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1.
公开(公告)号:US12014565B2
公开(公告)日:2024-06-18
申请号:US17538901
申请日:2021-11-30
Applicant: Samsung Display Co., Ltd.
Inventor: Joon-Hwa Bae , Bonggu Kang , Seungbae Kang , Heesung Yang , Woojin Cho , Byoung Kwon Choo
IPC: G06V40/13 , G06F1/16 , G06F3/041 , G06F21/32 , H01L27/146
CPC classification number: G06V40/13 , G06F1/1626 , G06F3/0412 , G06F21/32 , G06V40/1318 , H01L27/14683 , H01L27/14685
Abstract: A method of manufacturing a detection sensor is disclosed. The method includes forming a biometric information sensing layer including a transistor on a base layer, forming an initial optical pattern layer on the biometric information sensing layer, patterning the initial optical pattern layer to form a plurality of transmissive portions spaced apart from each other and having a first zeta potential, coating a light blocking material to form an initial light blocking portion that covers a side surface and an upper surface of the transmissive portions and has a second zeta potential different from the first zeta potential, and polishing the initial light blocking portion such that the upper surface of the transmissive portions is exposed to form a light blocking portion. The initial light blocking portion is polished by the abrasive, which has the first zeta potential, using a pad.
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公开(公告)号:US20230131912A1
公开(公告)日:2023-04-27
申请号:US17865501
申请日:2022-07-15
Applicant: Samsung Display Co., Ltd.
Inventor: HEESUNG YANG , Joon-Hwa Bae , Sukyeong Shin , Woojin Cho
Abstract: A display panel includes an emission area and a non-emission area. A light emitting element includes a first electrode, an emission layer on the first electrode, and a second electrode on the emission layer. A pixel defining layer includes a first opening defined therein and exposing the first electrode. A first encapsulation layer is on the second electrode to overlap the light emitting element. The first encapsulation layer includes a first inorganic layer on the second electrode and a second inorganic layer on the first inorganic layer. A top surface of the second electrode overlaps the first opening and includes at least one first stepped portion. A bottom surface of the second inorganic layer directly contacts a top surface of the first inorganic layer. At least one of the top surface of the first inorganic layer or a top surface of the second inorganic layer is a flat surface.
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公开(公告)号:US10204935B2
公开(公告)日:2019-02-12
申请号:US15702797
申请日:2017-09-13
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Hyun Jin Cho , Joon-Hwa Bae , Byoung Kwon Choo , Byung Hoon Kang , Kwang Suk Kim , Woo Jin Cho , Jun Hyuk Cheon
IPC: H01L27/12 , B24B31/00 , C09G1/02 , H01L21/3105 , H01L21/66 , G09G3/3233 , H01L21/02 , H01L27/32 , H01L29/786
Abstract: A method for manufacturing a display device includes forming a first gate metal wire on a substrate, forming a first insulation layer that covers the first gate metal wire, forming a second gate metal wire on the first insulation layer, forming a second main insulation layer that covers the second gate metal wire, forming a second auxiliary insulation layer on the second main insulation layer, forming an exposed portion of an upper surface of the second main insulation layer by polishing the second auxiliary insulation layer, and forming a first data metal wire on the second main insulation layer and the second auxiliary insulation layer.
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公开(公告)号:US10043860B2
公开(公告)日:2018-08-07
申请号:US15605431
申请日:2017-05-25
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Byung Hoon Kang , Kwang Suk Kim , Joon-Hwa Bae , Woo Jin Cho , Hyun Jin Cho , Jun Hyuk Cheon , Byoung Kwon Choo
Abstract: A method of manufacturing a display device includes: forming an active layer on a substrate; forming a first insulation layer covering the active layer; forming a gate metal line on the first insulation layer; forming a third insulation layer covering the gate metal line and including a silicon oxide; forming a fourth insulation layer including a silicon nitride on the third insulation layer; forming a fifth insulation layer including a silicon oxide on the fourth insulation layer; arranging a blocking member over a region in which the active layer and the gate metal line overlap; forming a fifth auxiliary insulation layer by doping nitrogen ions in the fifth insulation layer; and exposing a part of an upper surface of the fourth insulation layer by removing a portion of a fifth main insulation layer of the fifth insulation layer which does not overlap the fifth auxiliary insulation layer.
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公开(公告)号:US20170062248A1
公开(公告)日:2017-03-02
申请号:US15084201
申请日:2016-03-29
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: JOO WOAN CHO , Jeong Kyun Na , Seung Hwan Lee , Joon-Hwa Bae , Byoung Ho Cheong , Byoung Kwon Choo , Oleg Prudnikov
CPC classification number: H01L21/02678 , G02B27/283 , G02B27/286
Abstract: A laser crystallizing apparatus includes a laser generator that generates an incident laser beam that includes a P polarization component and an S polarization component, an optical system that converts the incident laser beam to generate an emitted laser beam, and a stage on which is mounted a target substrate with a target thin film which is laser-crystallized by being irradiated by the emitted laser beam. The optical system includes at least one half wave plate (HWP) that shifts a polarization axis direction of the incident laser beam received from the laser generator, at least one mirror that fully reflects the laser beam, and at least one polarization beam splitter (PBS) which reflects a part of the laser beam and transmits the other part of the laser beam.
