Method for detecting lamp current and lamp driving circuit using the method for detecting the lamp current
    11.
    发明授权
    Method for detecting lamp current and lamp driving circuit using the method for detecting the lamp current 失效
    使用检测灯电流的方法检测灯电流和灯驱动电路的方法

    公开(公告)号:US07564194B2

    公开(公告)日:2009-07-21

    申请号:US11777450

    申请日:2007-07-13

    IPC分类号: G05F1/00

    CPC分类号: H05B41/2851 H05B41/2855

    摘要: A lamp driving circuit includes: a voltage supply part including a first voltage supply part and a second voltage supply part; a first circuit part including a first terminal, a second terminal and a first coil; a second circuit part including a second coil electromagnetically coupled to the first coil and which supplies a voltage to a lamp; and an electric current detecting part which detects an electric current of the first coil and includes a detecting resistor and an electric current detector.

    摘要翻译: 灯驱动电路包括:电压供给部,包括第一电压供给部和第二电压供给部; 包括第一端子,第二端子和第一线圈的第一电路部件; 第二电路部分,包括电磁耦合到所述第一线圈并向灯提供电压的第二线圈; 以及检测第一线圈的电流并且包括检测电阻器和电流检测器的电流检测部。

    Backlight unit and liquid crystal display device including the same
    12.
    发明授权
    Backlight unit and liquid crystal display device including the same 有权
    背光单元和包括其的液晶显示装置

    公开(公告)号:US08058813B2

    公开(公告)日:2011-11-15

    申请号:US12207639

    申请日:2008-09-10

    IPC分类号: H05B37/00

    摘要: A backlight unit of a liquid crystal display includes a lamp, a balancing pattern capacitor electrically connected to the lamp for current balance, a transformer electrically connected to the lamp via the balancing pattern capacitor, a sensing pattern capacitor electrically connected to a terminal of the balancing pattern capacitor connected to the lamp to detect an abnormal driving state of the lamp, and a feedback circuit unit electrically connected to the sensing pattern capacitor to control the abnormal driving state of the lamp. A liquid crystal display device including the backlight unit is also disclosed.

    摘要翻译: 液晶显示器的背光单元包括灯,电连接到用于电流平衡的灯的平衡图形电容器,通过平衡图形电容器电连接到灯的变压器,电连接到平衡端子的感测图案电容器 连接到灯的图案电容器以检测灯的异常驱动状态,以及电连接到感测图案电容器以控制灯的异常驱动状态的反馈电路单元。 还公开了包括背光单元的液晶显示装置。

    Method for detecting defects in a substrate having a semiconductor device thereon
    13.
    发明授权
    Method for detecting defects in a substrate having a semiconductor device thereon 失效
    用于检测其上具有半导体器件的衬底中的缺陷的方法

    公开(公告)号:US08055057B2

    公开(公告)日:2011-11-08

    申请号:US12007680

    申请日:2008-01-14

    IPC分类号: G06K9/00

    摘要: An inspection apparatus and a method for detecting defects in a substrate having a semiconductor device thereon are provided. The method includes establishing a first inspection region including first patterns repeatedly formed in a first direction and a second inspection region including second patterns repeatedly formed in a second direction on the substrate, determining a first unit inspection size of the first inspection region and a second unit inspection size of the second inspection region, obtaining images of the first and second patterns by moving the substrate in the first direction, and detecting defects in the first and second inspection regions by comparing the obtained images of portions of the first and second inspection regions, respectively, with each other. The first inspection size and second inspection size function as comparison units if defects are detected. The substrate may face an image receiving member.

    摘要翻译: 提供一种用于检测其上具有半导体器件的衬底中的缺陷的检查装置和方法。 该方法包括建立包括在第一方向上重复形成的第一图案的第一检查区域和包括在基板上沿第二方向重复形成的第二图案的第二检查区域,确定第一检查区域的第一单位检查尺寸和第二单元检查区域 第二检查区域的检查尺寸,通过沿第一方向移动基板获得第一图案和第二图案的图像,并且通过比较获得的第一和第二检查区域的部分的图像来检测第一和第二检查区域中的缺陷, 分别彼此。 如果检测到缺陷,则第一检查尺寸和第二检查尺寸用作比较单元。 基板可面向图像接收部件。

