公开(公告)号：US08343646B1

公开(公告)日：2013-01-01

申请号：US13403026

申请日：2012-02-23

申请人： Howard F. Wilkins ,  Gretchen M. Bothwell ,  Ronald D. Brost ,  Kristine M. Brost ,  Steven L. Peace ,  Paul A. Trudeau, Jr. ,  Richard M. Bendert ,  Gerald P. Backer

发明人： Howard F. Wilkins ,  Gretchen M. Bothwell ,  Ronald D. Brost ,  Kristine M. Brost ,  Steven L. Peace ,  Paul A. Trudeau, Jr. ,  Richard M. Bendert ,  Gerald P. Backer

IPC分类号： H01M4/36 ,  H01M4/42 ,  H01M4/48 ,  H01M6/20 ,  H01M6/24 ,  H01M8/22

CPC分类号： H01M8/188 ,  Y02E60/528

摘要： An energy storage system according to the present disclosure includes a cell having an electrode and a deposition facilitating structure proximate the electrode for facilitating deposition of material on the electrode. The deposition facilitating structure includes first and second outer layers and an intermediate support arrangement positioned between the outer layers and connected to the outer layers.

摘要翻译： 根据本公开的能量存储系统包括具有电极和邻近电极的沉积促进结构的电池，以便于材料沉积在电极上。 沉积促进结构包括第一和第二外层和位于外层之间并连接到外层的中间支撑装置。

公开(公告)号：US07909967B2

公开(公告)日：2011-03-22

申请号：US11457192

申请日：2006-07-13

申请人： Daniel J. Woodruff ,  Paul R. McHugh ,  Gregory J. Wilson ,  Kyle M. Hanson ,  Erik Lund ,  Steven L. Peace

发明人： Daniel J. Woodruff ,  Paul R. McHugh ,  Gregory J. Wilson ,  Kyle M. Hanson ,  Erik Lund ,  Steven L. Peace

IPC分类号： C25F7/00

CPC分类号： C25F7/00

摘要： An electro-chemical processor for making porous silicon or processing other substrates has first and second chamber assemblies. The first and second chamber assemblies include first and second seals for sealing against a wafer, and first and second electrodes, respectively. The first seal is moveable towards and away from a wafer in the processor, to move between a wafer load/unload position, and a wafer process position. The first electrode may move along with the first seal. The processor may be pivotable from a substantially horizontal orientation, for loading and unloading a wafer, to a substantially vertical orientation, for processing a wafer.

摘要翻译： 用于制造多孔硅或处理其它衬底的电化学处理器具有第一和第二室组件。 第一和第二室组件包括分别用于密封晶片的第一和第二密封件以及第一和第二电极。 第一密封件可朝向和远离处理器中的晶片移动，以在晶片装载/卸载位置与晶片工艺位置之间移动。 第一电极可以与第一密封件一起移动。 处理器可以从用于加载和卸载晶片的基本上水平的方向枢转到基本垂直的取向，用于处理晶片。

公开(公告)号：US20080048306A1

公开(公告)日：2008-02-28

申请号：US11467232

申请日：2006-08-25

申请人： Nigel Stewart ,  Daniel J. Woodruff ,  Paul R. McHugh ,  Gregory J. Wilson ,  Kyle M. Hanson ,  Erik Lund ,  Steven L. Peace

发明人： Nigel Stewart ,  Daniel J. Woodruff ,  Paul R. McHugh ,  Gregory J. Wilson ,  Kyle M. Hanson ,  Erik Lund ,  Steven L. Peace

IPC分类号： H01L23/06

CPC分类号： H01L21/6719 ,  H01L21/67115 ,  H01L21/67126

摘要： A processor for making porous silicon or processing other substrates has first and second chamber assemblies. The first and second chamber assemblies include first and second seals for sealing against a wafer, and first and second electrodes, respectively. The second seal is moveable towards and away from a wafer in the processor, to move between a wafer load/unload position, and a wafer process position. The second electrode may move with the second seal. A light source shines light onto the first side of the wafer. The processor may be pivotable from a substantially horizontal orientation, for loading and unloading a wafer, to a substantially vertical orientation, for processing a wafer.

