PROCESS CHAMBERS HAVING SHARED RESOURCES AND METHODS OF USE THEREOF
    11.
    发明申请
    PROCESS CHAMBERS HAVING SHARED RESOURCES AND METHODS OF USE THEREOF 审中-公开
    具有共享资源的过程池及其使用方法

    公开(公告)号:US20110269314A1

    公开(公告)日:2011-11-03

    申请号:US12905032

    申请日:2010-10-14

    CPC classification number: H01L21/67109 H01L21/6719

    Abstract: Process chambers having shared resources and methods of use are provided. In some embodiments, substrate processing systems may include a first process chamber having a first substrate support disposed within the first process chamber, wherein the first substrate support has a first heater and a first cooling plate to control a temperature of the first substrate support; a second process chamber having a second substrate support disposed within the second process chamber, wherein the second substrate support has a second heater and a second cooling plate to control a temperature of the second substrate support; and a shared heat transfer fluid source having an outlet to provide a heat transfer fluid to the first cooling plate and the second cooling plate and an inlet to receive the heat transfer fluid from the first cooling plate and the second cooling plate.

    Abstract translation: 提供了具有共享资源和使用方法的过程室。 在一些实施例中,衬底处理系统可以包括第一处理室,其具有设置在第一处理室内的第一衬底支撑件,其中第一衬底支撑件具有第一加热器和第一冷却板以控制第一衬底支撑件的温度; 第二处理室,具有设置在所述第二处理室内的第二基板支撑件,其中所述第二基板支撑件具有第二加热器和第二冷却板,以控制所述第二基板支撑件的温度; 以及共用传热流体源,其具有出口以向第一冷却板和第二冷却板提供传热流体,以及从第一冷却板和第二冷却板接收传热流体的入口。

    SYSTEM AND METHOD FOR CALIBRATING PRESSURE GAUGES IN A SUBSTRATE PROCESSING SYSTEM
    12.
    发明申请
    SYSTEM AND METHOD FOR CALIBRATING PRESSURE GAUGES IN A SUBSTRATE PROCESSING SYSTEM 有权
    用于在基板处理系统中校准压力计的系统和方法

    公开(公告)号:US20110265899A1

    公开(公告)日:2011-11-03

    申请号:US12916450

    申请日:2010-10-29

    CPC classification number: G01L27/005 H01L21/67253 Y10T137/86083

    Abstract: Systems and methods for calibrating pressure gauges in one or more process chambers coupled to a transfer chamber having a transfer volume is disclosed herein. The method includes providing a first pressure in the transfer volume and in a first inner volume of a first process chamber coupled to the transfer chamber, wherein the transfer volume and the first inner volume are fluidly coupled, injecting a calibration gas into the transfer volume to raise a pressure in the transfer volume and in the first inner volume to a second pressure, measuring the second pressure using each of a reference pressure gauge coupled to the transfer chamber and a first pressure gauge coupled to the first process chamber while the transfer volume and the first inner volume are fluidly coupled, and calibrating the first pressure gauge based on a difference in the measured second pressure between the reference pressure gauge and the first pressure gauge.

    Abstract translation: 本文公开了用于校准耦合到具有转移体积的转移室的一个或多个处理室中的压力计的系统和方法。 该方法包括在传送体积和连接到传送室的第一处理室的第一内部容积中提供第一压力,其中传送体积和第一内部体积被流体耦合,将校准气体注入到传送体积中 将传送体积和第一内部体积中的压力提高到第二压力,使用耦合到传送室的参考压力表中的每一个测量第二压力,以及耦合到第一处理室的第一压力表,同时传送体积和 第一内部体积流体耦合,并且基于测量的参考压力计和第一压力计之间的第二压力的差异校准第一压力计。

    APPARATUS FOR CONTROLLING GAS DISTRIBUTION USING ORIFICE RATIO CONDUCTANCE CONTROL
    13.
    发明申请
    APPARATUS FOR CONTROLLING GAS DISTRIBUTION USING ORIFICE RATIO CONDUCTANCE CONTROL 有权
    用于控制比例控制的气体分配设备

    公开(公告)号:US20120097266A1

    公开(公告)日:2012-04-26

    申请号:US13091827

    申请日:2011-04-21

    Abstract: Apparatus for controlling gas distribution are provided. In some embodiments, apparatus for controlling gas distribution may include a first flow path from an inlet to a first outlet; a plurality of first orifices disposed within the first flow path; a plurality of first valves that control gas flow through the plurality of first orifices to control a total gas flow at the first outlet; a second flow path from the inlet to a second outlet; a plurality of second orifices disposed along the second flow path; a plurality of second valves that control gas flow through respective ones of the plurality of second orifices to control a total gas flow at the second outlet; and a mounting block having the plurality of first valves and second valves coupled thereto, wherein at least a portion of the first flow path and the second flow path is disposed within the mounting block.

