公开(公告)号：US20190145920A1

公开(公告)日：2019-05-16

申请号：US16225087

申请日：2018-12-19

Applicant: NATIONAL INSTITUTE FOR MATERIALS SCIENCE

Inventor： Jin KAWAKITA ,  Tadashi SHINOHARA ,  Toyohiro CHIKYO ,  Toshihide NABATAME ,  Akihiko OHI ,  Tomoko OHKI

IPC: G01N27/04 ,  G01N27/12 ,  G01N27/22 ,  G01N17/04

Abstract: The present invention improves the sensitivity and the responsiveness of a dryness/wetness responsive sensor utilizing a galvanic current, allowing for downsizing of the dryness/wetness responsive sensor. Instead of the conventional structure in which an anode electrode and a cathode electrode are stacked with an intervening insulator, the present invention employs a structure in which both electrodes run in juxtaposition with each other on an insulating substrate in the form of, for example, a comb-shaped electrode as shown in the drawing. By utilizing a semiconductor manufacturing process or any other micro/nano-fabrication technology, an inter-electrode distance can be extremely shortened as compared with the conventional sensors, allowing enhancing the sensitivity per unit footprint of the electrodes. Accordingly, a decrease in the size of the dryness/wetness responsive sensor can be easily achieved.

公开(公告)号：US20160238937A1

公开(公告)日：2016-08-18

申请号：US15024407

申请日：2014-09-25

Applicant: NATIONAL INSTITUTE FOR MATERIALS SCIENCE

Inventor： Jin KAWAKITA ,  Toyohiro CHIKYO ,  Takayuki NAKANE

IPC: G03F7/11 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/11 ,  G03F7/091 ,  G03F7/20 ,  G03F7/32 ,  H01L21/0274 ,  H01L21/0277 ,  H01L21/0278

Abstract: A resist film structure is provided, which allows a resist layer to have improved photosensitivity to EUV or electron beams without changing the photosensitivity of the resist material itself. A metal layer 1 with a thickness as small as a nanometer level is provided on a resist polymer layer 2 formed on a substrate 3. When the resist layer in this structure is exposed to light, the metal layer 1 produces a surface plasmon effect to enhance the irradiation to the resist film, so that the photosensitivity of the resist film is improved.

Abstract translation: 提供了抗蚀剂膜结构，其允许抗蚀剂层对EUV或电子束具有改善的光敏性，而不改变抗蚀剂材料本身的光敏性。 在形成在基板3上的抗蚀剂聚合物层2上设置有厚度小至纳米级的金属层1.当该结构中的抗蚀剂层曝光时，金属层1产生表面等离子体效应以提高 照射到抗蚀剂膜上，使得抗蚀剂膜的光敏性得到改善。

公开(公告)号：US20140199516A1

公开(公告)日：2014-07-17

申请号：US14132404

申请日：2013-12-18

Applicant: National Institute For Materials Science

Inventor： Jin KAWAKITA ,  Seiji KURODA ,  Masayuki KOMATSU

IPC: C09D123/06

CPC classification number: C09D123/06 ,  B05B7/205 ,  B05D1/10 ,  C23C4/04 ,  Y10T428/24355 ,  Y10T428/24364

Abstract: A coating method through HVOF spraying that comprises generating a combustion jet in a combustion chamber connected to one end of a barrel while controlling the temperature of the combustion jet by supply of an inert gas to the jet, feeding resin coating materials into the temperature-controlled combustion jet and leading them to pass through the barrel, and spouting the coating particles through a spout port along with the combustion jet therethrough to thereby coat the substrate surface; wherein the length of the barrel, the temperature of the combustion jet and the physical properties of the coating particles are defined so as to satisfy both the following formulae (1) and (2). Numerical   Formula   1 α × t r > 0.5 ( 1 ) Numerical   Formula   2 2.5

Abstract translation: 一种通过HVOF喷涂的涂覆方法，包括在连接到筒的一端的燃烧室中产生燃烧射流，同时通过向喷射器供应惰性气体来控制燃烧射流的温度，将树脂涂料输送到温度控制 燃烧喷射并引导它们通过筒体，并且通过喷嘴口喷射涂层颗粒以及燃烧射流，从而涂覆基底表面; 其中筒的长度，燃烧射流的温度和涂层颗粒的物理性能被定义为满足下列公式（1）和（2）。 数学公式1α×t r> 0.5（1）数学公式2 2 5