Plasma enhanced chemical deposition for high and/or low index of refraction polymers
    18.
    发明授权
    Plasma enhanced chemical deposition for high and/or low index of refraction polymers 有权
    用于高和/或低折射率聚合物的等离子体增强化学沉积

    公开(公告)号:US06858259B2

    公开(公告)日:2005-02-22

    申请号:US09811919

    申请日:2001-03-19

    CPC分类号: B05D1/62

    摘要: A method for making a polymer layer with a selected index of refraction. The method includes flash evaporating a polymer precursor material capable of cross linking into a polymer with the selected index of refraction, forming an evaporate, passing the evaporate to a glow discharge electrode creating a glow discharge polymer precursor plasma from the evaporate, and cryocondensing the glow discharge polymer precursor plasma on a substrate as a condensate and crosslinking the condensate thereon, the crosslinking resulting from radicals created in the glow discharge polymer precursor plasma, forming a polymer having the selected index of refraction.

    摘要翻译: 一种制备具有选定折射率的聚合物层的方法。 该方法包括将能够与所选择的折射率交联的聚合物前体材料闪蒸,蒸发,将蒸发物通过辉光放电电极,从蒸发器产生辉光放电聚合物前体等离子体,并冷凝发光 将基板上的聚合物前体等离子体作为冷凝物排出,并将其上的冷凝物交联,由在辉光放电聚合物前体等离子体中产生的自由基产生的交联,形成具有所选折射率的聚合物。