公开(公告)号：US12060317B2

公开(公告)日：2024-08-13

申请号：US17331869

申请日：2021-05-27

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Masahiro Fukushima ,  Satoshi Watanabe ,  Ryosuke Taniguchi ,  Naoya Inoue

IPC分类号： G03F7/004 ,  C07C303/32 ,  C07C309/06 ,  C07C309/19 ,  C07C309/24 ,  C07C381/12 ,  G03F1/22 ,  G03F7/037 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26

CPC分类号： C07C381/12 ,  C07C303/32 ,  C07C309/06 ,  C07C309/19 ,  C07C309/24 ,  G03F1/22 ,  G03F7/0045 ,  G03F7/037 ,  G03F7/0382 ,  G03F7/2004 ,  G03F7/26

摘要： An onium salt having a partial structure of formula (A) is provided wherein Ra1 and Ra2 are hydrogen or a C1-C10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH2— may be replaced by —O— or —C(═O)—, both Ra1 and Ra2 are not hydrogen at the same time, Ra1 and Ra2 may bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

公开(公告)号：US20240069442A1

公开(公告)日：2024-02-29

申请号：US18503696

申请日：2023-11-07

申请人： International Business Machines Corporation

发明人： Gerhard Ingmar Meijer ,  Valery Weber ,  Peter Willem Jan Staar

IPC分类号： G03F7/26 ,  C07C309/06 ,  C07C309/19 ,  C07C309/30 ,  C07C309/39 ,  C07C311/48 ,  C07D285/16 ,  C07F7/22 ,  C07F9/92 ,  C07F9/94 ,  G03F7/004

CPC分类号： G03F7/26 ,  C07C309/06 ,  C07C309/19 ,  C07C309/30 ,  C07C309/39 ,  C07C311/48 ,  C07D285/16 ,  C07F7/2208 ,  C07F9/92 ,  C07F9/94 ,  G03F7/0045 ,  C07C381/12 ,  C07C2602/42

摘要： The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×107·cm2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

公开(公告)号：US11720019B2

公开(公告)日：2023-08-08

申请号：US17157011

申请日：2021-01-25

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Jun Hatakeyama ,  Tomomi Watanabe

IPC分类号： G03F7/004 ,  C07C381/12 ,  G03F7/038 ,  C07C65/10 ,  C07C61/135 ,  C07C59/115 ,  C07C205/58 ,  C07C63/70 ,  C07C311/03 ,  C07D275/06 ,  C07C309/19 ,  C08F220/18 ,  C08F212/14 ,  G03F7/039

CPC分类号： G03F7/0045 ,  C07C59/115 ,  C07C61/135 ,  C07C63/70 ,  C07C65/10 ,  C07C205/58 ,  C07C309/19 ,  C07C311/03 ,  C07C381/12 ,  C07D275/06 ,  C08F212/24 ,  C08F220/1806 ,  G03F7/0382 ,  G03F7/0392 ,  C07C2603/62 ,  C07C2603/74

摘要： A resist composition comprising a quencher containing a sulfonium salt having the formula (A).

公开(公告)号：US20180092925A1

公开(公告)日：2018-04-05

申请号：US15833073

申请日：2017-12-06

申请人： Pfizer Inc.

发明人： Patricia Ann Basford ,  Anthony Michael Campeta ,  Adam Gillmore ,  Matthew Cameron Jones ,  Eleftherios Kougoulos ,  Suman Luthra ,  Robert Walton

IPC分类号： A61K31/55 ,  A61K45/06 ,  C07D487/06 ,  C07C57/145 ,  C07C309/19

CPC分类号： A61K31/55 ,  A61K45/06 ,  C07C57/145 ,  C07C309/19 ,  C07D487/06

摘要： The present invention relates to novel polymorphic forms of 8-fluoro-2-{4-[(methylamino)methyl]phenyl}-1,3,4,5-tetrahydro-6H-azepino[5,4,3-cd]indol-6-one, and to processes for their preparation. Such polymorphic forms may be a component of a pharmaceutical composition and may be used to treat a mammalian disease condition mediated by poly(ADP-ribose) polymerase activity including the disease condition such as cancer.

