公开(公告)号：US07208915B2

公开(公告)日：2007-04-24

申请号：US11237786

申请日：2005-09-29

申请人： Atsumasa Kubota ,  Tatsuya Miwa ,  Masaki Ikeda ,  Naoki Shimizu

发明人： Atsumasa Kubota ,  Tatsuya Miwa ,  Masaki Ikeda ,  Naoki Shimizu

IPC分类号： H02J7/00

CPC分类号： H02J7/0072 ,  H02J7/06

摘要： A constant-current battery charger includes a power supply for supplying a charge current to a secondary cell, and a current monitor for monitoring a charge current being supplied to the cell. A controller is included for varying the charge current in accordance with the monitored charge current. The controller calculates a current difference between a predetermined target current and the instant charge current, and generates a demand of varying the charge current at a first charge rate when the current difference is out of a predetermined range, and varying the charge current at a second charge rate when the current difference is within the predetermined range. The controller generates the demand repeatedly at regular or varying intervals for varying the charge current. The first charge rate is set to be higher than the second charge rate in order to make a rapid charging until it comes close to the target current. Since the current difference between the instant charge current and the target current is relied upon to switch the charge rate between the first and second charge rates, the switching can be made at an exact timing truly indicative of the condition of the battery, which enables a rapid charging, yet assuring to complete the charging successfully.

摘要翻译： 恒流电池充电器包括用于向二次电池提供充电电流的电源，以及用于监视被提供给电池的充电电流的电流监视器。 包括用于根据监视的充电电流来改变充电电流的控制器。 控制器计算预定目标电流和瞬时充电电流之间的电流差，并且当电流差超出预定范围时产生以第一充电速率改变充电电流的需求，并且在第二充电电流下改变充电电流 当电流差在预定范围内时的充电率。 控制器以规则或变化的间隔重复地产生需求以改变充电电流。 第一充电速率被设置为高于第二充电速率，以便在接近目标电流之前进行快速充电。 由于瞬时充电电流和目标电流之间的电流差异依赖于在第一和第二充电速率之间切换充电速率，所以可以在真实地指示电池状态的确切时间进行切换，这使得能够 快速充电，但确保成功完成充电。

公开(公告)号：US20060179473A1

公开(公告)日：2006-08-10

申请号：US11349887

申请日：2006-02-09

申请人： Teruhisa Innami ,  Masaki Ikeda ,  Naotake Tanaka ,  Atsumasa Kubota ,  Tatsuya Miwa

发明人： Teruhisa Innami ,  Masaki Ikeda ,  Naotake Tanaka ,  Atsumasa Kubota ,  Tatsuya Miwa

IPC分类号： H04L9/32

CPC分类号： B25F5/00

摘要： A power tool system with enhanced antitheft capability has a hand-held power tool and a wearable piece worn by the user. The wearable piece incorporates a certification unit which stores an identification code specifying the power tool and transmits the identification code to an authenticator incorporated in the power tool. The authenticator reads the identification code from the certification unit and to provide an authentication signal when the identification code is authenticated to be eligible for a privileged use of the power tool. The power tool is enabled only in response to the authentication signal, and otherwise disabled for avoiding unauthorized use. A communication is established between the certification unit and the authenticator for transmission of the identification code, while the user holds the power tool with the wearable piece carried on.

摘要翻译： 具有增强的防盗能力的电动工具系统具有手持电动工具和用户佩戴的可穿戴件。 可穿戴件包括认证单元，其存储指定电动工具的识别码，并将识别码发送到并入电动工具中的认证器。 认证器从认证单元读取识别代码，并且当识别码被认证为有资格使用电动工具时提供认证信号。 电源工具仅在响应认证信号时使能，否则禁用以避免未经授权的使用。 在认证单元和认证器之间建立用于发送识别码的通信，同时用户用携带的可穿戴件保持电动工具。

公开(公告)号：US20060090853A1

公开(公告)日：2006-05-04

申请号：US11293987

申请日：2005-12-05

申请人： Shusaku Kido ,  Yoshihide Iio ,  Masaki Ikeda

发明人： Shusaku Kido ,  Yoshihide Iio ,  Masaki Ikeda

IPC分类号： H01L21/306

CPC分类号： H01L21/67017 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/6715 ,  H01L21/67248 ,  H01L21/68742 ,  H01L21/68764

摘要： A substrate processing system which sprays exposure process gas onto a substrate disposed within a chamber. The substrate processing system is used, for example, for performing an exposure process of an organic film formed on a substrate in a gas atmosphere obtained by vaporizing an organic solvent solution for dissolving and reflowing an organic film. The substrate processing system comprises: the chamber having at least one gas inlet and at least one gas outlets; a gas introducing means which introduces the exposure process gas into the chamber via the gas inlet; and a gas distributing means. The gas distributing means separates an inner space of the chamber into a first space into which the exposure process gas is introduced via the gas inlet and a second space in which the substrate is disposed. The gas distributing means has a plurality of openings via which the first space and the second space communicate with each other and introduces the exposure process gas introduced into the first space into the second space via the openings.

