公开(公告)号：US10043860B2

公开(公告)日：2018-08-07

申请号：US15605431

申请日：2017-05-25

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Byung Hoon Kang ,  Kwang Suk Kim ,  Joon-Hwa Bae ,  Woo Jin Cho ,  Hyun Jin Cho ,  Jun Hyuk Cheon ,  Byoung Kwon Choo

IPC: H01L29/08 ,  H01L27/32

Abstract: A method of manufacturing a display device includes: forming an active layer on a substrate; forming a first insulation layer covering the active layer; forming a gate metal line on the first insulation layer; forming a third insulation layer covering the gate metal line and including a silicon oxide; forming a fourth insulation layer including a silicon nitride on the third insulation layer; forming a fifth insulation layer including a silicon oxide on the fourth insulation layer; arranging a blocking member over a region in which the active layer and the gate metal line overlap; forming a fifth auxiliary insulation layer by doping nitrogen ions in the fifth insulation layer; and exposing a part of an upper surface of the fourth insulation layer by removing a portion of a fifth main insulation layer of the fifth insulation layer which does not overlap the fifth auxiliary insulation layer.

公开(公告)号：US11985865B2

公开(公告)日：2024-05-14

申请号：US17332933

申请日：2021-05-27

Applicant: Samsung Display Co., Ltd.

Inventor： Byoung Kwon Choo ,  Seung Bae Kang ,  Bong Gu Kang ,  Tae Joon Kim ,  Jeong Min Park ,  Joon-Hwa Bae ,  Hee Sung Yang ,  Woo Jin Cho

IPC: H10K59/123 ,  H10K50/84 ,  H10K50/86 ,  H10K59/12 ,  H10K59/38 ,  H10K59/40 ,  H10K71/00

CPC classification number: H10K59/123 ,  H10K50/84 ,  H10K50/865 ,  H10K59/38 ,  H10K59/40 ,  H10K71/00 ,  H10K59/1201

Abstract: A display device according to an embodiment includes: a substrate; a transistor that is disposed on the substrate; a light emitting diode that is disposed on the substrate, and connected to the transistor; and a passivation layer that is disposed between the transistor and the light emitting diode, wherein a surface step of the passivation layer is within a range of and including 1 nm to 30 nm.

公开(公告)号：US11594561B2

公开(公告)日：2023-02-28

申请号：US17074947

申请日：2020-10-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong-Hwan Ryu ,  Woo Jin Cho ,  Jong-Hyun Choung ,  Jae Uoon Kim ,  Sun-Jin Song ,  Hyun Duck Cho

IPC: H01L27/12 ,  G03F7/038 ,  H01L21/027 ,  G03F7/00 ,  C23F1/00 ,  C23C16/44

Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.

公开(公告)号：US20220246702A1

公开(公告)日：2022-08-04

申请号：US17511531

申请日：2021-10-26

Applicant: Samsung Display Co., LTD.

Inventor： Byoung Kwon Choo ,  Seung Bae Kang ,  Hee Sung Yang ,  Bong Gu Kang ,  Tae Wook Kang ,  Woo Jin Cho

IPC: H01L27/32 ,  H01L51/56

Abstract: A display device includes: a substrate; a first signal line and a second signal line disposed on the substrate; and an interlayer-insulating layer disposed between the first signal line and the second signal line. The interlayer-insulating layer includes a first portion and a second portion having different heights measured from a surface of the substrate along a first direction that is perpendicular to the surface of the substrate, an upper surface of the first portion of the interlayer-insulating layer is flat, a surface of the second portion of the interlayer-insulating layer is flat, a height of the first portion is lower than a height of the second portion, the interlayer-insulating layer defines a contact hole, and the contact hole is disposed in the first portion of the interlayer-insulating layer.

公开(公告)号：US11145846B2

公开(公告)日：2021-10-12

申请号：US16798924

申请日：2020-02-24

Applicant: Samsung Display Co., Ltd.

Inventor： Seung Jun Moon ,  Byung Hoon Kang ,  Dong Kyun Seo ,  Hee Kyun Shin ,  Jun Ho Sim ,  Woo Jin Cho

IPC: H01L51/56 ,  H01L27/32 ,  H01L51/00

Abstract: An apparatus and a method for manufacturing a display device are provided. An apparatus for manufacturing a display device includes a first unit configured to remove impurities of a support substrate, a second unit configured to form a sacrificial layer on the support substrate, a third unit configured to form a flexible substrate on the sacrificial layer, and a fourth unit configured to form a display unit on the flexible substrate. The second unit includes a moving unit movable in a first direction to receive the support substrate, a first supply nozzle configured to spray a solution onto the support substrate to coat a graphene oxide layer, and a second supply nozzle configured to dry the graphene oxide layer coated on the support substrate while removing a portion of the graphene oxide layer, to form the sacrificial layer.

