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公开(公告)号：US06605195B2
公开(公告)日：2003-08-12
申请号：US09834102
申请日：2001-04-12
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C1434
CPC分类号： H01J37/3414 , C23C14/3464 , H01J37/34
摘要： A sputtering apparatus for depositing layers of material onto a substrate includes a vacuum chamber, a first target and a second target positioned within the vacuum chamber. A source of power is placed in electrical communication with the first target and the second target. A switch alternately connects the source of power between the first target and the second target. The first target and the second target are different materials. The switch connects power to the first target when the transport mechanism positions the substrate near the first target and the switch connects power to the second target when the transport mechanism positions the substrate closer to the second target.
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公开(公告)号：US06290821B1
公开(公告)日：2001-09-18
申请号：US09533696
申请日：2000-03-23
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C1434
CPC分类号： C23C14/345 , C23C14/34 , C23C14/568
摘要： A method for depositing on a substrate surface a thin film layer comprising a target material comprises providing a cathode including a target having a sputtering surface comprised of the target material, with the target sputtering surface facing the substrate surface with a space therebetween, and sputtering the target material onto the substrate surface by applying a plurality of negative voltage pulses to the cathode while simultaneously applying a bias voltage to the substrate. Embodiments include depositing thin film layers onto static or moving substrates and application of constant or time-varying substrate bias voltage. The invention finds particular utility in the formation of high purity layers in the automated manufacture of magnetic data/information storage and retrieval media.
摘要翻译： 一种在衬底表面上沉积包括目标材料的薄膜层的方法包括提供包括靶的阴极，所述靶具有由靶材料组成的溅射表面，靶溅射表面与衬底表面相对置，并且溅射 通过向阴极施加多个负电压脉冲，同时向衬底施加偏置电压，将目标材料涂覆到衬底表面上。 实施例包括将薄膜层沉积到静态或移动的衬底上以及施加恒定或随时间变化的衬底偏置电压。 本发明在磁数据/信息存储和检索介质的自动制造中形成高纯度层具有特别的用途。
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公开(公告)号：US08946651B2
公开(公告)日：2015-02-03
申请号：US13192251
申请日：2011-07-27
CPC分类号： H01J27/028 , G11B5/8408
摘要： An ion source is provided. The ion source comprises a first cylindrical anode and a second cylindrical anode. The first cylindrical anode is concentric with the second cylindrical anode. The ion source further comprises an electron source positioned within the first cylindrical anode or the second cylindrical anode.
摘要翻译： 提供离子源。 离子源包括第一圆柱形阳极和第二圆柱形阳极。 第一圆柱形阳极与第二圆柱形阳极同心。 离子源还包括位于第一圆柱形阳极或第二圆柱形阳极内的电子源。
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公开(公告)号：US20110278156A1
公开(公告)日：2011-11-17
申请号：US13192251
申请日：2011-07-27
CPC分类号： H01J27/028 , G11B5/8408
摘要： An ion source is provided. The ion source comprises a first cylindrical anode and a second cylindrical anode. The first cylindrical anode is concentric with the second cylindrical anode. The ion source further comprises an electron source positioned within the first cylindrical anode or the second cylindrical anode.
摘要翻译： 提供离子源。 离子源包括第一圆柱形阳极和第二圆柱形阳极。 第一圆柱形阳极与第二圆柱形阳极同心。 离子源还包括位于第一圆柱形阳极或第二圆柱形阳极内的电子源。
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公开(公告)号：US20110033612A1
公开(公告)日：2011-02-10
申请号：US12905991
申请日：2010-10-15
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
CPC分类号： C23C16/4485 , B05D1/60 , B05D5/08 , B05D5/083 , C23C14/243 , C23C16/448 , C23C16/455 , C23C16/45563 , C23C16/45565 , C23C16/458 , C23C16/4582 , C23C16/4587 , C23C16/54 , G11B5/8408 , G11B11/10582 , G11B11/10584
摘要： A method comprising introducing a workpiece support into a chamber of an apparatus. The workpiece support is for supporting thereon a plurality of workpieces. The apparatus comprising: the chamber having an interior space configured to be maintained at a pressure below atmospheric pressure; a vapor source for supplying the interior space of the chamber with a linearly extending stream of lubricant vapor; the workpiece support for supporting thereon a plurality of workpieces with surfaces facing the vapor source; and a conveyor for continuously moving the workpiece support transversely past the linearly extending stream of lubricant vapor from the vapor source. The method also comprising continuously moving the workpiece support with the plurality of workpieces supported thereon transversely past the linearly extending stream of lubricant vapor from the vapor source and depositing a uniform thickness film of the lubricant on at least one surface of each of the plurality of workpieces.
