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    High-resolution multiple beam source
    11.
    发明授权
    High-resolution multiple beam source 有权

    公开(公告)号：US11615938B2

    公开(公告)日：2023-03-28

    申请号：US16723698

    申请日：2019-12-20

    Applicant: NuFlare Technology, Inc. ,  NuFlare Technology America, Inc.

    Inventor： John Hartley ,  Victor Katsap

    IPC: H01J37/09 ,  H01J37/26

    Abstract: A thermal field emitter, an apparatus, and a method for generating multiple beams for an e-beam tool are provided. The thermal field emitter includes an electron emitting portion configured to emit an electron beam and a nano-aperture array (NAA) having a plurality of openings. The NAA is positioned in a path of the electron beam. The NAA is configured to form multiple beams. The multiple beams include electrons from the electron beam that pass through the plurality of openings.

    Electron guns for electron beam tools
    12.
    发明授权
    Electron guns for electron beam tools 有权

    公开(公告)号：US10573481B1

    公开(公告)日：2020-02-25

    申请号：US16203510

    申请日：2018-11-28

    Applicant: NuFlare Technology, Inc. ,  NuFlare Technology America, Inc.

    Inventor： Victor Katsap

    IPC: H01J1/46 ,  H01J3/02 ,  H01J1/148 ,  H01J9/18

    Abstract: An electron emission apparatus, an electron gun, and a method of fabrication of the electron gun are provided. The electron gun includes a cathode, a Wehnelt, and an anode. The cathode is configured to provide an electron beam. The Wehnelt has a bore. The bore is configured to pass the electron beam. The anode is disposed proximate to the cathode. The diameter of the bore of the Wehnelt and the offset between the Wehnelt and the cathode satisfy a predetermined dimensional relationship. The predetermined dimensional relationship is at least a function of a diameter of the bore of the anode and a distance between the Wehnelt and the anode.

    Schottky thermal field emitter with integrated beam splitter
    14.
    发明授权
    Schottky thermal field emitter with integrated beam splitter 有权

    公开(公告)号：US11699564B2

    公开(公告)日：2023-07-11

    申请号：US17078681

    申请日：2020-10-23

    Applicant: NuFlare Technology, Inc. ,  NuFlare Technology America, Inc.

    Inventor： Victor Katsap

    IPC: H01J37/073 ,  H01J37/063 ,  H01J37/12

    CPC classification number: H01J37/073 ,  H01J37/063 ,  H01J37/12

    Abstract: A Schottky thermal field emitter (TFE) source integrated with a beam splitter by a standoff, which supports the beam splitter above the Schottky TFE extractor faceplate by a distance of 0.05 mm to 2 mm. The beam splitter includes a microhole array integrated with the standoff and being disposed opposite the extractor faceplate, the microhole array having a plurality of microholes that split the electron beam generated by the Schottky TFE into a plurality of beamlets. The support and extractor may be fabricated from the same material or from different materials. The support may be formed from a high temperature resistive material, which causes a potential difference between the extractor and the microhole array. This potential difference creates positively charged electrostatic lenses at the microholes, which increases current in the individual beamlets. Voltage on the microarray plate may be varied to achieve a high beamlet current.

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