Idle speed control device for internal combustion engine
    11.
    发明授权
    Idle speed control device for internal combustion engine 有权
    内燃机空转速度控制装置

    公开(公告)号:US6065447A

    公开(公告)日:2000-05-23

    申请号:US246733

    申请日:1999-02-09

    IPC分类号: F02M69/00 F02M69/32 F16K31/06

    CPC分类号: F02M69/32 F02M2200/502

    摘要: An idle speed control device has a valve portion disposed in an auxiliary intake air passage by-passing a throttle valve disposed in a main intake air passage for opening and closing a valve provided in the auxiliary air passage, and a spring urging the valve portion to close. The spring is arranged in a portion separated from the air flow in the auxiliary intake air passage, and the valve portion has a guide portion formed therein to be integrated therewith for guiding sliding of the valve portion.

    摘要翻译: 怠速控制装置具有设置在辅助进气通道中的阀部分,旁通设置在主进气通道中的节流阀,用于打开和关闭设置在辅助空气通道中的阀,以及将阀部分推压到 关。 弹簧布置在与辅助进气通道中的气流分开的部分中,并且阀部分具有形成在其中的引导部分,以与其一体地引导以引导阀部分的滑动。

    Cassette chamber
    12.
    发明授权
    Cassette chamber 失效
    盒式室

    公开(公告)号:US5857827A

    公开(公告)日:1999-01-12

    申请号:US910057

    申请日:1997-08-12

    CPC分类号: H01L21/67775 Y10S414/14

    摘要: A cassette chamber according to the present invention comprises a housing defining a space stored with a cassette for holding a plurality of objects of treatment, a lift base having a rotatable shaft and located in the housing for up-and-down motion, an auxiliary base fixed to the shaft and inclined at a predetermined angle to the longitudinal direction of the shaft, a cassette support having a bottom support portion set on the lift base and bearing the bottom face of the cassette and a back support portion rotatably supported by the auxiliary base and bearing the back face of the cassette, a rotation mechanism for rotating the shaft as the lift base ascends or descends, thereby rotating the auxiliary base and the cassette support between a first position inside the housing and a second position outside the housing, and a support section for keeping the back support portion of the cassette support parallel to the shaft by engaging the back support portion being rotated to the second position by the rotation mechanism and causing the back support portion to rotate relatively to the auxiliary base.

    摘要翻译: 根据本发明的盒室包括限定存储有用于保持多个处理对象的盒的空间的壳体,具有可旋转轴并位于壳体中用于上下运动的升降台,辅助基座 固定在轴上并且以与轴的纵向方向成预定角度倾斜;盒支架,其具有设置在提升基座上并承载盒的底面的底部支撑部分,以及由辅助基座可旋转地支撑的后支撑部分 并且承载所述盒的后表面,所述旋转机构用于当所述提升基座上升或下降时使所述轴旋转,从而使所述辅助基座和所述盒支撑件在所述壳体内部的第一位置和所述壳体外部的第二位置之间旋转, 支撑部分,用于通过使旋转的第二支撑部分接合到第二支杆上来保持盒支撑件的后支撑部分平行于轴 并且使后支撑部相对于辅助基座旋转。

    Self-bias measuring method, apparatus thereof and electrostatic chucking
apparatus
    13.
    发明授权
    Self-bias measuring method, apparatus thereof and electrostatic chucking apparatus 失效
    自偏置测量方法,其设备和静电吸附装置

    公开(公告)号:US5557215A

    公开(公告)日:1996-09-17

    申请号:US239982

    申请日:1994-05-09

    摘要: According to the present invention, there are provided a self-bias measurement method of measuring the self-bias voltage of an object when the object is subjected to a plasma process by using a plasma generated between a pair of electrodes, the object being held, by means of electrostatic chucking means having an electrostatic chucking electrode, on one of the pair of electrodes situated in a processing chamber, the method including the steps of detecting a leak current between the object and the electrostatic chucking electrode while varying the DC voltage applied to the electrostatic chucking electrode, and calculating the self-bias voltage of the object on the basis of the leak current detected, an apparatus for measuring the self-bias, and an electrostatic chucking apparatus having means capable of measuring the self-bias.