摘要翻译： 一种方法，包括将工件支撑件引入装置的室中。 工件支撑件用于在其上支撑多个工件。 该装置包括：该室具有被配置为保持在低于大气压的压力的内部空间; 用于向腔室的内部空间供应线性延伸的润滑剂蒸汽流的蒸汽源; 用于在其上支撑具有面向蒸气源的表面的多个工件的工件支撑件; 以及用于将工件支撑件横向移动通过来自蒸汽源的线性延伸的润滑剂蒸汽流的输送机。 该方法还包括使支撑在其上的多个工件连续移动工件支撑件横向地从蒸气源穿过线性延伸的润滑剂蒸汽流，并将均匀的厚度的润滑剂膜沉积在多个工件中的每一个的至少一个表面上 。
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公开(公告)号：US07828899B2
公开(公告)日：2010-11-09
申请号：US10957600
申请日：2004-10-05
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C16/00 , C23C16/448 , C23C16/455
CPC分类号： C23C16/4485 , B05D1/60 , B05D5/08 , B05D5/083 , C23C14/243 , C23C16/448 , C23C16/455 , C23C16/45563 , C23C16/45565 , C23C16/458 , C23C16/4582 , C23C16/4587 , C23C16/54 , G11B5/8408 , G11B11/10582 , G11B11/10584
摘要： An apparatus for performing simultaneous pass-by vapor deposition of a uniform thickness thin film of a lubricant on at least one surface of each of a plurality of substrates. The apparatus includes a (a) chamber member having an interior space adapted to be maintained at a reduced pressure below atmospheric pressure; (b) at least one linearly extending vapor source member for supplying the interior space of the chamber with at least one linearly extending stream of lubricant vapor; (c) a substrate/workpiece mounting/supporting member adapted for supporting thereon a plurality of substrates/workpieces; and (d) a transporter/conveyor member for continuously moving the substrate/workpiece mounting/supporting member transversely past the at least one linearly extending stream of lubricant vapor for depositing a uniform thickness thin film of lubricant on the surfaces of each of a plurality of substrates/workpieces carried by the substrate/workpiece mounting/supporting member.
摘要翻译： 一种用于在多个基板中的每一个的至少一个表面上执行均匀厚度的润滑剂薄膜的同时蒸发沉积的装置。 该装置包括（a）室构件，其具有适于保持在低于大气压的减压的内部空间; （b）至少一个线性延伸的蒸气源构件，用于向腔室的内部空间提供至少一个线性延伸的润滑剂蒸汽流; （c）适于在其上支撑多个基板/工件的基板/工件安装/支撑部件; 和（d）用于将衬底/工件安装/支撑构件横向移动通过所述至少一个线性延伸的润滑剂蒸汽流的运送器/传送器构件，用于在多个的每个的表面上沉积均匀厚度的润滑剂薄膜 由基板/工件安装/支撑构件承载的基板/工件。
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公开(公告)号：US20050039687A1
公开(公告)日：2005-02-24
申请号：US10957600
申请日：2004-10-05
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
CPC分类号： C23C16/4485 , B05D1/60 , B05D5/08 , B05D5/083 , C23C14/243 , C23C16/448 , C23C16/455 , C23C16/45563 , C23C16/45565 , C23C16/458 , C23C16/4582 , C23C16/4587 , C23C16/54 , G11B5/8408 , G11B11/10582 , G11B11/10584
摘要： An apparatus for performing simultaneous pass-by vapor deposition of a uniform thickness thin film of a lubricant on at least one surface of each of a plurality of substrates, comprising: (a) chamber means having an interior space adapted to be maintained at a reduced pressure below atmospheric pressure, including entrance and exit means at opposite ends thereof; (b) at least one linearly extending vapor source means for supplying the interior space of the chamber with at least one linearly extending stream of lubricant vapor; (c) a substrate/workpiece mounting/supporting means adapted for supporting thereon a plurality of substrates/workpieces; and (d) a transporter/conveyor means for continuously moving the substrate/workpiece mounting/supporting means transversely past the at least one linearly extending stream of lubricant vapor for depositing a uniform thickness thin film of lubricant on the surfaces of each of a plurality of substrates/workpieces carried by the substrate/workpiece mounting/supporting means. Embodiments of the method of the invention include depositing lubricant thin films on freshly deposited carbon-containing protective overcoats formed on disc-shaped magnetic and/or magneto-optical recording media.
