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公开(公告)号：US07859187B2
公开(公告)日：2010-12-28
申请号：US10576495
申请日：2004-11-05
CPC分类号： H01L27/12 , H01L27/1292 , H01L29/42384 , H01L29/66765 , H01L29/78696
摘要： It is an object of the invention to provide a display device which can be manufactured by a simplified manufacturing process by which the efficiency in the use of material is improved. It is a further object of the invention to provide a manufacturing method of the display device. It is another object of the invention to provide a fabrication technology for improving adhesion of a pattern. In view of the above problems, according to the present invention, a pattern is formed by a droplet discharge method. Particularly in the invention, base pretreatment is performed before/after a pattern is formed by a droplet discharge method. As a result of such base pretreatment, adhesion of a pattern can improved, and the pattern may be made finer.
摘要翻译： 本发明的目的是提供一种显示装置，其可以通过简化的制造工艺制造，通过该制造工艺提高了材料使用的效率。 本发明的另一个目的是提供一种显示装置的制造方法。 本发明的另一个目的是提供一种用于改进图案粘附的制造技术。 鉴于上述问题，根据本发明，通过液滴喷射法形成图案。 特别是在本发明中，在通过液滴喷射法形成图案之前/之后进行基础预处理。 作为这种基底预处理的结果，可以提高图案的粘附性，并且可以使图案更细。
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公开(公告)号：US07795616B2
公开(公告)日：2010-09-14
申请号：US10576420
申请日：2004-11-05
申请人： Shunpei Yamazaki , Shinji Maekawa , Gen Fujii , Hideaki Kuwabara
发明人： Shunpei Yamazaki , Shinji Maekawa , Gen Fujii , Hideaki Kuwabara
IPC分类号： H01L31/00
CPC分类号： G02F1/13458 , G02F1/136227 , G02F1/136286 , G02F2001/13415 , G02F2001/136295 , H01L27/1292
摘要： As a substrate gets larger, time of manufacture is increased due to the repetition of film formations and etchings; waste disposal costs of etchant and the like are increased; and material efficiency is significantly reduced. A base film for improving adhesion between a substrate and a material layer formed by a droplet discharge method is formed in the invention. Further, a manufacturing method of a liquid crystal display device according to the invention includes at least one step for forming the following patterns required for manufacturing a liquid crystal display device without using a photomask: a pattern of a material layer typified by a wiring (or an electrode) pattern, an insulating layer pattern; or a mask pattern for forming another pattern.
摘要翻译： 由于重复膜形成和蚀刻，衬底越来越大，制造时间增加; 蚀刻剂等的废物处理成本增加; 材料效率显着降低。 在本发明中形成了用于改善基板和通过液滴喷射方法形成的材料层之间的粘附性的基膜。 此外，根据本发明的液晶显示装置的制造方法包括至少一个步骤，用于形成在不使用光掩模的情况下制造液晶显示装置所需的以下图案：以布线为代表的材料层的图案（或 电极）图案，绝缘层图案; 或用于形成另一图案的掩模图案。
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公开(公告)号：US20070120471A1
公开(公告)日：2007-05-31
申请号：US10576495
申请日：2004-11-05
CPC分类号： H01L27/12 , H01L27/1292 , H01L29/42384 , H01L29/66765 , H01L29/78696
摘要： It is an object of the invention to provide a display device which can be manufactured by a simplified manufacturing process by which the efficiency in the use of material is improved. It is a further object of the invention to provide a manufacturing method of the display device. It is another object of the invention to provide a fabrication technology for improving adhesion of a pattern. In view of the above problems, according to the present invention, a pattern is formed by a droplet discharge method. Particularly in the invention, base pretreatment is performed before/after a pattern is formed by a droplet discharge method. As a result of such base pretreatment, adhesion of a pattern can improved, and the pattern may be made finer.
摘要翻译： 本发明的目的是提供一种显示装置，其可以通过简化的制造工艺制造，通过该制造工艺提高了材料使用的效率。 本发明的另一个目的是提供一种显示装置的制造方法。 本发明的另一个目的是提供一种用于改进图案粘附的制造技术。 鉴于上述问题，根据本发明，通过液滴喷射法形成图案。 特别是在本发明中，在通过液滴喷射法形成图案之前/之后进行基础预处理。 作为这种基底预处理的结果，可以提高图案的粘附性，并且可以使图案更细。
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公开(公告)号：US20070069210A1
公开(公告)日：2007-03-29
申请号：US10576420
申请日：2004-11-05
申请人： Shunpei Yamazaki , Shinji Maekawa , Gen Fujii , Hideaki Kuwabara
发明人： Shunpei Yamazaki , Shinji Maekawa , Gen Fujii , Hideaki Kuwabara
CPC分类号： G02F1/13458 , G02F1/136227 , G02F1/136286 , G02F2001/13415 , G02F2001/136295 , H01L27/1292
摘要： As a substrate gets larger, time of manufacture is increased due to the repetition of film formations and etchings; waste disposal costs of etchant and the like are increased; and material efficiency is significantly reduced. A base film for improving adhesion between a substrate and a material layer formed by a droplet discharge method is formed in the invention. Further, a manufacturing method of a liquid crystal display device according to the invention includes at least one step for forming the following patterns required for manufacturing a liquid crystal display device without using a photomask: a pattern of a material layer typified by a wiring (or an electrode) pattern, an insulating layer pattern; or a mask pattern for forming another pattern.
