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公开(公告)号:US20240106191A1
公开(公告)日:2024-03-28
申请号:US18536466
申请日:2023-12-12
Inventor: Bryan LOCHMAN , Matthew Sauter , Bien Chann
CPC classification number: H01S5/02423 , H01S5/143 , H01S5/4012 , H01S5/4025 , H01S5/4062 , H01S5/02208
Abstract: In various embodiments, laser systems or resonators incorporate two separate cooling loops that may be operated at different cooling temperatures. One cooling loop, which may be operated at a lower temperature, cools beam emitters. The other cooling loop, which may be operated at a higher temperature, cools other mechanical and/or optical components, for example optical elements such as lenses and/or reflectors.
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公开(公告)号:US11876344B2
公开(公告)日:2024-01-16
申请号:US18075524
申请日:2022-12-06
Inventor: Bryan Lochman , Matthew Sauter , Bien Chann
IPC: H01S3/04 , H01S5/024 , H01S5/40 , H01S5/14 , H01S5/02208
CPC classification number: H01S5/02423 , H01S5/143 , H01S5/4012 , H01S5/4025 , H01S5/4062 , H01S5/02208
Abstract: In various embodiments, laser systems or resonators incorporate two separate cooling loops that may be operated at different cooling temperatures. One cooling loop, which may be operated at a lower temperature, cools beam emitters. The other cooling loop, which may be operated at a higher temperature, cools other mechanical and/or optical components, for example optical elements such as lenses and/or reflectors.
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公开(公告)号:US11424592B2
公开(公告)日:2022-08-23
申请号:US17071205
申请日:2020-10-15
Inventor: Bryan Lochman , Wang-Long Zhou , Francisco Villarreal-Saucedo , Bien Chann
IPC: H01S5/0222 , H01S5/02235 , H01S5/40 , H01S5/024 , H01S5/30
Abstract: In various embodiments, the concentration and deposition of siloxane materials within components of laser systems, such as laser resonators, is reduced or minimized utilizing mitigation systems that may also supply gas having low siloxane levels into multiple different components in series or in parallel.
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公开(公告)号:US11121526B2
公开(公告)日:2021-09-14
申请号:US16421728
申请日:2019-05-24
Inventor: Bryan Lochman , Matthew Sauter , Bien Chann , Wang-Long Zhou
IPC: H01S5/40 , H01S5/14 , H01S3/086 , H01S5/0225
Abstract: In various embodiments, emitter modules include a laser source and (a) a refractive optic, (b) an output coupler, or (c) both a refractive optic and an output coupler. Either or both of these may be situated on mounts that facilitate two-axis rotation. The mount may be, for example, a conventional, rotatively adjustable “tip/tilt” mount or gimbal arrangement. In the case of the refractive optic, either the optic itself or the beam path may be adjusted; that is, the optic may be on a tip/tilt mount or the optic may be replaced with two or more mirrors each on tip/tilt mount.
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公开(公告)号:USD917587S1
公开(公告)日:2021-04-27
申请号:US29679658
申请日:2019-02-08
Designer: Matthew Sauter , Bryan Lochman , Bien Chann
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公开(公告)号:US12107395B2
公开(公告)日:2024-10-01
申请号:US18144310
申请日:2023-05-08
Inventor: Wang-Long Zhou , Bryan Lochman , Bien Chann , Matthew Sauter
IPC: H01S5/40 , G02B27/10 , G02B27/30 , H01S5/02255
CPC classification number: H01S5/4012 , G02B27/1086 , G02B27/30 , H01S5/02255 , H01S5/4087
Abstract: In various embodiments, pointing errors in a non-wavelength-beam-combining dimension of a laser system are at least partially alleviated via staircased collimation lenses.
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公开(公告)号:USD918972S1
公开(公告)日:2021-05-11
申请号:US29658597
申请日:2018-08-01
Designer: Bien Chann , Bryan Lochman , Matthew Sauter
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公开(公告)号:USD908148S1
公开(公告)日:2021-01-19
申请号:US29658599
申请日:2018-08-01
Designer: Bien Chann , Bryan Lochman , Mark Mordarski , Matthew Sauter
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公开(公告)号:US11883904B2
公开(公告)日:2024-01-30
申请号:US16984489
申请日:2020-08-04
Inventor: Wang-Long Zhou , Francisco Villarreal-Saucedo , Bien Chann , Mark Mordarski , Bryan Lochman
IPC: B23K26/34 , B23K26/0622 , B23K103/00
CPC classification number: B23K26/34 , B23K26/0624 , B23K2103/50
Abstract: In various embodiments, laser beams of two different wavelengths are utilized, sequentially and/or simultaneously, to process workpieces in various processing stages such as melting, piercing, cutting, and welding.
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公开(公告)号:US11769986B2
公开(公告)日:2023-09-26
申请号:US17867941
申请日:2022-07-19
Inventor: Bryan Lochman , Wang-Long Zhou , Francisco Villarreal-Saucedo , Bien Chann
IPC: H01S5/02235 , H01S5/40 , H01S5/0222 , H01S5/024 , H01S5/30
CPC classification number: H01S5/02235 , H01S5/0222 , H01S5/02423 , H01S5/4012 , H01S5/4025 , H01S5/3013
Abstract: In various embodiments, the concentration and deposition of siloxane materials within components of laser systems, such as laser resonators, is reduced or minimized utilizing mitigation systems that may also supply gas having low siloxane levels into multiple different components in series or in parallel.
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