公开(公告)号：US20120206576A1

公开(公告)日：2012-08-16

申请号：US13502907

申请日：2011-08-24

申请人： Shuzo Sato ,  Eiji Otani ,  Ken Ozawa ,  Seiji Kobayashi

发明人： Shuzo Sato ,  Eiji Otani ,  Ken Ozawa ,  Seiji Kobayashi

IPC分类号： H04N13/02

CPC分类号： G02B5/3058 ,  G03B35/08 ,  G03B35/26 ,  H04N13/218 ,  H04N13/257

摘要： A stereoscopic imaging method where a pixel matrix is divided into groups such that parallax information is received by one pixel group and original information is received by another pixel group. The parallax information may, specifically, be based on polarized information received by subgroups of the one pixel, group and by processing all of the information received multiple images are rendered by the method.

摘要翻译： 一种立体成像方法，其中像素矩阵被划分成组，使得由一个像素组接收视差信息，并且由另一个像素组接收原始信息。 具体而言，视差信息可以基于由一个像素，组的子组接收的偏振信息，并且通过处理通过该方法呈现的所有接收到的多个图像的信息。

公开(公告)号：US08008777B2

公开(公告)日：2011-08-30

申请号：US12457153

申请日：2009-06-02

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： H01L23/52 ,  H01L23/528 ,  H01L23/532 ,  H01L21/768

CPC分类号： H01L21/76832 ,  H01L21/7681

摘要： An etching stopper film is formed on top of a first insulating film. The etching stopper film is a film formed by depositing at least two films, made of constituent materials identical in quality to each other, one another. Subsequently, a first opening pattern is formed in the etching stopper film. Subsequently, a second insulating film is formed on top of the etching stopper film. Subsequently, a mask pattern is formed on top of the second insulating film. Subsequently, the second insulating film is etched with the use of the mask pattern as a mask to be followed by etching of the first insulating film with the use of the etching stopper film as a mask.

摘要翻译： 在第一绝缘膜的顶部形成蚀刻停止膜。 蚀刻停止膜是通过彼此沉积至少两层由质量相同的构成材料制成的膜而形成的膜。 随后，在蚀刻停止膜中形成第一开口图案。 随后，在蚀刻停止膜的顶部上形成第二绝缘膜。 随后，在第二绝缘膜的顶部上形成掩模图案。 随后，使用掩模图案作为掩模蚀刻第二绝缘膜，然后使用蚀刻阻挡膜作为掩模蚀刻第一绝缘膜。

公开(公告)号：US07879513B2

公开(公告)日：2011-02-01

申请号：US12283944

申请日：2008-09-17

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： G03F1/00

CPC分类号： G03F1/36 ,  G03F1/44 ,  G03F1/68

摘要： There is provided a method for correcting a photo mask, which allows the difference between a test mask and a corrected mask with respect to an error of line width depending on coarse/dense pattern to be decreased when the photo masks are corrected by optical proximity effect correction.The present method is consisted of: producing a test mask which acts as a mask for extracting process model for applying an optical proximity effect correction method (s1); transferring and measuring the dimensions of the transferred pattern using the test mask (s2 and s3); obtaining a function model (referred to as process model) of which a simulated result of the transferred pattern of a mask pattern of the photo mask using a function model matches the measured result (s4); obtaining a mask pattern of which a transferred pattern matches a designed pattern using said process model and creating mask data in accordance with the obtained mask pattern (s5); producing a corrected mask in accordance with the created mask data (s5); and setting an exposing condition where an OPE characteristic becomes flat with respect of wide and narrow pitches by adjusting at least one of a numerical aperture (NA) and a coherence factor (σ) of an exposing device when the corrected mask is transferred.

摘要翻译： 提供了一种用于校正光掩模的方法，其允许当光掩模通过光学邻近效应校正时，测试掩模和校正掩模之间的差异相对于根据粗/密图案的线宽度的误差而减小 更正。 本发明的方法包括：产生用作提取用于应用光学邻近效应校正方法的处理模型的掩模的测试掩模（s1）; 使用测试掩模转移和测量转印图案的尺寸（s2和s3）; 获得使用功能模型的光掩模的掩模图案的转印图案的模拟结果与测量结果匹配的功能模型（称为过程模型）（s4）; 使用所述处理模型获得传送图案与设计图案匹配的掩模图案，并根据获得的掩模图案创建掩模数据（s5）; 根据创建的掩模数据产生校正掩模（s5）; 并且当校正的掩模被传送时，通过调节曝光装置的数值孔径（NA）和相干因子（＆sgr）中的至少一个来设置OPE特性相对于宽和窄间距变平坦的曝光条件。

