Method of making a coating of a microtextured surface
    1.
    发明授权
    Method of making a coating of a microtextured surface 有权
    制作微结构表面涂层的方法

    公开(公告)号:US06811829B2

    公开(公告)日:2004-11-02

    申请号:US09811869

    申请日:2001-03-19

    IPC分类号: H05H100

    CPC分类号: B05D1/62

    摘要: A method for conformally coating a microtextured surface. The method includes flash evaporating a polymer precursor forming an evaporate, passing the evaporate to a glow discharge electrode creating a glow discharge polymer precursor plasma from the evaporate, cryocondensing the glow discharge polymer precursor plasma on the microtextured surface and crosslinking the glow discharge polymer precursor plasma thereon, wherein the crosslinking resulting from radicals created in the glow discharge polymer precursor plasma.

    摘要翻译: 一种用于保形涂布微结构表面的方法。 该方法包括闪蒸蒸发形成蒸发物的聚合物前体,将蒸发物通过辉光放电电极,从蒸发器产生辉光放电聚合物前体等离子体,将辉光放电聚合物前体等离子体冷凝在微结构表面上并交联辉光放电聚合物前体等离子体 其上由在辉光放电聚合物前体等离子体中产生的自由基产生的交联。

    Plasma enhanced chemical deposition for high and/or low index of refraction polymers
    3.
    发明授权
    Plasma enhanced chemical deposition for high and/or low index of refraction polymers 有权
    用于高和/或低折射率聚合物的等离子体增强化学沉积

    公开(公告)号:US06858259B2

    公开(公告)日:2005-02-22

    申请号:US09811919

    申请日:2001-03-19

    CPC分类号: B05D1/62

    摘要: A method for making a polymer layer with a selected index of refraction. The method includes flash evaporating a polymer precursor material capable of cross linking into a polymer with the selected index of refraction, forming an evaporate, passing the evaporate to a glow discharge electrode creating a glow discharge polymer precursor plasma from the evaporate, and cryocondensing the glow discharge polymer precursor plasma on a substrate as a condensate and crosslinking the condensate thereon, the crosslinking resulting from radicals created in the glow discharge polymer precursor plasma, forming a polymer having the selected index of refraction.

    摘要翻译: 一种制备具有选定折射率的聚合物层的方法。 该方法包括将能够与所选择的折射率交联的聚合物前体材料闪蒸,蒸发,将蒸发物通过辉光放电电极,从蒸发器产生辉光放电聚合物前体等离子体,并冷凝发光 将基板上的聚合物前体等离子体作为冷凝物排出,并将其上的冷凝物交联,由在辉光放电聚合物前体等离子体中产生的自由基产生的交联,形成具有所选折射率的聚合物。

    Method of making an encapsulated plasma sensitive device
    8.
    发明授权
    Method of making an encapsulated plasma sensitive device 有权
    制造封装等离子体敏感器件的方法

    公开(公告)号:US07510913B2

    公开(公告)日:2009-03-31

    申请号:US11439474

    申请日:2006-05-23

    IPC分类号: H01L21/44 H01L21/48 H01L21/50

    摘要: A method of making an encapsulated plasma sensitive device. The method comprises: providing a plasma sensitive device adjacent to a substrate; depositing a plasma protective layer on the plasma sensitive device using a process selected from non-plasma based processes, or modified sputtering processes; and depositing at least one barrier stack adjacent to the plasma protective layer, the at least one barrier stack comprising at least one decoupling layer and at least one barrier layer, the plasma sensitive device being encapsulated between the substrate and the at least one barrier stack, wherein the decoupling layer, the barrier layer, or both are deposited using a plasma process, the encapsulated plasma sensitive device having a reduced amount of damage caused by the plasma compared to an encapsulated plasma sensitive device made without the plasma protective layer. An encapsulated plasma sensitive device is also described.

    摘要翻译: 一种制造封装等离子体敏感装置的方法。 该方法包括:提供与衬底相邻的等离子体敏感器件; 使用选自非等离子体工艺或改进的溅射工艺的工艺在等离子体敏感器件上沉积等离子体保护层; 以及沉积与所述等离子体保护层相邻的至少一个势垒堆叠,所述至少一个势垒堆叠包括至少一个去耦层和至少一个势垒层,所述等离子体敏感器件封装在所述衬底和所述至少一个阻挡层之间, 其中使用等离子体工艺沉积去耦层,阻挡层或两者,所述封装等离子体敏感器件与不具有等离子体保护层的封装的等离子体感应器件相比,具有由等离子体引起的损伤量减少。 还描述了封装的等离子体敏感器件。