    摘要翻译: 根据本发明,提供了一种自偏置测量方法,其通过使用在一对电极之间产生的等离子体处理对物体进行等离子体处理时,测量物体的自偏压,被保持物体, 通过具有静电夹持电极的静电吸附装置,位于处理室中的一对电极中的一个电极上,该方法包括以下步骤:检测物体和静电吸持电极之间的漏电流,同时改变施加到 静电吸附电极,并且基于检测到的泄漏电流来计算物体的自偏压,用于测量自偏压的装置,以及具有能够测量自偏压的装置的静电夹持装置。

    FUEL INJECTOR HOLDER
    14.
    发明申请
    FUEL INJECTOR HOLDER 有权
    燃油喷射器支架

    公开(公告)号:US20120031996A1

    公开(公告)日:2012-02-09

    申请号:US12852905

    申请日:2010-08-09

    IPC分类号: B05B15/00 B23P19/00

    摘要: A fuel injector for an internal combustion engine having an elongated body with a fuel inlet end and a fuel discharge end. The injector body includes an outwardly extending plate attached at a position between its ends and this plate includes at least one radially outwardly extending tab so that the cross-sectional shape of the plate is noncircular. A fuel cup receives the fuel inlet end of the fuel injector and includes a radially inwardly extending ledge at a mid position of the cavity. This ledge includes a through bore complementary in shape to the shape of the plate so that, with the fuel injector and plate aligned at a predetermined angular assembly position, the plate passes through the ledge upon insertion of the fuel injector into the cavity. Thereafter, rotation of the fuel injector and attached plate to a locking position positions the tabs above the ledge thus locking the fuel injector to the fuel cup.

    摘要翻译: 一种用于内燃机的燃料喷射器,具有具有燃料入口端和燃料排出端的细长主体。 喷射器主体包括附接在其端部之间的位置处的向外延伸的板,并且该板包括至少一个径向向外延伸的突片,使得板的横截面形状是非圆形的。 燃料杯接收燃料喷射器的燃料入口端,并且在空腔的中间位置包括径向向内延伸的凸缘。 该凸缘包括与板的形状互补的通孔,使得当燃料喷射器和板在预定的角度组装位置对准时,板将燃料喷射器插入空腔中时通过凸缘。 此后,燃料喷射器和附接板旋转到锁定位置将突出部定位在突出部上方,从而将燃料喷射器锁定到燃料杯。

    Semiconductor processing system
    15.
    发明授权
    Semiconductor processing system 有权
    半导体处理系统

    公开(公告)号:US07857569B2

    公开(公告)日:2010-12-28

    申请号:US11774335

    申请日:2007-07-06

    IPC分类号: H01L21/677

    摘要: A supporting mechanism (12A) is used for transfer-ring a target substrate (W) in cooperation with a transfer arm (32), in a semiconductor processing system. The supporting mechanism includes first and second holding portions (38A to 38C, 40A to 40C) each configured to be moved up and down and transfer a substrate to and from the transfer arm. The first and second holding portions are configured to be moved relative to each other in a vertical direction without spatially interfering with each other, and support substrates at substantially the same horizontal coordinate position. The supporting mechanism further includes first and second drives (46, 48) configured to move the first and second holding portions up and down, and a controller (68) configured to control the first and second drives. The controller is arranged to control the first and second drives to alternatively support a substrate by the first and second holding portions.

    摘要翻译: 在半导体处理系统中,支撑机构(12A)用于与传送臂(32)协作传送环目标衬底(W)。 支撑机构包括每个被配置为上下移动并将基板传送到传送臂和从传送臂传送基板的第一和第二保持部分(38A至38C,40A至40C)。 第一保持部和第二保持部被配置为在垂直方向上相对于彼此移动而没有彼此空间干涉,并且将基板支撑在基本上相同的水平坐标位置。 支撑机构还包括构造成使第一和第二保持部分上下移动的第一和第二驱动器(46,48)以及被配置为控制第一和第二驱动器的控制器(68)。 控制器被布置成控制第一和第二驱动器以由第一和第二保持部分交替地支撑衬底。

    Transportation apparatus and drive mechanism
    16.
    发明授权
    Transportation apparatus and drive mechanism 有权
    运输装置及驱动机构