    Abstract translation: 提供了用于控制气体分布的装置。 在一些实施例中,用于控制气体分配的装置可以包括从入口到第一出口的第一流动路径; 设置在第一流路内的多个第一孔; 多个第一阀,其控制通过所述多个第一孔的气体流,以控制在所述第一出口处的总气流; 从入口到第二出口的第二流动路径; 沿所述第二流路布置的多个第二孔; 多个第二阀,其控制通过所述多个第二孔中的相应孔的气体流动,以控制在所述第二出口处的总气流; 以及安装块,其具有联接到其上的多个第一阀和第二阀,其中第一流动路径和第二流动路径的至少一部分设置在安装块内。

    TWIN CHAMBER PROCESSING SYSTEM WITH SHARED VACUUM PUMP
    14.
    发明申请
    TWIN CHAMBER PROCESSING SYSTEM WITH SHARED VACUUM PUMP 审中-公开
    具有共享真空泵的双腔加工系统

    公开(公告)号:US20110265884A1

    公开(公告)日:2011-11-03

    申请号:US12907952

    申请日:2010-10-19

    Abstract: Methods and apparatus for twin chamber processing systems are disclosed, and, in some embodiments, may include a first process chamber having a first vacuum pump to maintain a first operating pressure in a first processing volume selectively isolatable by a first gate valve disposed between the first processing volume and the first vacuum pump; a second process chamber having a second vacuum pump for maintaining a second operating pressure in a second processing volume selectively isolatable by a second gate valve disposed between the second processing volume and the second vacuum pump; and a shared vacuum pump coupled to the first and second processing volumes to reduce a pressure in each processing volume below a critical pressure level, wherein the shared vacuum pump can be selectively isolated from any of the first or second process chambers or the first or second vacuum pumps.

    Abstract translation: 公开了用于双室处理系统的方法和装置,并且在一些实施例中,可以包括具有第一真空泵的第一处理室,以保持第一处理容积中的第一操作压力,所述第一处理容积可选择性地通过设置在第一 加工量和第一台真空泵; 具有第二真空泵的第二处理室,用于保持第二处理容积中的第二操作压力,所述第二处理容积可由设置在所述第二处理容积和所述第二真空泵之间的第二闸阀选择性分离; 以及耦合到所述第一和第二处理体积的共享真空泵,以将每个处理体积中的压力降低到临界压力水平以下,其中所述共享真空泵可以选择性地与所述第一或第二处理室中的任何一个或所述第一或第二处理室隔离 真空泵。

    SINGLE STAGE STARTER/GENERATOR WITH ROTOR QUADRATURE AC EXCITATION
    16.
    发明申请
    SINGLE STAGE STARTER/GENERATOR WITH ROTOR QUADRATURE AC EXCITATION 失效
    单级起动器/发电机,带有转子四次交流励磁

    公开(公告)号:US20090243417A1

    公开(公告)日:2009-10-01

    申请号:US12060787

    申请日:2008-04-01

    CPC classification number: H02K7/20 H02K3/28 H02K19/38

    Abstract: When driven by a variable speed prime mover, a generator system provides relatively constant frequency AC power by independently controlling the main rotor flux rotational speed. The generator system includes an exciter stator that induces current in the exciter rotor windings at a desired frequency and phasing. The exciter rotor windings are electrically connected to and located in a common core as the main rotor windings to provide two-phase excitation current to the main rotor windings. The exciter stator winding is also located in a common core as the main generator stator windings. Excitation is supplied to the exciter stator from an exciter controller, which controls the frequency and phasing of the exciter excitation, based on the rotational speed and rotor position of the generator, to maintain a constant output frequency. The exciter frequency control function of the exciter controller may be eliminated when the generator system is driven by a constant speed prime mover or when a narrow band variable frequency output is required.

    Abstract translation: 当由可变速原动机驱动时,发电机系统通过独立地控制主转子磁通转速提供相对恒定的交流电力。 发电机系统包括激励器定子,其以期望的频率和定相在励磁机转子绕组中感应电流。 励磁机转子绕组与主转子绕组电连接并位于公共芯中,以向主转子绕组提供两相励磁电流。 励磁机定子绕组也位于公共铁心中作为主发电机定子绕组。 激励从激励器控制器提供给励磁机定子,励磁机控制器基于发电机的转速和转子位置来控制励磁机励磁的频率和定相,以保持恒定的输出频率。 当发电机系统由恒速原动机驱动时或者当需要窄带可变频率输出时,可以消除励磁机控制器的励磁机频率控制功能。

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