Abstract translation: 激光结晶装置包括:激光发生器,其产生包括P偏振分量和S偏振分量的入射激光束;转换入射激光束以产生发射的激光束的光学系统;以及安装有 具有通过被发射的激光束照射激光结晶的目标薄膜的靶基板。 所述光学系统包括至少一个半波片(HWP),其移动从激光发生器接收的入射激光束的偏振轴方向,至少一个完全反射激光束的反射镜,以及至少一个偏振分束器 ),其反映了激光束的一部分并透射激光束的另一部分。
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公开(公告)号:US11148247B2
公开(公告)日:2021-10-19
申请号:US15664166
申请日:2017-07-31
Applicant: Samsung Display Co., Ltd.
Inventor: Hyun Jin Cho , Joon-Hwa Bae , Byoung Kwon Choo , Byung Hoon Kang , Jun Hyuk Cheon , Jeong-Hye Choi , Young Ho Jeong , Woo Jin Cho
IPC: B24B37/34 , B24B53/017 , B24B37/10
Abstract: A substrate polishing system includes: a polishing machine and a substrate transporter. The polishing machine includes: a lower surface plate to which a substrate is mounted, and an upper surface plate which faces the lower surface plate and polishes the substrate in cooperation with the lower surface plate, the upper surface plate having a larger area than the substrate mounted on the lower surface plate. The substrate transporter is adjacent to the polishing machine and commonly transports the substrate to and from the polishing machine in a first direction, attaches the substrate to the lower surface plate before polishing thereof, and separates from the lower surface plate the substrate after polishing thereof.
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公开(公告)号:US10347484B2
公开(公告)日:2019-07-09
申请号:US15084201
申请日:2016-03-29
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Joo Woan Cho , Jeong Kyun Na , Seung Hwan Lee , Joon-Hwa Bae , Byoung Ho Cheong , Byoung Kwon Choo , Oleg Prudnikov
Abstract: A laser crystallizing apparatus includes a laser generator that generates an incident laser beam that includes a P polarization component and an S polarization component, an optical system that converts the incident laser beam to generate an emitted laser beam, and a stage on which is mounted a target substrate with a target thin film which is laser-crystallized by being irradiated by the emitted laser beam. The optical system includes at least one half wave plate (HWP) that shifts a polarization axis direction of the incident laser beam received from the laser generator, at least one mirror that fully reflects the laser beam, and at least one polarization beam splitter (PBS) which reflects a part of the laser beam and transmits the other part of the laser beam.
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8.
公开(公告)号:US09806100B2
公开(公告)日:2017-10-31
申请号:US15140725
申请日:2016-04-28
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Joon-Hwa Bae , Jong Chan Lee , Woong Hee Jeong , In Sun Hwang
CPC classification number: H01L27/1229 , H01L27/124 , H01L27/1274 , H01L29/04 , H01L29/1604 , H01L29/66765 , H01L29/78618 , H01L29/78678
Abstract: A manufacturing method of a thin film transistor array panel according to an exemplary embodiment of the present invention includes forming an amorphous silicon thin film on a substrate. A lower region of the amorphous silicon thin film is crystallized to form a polycrystalline silicon thin film by irradiating a laser beam with an energy density of from about 150 mj/cm2 to about 250 mj/cm2 to the amorphous silicon thin film.
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9.
公开(公告)号:US12113077B2
公开(公告)日:2024-10-08
申请号:US16927327
申请日:2020-07-13
Applicant: Samsung Display Co., LTD. , UBmaterials Inc.
Inventor: Joon-Hwa Bae , Jin Hyung Park , Bonggu Kang , Seungbae Kang , Heesung Yang , Woojin Cho , Byoung Kwon Choo
IPC: H01L27/12 , C09G1/02 , C09K3/14 , H01L21/3105
CPC classification number: H01L27/1251 , C09G1/02 , C09K3/1409 , H01L21/31053 , H01L27/1229 , H01L27/1248 , H01L27/1259
Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.
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公开(公告)号:US12082479B2
公开(公告)日:2024-09-03
申请号:US17324626
申请日:2021-05-19
Applicant: Samsung Display Co., LTD.
Inventor: Heesung Yang , Seung Bae Kang , Bonggu Kang , Tae Wook Kang , Joon-Hwa Bae , Woojin Cho , Byoung Kwon Choo
IPC: H10K71/00 , H01L21/3105 , H01L21/311
CPC classification number: H10K71/00 , H01L21/31051 , H01L21/31127
Abstract: A display device includes a planarization layer covering transistors in a display area on a substrate, an organic light emitting diode on the planarization layer, a pad electrode in a non-display area on the substrate surrounding the display area, and a sacrificial layer remnant capping a side surface of the pad electrode.
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