告)号：US20080196515A1

公开(公告)日：2008-08-21

申请号：US12031086

申请日：2008-02-14

申请人： Ok-Sun Lee ,  Hyung-Seok Choi ,  Yo-Han Ahn ,  Ji-Young Kim

发明人： Ok-Sun Lee ,  Hyung-Seok Choi ,  Yo-Han Ahn ,  Ji-Young Kim

IPC分类号： G01N1/14

CPC分类号： G03F1/82 ,  G01N2015/0687

摘要： A contamination analysis unit and method for inspecting pollutants remaining on a target side of an inspection object such as a reticle after cleaning the object is provided. After steeping the target side in a solution, a sampling liquid may be abstracted therefrom after a predetermined time and may be analyzed.

摘要翻译： 提供了一种污染分析单元和用于检查在清洁物体之后残留在诸如掩模版之类的检查对象的目标侧上的污染物的方法。 在将目标侧浸入溶液中之后，可以在预定时间之后从其中抽取取样液体并进行分析。