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公开(公告)号:US20210005430A1
公开(公告)日:2021-01-07
申请号:US16993775
申请日:2020-08-14
Applicant: MKS Instruments, Inc.
Inventor: Mohammad Kamarehi , Ken Trenholm , Colin Sanford , Kevin Wenzel , Olivia Keller
Abstract: A microwave system has a solid-state generator which generates microwave energy and includes at least one control input for receiving a control signal to vary electrically a parameter of the microwave energy. A microwave load receives the microwave energy and produces an effect in response to the microwave energy. A microwave conducting element couples the microwave energy to the microwave load. An impedance match adjusting device is coupled to the microwave conducting element to vary at least one of the parameters of the microwave energy. The effect produced in response to the microwave energy is altered by both electrical variation of the parameter of the microwave energy via the control signal and adjustment of the impedance match adjusting device to vary the parameter of the microwave energy.
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12.
公开(公告)号:US20200099199A1
公开(公告)日:2020-03-26
申请号:US16682693
申请日:2019-11-13
Applicant: MKS Instruments, Inc.
Inventor: Atul Gupta , Colin Sanford , Joshua Lamontagne , Kevin Wenzel
Abstract: An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a grounded region in the vicinity of the plasma confining volume. A parameter in the ignition circuit is sensed, and the sensed parameter is compared to a first parameter threshold. A condition associated with the plasma confining volume is determined if the sensed parameter differs from the first voltage threshold, and a corrective action can be taken.
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公开(公告)号:US10535506B2
公开(公告)日:2020-01-14
申请号:US15404457
申请日:2017-01-12
Applicant: MKS Instruments, Inc.
Inventor: Gordon Hill , Scott Benedict , Kevin Wenzel
Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.
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公开(公告)号:US20170200591A1
公开(公告)日:2017-07-13
申请号:US15404457
申请日:2017-01-12
Applicant: MKS Instruments, Inc.
Inventor: Gordon Hill , Scott Benedict , Kevin Wenzel
CPC classification number: H01J37/32862 , F16K1/22 , F16K3/06 , F16K15/026 , F16K51/02 , H01J37/32348 , H01J37/32568 , H01J37/32844 , H01J37/32963 , Y02C20/30
Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.
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