    公开(公告)号:US07837425B2

    公开(公告)日:2010-11-23

    申请号:US10564618

    申请日:2004-07-09

    IPC分类号: B25J18/02

    摘要: A transfer apparatus (20) for a target substrate (W) includes a rotatable rotary base (24). First and second arm mechanisms (26, 28) are attached to the rotary base and configured to bend and stretch. Each of the first and second arm mechanisms has a proximal end arm (26A, 28A), an intermediate arm (26B, 28B), and a pick (26C, 28C) which are pivotally coupled to each other sequentially from the rotary base. The picks are disposed to support the target substrate. A link mechanism (30) is coupled to the proximal end arms of the first and second arm mechanisms to drive the first and second arm mechanisms. A first driving source (32) is disposed to rotatably drive the rotary base. A second driving source (34) is disposed to drive the link mechanism so as to bend or stretch the first and second arm mechanisms.

    摘要翻译: 用于目标基板(W)的转印装置(20)包括可旋转的旋转基座(24)。 第一和第二臂机构(26,28)附接到旋转底座并且构造成弯曲和拉伸。 第一和第二臂机构中的每一个具有近端臂(26A,28A),中间臂(26B,28B)和拾取器(26C,28C),其从旋转底座依次枢转地联接。 设置拾取器以支撑目标衬底。 连杆机构(30)联接到第一和第二臂机构的近端臂以驱动第一和第二臂机构。 第一驱动源(32)设置成可旋转地驱动旋转底座。 第二驱动源(34)设置成驱动连杆机构以使第一和第二臂机构弯曲或拉伸。

    Method and apparatus for attenuating fuel pump noise in a direct injection internal combustion chamber
    17.
    发明授权
    Method and apparatus for attenuating fuel pump noise in a direct injection internal combustion chamber 有权
    用于在直接喷射内燃室中减轻燃油泵噪声的方法和装置

    公开(公告)号:US07527038B2

    公开(公告)日:2009-05-05

    申请号:US12166760

    申请日:2008-07-02

    IPC分类号: F02M61/14 F02M61/18

    摘要: An apparatus for attenuating fuel pump noise in a direct injection internal combustion engine. In one proposal, the direct injection fuel nozzle is suspended from a fuel rail in a fashion that avoids direct metal-to-metal contact between the injector and the engine block. The direct injection nozzle may also be connected to the fuel rail by a pair of spaced-apart seals which equalize the longitudinal pressure on the nozzle during operation. Enlarged diameter fuel reservoirs and/or a restricted orifice may be provided fluidly in series between the fuel pump and the direct injection nozzle in order to attenuate noise resulting from fuel pump pulsation. A clip holder and clip plate mount the fuel injector to the injector cup.

    摘要翻译: 一种用于在直喷式内燃机中减轻燃油泵噪声的装置。 在一个方案中,直接喷射燃料喷嘴以避免喷射器和发动机缸体之间的直接金属对金属接触的方式从燃料轨悬挂。 直接喷射喷嘴也可以通过一对间隔开的密封件连接到燃料轨道,该密封件在操作期间均衡喷嘴上的纵向压力。 可以在燃料泵和直接喷射喷嘴之间流体地串联提供扩大直径的燃料储存器和/或限制孔口,以便减少由燃料泵脉动引起的噪音。 夹持器和夹板将燃料喷射器安装到注射器杯。

    METHOD AND APPARATUS FOR ATTENUATING FUEL PUMP NOISE IN A DIRECT INJECTION INTERNAL COMBUSTION CHAMBER
    18.
    发明申请
    METHOD AND APPARATUS FOR ATTENUATING FUEL PUMP NOISE IN A DIRECT INJECTION INTERNAL COMBUSTION CHAMBER 有权
    直接喷射内燃机室内燃油泵噪声衰减的方法及装置

    公开(公告)号:US20080264386A1

    公开(公告)日:2008-10-30

    申请号:US12166760

    申请日:2008-07-02

    IPC分类号: F02M69/46

    摘要: An apparatus for attenuating fuel pump noise in a direct injection internal combustion engine. In one proposal, the direct injection fuel nozzle is suspended from a fuel rail in a fashion that avoids direct metal-to-metal contact between the injector and the engine block. The direct injection nozzle may also be connected to the fuel rail by a pair of spaced-apart seals which equalize the longitudinal pressure on the nozzle during operation. Enlarged diameter fuel reservoirs and/or a restricted orifice may be provided fluidly in series between the fuel pump and the direct injection nozzle in order to attenuate noise resulting from fuel pump pulsation. A clip holder and clip plate mount the fuel injector to the injector cup.

