摘要:
Aromatic-aliphatic ketones of the formulae I, II, III or IV ##STR1## wherein n is 1 or 2, Ar is an aryl radical, R.sup.1 and R.sup.2 are monovalent aliphatic, cycloaliphatic or araliphatic radicals, R.sup.3 is a direct bond or a divalent organic radical, X is a hydroxyl or amino group or the monovalent etherification or silylation products thereof, and X' is a divalent amino, ether or silyloxy group, Y is a direct bond or CH.sub.2 and Z is O, S, SO.sub.2, CH.sub.2 or C(CH.sub.3).sub.2, are suitable sensitizers for the photopolymerization of unsaturated compounds and for the photochemical crosslinking of polyolefins. Some of these compounds are novel and can be obtained by methods analogous to those for obtaining the known compounds of this type.
摘要:
Compounds of the formula I and II ##STR1## in which R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6, X, Y and n are as defined in claim 1, are latent curing catalysts for acid-curable stoving lacquers. They are distinguished by satisfactory solubility in the acid-curable resin systems, can be stored virtually indefinitely in the dark and, when exposed to shortwave light, make it possible to cure the resins by acid catalysis at a relatively low temperature.
摘要:
Compounds of the formula I ##STR1## in which R.sub.1, is aryl, R.sub.2 is hydrogen, --OH or alkyl, R.sub.3 is hydrogen or alkyl, R.sub.4 is hydrogen, aryl, alkenyl, furyl or --CCl.sub.3, when n is 1, R.sub.5 is alkyl, aryl, camphoryl, --CF.sub.3 or fluoro, or when n is 2, R.sub.5 is alkylene or arylene, are latent curing catalysts for acid-curable stoving varnishes. On irradiation, the active curing catalysts which lead to acid-catalyzed curing of the resins are formed from the compounds of the formula I.
摘要:
Compounds of formula X ##STR1## in which R.sub.6 is aryl, R.sub.7 is hydrogen, --OH or alkyl, R.sub.8 is alkyl, R.sub.9 is hydrogen, alkyl, alkenyl, aryl, furyl or --CCl.sub.3, when n is 1, R.sub.10 is alkyl, aryl, camphoryl, --CF.sub.3 or fluoro, or when n is 2, R.sub.10 is alkylene or arylene are latent curing catalysts for acid-curable stoving varnishes. On irradiation, the active curing catalysts which lead to acid-catalysed curing of the resins are formed from the compounds of the formula x.
摘要:
Compounds of the formula I and II ##STR1## in which R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6, X, Y and n are as defined in claim 1, are latent curing catalysts for preparing relief images with acid-curable resins. They are distinguished by satisfactory solubility in the acid-curable resin systems, can be stored virtually indefinitely in the dark and, when exposed to shortwave light, make it possible to cure the resins by acid catalysis at a relatively low temperature.
摘要:
Cationically polymerizable compounds, for example cyclic ethers, can be thermally polymerised if an aromatic iodonium salt of the formula I[(Ar.sup.1)(Ar.sup.2)I].sup.+ [MX.sub.n ].sup.- (I)in which Ar.sup.1 Ar.sup.2, M, X and n are as defined in claim 1, is used as the catalyst and an agent which forms free radicals on heating and has the formula III or IV ##STR1## in which R.sup.2, R.sup.3, R.sup.5, R.sup.6, R.sup.8 and m are as defined in claim 1, for example a benzpinacol silyl ether, is used as the co-catalyst. The process is of particular importance for heat-curing epoxide resins as a one-component system.
摘要:
Mixtures of (A) a mercaptophenyl ketone of the formula I ##STR1## in which n is 1 or 2, Ar is an unsubstituted or substituted aryl radical or a hetero-aromatic radical, R.sup.1 is hydrogen, alkyl or, if n is 1, also --SCH.sub.2 X and X, if n is 1, is one of the groups --CH(R.sup.2)--OH, --CH(R.sup.2)--O--CO--R.sup.5, --CH.sub.2 SH or --(CH.sub.2).sub.1-3 --NR.sup.3 R.sup.4, in which R.sup.2 is hydrogen, methyl, phenyl or one of the groups --CH.sub.2 OH, --CH.sub.2 --NR.sup.3 R.sup.4 or --CH.sub.2 --OR.sup.6, R.sup.3 and R.sup.4 independently of one another are hydrogen, alkyl or hydroxyalkyl, or R.sup.3 and R.sup.4 together are 1,4-butylene, 1,5-pentylene or 3-oxa-1,5-pentylene, and R.sup.5 and R.sup.6 are monovalent hydrocarbon radicals, and X, if n is 2, is alkylene, vinylene, phenylene or one of the divalent groups --CH.sub.2 S--SCH.sub.2 --, --CH(R.sup.2)--O--CO--O--CH(R.sup.2)--, --CH(R.sup.2)--O--CO--R.sup.7 --CO-- OCH(R.sup.2)--, --CO--O--R.sup.8 --O--CO--, --CH.sub.2 COO--R.sup.8 --OOCCH.sub.2 -- or --CH(OH)--CH.sub.2 --O--R.sup.8 --O--CH.sub.2 --CH(OH)--, in which R.sup.7 is a divalent hydrocarbon radical or --NH--R.sup.9 --NH--and R.sup.8 and R.sup.9 are divalent hydrocarbon radicals, and (B) an organic amine are effective initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins.
摘要:
Novel 2,4-Bis-(stilben-4'-yl)-v-triazoles of the formula ##STR1## wherein the rings A, B, C, D and E can contain certain nonchromophoric substituents, methods for their preparation as well as their use as optical brighteners are disclosed.
摘要:
2-Oxo-2-alkoxy-5-dialkylphosphono-1,2-oxaphospholanes of the formula ##STR1## in which R.sub.1 to R.sub.7 are hydrocarbon radicals can be prepared from .alpha.,.beta.-unsaturated ketones and 2 or more moles of a dialkyl phosphite. Obviously .gamma.-ketophosphonates are intermediates of this reaction, as these compounds react with 1 or more moles of dialkyl phosphite in yielding the oxaphospholanes too. Both reactions are promoted by alkaline catalysts.The new oxaphospholane derivatives are considerably stable against thermal decomposition. They are compatible with polymeric materials and can be used as flame protecting agent for plastics and resins, for example, in polyurethane foams.
摘要:
Polyhalogenated dibenzofuranes having at least six halogen atoms are prepared by halogenation of 2,4,8-trichlorodibenzofurane or of dibenzofurane. The halogenation may be achieved by Cl.sub.2, Br.sub.2, SO.sub.2 Cl.sub.2, S.sub.2 Cl.sub.2 or similar halogen donors. The products are flameproofing agents for polymers, especially for polyesters and polyolefins. Examples are octachloro-, trichlorotribromo- and trichlorotetrabromo-benzofurane.