公开(公告)号：US07473494B2

公开(公告)日：2009-01-06

申请号：US10898809

申请日：2004-07-26

申请人： Ken Ozawa ,  Kazuharu Inoue

发明人： Ken Ozawa ,  Kazuharu Inoue

IPC分类号： G03F9/00

CPC分类号： G03F1/50

摘要： An exposure mask in the form of a binary mask for intensity modulating 0th order diffracted light and a mask pattern production method using the exposure mask are disclosed on which a mask production error, an influence of flare of an exposure apparatus and a development characteristic of resist reflect on the design. The exposure mask has a block area in which a plurality of pattern sites in each of which light intercepting patterns for intercepting illumination light emitted from an exposure apparatus and light transmitting patterns for transmitting the illumination light therethrough are formed at an equal ratio and an equal pitch are disposed. The pattern sites which form the block area are disposed such that the pitches of the light intercepting patterns and the light transmitting patterns are equal while the ratio varies gradually.

摘要翻译： 公开了用于强度调制0次衍射光的二进制掩模形式的曝光掩模和使用曝光掩模的掩模图案制造方法，其中掩模产生误差，曝光装置的耀斑和抗蚀剂的显影特性的影响 反思设计。 曝光掩模具有阻挡区域，其中在曝光装置中发射的照明光的遮光图案和用于透射照明光的透光图案以相同的比例和相等的间距形成在其中的多个图案位置 被处置。 形成块区域的图案位置被布置成使得遮光图案和透光图案的间距相等，同时比例逐渐变化。

公开(公告)号：US06924206B2

公开(公告)日：2005-08-02

申请号：US10893184

申请日：2004-07-16

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： H01L21/3205 ,  H01L21/02 ,  H01L21/20 ,  H01L21/283 ,  H01L21/768 ,  H01L21/822 ,  H01L23/522 ,  H01L27/04 ,  H01L27/108 ,  H01L29/00 ,  H01L29/40

CPC分类号： H01L28/40 ,  H01L21/768 ,  H01L21/76802 ,  H01L21/76807 ,  H01L21/76816 ,  H01L21/76838 ,  H01L23/5223 ,  H01L2924/0002 ,  H01L2924/00

摘要： A semiconductor capacitor configured so as to use buried wirings, as electrodes, formed in an interlayer dielectric is provided on a semiconductor substrate which is capable of preventing an increase in a number of manufacturing processes with occurrence of parasitic capacity being suppressed. The semiconductor capacitor has a capacitive insulating film made up of an etching stopper film formed only in a region being sandwiched between a via plug serving as an upper electrode and a lower electrode, in which the capacitive insulating film is not formed in a region other than the facing region.

摘要翻译： 在半导体基板上设置半导体电容器，该半导体电容器被构造为使用形成在层间电介质中的作为电极的埋入布线，其能够防止在抑制寄生电容的发生的情况下增加制造工艺。 半导体电容器具有电容绝缘膜，该电容绝缘膜仅由夹在用作上电极的通孔和下电极之间形成的区域中形成，其中电容绝缘膜不形成在除了 面对地区。

公开(公告)号：US06730925B1

公开(公告)日：2004-05-04

申请号：US09711944

申请日：2000-11-15

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： G01N2186

CPC分类号： G03F7/70558 ,  G03F7/70358 ,  G03F7/70433

摘要： An exposure method is provided so that the dividend regions defined on a wafer are successively exposed using pulses of laser light emitted from an excimer laser light source in such a way that each region receives a different level of target exposure levels. And, transmittance of a course energy adjuster, having a number of neutral density filters, is adjusted so that a sub-divided region receiving the least number of exposure pulses can receive a pulse count that exceeds the minimum number of exposure pulses required for optimal exposure. During the process of scanning exposure, transmittance of the coarse energy adjuster is held constant so that, to compensate for variations in the pulse energy, the output power of the excimer laser light source is adjusted according to real-time data output from an integrator sensor.

摘要翻译： 提供一种曝光方法，使得利用从准分子激光光源发射的激光的脉冲，使得每个区域接收不同水平的目标曝光水平的方式，在晶片上限定的被除数区域被连续曝光。 并且，调整具有多个中性密度滤光器的光谱能量调节器的透射率，使得接收最少数量的曝光脉冲的分割区域可以接收超过最佳曝光所需的最小曝光脉冲数的脉冲数 。 在扫描曝光的过程中，粗调能量调节器的透射率保持恒定，从而为了补偿脉冲能量的变化，根据来自积分器传感器的实时数据输出来调整准分子激光光源的输出功率 。

公开(公告)号：US5898480A

公开(公告)日：1999-04-27

申请号：US772864

申请日：1996-12-26

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70058 ,  G03F7/70133 ,  G03F7/70358