公开(公告)号：US20060090852A1

公开(公告)日：2006-05-04

申请号：US11293962

申请日：2005-12-05

申请人： Shusaku Kido ,  Yoshihide Iio ,  Masaki Ikeda

发明人： Shusaku Kido ,  Yoshihide Iio ,  Masaki Ikeda

IPC分类号： H01L21/306

CPC分类号： H01L21/67017 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/6715 ,  H01L21/67248 ,  H01L21/68742 ,  H01L21/68764

摘要： A substrate processing system which sprays exposure process gas onto a substrate disposed within a chamber. The substrate processing system is used, for example, for performing an exposure process of an organic film formed on a substrate in a gas atmosphere obtained by vaporizing an organic solvent solution for dissolving and reflowing an organic film. The substrate processing system comprises: the chamber having at least one gas inlet and at least one gas outlets; a gas introducing means which introduces the exposure process gas into the chamber via the gas inlet; and a gas distributing means. The gas distributing means separates an inner space of the chamber into a first space into which the exposure process gas is introduced via the gas inlet and a second space in which the substrate is disposed. The gas distributing means has a plurality of openings via which the first space and the second space communicate with each other and introduces the exposure process gas introduced into the first space into the second space via the openings.

公开(公告)号：US06958631B2

公开(公告)日：2005-10-25

申请号：US10168572

申请日：2001-12-21

申请人： Yusuke Aiba ,  Masaki Ikeda ,  Takeshi Fujita ,  Hideaki Hirose ,  Akio Maruo

发明人： Yusuke Aiba ,  Masaki Ikeda ,  Takeshi Fujita ,  Hideaki Hirose ,  Akio Maruo

IPC分类号： H03K17/04 ,  G11B7/125 ,  H03K17/0412 ,  H03K17/687

CPC分类号： H03L7/02 ,  G11B7/126 ,  H03K17/04123

摘要： A high-speed current switch circuit of this invention has an n-type MOS transistor Q11 which switches and outputs a current, and a control circuit 11 which performs switching control of the MOS transistor Q11. In the control circuit 11, a source follower is formed by an N-type MOS transistor Q12 and a constant current source I2 which is a load on this transistor. A switch SW11 is connected to the MOS transistor Q12 to perform switching control of a current flowing through the MOS transistor Q12. The control circuit 11 includes a switch SW12 capable of grounding the gate of the MOS transistor 11. The source of the MOS transistor Q12 is connected to the gate of the MOS transistor Q11. Thus, even if a large current is caused to flow through the output transistor, the output transistor can be made to operate for switching at a high speed.

摘要翻译： 本发明的高速电流开关电路具有切换并输出电流的n型MOS晶体管Q 11和执行MOS晶体管Q 11的开关控制的控制电路11。 在控制电路11中，源极跟随器由N型MOS晶体管Q 12和作为该晶体管上的负载的恒流源I 2形成。 开关SW 11连接到MOS晶体管Q 12，以对流过MOS晶体管Q12的电流进行开关控制。 控制电路11包括能够使MOS晶体管11的栅极接地的开关SW 12。 MOS晶体管Q12的源极连接到MOS晶体管Q11的栅极。 因此，即使使大电流流过输出晶体管，也可以使输出晶体管进行高速切换。

公开(公告)号：US5606479A

公开(公告)日：1997-02-25

申请号：US355066

申请日：1994-12-13

申请人： Yasuo Mizuno ,  Yoshihiro Hori ,  Masaki Ikeda ,  Akihiko Yoshida

发明人： Yasuo Mizuno ,  Yoshihiro Hori ,  Masaki Ikeda ,  Akihiko Yoshida

IPC分类号： G11B5/235 ,  G11B5/127

CPC分类号： G11B5/235 ,  Y10T428/1193

摘要： A magnetic head of the present invention includes a pair of substrates which are formed of ferrite and sealed with sealing glass, wherein an averaged thermal expansion ratio of the sealing glass in the range of 30.degree. C. to a setting temperature .alpha..sub.Ts (glass) is smaller than an averaged thermal expansion ratio of the substrate in the range of 30.degree. C. to a setting temperature .alpha..sub.Ts (substrate); and a difference between a thermal expansion ratio at a glass transition temperature of the sealing glass and a thermal expansion ratio at a yielding temperature thereof is 2.times.10.sup.-3 or less.