摘要翻译： 一种用于在多个基板中的每一个的至少一个表面上执行均匀厚度的润滑剂薄膜的同时蒸发沉积的装置，包括：（a）腔室装置，其具有适于保持在减小的 压力低于大气压，包括在其相对端的入口和出口装置; （b）至少一个线性延伸的蒸汽源装置，用于向腔室的内部空间提供至少一个线性延伸的润滑剂蒸汽流; （c）适于在其上支撑多个基板/工件的基板/工件安装/支撑装置; 和（d）用于将衬底/工件安装/支撑装置横向移动通过所述至少一个线性延伸的润滑剂蒸汽流的运输机/输送机装置，用于在多个的每个的表面上沉积均匀的厚度的润滑剂薄膜 由基板/工件安装/支撑装置承载的基板/工件。 本发明方法的实施例包括在形成于盘形磁和/或磁光记录介质上的新鲜沉积的含碳保护外涂层上沉积润滑剂薄膜。
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18.发明授权Apparatus and method for selectively and controllably electrically biasing a plurality of substrates on a pallet 失效用于选择性地和可控地电动地偏置托盘上的多个基板的装置和方法公开(公告)号：US06843892B1
公开(公告)日：2005-01-18
申请号：US10212693
申请日：2002-08-07
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
CPC分类号： C23C14/50
摘要： An in-line, multi-station apparatus including an improved pallet for transporting a plurality of workpieces/substrates through the apparatus, the pallet comprising: (a) a sheet of electrically conductive material provided with a plurality of spaced-apart regions extending at least partway therethrough, each of the regions adapted to mount therein and expose at least one major surface of respective workpieces/substrates for receipt of the treatment; and (b) a plurality of electrical contact means for selectively and controllably electrically contacting respective ones of said plurality of workpieces/substrates for applying an electrical bias potential thereto during treatment. Embodiments include in-line apparatus for performing bias sputtering of electrically conductive thin films on insulative substrates in the manufacture of multi-layer magnetic and/or magneto-optical recording media.
摘要翻译： 一种在线多站设备，包括用于通过设备传送多个工件/基板的改进的托盘，所述托盘包括：（a）导电材料片，其设置有至少延伸的多个间隔开的区域 每个区域适于安装在其中并且暴露相应工件/基板的至少一个主表面以接收处理; 和（b）多个电接触装置，用于选择性地和可控地电接触所述多个工件/基板中的相应的工件/基板，以在处理期间向其施加电偏置电位。实施例包括用于执行导电薄膜的偏置溅射的在线装置 在制造多层磁和/或磁光记录介质的绝缘基板上。
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公开(公告)号：US08382902B2
公开(公告)日：2013-02-26
申请号：US10644054
申请日：2003-08-20
IPC分类号： C23C16/00
CPC分类号： G11B5/85 , B05D1/60 , B05D5/083 , G11B5/8408
摘要： Apparatus and method for vapor deposition of a uniform thickness thin film of lubricant on at least one surface of a disk-shaped substrate. The invention has particular utility in depositing thin films of polymeric lubricants onto disc-shaped substrates in the manufacture of magnetic and MO recording media.
摘要翻译： 在盘形基板的至少一个表面上蒸镀均匀厚度的润滑剂薄膜的装置和方法。 本发明在磁性和MO记录介质的制造中将聚合润滑剂的薄膜沉积到盘形基底上具有特别的用途。
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公开(公告)号：US20100116202A1
公开(公告)日：2010-05-13
申请号：US12266915
申请日：2008-11-07
申请人： Mark Smura , Paul Stephen McLeod
发明人： Mark Smura , Paul Stephen McLeod
CPC分类号： G11B5/84
摘要： A modular chamber design for manufacturing magnetic disks is provided. The modular chambers are linearly aligned, have a trapezoidal shape, and are inversely oriented. In this inverse orientation, a chamber can be exchanged and/or removed without first having to laterally move the other chambers to create space on each side of the chamber being moved. Because the modular chamber design decreases the amount of time and labor required to exchange or replace chambers in a disk processing line, disk throughput is increased. Thus, the modular chamber design facilitates faster and more efficient chamber exchange/removal.
摘要翻译： 提供了用于制造磁盘的模块化室设计。 模块化腔体是直线对准的，具有梯形形状，并且反向取向。 在这种反向取向中，可以更换和/或移除腔室，而不必首先必须横向移动其它腔室，以在被移动的腔室的每一侧上产生空间。 由于模块化室设计减少了更换或更换磁盘处理线中的腔室所需的时间和人力，因此磁盘吞吐量增加。 因此，模块化室设计有助于更快更有效地进行室的更换/移除。
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