    METHOD OF ANALYZING A WAFER SAMPLE
    14.
    发明申请
    METHOD OF ANALYZING A WAFER SAMPLE 失效
    分析样品的方法

    公开(公告)号:US20080219547A1

    公开(公告)日:2008-09-11

    申请号:US12041127

    申请日:2008-03-03

    IPC分类号: G06K9/00

    摘要: In a method of analyzing a wafer sample, a first defect of a photoresist pattern on the wafer sample having shot regions exposed with related exposure conditions is detected. A first portion of the pattern includes the shot regions exposed with an exposure condition corresponding to a reference exposure condition and a tolerance error range of the reference exposure condition. The first defect repeatedly existing in at least two of the shot regions in a second portion of the pattern is set up as a second defect of the pattern. A first reference image displaying the second defect is obtained. The first defect of the shot regions in the first portion corresponding to the second defect is set up as a third defect corresponding to weak points of the pattern. The exposure conditions of the shot region having no weak points are set up as an exposure margin of an exposure process.

    摘要翻译: 在分析晶片样品的方法中,检测具有用相关曝光条件曝光的拍摄区域的晶片样品上的光致抗蚀剂图案的第一缺陷。 图案的第一部分包括用与参考曝光条件相对应的曝光条件和参考曝光条件的公差误差范围暴露的照射区域。 在图案的第二部分中的至少两个拍摄区域中重复存在的第一缺陷被设置为图案的第二缺陷。 获得显示第二缺陷的第一参考图像。 对应于第二缺陷的第一部分中的拍摄区域的第一缺陷被设置为对应于图案的弱点的第三缺陷。 没有弱点的照射区域的曝光条件被设置为曝光处理的曝光余量。

    Method of detecting defects in patterns and apparatus for performing the same
    15.
    发明申请
    Method of detecting defects in patterns and apparatus for performing the same 有权
    检测图案中的缺陷的方法及其执行方法

    公开(公告)号:US20080112608A1

    公开(公告)日:2008-05-15

    申请号:US11979776

    申请日:2007-11-08

    IPC分类号: G06K9/00

    摘要: In a method of detecting defects in patterns and an apparatus for performing the method, a first image of a detection region on a semiconductor substrate may be acquired. A second image may be acquired from the first image by performing a Fourier transform and performing a low pass filtering. The second image may be compared with a reference image so that the defects of the detection region are detected. Existence of the defect of the second image is determined using a relation value between a grey level of each of pixels of the second image and the reference image, respectively. When a defect exists, the horizontal and the vertical positions of the pixel where the relation value is minimum are combined to determine the position of the defect.

    摘要翻译: 在检测图案中的缺陷的方法和执行该方法的装置中,可以获取半导体衬底上的检测区域的第一图像。 可以通过执行傅里叶变换并执行低通滤波从第一图像获取第二图像。 可以将第二图像与参考图像进行比较,从而检测出检测区域的缺陷。 使用第二图像的每个像素的灰度级与参考图像之间的关系值来确定第二图像的缺陷的存在。 当存在缺陷时,组合关系值最小的像素的水平和垂直位置以确定缺陷的位置。

    WAFER INSPECTING METHOD
    16.
    发明申请
    WAFER INSPECTING METHOD 有权
    波形检测方法

    公开(公告)号:US20080049219A1

    公开(公告)日:2008-02-28

    申请号:US11693356

    申请日:2007-03-29

    IPC分类号: G01N21/00

    摘要: A wafer inspecting method including the steps of: multi-scanning a pattern image of a unit inspection region in a normal state and a pattern image of a unit inspection region to be inspected, respectively, using different inspection conditions; comparing the multi-scanned pattern images in the normal state with the multi-scanned pattern images to be inspected obtained by the same inspection conditions, and storing differences between the pattern images as difference images; generating a discrimination difference image by calculating a balance between the stored difference images; and discriminating a defect from noise by using the discrimination difference image.

    摘要翻译: 一种晶片检查方法,包括以下步骤:使用不同的检查条件分别对正常状态下的单位检查区域的图案图像和要检查的单位检查区域的图案图像进行多次扫描; 将正常状态下的多扫描图案图像与通过相同检查条件获得的待检查的多扫描图案图像进行比较,并且将图案图像之间的差异存储为差分图像; 通过计算所存储的差分图像之间的平衡来产生鉴别差异图像; 以及通过使用辨别差异图像来区分缺陷和噪声。

    Power supply apparatus, backlight assembly and liquid crystal display apparatus having the same
    17.
    发明授权
    Power supply apparatus, backlight assembly and liquid crystal display apparatus having the same 有权
    电源装置,背光组件和具有该电源装置的液晶显示装置

