EXPOSURE MASK AND METHOD OF MANUFACTURING A SUBSTRATE USING THE EXPOSURE MASK

    公开(公告)号:US20170221937A1

    公开(公告)日:2017-08-03

    申请号:US15491279

    申请日:2017-04-19

    IPC分类号: H01L27/12 G03F1/38 G03F1/22

    摘要: An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

    Photo mask and method of manufacturing the same
    12.
    发明授权
    Photo mask and method of manufacturing the same 有权
    照相面具及其制造方法

    公开(公告)号:US09575405B2

    公开(公告)日:2017-02-21

    申请号:US14678743

    申请日:2015-04-03

    摘要: A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.

    摘要翻译: 光掩模包括透明基板和掩模图案。 掩模图案设置在透明基板上。 掩模图案包括用于遮挡光的阻挡部分和用于透射光的透射部分。 传送部分与阻挡部分相邻。 阻挡部分包括第一阻挡层,光引导层和第二阻挡层。 第一阻挡层设置在透明基板上。 第一阻挡层透射光的一部分。 第一阻挡层包括多个阻挡图案,包括第一阻挡材料。 光引导层设置在第一阻挡层上。 光导层将光的透射部分引导到光导层的侧表面。 第二阻挡层反射光的透射部分。