Abstract:
A MOS device of an IC includes pMOS and nMOS transistors. The MOS device further includes a first Mx layer interconnect extending in a first direction and coupling the pMOS and nMOS transistor drains together, and a second Mx layer interconnect extending in the first direction and coupling the pMOS and nMOS transistor drains together. The first and second Mx layer interconnects are parallel. The MOS device further includes a first Mx+1 layer interconnect extending in a second direction orthogonal to the first direction. The first Mx+1 layer interconnect is coupled to the first Mx layer interconnect and the second Mx layer interconnect. The MOS device further includes a second Mx+1 layer interconnect extending in the second direction. The second Mx+1 layer interconnect is coupled to the first Mx layer interconnect and the second Mx layer interconnect. The second Mx+1 layer interconnect is parallel to the first Mx+1 layer interconnect.
Abstract:
In certain aspects of the disclosure, a cell includes a first dummy gate extended along a second lateral direction and on a boundary of the cell, a second dummy gate extended along the second lateral direction and on an opposite boundary of the cell, and a third gate extended along the second lateral direction, wherein the third gate is between the first dummy gate and the second dummy gate. The cell also includes a source between the second dummy gate and the third gate electrically coupled to a power rail. The cell further includes a metal interconnect extended along a first lateral direction approximately perpendicular to the second lateral direction and above the first dummy gate, the source, and the third gate, wherein the metal interconnect is configured to couple the first dummy gate to the power rail through the source.
Abstract:
In certain aspects, a semiconductor die includes a first cell and a second cell. The first cell includes first transistors, and a first interconnect structure interconnecting the first transistors to form a first circuit. The second cell includes second transistors, and a second interconnect structure interconnecting the second transistors to form a second circuit. The first circuit and the second circuit are configured to perform a same function, and a length of the first cell in a first lateral direction is greater than a length of the second cell in the first lateral direction.
Abstract:
Methods and systems for clock gating are described herein. In certain aspects, a method for clock gating includes receiving an input signal of a flip-flop and an output signal of the flip-flop, and passing a clock signal to an input of a gate in the flip-flop if the input signal and the output signal have different logic values or both the input signal and the output signal have a logic value of zero. The method also includes gating the clock signal if both the input signal and the output signal have a logic value of one.
Abstract:
A standard cell IC includes pMOS transistors in a pMOS region of a MOS device. The pMOS region extends between a first cell edge and a second cell edge opposite the first cell edge. The standard cell IC further includes nMOS transistors in an nMOS region of the MOS device. The nMOS region extends between the first cell edge and the second cell edge. The standard cell IC further includes at least one single diffusion break located in an interior region between the first cell edge and the second cell edge that extends across the pMOS region and the nMOS region to separate the pMOS region into pMOS subregions and the nMOS region into nMOS subregions. The standard cell IC includes a first double diffusion break portion at the first cell edge. The standard cell IC further includes a second double diffusion break portion at the second cell edge.
Abstract:
Systems and methods for level-shifting multiplexing are described herein. In one embodiment, a method for level-shifting multiplexing comprises selecting one of a plurality of inputs based on one or more select signals, and pulling down one of first and second nodes based on a logic state of the selected one of the plurality of inputs. The method also comprises pulling up the first node if the second node is pulled down, and pulling up the second node if the first node is pulled down.
Abstract:
An example scannable register file includes a plurality of memory cells and, a shift phase of a scan test shifts data bits from a scan input through the plurality of memory cells to a scan output. The shifting can be performed by, on each clock cycle, reading one of the plurality of memory cells to supply the scan out and writing one of the plurality of memory cells with the data bit on a scan input. To perform sequential reads and writes on each clock cycle, the scannable register can generate a write clock that, during the shift phase, is inverted from the clock used for functional operation. The write clock is generated without glitches so that unintended writes do not occur. Scannable register files can be integrated with scan-based testing (e.g., using automatic test pattern generation) of other modules in an integrated circuit.
Abstract:
A cross-bar switch is provided that enables each master from a plurality of masters to read from and write to selected memories from an array of memories. A logic circuit controls the cross-bar switch so that redundancy for the memories is provided by a shared redundancy storage element.
Abstract:
A MOS device of an IC includes pMOS and nMOS transistors. The MOS device further includes a first Mx layer interconnect extending in a first direction and coupling the pMOS and nMOS transistor drains together, and a second Mx layer interconnect extending in the first direction and coupling the pMOS and nMOS transistor drains together. The first and second Mx layer interconnects are parallel. The MOS device further includes a first Mx+1 layer interconnect extending in a second direction orthogonal to the first direction. The first Mx+1 layer interconnect is coupled to the first Mx layer interconnect and the second Mx layer interconnect. The MOS device further includes a second Mx+1 layer interconnect extending in the second direction. The second Mx+1 layer interconnect is coupled to the first Mx layer interconnect and the second Mx layer interconnect. The second Mx+1 layer interconnect is parallel to the first Mx+1 layer interconnect.
Abstract:
In certain aspects, a semiconductor die includes a first doped region, a second doped region, and an interconnect formed from a first middle of line (MOL) layer, wherein the interconnect electrically couples the first doped region to the second doped region. The semiconductor die also includes a first metal line formed from a first interconnect metal layer, and a first via electrically coupling the interconnect to the first metal line.