公开(公告)号：US10998343B2

公开(公告)日：2021-05-04

申请号：US16591859

申请日：2019-10-03

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Byoung Kwon Choo ,  Joon Hwa Bae ,  Hyun Jin Cho ,  Jun Hyuk Cheon ,  Zi Yeon Yoon ,  Woo Jin Cho ,  Sung Hwan Choi ,  Jeong Hye Choi

IPC: H01L27/12 ,  G02F1/1368 ,  H01L21/321 ,  G02F1/1362 ,  H01L27/32 ,  H01L29/66 ,  H01L29/786 ,  H01L29/78

Abstract: A thin-film transistor (TFT) array substrate is provided. The TFT array substrate includes a base substrate, a semiconductor layer disposed on the base substrate, an insulating layer disposed on the semiconductor layer, and a gate electrode disposed on the insulating layer. A top surface of a portion of the insulating layer overlapping the semiconductor layer in a plan view of the base substrate and a top surface of the gate electrode are placed on the same level.

公开(公告)号：US10930895B2

公开(公告)日：2021-02-23

申请号：US15967750

申请日：2018-05-01

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hee Kyun Shin ,  Seung Jun Moon ,  Byung Hoon Kang ,  Min Woo Lee ,  Woo Jin Cho

IPC: H01L51/56 ,  B32B7/12 ,  B32B5/16 ,  H01L51/00 ,  H01L51/52 ,  H01L27/32

Abstract: A display device includes a base, a light emitting device on a first surface of the base, and a plate-like inorganic layer on a second surface of the base, the plate-like inorganic layer including a first plate-like inorganic particle with a first size and a second plate-like inorganic particle with a second size different from the first size.

公开(公告)号：US10910605B2

公开(公告)日：2021-02-02

申请号：US16883780

申请日：2020-05-26

Applicant: Samsung Display Co., Ltd.

Inventor： Joon Hwa Bae ,  Hyun Jin Cho ,  Byoung Kwon Choo ,  Woo Jin Cho

IPC: H01L51/56 ,  H01L27/32 ,  H01L27/12 ,  H01L51/52

Abstract: In a method of manufacturing a display device, the method includes: forming a conductive layer on a base; forming an organic layer, with a hole partially exposing the conductive layer, on the conductive layer; polishing an upper surface of the organic layer; and forming a light emitting element on the polished organic layer.

公开(公告)号：US20200321563A1

公开(公告)日：2020-10-08

申请号：US16798924

申请日：2020-02-24

Applicant: Samsung Display Co., Ltd.

Inventor： Seung Jun Moon ,  Byung Hoon Kang ,  Dong Kyun Seo ,  Hee Kyun Shin ,  Jun Ho Sim ,  Woo Jin Cho

IPC: H01L51/56

Abstract: An apparatus and a method for manufacturing a display device are provided. An apparatus for manufacturing a display device includes a first unit configured to remove impurities of a support substrate, a second unit configured to form a sacrificial layer on the support substrate, a third unit configured to form a flexible substrate on the sacrificial layer, and a fourth unit configured to form a display unit on the flexible substrate. The second unit includes a moving unit movable in a first direction to receive the support substrate, a first supply nozzle configured to spray a solution onto the support substrate to coat a graphene oxide layer, and a second supply nozzle configured to dry the graphene oxide layer coated on the support substrate while removing a portion of the graphene oxide layer, to form the sacrificial layer.

公开(公告)号：US10700310B2

公开(公告)日：2020-06-30

申请号：US16007788

申请日：2018-06-13

Applicant: Samsung Display Co., Ltd.

Inventor： Joon Hwa Bae ,  Hyun Jin Cho ,  Byoung Kwon Choo ,  Woo Jin Cho

IPC: H01L51/56 ,  H01L27/32 ,  H01L27/12 ,  H01L51/52

Abstract: In a method of manufacturing a display device, the method includes: forming a conductive layer on a base; forming an organic layer, with a hole partially exposing the conductive layer, on the conductive layer; polishing an upper surface of the organic layer; and forming a light emitting element on the polished organic layer.