CEILING STORAGE SYSTEM
    11.
    发明申请

    公开(公告)号:US20240383679A1

    公开(公告)日:2024-11-21

    申请号:US18391759

    申请日:2023-12-21

    Abstract: A ceiling storage system includes a first support rail and a second support rail that extend in a first direction; a first driving rail that extends in the first direction and is parallel to the first support rail and the second support rail; a second driving rail movably coupled to the first support rail, the second support rail, and the first driving rail, where the second driving rail is configured to move along the first support rail, the second support rail, and the first driving rail; a transfer vehicle movably coupled to the second driving rail and configured to move along the second driving rail; and a connection device that connects the first driving rail and the second driving rail to each other, where the connection device and the second driving rail are rotatable around a first axis that is parallel to the first direction.

    Method of forming pattern of semiconductor device

    公开(公告)号:US10553429B2

    公开(公告)日:2020-02-04

    申请号:US15355360

    申请日:2016-11-18

    Abstract: A method of forming a pattern of a semiconductor device includes forming a mask and a sacrificial layer on a substrate, etching the sacrificial layer in a first area of the substrate to form first units, each having a first width and a first distance from an adjacent unit, etching the sacrificial layer in a second area of the substrate to form second units, each having a second width equal to the first distance and being spaced apart from an adjacent unit by a second distance equal to the first width, forming a spacer conformally covering the first and second units, the spacer having a first thickness and being merged between the second units, removing a portion of the spacer on upper surfaces of the first and second units, and etching the mask in a region from which first and second units have been removed.

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