Abstract:
An integrated circuit includes a first column including a plurality of first cells aligned and placed in a plurality of first rows, each first row having a first width and extending in a first horizontal direction, a second column including a plurality of second cells aligned and placed in a plurality of second rows, each second row having a second width and extending in the first horizontal direction, and an interface column extending in a second horizontal direction perpendicular to the first horizontal direction between the first column and the second column, wherein the interface column includes at least one well tap configured to provide a first supply voltage to a well, and at least one substrate tap configured to provide a second supply voltage to a substrate.
Abstract:
The integrated circuit includes first and second vias, a first buffer configured to receive a signal transmitted from the first via, a second buffer configured to receive a signal transmitted from the second via, a first detour circuit configured to receive a signal transmitted through the second buffer, a second detour circuit configured to receive a signal transmitted through the first buffer, a first selector configured to selectively output one of the signal transmitted from the first via and a signal transmitted through the first detour circuit, and a second selector configured to selectively output one of the signal transmitted from the second via and a signal transmitted through the second detour circuit. Each of the first and second buffers and the first and second detour circuits transmits a signal in only one direction.
Abstract:
Disclosed are a semiconductor device and a method of fabricating the same. The semiconductor device includes an area-oriented region and a performance-oriented region, standard cells disposed on each of the area-oriented region and the performance-oriented region, and a routing metal layer on the standard cells. The routing metal layer includes first routing lines on the area-oriented region and second routing lines on the performance-oriented region. The smallest line width of the first routing lines is a first width, the smallest line width of the second routing lines is a second width greater than the first width, a pitch between the first routing lines is a first pitch, and a pitch between the second routing lines is a second pitch greater than the first pitch.
Abstract:
An integrated circuit includes a first column including a plurality of first cells aligned and placed in a plurality of first rows, each first row having a first width and extending in a first horizontal direction, a second column including a plurality of second cells aligned and placed in a plurality of second rows, each second row having a second width and extending in the first horizontal direction, and an interface column extending in a second horizontal direction perpendicular to the first horizontal direction between the first column and the second column, wherein the interface column includes at least one well tap configured to provide a first supply voltage to a well, and at least one substrate tap configured to provide a second supply voltage to a substrate.
Abstract:
An IC includes: a plurality of first cells placed in a series of first rows extending in a first horizontal direction and each having a first height; and a plurality of second cells placed in a series of second rows extending in the first horizontal direction and each having a second height different from the first height, wherein a total height of the series of first rows corresponds to a multiple of a height of a first multi-height cell with a maximum height among the plurality of first cells, and a total height of the series of second rows corresponds to a multiple of a height of a second multi-height cell with a maximum height among the plurality of second cells.