摘要翻译： 本发明的磁头包括由铁氧体形成并用密封玻璃密封的一对基板，其中密封玻璃的平均热膨胀率在30℃至设定温度αTs（玻璃）的范围内， 小于基板在30℃至设定温度αTs（底物）的平均热膨胀率; 并且密封玻璃的玻璃化转变温度下的热膨胀率与其屈服温度下的热膨胀率之差为2×10 -3以下。

公开(公告)号：US4694573A

公开(公告)日：1987-09-22

申请号：US832716

申请日：1986-02-10

申请人： Atsushi Nishino ,  Masaki Ikeda ,  Yoshihiro Watanabe ,  Masahiro Hiraka

发明人： Atsushi Nishino ,  Masaki Ikeda ,  Yoshihiro Watanabe ,  Masahiro Hiraka

IPC分类号： H05B3/20 ,  H05K1/03 ,  H05K1/05 ,  H05K3/20 ,  H05K3/28 ,  H05K3/46

CPC分类号： H05K3/20 ,  H05K1/0306 ,  H05K1/053 ,  H05K2201/017 ,  H05K2203/0531 ,  H05K3/28 ,  Y10T29/49155

摘要： Disclosed is a method of forming an electrically conductive circuit comprising the steps of: preparing a transferring paper in which an assembly of electrically conductive foil carrying a predetermined pattern and an insulating layer containing glass frit and an overcoat layer consisting of a resin film having good burning property are provided on a transferring paper covered with a paste layer; removing an integral structure of the conductive foil, the insulating layer, and the overcoat layer from the transferring paper; transferring the removed integral structure onto a substrate; and burning the substrate with the integral structure set thereon at a temperature where the glass is soften. According to this method, it is possible to eliminate transformation or damage of a conductive foil where a conductive foil is singly disposed on a substrate.

摘要翻译： PCT No.PCT / JP85 / 00327 Sec。 371日期1986年2月10日 102（e）日期1986年2月10日PCT提交1985年6月12日PCT公布。 出版物WO86 / 00190 1986年1月3日公开。公开是一种形成导电电路的方法，包括以下步骤：制备转印纸，其中承载预定图案的导电箔的组件和包含玻璃料的绝缘层和覆盖层组成 具有良好燃烧性能的树脂膜设置在被糊层覆盖的转印纸上; 从转印纸上去除导电箔，绝缘层和外涂层的整体结构; 将去除的整体结构转移到基底上; 并且在玻璃被软化的温度下，以设置在其上的整体结构燃烧基板。 根据该方法，可以消除将导电箔单独设置在基板上的导电箔的变形或损坏。

公开(公告)号：US4469798A

公开(公告)日：1984-09-04

申请号：US433819

申请日：1982-10-12

申请人： Atsushi Nishino ,  Kunio Kimura ,  Masaki Ikeda ,  Hajime Oyabu

发明人： Atsushi Nishino ,  Kunio Kimura ,  Masaki Ikeda ,  Hajime Oyabu

IPC分类号： C03C3/064 ,  C03C8/08 ,  C03C8/14 ,  C03C8/20 ,  C03C5/02

CPC分类号： C03C8/20 ,  C03C8/08

摘要： A low melting, opaque enamel frit is described, which comprises 30 to 36 wt. % of SiO.sub.2, 15 to 20 wt. % of B.sub.2 O.sub.3, 7 to 9 wt. % of Na.sub.2 O, 5 to 10 wt. % of ZrO.sub.2, 10 to 17 wt. % of TiO.sub.2, 7 to 15 wt. % of K.sub.2 O, 2 to 10 wt. % of F.sub.2 and 0.5 to 2.5 wt. % of P.sub.2 O.sub.5. The total of Na.sub.2 O and K.sub.2 O is in the range of 15 to 20 wt. % and the total of TiO.sub.2 and ZrO.sub.2 is in the range of 15 to 20 wt. %. The ZrO.sub.2 /(TiO.sub.2 +ZrO.sub.2) ratio is in the range of 0.25 to 0.5:1 and the SiO.sub.2 /B.sub.2 O.sub.3 ratio is in the range of 1.5 to 2.4:1. In addition, the Na.sub.2 O/K.sub.2 O ratio is in the range of 0.6 to 1.0:1 and the (Na.sub.2 O+K.sub.2 O)/(TiO.sub.2 +ZrO.sub.2) is in the range of 0.7 to 1.2:1.

