公开(公告)号：US20130084438A1

公开(公告)日：2013-04-04

申请号：US13613437

申请日：2012-09-13

Applicant: Kaoru IWATO ,  Hideaki TSUBAKI ,  Shuji HIRANO

Inventor： Kaoru IWATO ,  Hideaki TSUBAKI ,  Shuji HIRANO

IPC: G03F7/004 ,  B32B3/10 ,  G03F7/20

CPC classification number: G03F7/11 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/2059 ,  G03F7/325 ,  G03F7/40

Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition containing (A) a resin that contains a repeating unit having a partial structure represented by the specific formula and can decrease the solubility for a developer containing an organic solvent by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an electron beam or an extreme ultraviolet ray, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 提供一种图案形成方法，其包括（1）通过使用电子束敏感或极紫外线敏感性树脂组合物形成膜的步骤，所述树脂组合物含有（A）含有具有由具体的 并且可以通过酸的作用降低含有有机溶剂的显影剂的溶解度，和（B）在用电子束或极紫外线照射时能够产生酸的化合物，（2）曝光步骤 通过使用电子束或极紫外线的膜，以及（4）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。

公开(公告)号：US20130078433A1

公开(公告)日：2013-03-28

申请号：US13614797

申请日：2012-09-13

Applicant: Kaoru IWATO ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA

Inventor： Kaoru IWATO ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA

IPC: G03F7/038 ,  B32B3/10 ,  G03F7/20

CPC classification number: G03F7/0045 ,  B32B3/10 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C309/19 ,  C07C309/24 ,  C07D327/10 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38 ,  Y10T428/24802

Abstract: Provided are an actinic-ray-sensitive or a radiation-sensitive resin composition with greater residual film ratio and capable of suppressing pattern collapse and an occurrence of bridge defects after development, and a resist film, a pattern forming method, an electronic device manufacturing method, and an electronic device, each using the same. An actinic-ray-sensitive or radiation-sensitive resin composition includes a resin (P) having a repeating unit (a) represented by following General Formula (I), a compound (B) represented by any of following General Formulae (B-1) to (B-3), and a solvent, in General Formula (I), R0 represents a hydrogen atom or a methyl group, and R1, R2 and R3 each independently represent a straight chain or branched alkyl group.

Abstract translation: 本发明提供了具有更大的残留膜比并且能够抑制图案塌陷和显影后的桥缺陷的发生的光化学敏感性或辐射敏感性树脂组合物，以及抗蚀剂膜，图案形成方法，电子器件制造方法 ，以及各自使用的电子设备。 光化射线敏感性或辐射敏感性树脂组合物包含具有下述通式（I）表示的重复单元（a）的树脂（P），下述通式（B-1） ）至（B-3），和通式（I）中的R 0表示氢原子或甲基的溶剂，R 1，R 2和R 3各自独立地表示直链或支链烷基。

公开(公告)号：US20120077122A1

公开(公告)日：2012-03-29

申请号：US13245326

申请日：2011-09-26

Applicant: Kaoru IWATO ,  Keita KATO

Inventor： Kaoru IWATO ,  Keita KATO

IPC: H01L21/02 ,  G03F7/30 ,  G03F7/039

CPC classification number: G03F7/0382 ,  G03F7/0048 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40

Abstract: A pattern forming method includes: (i) forming a film from a chemical amplification resist composition that contains (A) a resin, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a tertiary alcohol; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

Abstract translation: 图案形成方法包括：（i）从化学放大抗蚀剂组合物形成膜，其包含（A）树脂，（B）在通过光化射线或辐射照射时能够产生酸的化合物和（C） 醇; （ii）曝光胶片; 和（iii）通过使用含有有机溶剂的显影剂进行显影。