摘要： An exposure method wherein a mask on which a pattern is formed is illuminated with a slit-like illumination light beam, and the mask and a substrate are caused to scan the slit-like illumination light beam in a scanning direction in order to form an image of the pattern on the substrate, and wherein photo-electric signals obtained by a sensor which moves in the scanning direction, relative to the slit-like illumination light beam, and photo-electric signals obtained from the sensor which moves in a direction orthogonal to the scanning direction are integrated so as to obtain integrated values thereof, and an unevenness among the integrated values relating to a direction orthogonal to the scanning direction is calculated

摘要翻译： 曝光方法，其中形成有图案的掩模用狭缝状的照明光束照射，并且使掩模和基板沿扫描方向扫描狭缝状的照明光束，以便形成图像 并且其中通过相对于狭缝状照明光束在扫描方向上移动的传感器获得的光电信号和从与传感器正交的方向移动的传感器获得的光电信号 积分扫描方向以获得其积分值，并计算与扫描方向正交的方向相关的积分值之间的不均匀度

公开(公告)号：US5574537A

公开(公告)日：1996-11-12

申请号：US227237

申请日：1994-04-13

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01S3/10 ,  G03B27/72

CPC分类号： G03F7/70558

摘要： An apparatus for controlling a light quantity comprises a light source for emitting light and an acousto optical modulating element, having a driving unit for giving a progressive wave to a medium, for generating 0th-order and higher-order diffracted beams of light by an acousto optical effect of the progressive wave. The apparatus also comprises a stop element which transmits, not the higher-order diffracted beams, but the 0th-order diffracted beam; and a drive controlling section for varying a quantity of light irradiating an object by regulating the progressive wave through the driving unit.

摘要翻译： 一种用于控制光量的装置包括用于发射光的光源和声光调制元件，具有用于向介质施加逐行波的驱动单元，用于通过声音产生0级和更高级的衍射光束 渐进波的光学效应。 该装置还包括一个停止元件，其不传输高阶衍射光束，而是传输0级衍射光束; 以及驱动控制部分，用于通过通过驱动单元调节行波来改变照射物体的光量。

公开(公告)号：US4856966A

公开(公告)日：1989-08-15

申请号：US142537

申请日：1988-01-11

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： F04B43/02

CPC分类号： F04B43/026

摘要： A power source (14) rotates an eccentric (20) engaged within the center of a relatively large drive roller (22) to rotate the drive roller while simultaneously orbiting the center of the drive roller about a circular path so as to cyclically advance and retract from piston assemblies (24) located within pump assemblies (16a-16d). Rotation of the eccentric (20) causes each piston assembly (24) to cyclically advance against and retract from a flexible diaphragm (26) to cause fluid entering the pump assembly to be forced out under pressure. Each diaphragm (26) is "backed" by a spring-loaded support (27) that resiliently pushes against the side of the diaphragm opposite the piston assembly.

摘要翻译： 动力源（14）旋转接合在相对大的驱动辊（22）的中心内的偏心轮（20），以使驱动辊旋转，同时绕驱动辊的中心围绕圆形路径绕行，以循环前进和缩回 来自位于泵组件（16a-16d）内的活塞组件（24）。 偏心轮（20）的旋转使得每个活塞组件（24）能够从柔性隔膜（26）周期性地推进和缩回，以使进入泵组件的流体在压力下被迫离开。 每个隔膜（26）由弹性加载的支撑件（27）“支撑”，该弹簧加载的支撑件弹性地推动与活塞组件相对的隔膜的侧面。

公开(公告)号：US20140347493A1

公开(公告)日：2014-11-27

申请号：US14345168

申请日：2012-09-03

申请人： Yoshihito Higashitsutsumi ,  Hideaki Mogi ,  Ken Ozawa ,  Jun Iwama

发明人： Yoshihito Higashitsutsumi ,  Hideaki Mogi ,  Ken Ozawa ,  Jun Iwama

IPC分类号： H04N5/33 ,  H04N5/225

CPC分类号： H04N5/332 ,  G02B5/208 ,  H01L27/14621 ,  H04N5/2254 ,  H04N9/045

摘要： An image-capturing device including a lens system and an image-capturing unit upon which light having passed through the lens system is incident, wherein the image-capturing unit includes a plurality of first image-capturing elements configured to receive light in a first wavelength band and a plurality of second image-capturing elements configured to receive light in a second wavelength band which is different from the first wavelength band, and wherein the lens system or the image-capturing unit is provided with an optical element so that the light in the first wavelength band of which light quantity is less than the light quantity of the light in the second wavelength band reaches the image-capturing unit.

摘要翻译： 一种图像拍摄装置，包括透镜系统和通过透镜系统的光入射到其上的图像捕获单元，其中图像捕获单元包括多个第一图像捕获元件，其被配置为接收第一波长的光 以及多个第二图像捕获元件，被配置为接收与所述第一波长带不同的第二波长带中的光，并且其中所述透镜系统或所述图像捕获单元设置有光学元件， 光量小于第二波长带中的光的光量的第一波长带到达图像捕获单元。