摘要:
A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.
摘要:
A transistor array includes conductor lines, function lines, and transistors. Each of the conductor lines includes a core and a conductor layer that covers the core. Each of the function lines includes a core, at least the surface of which is electrically conductive, an insulating layer that covers the core, and a semiconductor layer that covers the insulating layer. Each of the function lines contacts with, and crosses, the conductor lines. Each of the transistors includes a first ohmic contact region, which is defined by a region where one of the conductor lines crosses one of the function lines and which makes an ohmic contact with the semiconductor layer, a second ohmic contact region, which also makes an ohmic contact with the semiconductor layer, and a channel region, which is defined in the semiconductor layer between the first and second ohmic contact regions.
摘要:
A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.
摘要:
A cleaning apparatus of the present invention includes a roll brush for scrubbing the surface of the substrate, and an ultrasonic nozzle for blowing an aqueous cleaning solution against the surface of the substrate and generating an ultrasonic wave, wherein the roll brush and the ultrasonic nozzle are provided so as to oppose one another so that the substrate can be set in between. With the synergetic effects of brush scrubbing cleaning, ultrasonic cleaning and shower-cleaning, the precision cleaning of the upper surface of the substrate can be performed at a sufficient level of cleanliness. Moreover, in a state where the substrate to be cleaned is set, the roll brush can be cleaned automatically by the ultrasonic nozzle, and it is therefore possible to maintain the roll brush at high level of cleanliness without requiring maintenance operations. Furthermore, by integrating the roll brush and the ultrasonic wave nozzle in one part, the size of the apparatus can be reduced in the transport direction of the substrate, thereby reducing an overall footprint area.
摘要:
A solvent containing low-boiling and high-boiling impurities in an evaporating section, so that the high-boiling impurities is left as a tank bottom waste, and a solvent vapor from the section is guide through a mist separator into a condenser. A condensate produced in the condenser is returned to the mist separator so as to serve as a mist catching liquid. A fraction not having condensed in the condenser is fed to a rectifying section where fractional condensation is performed so that the low-boiling impurities are condensed to be removed. A remainder of the solvent vapor from which the impurities have been removed is also condensed and recovered for reuse in the resist washing/exfoliating step during manufacture of liquid crystal devices or IC, so that the soiled solvent need not be discarded or treated in a remote cite, thereby facilitating the process or the step using the solvent.
摘要:
A box-shaped projection screen unit is attachable to an optical projector to constitute a cover therefor. The screen unit comprises a translucent screen mounted in an opening formed through the side of the box opposite an open side of the box which mates with the projector. A rectangular plate hinged to a vertical edge of the box has an internal reflecting surface facing the screen, and is swingable from a storage position covering the screen outward to a projection position in which the plate forms an angle with the screen. A triangular cover plate is hinged to the top edge of the box, and is swingable from a storage position between the rectangular plate and the screen outward to a horizontal position in which another edge of the triangular plate engages with the rectangular plate to hold the same in the projection position and prevent incident light from above from reaching the screen. In operation, an image from the projector is reflected from the reflecting surface of the rectangular plate and focussed onto the screen, and the image is viewed through the box from the open side thereof.
摘要:
The present invention provides a method for manufacturing a color filter substrate, in which the occurrence of color mixing between adjacent sub-pixels is prevented even when an inkjet method is used. A color filter substrate having color filters of a plurality of colors arranged in a matrix with a bank therebetween is manufactured using this method. The method has: a first inkjet step in which an ink is jetted to at least one region among a plurality of regions partitioned by the bank, and the ink is not jetted to any of regions adjacent to the one region in the horizontal direction and the vertical direction; and a second inkjet step in which the ink is jetted to at least one region to which the ink has not been jetted in the first inkjet step, the aforementioned at least one region being among the plurality of regions partitioned by the bank.
摘要:
A method and apparatus for treating an exhaust gas comprising heavy metals, wherein the apparatus comprises a heat recovery unit, recovering exhaust gas heat at an exit of the air preheater; a precipitator, collecting soot/dust contained in an exhaust gas at an exit of the heat recovery unit; a wet flue gas desulfurizer, removing sulfur oxides contained in the exhaust gas at the exit of the precipitator; and a reheater, heating the exhaust gas at the exit of the wet flue gas desulfurizer. Each of the heat recovery unit and the reheater has a heat exchanger tube, and a circulation line is disposed to connect the heat exchanger tubes. A sulfur trioxide (SO3) removing agent is supplied to the upstream side of the heat recovery unit, and the temperature of the exhaust gas at the exit of the heat recovery unit is adjusted to not more than a dew point of sulfur trioxide.
摘要:
The present invention provides an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, and a method of using it for etching a multilayer thin film containing a copper layer and a titanium layer, that is, an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, which comprises (A) hydrogen peroxide, (B) nitric acid, (C) a fluoride ion source, (D) an azole, (E) a quaternary ammonium hydroxide and (F) a hydrogen peroxide stabilizer and has a pH of from 1.5 to 2.5, and a etching method of using it.
摘要:
A particulate material removing filter for exhaust gas from a diesel engine is provided. The particulate material removing filter is formed by laminating metal laths having an oxidation catalyst layer containing a noble metal that oxidizes nitrogen oxide in exhaust gas into nitrogen dioxide. The metal laths are laminated to form a laminate in such a manner that the drawing direction of the metal lath processing differs by 90 degrees with each other.