    公开(公告)号:US07642726B2

    公开(公告)日:2010-01-05

    申请号:US11958013

    申请日:2007-12-17

    IPC分类号: H05B37/02

    摘要: A power supply apparatus includes an inverter controller, a power transforming part and a connecting part. The power transforming part converts a direct current supplied from the inverter controller into an alternating current to output first and second polarity currents. The connecting part outputs the first and second polarity currents to first and second end portions of a load through first and second terminals, respectively and has a third terminal to receive a sensed signal in response to the first or second polarity currents so as to output the sensed signal. The first terminal is spaced apart from the second terminal by a first insulating distance, and the third terminal is spaced apart from the first or second terminals adjacent to the third terminal by a second insulating distance. Therefore, the sensed signal is independent of the output power, thereby increasing the sensing efficiency.

    摘要翻译: 电源装置包括逆变器控制器,功率变换部分和连接部分。 功率变换部分将从逆变器控制器提供的直流电转换为交流电流,以输出第一和第二极性电流。 连接部分将第一和第二极性电流分别通过第一和第二端子输出到负载的第一和第二端部,并且具有响应于第一或第二极性电流接收感测信号的第三端子,以便输出 感测信号。 第一端子与第二端子隔开第一绝缘距离,并且第三端子与第三端子相邻的第一端子或第二端子间隔开第二绝缘距离。 因此,感测到的信号与输出功率无关,从而提高感测效率。

    Lamp driving device and display apparatus having the same
    18.
    发明授权
    Lamp driving device and display apparatus having the same 失效
    灯驱动装置及其显示装置

    公开(公告)号:US07633238B2

    公开(公告)日:2009-12-15

    申请号:US11929223

    申请日:2007-10-30

    IPC分类号: H05B41/24

    CPC分类号: H05B41/2881

    摘要: A lamp driving device includes first, second, and third voltage converters. The first voltage converter converts a direct current (DC) power voltage to a first pulse voltage. The second voltage converter converts the DC power voltage to a second pulse voltage. The third voltage converter generates a high alternating current (AC) voltage based on the first and second pulse voltages. The lamp driving device generates the high AC voltage without a transformer, so that a manufacturing cost of a display apparatus adopting the lamp driving device may be reduced.

    摘要翻译: 灯驱动装置包括第一,第二和第三电压转换器。 第一电压转换器将直流(DC)电源电压转换为第一脉冲电压。 第二电压转换器将DC电源电压转换成第二脉冲电压。 第三电压转换器基于第一和第二脉冲电压产生高交流(AC)电压。 灯驱动装置在没有变压器的情况下产生高交流电压,从而可以减少采用灯驱动装置的显示装置的制造成本。

    Method for detecting defects in a substrate having a semiconductor device thereon
    19.
    发明申请
    Method for detecting defects in a substrate having a semiconductor device thereon 失效
    用于检测其上具有半导体器件的衬底中的缺陷的方法

    公开(公告)号:US20080172196A1

    公开(公告)日:2008-07-17

    申请号:US12007680

    申请日:2008-01-14

    IPC分类号: G06F19/00

    摘要: An inspection apparatus and a method for detecting defects in a substrate having a semiconductor device thereon are provided. The method includes establishing a first inspection region including first patterns repeatedly formed in a first direction and a second inspection region including second patterns repeatedly formed in a second direction on the substrate, determining a first unit inspection size of the first inspection region and a second unit inspection size of the second inspection region, obtaining images of the first and second patterns by moving the substrate in the first direction, and detecting defects in the first and second inspection regions by comparing the obtained images of portions of the first and second inspection regions, respectively, with each other. The first inspection size and second inspection size function as comparison units if defects are detected. The substrate may face an image receiving member.

    摘要翻译: 提供一种用于检测其上具有半导体器件的衬底中的缺陷的检查装置和方法。 该方法包括建立包括在第一方向上重复形成的第一图案的第一检查区域和包括在基板上沿第二方向重复形成的第二图案的第二检查区域,确定第一检查区域的第一单位检查尺寸和第二单元检查区域 第二检查区域的检查尺寸,通过沿第一方向移动基板获得第一图案和第二图案的图像,并且通过比较获得的第一和第二检查区域的部分的图像来检测第一和第二检查区域中的缺陷, 分别彼此。 如果检测到缺陷,则第一检查尺寸和第二检查尺寸用作比较单元。 基板可面向图像接收部件。