公开(公告)号：US09926327B2

公开(公告)日：2018-03-27

申请号：US15426292

申请日：2017-02-07

申请人： Zoetis Services LLC

发明人： Timothy Lee Stuk ,  Denis Billen ,  Valerie Sue Westrick ,  Vageesha Warnajith Liyana Gunawardana

IPC分类号： C07D487/04 ,  C07C303/22 ,  C07C303/32 ,  C07C309/19 ,  C07C309/24 ,  C07C309/30

CPC分类号： C07D487/04 ,  C07C303/22 ,  C07C303/32 ,  C07C309/19 ,  C07C309/24 ,  C07C309/30

摘要： Described herein are improved processes for the preparation of the 7H-pyrrolo[2,3-d]pyrimidine compound, N-methyl-1-{trans-4-[methyl(7H-pyrrolo[2,3-d]pyrimidin-4-yl)amino]cyclohexyl}-methanesulfonamide, intermediates thereof, and veterinary acceptable salts thereof.

公开(公告)号：US09766541B2

公开(公告)日：2017-09-19

申请号：US15186044

申请日：2016-06-17

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Hiroto Yamazaki ,  Yoshitaka Komuro ,  Masatoshi Arai ,  Daisuke Kawana ,  Kenta Suzuki ,  Tatsuya Fujii

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  C08F216/10 ,  G03F7/038 ,  H01L21/027 ,  C07C65/10 ,  C07C309/06 ,  C07C309/12 ,  C07C309/19 ,  C07C381/12

CPC分类号： G03F7/0045 ,  C07C65/10 ,  C07C309/06 ,  C07C309/12 ,  C07C309/19 ,  C07C381/12 ,  C07C2602/42 ,  C07C2603/74 ,  C08F216/10 ,  G03F7/004 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/2059 ,  G03F7/322 ,  H01L21/0274

摘要： A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0): Z01 to Z04 each independently represent a substituent having electron withdrawing properties, Rb21 and Rb22 each independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rb1 represents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0− represents an organic anion.

公开(公告)号：US20170233397A1

公开(公告)日：2017-08-17

申请号：US15426292

申请日：2017-02-07

申请人： Zoetis Services LLC

发明人： Timothy Lee Stuk ,  Denis Billen ,  Valerie Sue Westrick ,  Vageesha Warnajith Liyana Gunawardana

IPC分类号： C07D487/04 ,  C07C309/19 ,  C07C309/24 ,  C07C303/32 ,  C07C303/22

CPC分类号： C07D487/04 ,  C07C303/22 ,  C07C303/32 ,  C07C309/19 ,  C07C309/24 ,  C07C309/30

摘要： Described herein are improved processes for the preparation of the 7H-pyrrolo[2,3-d]pyrimidine compound, N-methyl-1-{trans-4-[methyl(7H-pyrrolo[2,3-d]pyrimidin-4-yl)amino]cyclohexyl}-methanesulfonamide, intermediates thereof, and veterinary acceptable salts thereof.

公开(公告)号：US09682951B2

公开(公告)日：2017-06-20

申请号：US15077034

申请日：2016-03-22

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Takashi Nagamine ,  Kotaro Endo ,  Miki Shinomiya

IPC分类号： C07D333/54 ,  C07C65/10 ,  C07C53/21 ,  C07C53/19 ,  C07C309/19 ,  C07C309/06 ,  C07C307/02 ,  G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C07D327/04 ,  C07D285/16 ,  C07D493/08 ,  C07C309/12 ,  C07C309/17 ,  C07C311/04 ,  C07C61/135