摘要翻译： 由于重复膜形成和蚀刻，衬底越来越大，制造时间增加; 蚀刻剂等的废物处理成本增加; 材料效率显着降低。 在本发明中形成了用于改善基板和通过液滴喷射方法形成的材料层之间的粘附性的基膜。 此外，根据本发明的液晶显示装置的制造方法包括至少一个步骤，用于形成在不使用光掩模的情况下制造液晶显示装置所需的以下图案：以布线为代表的材料层的图案（或 电极）图案，绝缘层图案; 或用于形成另一图案的掩模图案。
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公开(公告)号：US08283216B2
公开(公告)日：2012-10-09
申请号：US13101766
申请日：2011-05-05
申请人： Shunpei Yamazaki , Shinji Maekawa , Gen Fujii , Hideaki Kuwabara
发明人： Shunpei Yamazaki , Shinji Maekawa , Gen Fujii , Hideaki Kuwabara
CPC分类号： G02F1/13458 , G02F1/136227 , G02F1/136286 , G02F2001/13415 , G02F2001/136295 , H01L27/1292
摘要： As a substrate gets larger, time of manufacture is increased due to the repetition of film formations and etchings; waste disposal costs of etchant and the like are increased; and material efficiency is significantly reduced. A base film for improving adhesion between a substrate and a material layer formed by a droplet discharge method is formed in the invention. Further, a manufacturing method of a liquid crystal display device according to the invention includes at least one step for forming the following patterns required for manufacturing a liquid crystal display device without using a photomask: a pattern of a material layer typified by a wiring (or an electrode) pattern, an insulating layer pattern; or a mask pattern for forming another pattern.
摘要翻译： 由于重复膜形成和蚀刻，衬底越来越大，制造时间增加; 蚀刻剂等的废物处理成本增加; 材料效率显着降低。 在本发明中形成了用于改善基板和通过液滴喷射方法形成的材料层之间的粘附性的基膜。 此外，根据本发明的液晶显示装置的制造方法包括至少一个步骤，用于形成在不使用光掩模的情况下制造液晶显示装置所需的以下图案：以布线为代表的材料层的图案（或 电极）图案，绝缘层图案; 或用于形成另一图案的掩模图案。
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公开(公告)号：US20090325333A1
公开(公告)日：2009-12-31
申请号：US12552305
申请日：2009-09-02
申请人： Kunihiko Fukuchi , Gen Fujii , Osamu Nakamura , Shinji Maekawa
发明人： Kunihiko Fukuchi , Gen Fujii , Osamu Nakamura , Shinji Maekawa
IPC分类号： H01L33/00
CPC分类号： H01L29/78678 , C25D5/022 , G02F2001/136295 , H01L21/288 , H01L21/76802 , H01L21/76838 , H01L27/12 , H01L27/1285 , H01L27/1292 , H01L27/3244 , H01L29/42384 , H01L29/66765 , H01L29/78696 , H01L51/56 , H01L2224/73204 , H01L2224/73265
摘要： According to one aspect of the present invention, at least one or more of patterns required for manufacturing a display device, such as a conductive layer which forms a wiring or an electrode and a mask, is formed by a droplet discharging method. At that time, a portion of the gate insulating film where is not located under the semiconductor layer is removed during manufacturing steps of the present invention.
摘要翻译： 根据本发明的一个方面，通过液滴喷射法形成制造显示装置所需的至少一种或多种图案，例如形成布线的导电层或电极和掩模。 此时，在本发明的制造工序中，除去不在半导体层下方的栅极绝缘膜的一部分。
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公开(公告)号：US07883912B2
公开(公告)日：2011-02-08
申请号：US12552305
申请日：2009-09-02
申请人： Kunihiko Fukuchi , Gen Fujii , Osamu Nakamura , Shinji Maekawa
发明人： Kunihiko Fukuchi , Gen Fujii , Osamu Nakamura , Shinji Maekawa
IPC分类号： H01L21/00
CPC分类号： H01L29/78678 , C25D5/022 , G02F2001/136295 , H01L21/288 , H01L21/76802 , H01L21/76838 , H01L27/12 , H01L27/1285 , H01L27/1292 , H01L27/3244 , H01L29/42384 , H01L29/66765 , H01L29/78696 , H01L51/56 , H01L2224/73204 , H01L2224/73265
摘要： According to one aspect of the present invention, at least one or more of patterns required for manufacturing a display device, such as a conductive layer which forms a wiring or an electrode and a mask, is formed by a droplet discharging method. At that time, a portion of the gate insulating film where is not located under the semiconductor layer is removed during manufacturing steps of the present invention.
