公开(公告)号：US20080297800A1

公开(公告)日：2008-12-04

申请号：US12045335

申请日：2008-03-10

申请人： Tomohiro Yamada ,  Yoichiro Handa ,  Satoru Nishiuma ,  Ryo Kuroda

发明人： Tomohiro Yamada ,  Yoichiro Handa ,  Satoru Nishiuma ,  Ryo Kuroda

IPC分类号： G01N21/59 ,  B29D11/00

CPC分类号： B29D11/00365 ,  B29D11/00807 ,  G01N21/554

摘要： An optical element 4 of the present invention includes a conductive microstructure 6 having a conductive property, and detects an optical spectrum signal varied by the binding of measured molecules on the surface of the conductive microstructure 6. The optical element 4 has a distribution in the direction to the electric displacement vector generated inside the conductive microstructure 6 by the binding capacity of the measured molecules on the surface of the conductive microstructure 6. As a result, it is possible to provide an optical element capable of measuring the density at high accuracy without depending on the binding position of the measured molecules.

摘要翻译： 本发明的光学元件4包括具有导电特性的导电微结构6，并且检测由导电微结构6的表面上测量分子的结合而变化的光谱信号。光学元件4在方向 通过导电微结构6的表面上测量的分子的结合能力，在导电性微结构体6内产生的电位移矢量。结果，可以提供能够以高精度测量密度的光学元件，而不依赖于 在测量分子的结合位置。

公开(公告)号：US07733491B2

公开(公告)日：2010-06-08

申请号：US12131433

申请日：2008-06-02

申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

IPC分类号： G12Q1/68 ,  G01N1/02 ,  G01N21/55

CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

公开(公告)号：US07652768B2

公开(公告)日：2010-01-26

申请号：US11948490

申请日：2007-11-30

申请人： Ryo Kuroda ,  Tomohiro Yamada ,  Masaya Ogino

发明人： Ryo Kuroda ,  Tomohiro Yamada ,  Masaya Ogino

IPC分类号： G01N21/55

CPC分类号： G01N21/554

摘要： In a chemical sensing apparatus utilizing a surface plasmon resonance in a small aperture formed in a metal thin film or on a surface of a metal fine particle, a capturing substance is disposed in the small aperture or on the surface of the metal fine particle for capturing a target substance. A marker substance, having a size comparable to that of the small aperture or the metal fine particle is combined with the target substance. As a result, a spectral change is increased in the transmitted light or the scattered light, induced by a surface plasmon resonance and resulting from the capture of the target substance.

摘要翻译： 在利用在金属薄膜中形成的小孔或金属微粒表面上的表面等离子体共振的化学感测装置中，捕获物质设置在小孔中或用于捕获的金属微粒的表面上 目标物质。 具有与小孔的尺寸相当的尺寸的标记物质或金属微粒与目标物质组合。 结果，由表面等离子体共振引起的并且由捕获目标物质导致的透射光或散射光中的光谱变化增加。

公开(公告)号：US08488125B2

公开(公告)日：2013-07-16

申请号：US12865171

申请日：2009-05-12

申请人： Kentaro Furusawa ,  Natsuhiko Mizutani ,  Ryo Kuroda

发明人： Kentaro Furusawa ,  Natsuhiko Mizutani ,  Ryo Kuroda

IPC分类号： G01B9/02

CPC分类号： G01B9/02014 ,  G01B9/02004 ,  G01B9/02069 ,  G01B9/02091

摘要： An optical tomography imaging a tomogram by using a coherent light by a backscattering light of a measured object and a reflected light of a reference mirror, which has supercontinuum light sources, an optical system having group velocity dispersion connected to the supercontinuum light source, an optical detection element detecting a coherent light by a backscattering light of the measured object and a reflected light of the reference mirror, a timing detection element detecting a timing of each wavelength component in an output light from the optical system having the group velocity dispersion, and a unit sampling a signal from the optical detector by using a timing signal from the timing detection element with a signal from the supercontinuum light source as a trigger, and detecting an optical tomogram signal imaging a tomogram, thereby acquiring an optical tomogram at a higher speed than a conventional SS-OCT.