CPC分类号： C07D333/54 ,  C07C53/21 ,  C07C61/135 ,  C07C65/10 ,  C07C307/02 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C309/19 ,  C07C311/04 ,  C07C2603/68 ,  C07C2603/74 ,  C07D285/16 ,  C07D327/04 ,  C07D493/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component including a compound (B0-1) represented by general formula (b0) shown below in which Ra1 represents an aromatic ring; Ra01 represents an alkyl group of 5 or more carbon atoms optionally having a substituent; Ra02 and Ra03 each independently represents an alkyl group of 1 to 10 carbon atoms optionally having a substituent; n1 represents an integer of 1 to 5; n2 represents an integer of 0 to 2; n3 represents an integer of 0 to 4; and X− represents a counteranion.

公开(公告)号：US20170108774A1

公开(公告)日：2017-04-20

申请号：US15294023

申请日：2016-10-14

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Jun Hatakeyama ,  Masaki Ohashi

IPC分类号： G03F7/004 ,  G03F7/32 ,  G03F7/20 ,  G03F7/40 ,  G03F7/039 ,  G03F7/16

CPC分类号： G03F7/0045 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/19 ,  C07C309/23 ,  C07C309/24 ,  C08F220/22 ,  C08F220/24 ,  C08F220/38 ,  C08F224/00 ,  C08F228/02 ,  C08F2220/283 ,  C08F2220/303 ,  C08F2220/382 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40

摘要： A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a cyclic hydrocarbon-substituted amino group offers dimensional stability on PPD and a satisfactory resolution.

公开(公告)号：US09522911B2

公开(公告)日：2016-12-20

申请号：US14338923

申请日：2014-07-23

申请人： Jeil Pharmaceutical Co., Ltd.

发明人： In-Hae Ye ,  Chun-Ho Park ,  Jong-Hee Choi ,  Dong-il Kang

IPC分类号： C07D471/04 ,  C07C53/06 ,  C07C55/10 ,  C07C55/14 ,  C07C57/145 ,  C07C57/15 ,  C07C59/245 ,  C07C59/255 ,  C07C229/24 ,  C07C307/02 ,  C07C309/04 ,  C07C309/19 ,  C07C309/29 ,  C07D239/22

CPC分类号： C07D471/04 ,  C07C53/06 ,  C07C55/10 ,  C07C55/14 ,  C07C57/145 ,  C07C57/15 ,  C07C59/245 ,  C07C59/255 ,  C07C229/24 ,  C07C307/02 ,  C07C309/04 ,  C07C309/19 ,  C07C309/29 ,  C07D239/22

摘要： The present invention relates to a novel crystalline acid salt of a tricyclic derivative or a hydrate thereof and a production method thereof. The crystalline acid salt or the hydrate thereof according to the present invention is stable with respect to humidity and stable with respect to hygroscopicity, and the quality control during manufacturing drugs is favorable. In addition, the crystalline acid salt or the hydrate thereof may be used in a pharmaceutical composition for preventing or treating neuropathic pain, epilepsy, stroke, Alzheimer's disease, Parkinson's disease, amyotrophic lateral sclerosis (ALS), Huntington's disease, schizophrenia, chronic and acute pain, ischemic brain injury, neuronal loss after hypoxia, trauma and nerve damage, which are medical conditions induced by PARP overactivity.

摘要翻译： 本发明涉及三环衍生物或其水合物的新型结晶酸盐及其制备方法。 根据本发明的结晶酸盐或其水合物在湿度方面是稳定的，并且在吸湿性方面是稳定的，并且制造药物期间的质量控制是有利的。 此外，结晶酸盐或其水合物可用于预防或治疗神经性疼痛，癫痫，中风，阿尔茨海默病，帕金森病，肌萎缩性侧索硬化（ALS），亨廷顿病，精神分裂症，慢性和急性 疼痛，缺血性脑损伤，缺氧后的神经元损失，创伤和神经损伤，这是由PARP过度活动引起的医学病症。