摘要翻译： 根据本发明的一个方面，通过液滴喷射法形成制造显示装置所需的至少一种或多种图案，例如形成布线的导电层或电极和掩模。 此时，在本发明的制造工序中，除去不在半导体层下方的栅极绝缘膜的一部分。
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公开(公告)号：US07601994B2
公开(公告)日：2009-10-13
申请号：US10576819
申请日：2004-11-05
申请人： Kunihiko Fukuchi , Gen Fujii , Osamu Nakamura , Shinji Maekawa
发明人： Kunihiko Fukuchi , Gen Fujii , Osamu Nakamura , Shinji Maekawa
IPC分类号： H01L27/10
CPC分类号： H01L29/78678 , C25D5/022 , G02F2001/136295 , H01L21/288 , H01L21/76802 , H01L21/76838 , H01L27/12 , H01L27/1285 , H01L27/1292 , H01L27/3244 , H01L29/42384 , H01L29/66765 , H01L29/78696 , H01L51/56 , H01L2224/73204 , H01L2224/73265
摘要： According to one aspect of the present invention, at least one or more of patterns required for manufacturing a display device, such as a conductive layer which forms a wiring or an electrode and a mask, is formed by a droplet discharging method. At that time, a portion of the gate insulating film where is not located under the semiconductor layer is removed during manufacturing steps of the present invention.
摘要翻译： 根据本发明的一个方面，通过液滴喷射法形成制造显示装置所需的至少一种或多种图案，例如形成布线的导电层或电极和掩模。 此时，在本发明的制造工序中，除去不在半导体层下方的栅极绝缘膜的一部分。
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公开(公告)号：US20070057258A1
公开(公告)日：2007-03-15
申请号：US10576819
申请日：2004-11-05
申请人： Kunihiko Fukuchi , Gen Fujii , Osamu Nakamura , Shinji Maekawa
发明人： Kunihiko Fukuchi , Gen Fujii , Osamu Nakamura , Shinji Maekawa
IPC分类号： H01L29/04
CPC分类号： H01L29/78678 , C25D5/022 , G02F2001/136295 , H01L21/288 , H01L21/76802 , H01L21/76838 , H01L27/12 , H01L27/1285 , H01L27/1292 , H01L27/3244 , H01L29/42384 , H01L29/66765 , H01L29/78696 , H01L51/56 , H01L2224/73204 , H01L2224/73265
摘要： According to one aspect of the present invention, at least one or more of patterns required for manufacturing a display device, such as a conductive layer which forms a wiring or an electrode and a mask, is formed by a droplet discharging method. At that time, a portion of the gate insulating film where is not located under the semiconductor layer is removed during manufacturing steps of the present invention.
摘要翻译： 根据本发明的一个方面，通过液滴喷射法形成制造显示装置所需的至少一种或多种图案，例如形成布线的导电层或电极和掩模。 此时，在本发明的制造工序中，除去不在半导体层下方的栅极绝缘膜的一部分。
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20.发明授权Semiconductor device, electronic device, and method of manufacturing semiconductor device 有权半导体器件，电子器件和半导体器件的制造方法公开(公告)号：US07635889B2
公开(公告)日：2009-12-22
申请号：US11333701
申请日：2006-01-17
申请人： Toshiyuki Isa , Gen Fujii , Masafumi Morisue , Ikuko Kawamata
发明人： Toshiyuki Isa , Gen Fujii , Masafumi Morisue , Ikuko Kawamata
IPC分类号： H01L23/48
CPC分类号： H01L21/288 , H01L21/02672 , H01L21/76838 , H01L27/12 , H01L27/124 , H01L27/1285 , H01L27/1292 , H01L27/3248 , H01L27/3276 , H01L51/0019 , H01L51/0022 , H01L51/0023 , H01L2924/0002 , Y02P80/30 , H01L2924/00
摘要： Conductive layers having knots are adjacently formed with uniform distance therebetween. Droplets of the conductive layers are discharged to stagger centers of the droplets in a length direction of wirings so that the centers of the discharged droplets are not on the same line in a line width direction between the adjacent conductive layers. Since the centers of the droplets are staggered, parts of the conductive layers each having a widest line width (the widest width of knot) are not connected to each other, and the conductive layers can be formed adjacently with a shorter distance therebetween.
摘要翻译： 具有结的导电层相邻地形成，其间具有均匀的距离。 导电层的液滴在布线的长度方向上被排出到液滴的错开中心，使得排出的液滴的中心在相邻导电层之间的线宽方向上不在相同的线上。 由于液滴的中心是错开的，所以每个具有最宽的线宽（结的最宽的宽度）的导电层的部分彼此不连接，导电层可以以较短的距离相邻地形成。
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