摘要翻译： 光学断层摄影通过使用具有超连续光源的测量对象的反向散射光和参考反射镜的反射光使用相干光来成像断层图像，具有连接到超连续光源的组速度色散的光学系统，光学 检测元件通过测量对象的后向散射光和参考反射镜的反射光来检测相干光，定时检测元件，检测来自具有组速度色散的光学系统的输出光中的每个波长分量的定时，以及 通过使用来自定时检测元件的来自超连续光源的信号的定时信号作为触发来对来自光学检测器的信号进行采样，并且检测成像断层图像的光学层析图像信号，从而以更高的速度获取光学层析图像 常规的SS-OCT。

公开(公告)号：US20100309480A1

公开(公告)日：2010-12-09

申请号：US12865171

申请日：2009-05-12

申请人： Kentaro Furusawa ,  Natsuhiko Mizutani ,  Ryo Kuroda

发明人： Kentaro Furusawa ,  Natsuhiko Mizutani ,  Ryo Kuroda

IPC分类号： G01B9/02

CPC分类号： G01B9/02014 ,  G01B9/02004 ,  G01B9/02069 ,  G01B9/02091

摘要： An optical tomography imaging a tomogram by using a coherent light by a backscattering light of a measured object and a reflected light of a reference mirror, which has supercontinuum light sources, an optical system having group velocity dispersion connected to the supercontinuum light source, an optical detection element detecting a coherent light by a backscattering light of the measured object and a reflected light of the reference mirror, a timing detection element detecting a timing of each wavelength component in an output light from the optical system having the group velocity dispersion, and a unit sampling a signal from the optical detector by using a timing signal from the timing detection element with a signal from the supercontinuum light source as a trigger, and detecting an optical tomogram signal imaging a tomogram, thereby acquiring an optical tomogram at a higher speed than a conventional SS-OCT.

摘要翻译： 光学断层摄影通过使用具有超连续光源的测量对象的反向散射光和参考反射镜的反射光使用相干光来成像断层图像，具有连接到超连续光源的组速度色散的光学系统，光学 检测元件通过测量对象的后向散射光和参考反射镜的反射光来检测相干光，定时检测元件，检测来自具有组速度色散的光学系统的输出光中的每个波长分量的定时，以及 通过使用来自定时检测元件的来自超连续光源的信号的定时信号作为触发来对来自光学检测器的信号进行采样，并且检测成像断层图像的光学层析图像信号，从而以更高的速度获取光学层析图像 常规的SS-OCT。

公开(公告)号：US07473518B2

公开(公告)日：2009-01-06

申请号：US11768445

申请日：2007-06-26

申请人： Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03F7/40 ,  G03F7/20

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

摘要： A method of manufacturing a device includes the steps of (i) providing a near-field photomask including a light shield film for constituting a light shield portion and openings formed in the light shield film, wherein the openings include two or more parallel first slit openings lengthening in a first direction and a second slit opening lengthening in a second direction that is perpendicular to the first directions, wherein the second slit opening interlinks the first slit openings, (ii) forming a photoresist layer on a substrate, (iii) exposing the photoresist layer to near-field light through the near-field photomask using polarized exposure light having an electrical field component parallel to the first direction, to form a latent image on the photoresist only in discrete regions at which the second slit opening crosses the light shield portion, (iv) forming a pattern of the photoresist layer based on the latent image, and (v) etching a surface of the substrate based on the pattern.

摘要翻译： 一种制造器件的方法包括以下步骤：（i）提供包括用于构成遮光部分的遮光膜和形成在遮光膜中的开口的近场光掩模，其中开口包括两个或更多个平行的第一狭缝开口 在第一方向上延长，第二狭缝开口在与第一方向垂直的第二方向上延长，其中第二狭缝开口互连第一狭缝开口，（ii）在基底上形成光致抗蚀剂层，（iii） 光致抗蚀剂层通过使用具有与第一方向平行的电场分量的偏振曝光光通过近场光掩模进行近场光，仅在第二狭缝开口穿过光屏蔽的离散区域中在光致抗蚀剂上形成潜像 部分，（iv）基于潜像形成光致抗蚀剂层的图案，和（v）基于图案蚀刻基板的表面 。

公开(公告)号：US20070248917A1

公开(公告)日：2007-10-25

申请号：US11768445

申请日：2007-06-26

申请人： Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03C5/00

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

摘要： A method of manufacturing a device includes the steps of (i) providing a near-field photomask including a light shield film for constituting a light shield portion and openings formed in the light shield film, wherein the openings include two or more parallel first slit openings lengthening in a first direction and a second slit opening lengthening in a second direction that is perpendicular to the first directions, wherein the second slit opening interlinks the first slit openings, (ii) forming a photoresist layer on a substrate, (iii) exposing the photoresist layer to near-field light through the near-field photomask using polarized exposure light having an electrical field component parallel to the first direction, to form a latent image on the photoresist only in discrete regions at which the second slit opening crosses the light shield portion, (iii) forming a pattern of the photoresist layer based on the latent image, and (iv) etching a surface of the substrate based on the pattern.

