摘要:
A lamp driving circuit includes: a voltage supply part including a first voltage supply part and a second voltage supply part; a first circuit part including a first terminal, a second terminal and a first coil; a second circuit part including a second coil electromagnetically coupled to the first coil and which supplies a voltage to a lamp; and an electric current detecting part which detects an electric current of the first coil and includes a detecting resistor and an electric current detector.
摘要:
A backlight unit of a liquid crystal display includes a lamp, a balancing pattern capacitor electrically connected to the lamp for current balance, a transformer electrically connected to the lamp via the balancing pattern capacitor, a sensing pattern capacitor electrically connected to a terminal of the balancing pattern capacitor connected to the lamp to detect an abnormal driving state of the lamp, and a feedback circuit unit electrically connected to the sensing pattern capacitor to control the abnormal driving state of the lamp. A liquid crystal display device including the backlight unit is also disclosed.
摘要:
An inspection apparatus and a method for detecting defects in a substrate having a semiconductor device thereon are provided. The method includes establishing a first inspection region including first patterns repeatedly formed in a first direction and a second inspection region including second patterns repeatedly formed in a second direction on the substrate, determining a first unit inspection size of the first inspection region and a second unit inspection size of the second inspection region, obtaining images of the first and second patterns by moving the substrate in the first direction, and detecting defects in the first and second inspection regions by comparing the obtained images of portions of the first and second inspection regions, respectively, with each other. The first inspection size and second inspection size function as comparison units if defects are detected. The substrate may face an image receiving member.
摘要:
In a method of analyzing a wafer sample, a first defect of a photoresist pattern on the wafer sample having shot regions exposed with related exposure conditions is detected. A first portion of the pattern includes the shot regions exposed with an exposure condition corresponding to a reference exposure condition and a tolerance error range of the reference exposure condition. The first defect repeatedly existing in at least two of the shot regions in a second portion of the pattern is set up as a second defect of the pattern. A first reference image displaying the second defect is obtained. The first defect of the shot regions in the first portion corresponding to the second defect is set up as a third defect corresponding to weak points of the pattern. The exposure conditions of the shot region having no weak points are set up as an exposure margin of an exposure process.
摘要:
In a method of detecting defects in patterns and an apparatus for performing the method, a first image of a detection region on a semiconductor substrate may be acquired. A second image may be acquired from the first image by performing a Fourier transform and performing a low pass filtering. The second image may be compared with a reference image so that the defects of the detection region are detected. Existence of the defect of the second image is determined using a relation value between a grey level of each of pixels of the second image and the reference image, respectively. When a defect exists, the horizontal and the vertical positions of the pixel where the relation value is minimum are combined to determine the position of the defect.
摘要:
A wafer inspecting method including the steps of: multi-scanning a pattern image of a unit inspection region in a normal state and a pattern image of a unit inspection region to be inspected, respectively, using different inspection conditions; comparing the multi-scanned pattern images in the normal state with the multi-scanned pattern images to be inspected obtained by the same inspection conditions, and storing differences between the pattern images as difference images; generating a discrimination difference image by calculating a balance between the stored difference images; and discriminating a defect from noise by using the discrimination difference image.
摘要:
A power supply apparatus includes an inverter controller, a power transforming part and a connecting part. The power transforming part converts a direct current supplied from the inverter controller into an alternating current to output first and second polarity currents. The connecting part outputs the first and second polarity currents to first and second end portions of a load through first and second terminals, respectively and has a third terminal to receive a sensed signal in response to the first or second polarity currents so as to output the sensed signal. The first terminal is spaced apart from the second terminal by a first insulating distance, and the third terminal is spaced apart from the first or second terminals adjacent to the third terminal by a second insulating distance. Therefore, the sensed signal is independent of the output power, thereby increasing the sensing efficiency.
摘要:
A lamp driving device includes first, second, and third voltage converters. The first voltage converter converts a direct current (DC) power voltage to a first pulse voltage. The second voltage converter converts the DC power voltage to a second pulse voltage. The third voltage converter generates a high alternating current (AC) voltage based on the first and second pulse voltages. The lamp driving device generates the high AC voltage without a transformer, so that a manufacturing cost of a display apparatus adopting the lamp driving device may be reduced.
摘要:
An inspection apparatus and a method for detecting defects in a substrate having a semiconductor device thereon are provided. The method includes establishing a first inspection region including first patterns repeatedly formed in a first direction and a second inspection region including second patterns repeatedly formed in a second direction on the substrate, determining a first unit inspection size of the first inspection region and a second unit inspection size of the second inspection region, obtaining images of the first and second patterns by moving the substrate in the first direction, and detecting defects in the first and second inspection regions by comparing the obtained images of portions of the first and second inspection regions, respectively, with each other. The first inspection size and second inspection size function as comparison units if defects are detected. The substrate may face an image receiving member.
摘要:
A backlight assembly is provided. The backlight assembly includes at least one lamp that generates a first light and a light diffusion member that is disposed over the lamp and diffuses the first light to generate a second light having a uniform brightness distribution. The light diffusion member includes a diffusion layer that diffuses the first light and a light path modulation member protruded from the diffusion layer to modulate a path of the first light. The light path modulation member is integrally formed with the diffusion layer.