摘要翻译： 描述了低熔点不透明的釉质玻璃料，其包含30至36重量％ 的SiO 2％，15〜20wt。 B2O3％，7〜9wt。 ％的Na 2 O，5〜10wt。 ％的ZrO 2，10〜17wt。 ％的TiO 2，7〜15wt。 ％的K2O，2〜10wt。 F2的比例为0.5〜2.5wt。 ％的P2O5。 Na 2 O和K 2 O的总量在15至20重量％的范围内。 ％，TiO 2和ZrO 2的总量在15〜20重量％的范围内。 ％。 ZrO 2 /（TiO 2 + ZrO 2）的比例在0.25〜0.5:1的范围内，SiO 2 / B 2 O 3的比例在1.5〜2.4:1的范围内。 另外，Na 2 O / K 2 O比在0.6〜1.0:1的范围内，（Na2O + K2O）/（TiO2 + ZrO2）在0.7〜1.2:1的范围内。

公开(公告)号：US4301615A

公开(公告)日：1981-11-24

申请号：US100892

申请日：1979-12-06

申请人： Masaki Ikeda

发明人： Masaki Ikeda

IPC分类号： A63H11/20 ,  A63H13/02

CPC分类号： A63H13/02 ,  A63H11/205

摘要： A toy has a body in the shape of a characterized animal. At least one of the extremities, preferably the head, is attached to a movable member which moves between a retracted position wherein the majority of the member is located inside the body to an extended position wherein the greatest portion of the member is located external of the body. The toy includes a mechanism which will move the member from its extended position to its retracted position upon activation of a mechanism at least a portion of which is exposed outside the body for manipulation by the operator. The member in going from its extended position to its retracted position reaches its retracted position and then automatically reverses itself until it is once again extended.

摘要翻译： 玩具具有特征动物形状的身体。 至少一个末端，优选头部，附接到可移动部件，该可移动部件在缩回位置之间移动，其中该部件的大部分位于本体内部至延伸位置，其中，该部件的最大部分位于 身体。 该玩具包括机构，该机构在启动机构时将其从延伸位置移动到其缩回位置，其中至少一部分被暴露在身体外部以由操作者操纵。 从延伸位置到缩回位置的构件到达其缩回位置，然后自动反转，直到再次延伸。

公开(公告)号：US4147835A

公开(公告)日：1979-04-03

申请号：US788582

申请日：1977-04-18

申请人： Atsushi Nishino ,  Kazunori Sonetaka ,  Kunio Kimura ,  Masaki Ikeda

发明人： Atsushi Nishino ,  Kazunori Sonetaka ,  Kunio Kimura ,  Masaki Ikeda

IPC分类号： C03C3/064 ,  A47J36/02 ,  B01J21/16 ,  B01J23/00 ,  B01J35/02 ,  B05D5/00 ,  C03C3/089 ,  C03C3/091 ,  C03C8/02 ,  C03C8/14 ,  C23D5/00 ,  F24C14/00 ,  F24C15/00 ,  B32B9/04 ,  A21B1/00 ,  B32B9/06 ,  B32B15/04

CPC分类号： C03C8/14 ,  A47J36/02 ,  C03C8/02 ,  F24C15/005 ,  C03C2205/04

摘要： A slip containing a frit and an oxidizing catalyst is sprayed over a substrate and fused at a temperature as low as 550.degree. C. The frit consists of 15-60% by weight of SiO.sub.2, 9-35% of B.sub.2 O.sub.3, 10-30% Na.sub.2 O, 1-25% of Al.sub.2 O.sub.3, 0-20% of Li.sub.2 O, 0-10% of K.sub.2 O and 0-10% of CaO but must have at least two of Li.sub.2 O, K.sub.2 O and CaO. The oxidizing catalyst is MnOx or CuCO.sub.3 Cu(OH).sub.2 or a mixture thereof, the content being preferably between 5 and 50% by weight. The self-cleaning is effected at a temperature as low as at 280.degree. C.

摘要翻译： 将含有玻璃料和氧化催化剂的料料喷在基材上并在低至550℃的温度下熔化。玻璃料由15-60重量％的SiO 2，9-35％的B 2 O 3，10-30重量％ Na2O，1-25％的Al2O3，0-20％的Li2O，0-10％的K2O和0-10％的CaO，但必须具有至少两种Li2O，K2O和CaO。 氧化催化剂是MnO x或CuCO 3 Cu（OH）2或其混合物，其含量优选为5至50重量％。 自清洁在低至280℃的温度下进行。