摘要翻译： 一种制造器件的方法包括以下步骤：（i）提供包括用于构成遮光部分的遮光膜和形成在遮光膜中的开口的近场光掩模，其中开口包括两个或更多个平行的第一狭缝开口 在第一方向上延长，第二狭缝开口在与第一方向垂直的第二方向上延长，其中第二狭缝开口互连第一狭缝开口，（ii）在基底上形成光致抗蚀剂层，（iii） 光致抗蚀剂层通过使用具有与第一方向平行的电场分量的偏振曝光光通过近场光掩模进行近场光，仅在第二狭缝开口穿过光屏蔽的离散区域中在光致抗蚀剂上形成潜像 部分，（iii）基于潜像形成光致抗蚀剂层的图案，以及（iv）基于所述图案蚀刻所述基板的表面 呃

公开(公告)号：US20070146680A1

公开(公告)日：2007-06-28

申请号：US10554993

申请日：2005-06-24

申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03B27/62

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70433 ,  G03F7/70691 ,  G03F9/703 ,  G03F9/7053 ,  G03F9/7088

摘要： Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure apparatus is arranged to be used with an exposure mask having an elastically deformable holding member and a light blocking film provided on the holding member and being formed with an opening pattern, wherein for exposure the exposure mask is flexed to be brought into contact with an object to be exposed. The exposure apparatus includes a distance detecting system for detecting a distance between the exposure mask before being flexed and the object to be exposed, and a distance controlling system for controlling the distance between the exposure mask before being flexed and the object to be exposed, on the basis of a signal from the distance detecting system.

摘要翻译： 公开了一种用于改进的光刻技术的曝光装置，曝光方法和曝光掩模。 具体地，根据本发明的一个优选形式，曝光装置被布置成与具有可弹性变形的保持构件和设置在保持构件上并形成有开口图案的遮光膜的曝光掩模一起使用，其中， 暴露曝光掩模被弯曲以与待曝光的物体接触。 曝光装置包括用于检测在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离检测系统，以及用于控制在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离控制系统， 来自距离检测系统的信号的基础。

公开(公告)号：US20070065734A1

公开(公告)日：2007-03-22

申请号：US11548756

申请日：2006-10-12

申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03C5/00 ,  G03F1/00

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

摘要： An exposure method for exposing a workpiece on the basis of near-field light escaping from an opening of a mask. The method includes projecting non-polarized exposure light having a predetermined wavelength, emitted from a laser light source and passed through a depolarization device and a diffusion device, onto an exposure mask having a light blocking film formed with a plurality of rectangular openings therein, the openings having (i) a width in a widthwise direction not greater than one-third of the wavelength of the exposure light and (ii) two or more lengthwise directions extending along the mask surface, so that near-field light escaping from the openings performs exposure of a pattern on the basis of the openings.

摘要翻译： 一种用于基于从掩模的开口逸出的近场光暴露工件的曝光方法。 该方法包括将从激光源射出并通过去极化装置和扩散装置的具有预定波长的非偏振曝光光投射到具有形成有多个矩形开口的遮光膜的曝光掩模上， 具有（i）宽度方向的宽度不大于曝光光的波长的三分之一的开口和（ii）沿着掩模表面延伸的两个或更多个长度方向，使得从开口逸出的近场光执行 在开口的基础上曝光图案。

公开(公告)号：US07262828B2

公开(公告)日：2007-08-28

申请号：US10648317

申请日：2003-08-27

申请人： Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03B27/54 ,  G03B27/64 ,  G03B27/16 ,  G03F1/08 ,  G03F7/20

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

摘要： A near-field photomask includes a light shield film having openings to constitute a light shield portion. The photomask can be used to expose an exposure target with near-field light generated through the openings. The openings formed in the light shield film include two or more parallel rows of first slit openings each having a width smaller than 100 nm, and two or more parallel rows of second slit openings each having a width smaller than 100 nm, which extend perpendicularly to the rows of first slit openings while interlinking at least two of the rows of first slit openings. A near-field exposure apparatus includes the near-field photomask with a positioning unit and a source for illuminating polarized light parallel to the first slit openings for forming a latent-dot-image on an exposure target only where a second slit opening crosses the light shield portion on the near-field photomak.

摘要翻译： 近场光掩模包括具有用于构成遮光部的开口的遮光膜。 光掩模可以用于通过开口产生的近场光来曝光曝光目标。 形成在遮光膜中的开口包括宽度小于100nm的两个或更多个平行的第一狭缝开口行，以及两个或更多个平行的第二狭缝开口，其宽度小于100nm，垂直于 第一狭缝开口的行，同时连接至少两排第一狭缝开口。 近场曝光装置包括具有定位单元的近场光掩模和用于照射与第一狭缝开口平行的偏振光的源，用于仅在第二狭缝开口穿过光的情况下在曝光目标上形成潜像图像 屏蔽部分在近场光掩模上。