    摘要翻译: 一种用于在直喷式内燃机中减轻燃油泵噪声的装置。 在一个方案中,直接喷射燃料喷嘴以避免喷射器和发动机缸体之间的直接金属对金属接触的方式从燃料轨悬挂。 直接喷射喷嘴也可以通过一对间隔开的密封件连接到燃料轨道,该密封件在操作期间均衡喷嘴上的纵向压力。 可以在燃料泵和直接喷射喷嘴之间流体地串联提供扩大直径的燃料储存器和/或限制孔口,以便减少由燃料泵脉动引起的噪音。 夹持器和夹板将燃料喷射器安装到注射器杯。

    SEMICONDUCTOR PROCESSING SYSTEM
    19.
    发明申请
    SEMICONDUCTOR PROCESSING SYSTEM 有权
    半导体加工系统

    公开(公告)号:US20080187416A1

    公开(公告)日:2008-08-07

    申请号:US11774335

    申请日:2007-07-06

    IPC分类号: H01L21/67

    摘要: A supporting mechanism (12A) is used for transfer-ring a target substrate (W) in cooperation with a transfer arm (32), in a semiconductor processing system. The supporting mechanism includes first and second holding portions (38A to 38C, 40A to 40C) each configured to be moved up and down and transfer a substrate to and from the transfer arm. The first and second holding portions are configured to be moved relative to each other in a vertical direction without spatially interfering with each other, and support substrates at substantially the same horizontal coordinate position. The supporting mechanism further includes first and second drives (46, 48) configured to move the first and second holding portions up and down, and a controller (68) configured to control the first and second drives. The controller is arranged to control the first and second drives to alternatively support a substrate by the first and second holding portions.

    摘要翻译: 在半导体处理系统中,支撑机构(12A)用于与传送臂(32)协作传送环目标衬底(W)。 支撑机构包括构造成上下移动的第一和第二保持部分(38A至38C,40A至40C),并将基板传送到传送臂和从传送臂传送。 第一保持部和第二保持部被配置为在垂直方向上相对于彼此移动而没有彼此空间干涉,并且将基板支撑在基本上相同的水平坐标位置。 支撑机构还包括构造成使第一和第二保持部分上下移动的第一和第二驱动器(46,48)以及被配置为控制第一和第二驱动器的控制器(68)。 控制器被布置成控制第一和第二驱动器以由第一和第二保持部分交替地支撑衬底。

    Untreated body transfer device and semiconductor manufacturing device with the untreated body transfer device
    20.
    发明授权
    Untreated body transfer device and semiconductor manufacturing device with the untreated body transfer device 失效
    未经处理的身体转移装置和半导体制造装置与未经处理的身体转移装置

    公开(公告)号:US07393172B1

    公开(公告)日:2008-07-01

    申请号:US10048012

    申请日:2000-07-26

    IPC分类号: H01L21/677

    摘要: In a wafer transfer system wherein a wafer transfer robot linearly reciprocates by a linear motor, dust is prevented from adhering to a wafer.A fixed base 9, on which the secondary side 11 of a linear motor M for linearly reciprocating a wafer transfer robot R is mounted, is mounted on the system body 1 of a wafer transfer system A in lateral directions and in vertical directions, so that dust dropping in accordance with the flow of clean air K from a clean air supply system 4 is directly sucked into an exhaust fan 5, which is provided on the bottom portion 1c of the system body 1, to be exhausted without being deposited on the top face of the fixed base 9 and the secondary side 11.

    摘要翻译: 在其中晶片传送机器人通过线性电动机线性往复运动的晶片传送系统中,防止灰尘附着在晶片上。 在晶片传送系统A的系统主体1上沿横向和垂直方向安装固定基座9,其上安装有晶片传送机器人R用于线性往复运动的线性电动机M的次级侧11,使得 根据来自清洁空气供给系统4的清洁空气K的流动的粉尘直接吸入设置在系统主体1的底部1c上的排气扇5,而不会沉积在排气扇5上 固定底座9和次侧11的顶面。