摘要翻译： 用于制造多孔硅或处理其它衬底的处理器具有第一和第二室组件。 第一和第二室组件包括分别用于密封晶片的第一和第二密封件以及第一和第二电极。 第二密封件可朝向和远离处理器中的晶片移动，以在晶片装载/卸载位置与晶片工艺位置之间移动。 第二电极可以与第二密封件一起移动。 光源将光照射到晶片的第一面上。 处理器可以从用于加载和卸载晶片的基本上水平的方向枢转到基本垂直的取向，用于处理晶片。

公开(公告)号：US06930046B2

公开(公告)日：2005-08-16

申请号：US10690864

申请日：2003-10-21

申请人： Kyle M. Hanson ,  Eric Lund ,  Coby Grove ,  Steven L. Peace ,  Paul Z. Wirth ,  Scott A. Bruner ,  Jonathan Kuntz

发明人： Kyle M. Hanson ,  Eric Lund ,  Coby Grove ,  Steven L. Peace ,  Paul Z. Wirth ,  Scott A. Bruner ,  Jonathan Kuntz

IPC分类号： H01L21/00 ,  H01L21/3213 ,  H01L21/311

CPC分类号： H01L21/6715 ,  H01L21/32134 ,  H01L21/67017 ,  Y10S438/906 ,  Y10S438/907 ,  Y10S438/913

摘要： A system and method for processing a workpiece, includes workpiece processors. A robot is moveable within an enclosure to load and unload workpieces into and out of the processors. A processor includes an upper rotor having a central air flow opening. The upper rotor is magnetically driven into engagement with a lower rotor to form a workpiece processing chamber. A moveable drain mechanism aligns different drain paths with the processing chamber so that different processing fluids may be removed from the processing chamber via different drain paths. A moveable nozzle positioned in the air flow opening distributes processing fluid to the workpiece. The processing fluid is distributed across the workpiece surface, via centrifugal force generated by spinning the processing chamber, and removed from the processing chamber via the moveable drain mechanism.

摘要翻译： 用于处理工件的系统和方法包括工件处理器。 机器人可以在机箱内移动，以将工件加载和卸载进出处理器。 处理器包括具有中心气流开口的上转子。 上转子被磁力驱动与下转子接合以形成工件处理室。 可移动排水机构使不同的排放路径与处理室对准，使得不同的处理流体可以经由不同的排出路径从处理室移除。 位于空气流通口中的可移动喷嘴将处理流体分配到工件。 处理液通过旋转处理室产生的离心力分布在工件表面上，并通过可移动的排水机构从处理室中移出。

公开(公告)号：US5493461A

公开(公告)日：1996-02-20

申请号：US337724

申请日：1994-11-14

申请人： Steven L. Peace

发明人： Steven L. Peace

IPC分类号： G11B33/00 ,  G11B25/10 ,  G11B33/06

CPC分类号： G11B33/005

摘要： A media lockout device and associated method for a combined media drive. The combined media drive permits the insertion of storage media into two separate insertion openings of the combined media drive to be received therein. The media lockout device permits reception within the media drive of storage media inserted through one of the insertion openings of the combined drive. Once a storage media is inserted through an insertion opening of the combined drive, the media lockout device prevents the insertion of another storage media through the other of the insertion openings while the first storage media is received within the combined drive.

摘要翻译： 媒体锁定装置和组合媒体驱动器的相关方法。 组合的介质驱动器允许将存储介质插入组合的介质驱动器的两个单独的插入开口以被接收在其中。 介质锁定装置允许在通过组合驱动器的一个插入开口插入的存储介质的介质驱动器内进行接收。 一旦通过组合的驱动器的插入开口插入存储介质，则当组合的驱动器内接收到第一存储介质时，介质锁定装置防止另一存储介质插入另一个插入开口。

公开(公告)号：US5096574A

公开(公告)日：1992-03-17

申请号：US466077

申请日：1990-01-16

申请人： Thomas E. Birdsong ,  Steve O. Mork ,  Steven L. Peace

发明人： Thomas E. Birdsong ,  Steve O. Mork ,  Steven L. Peace

IPC分类号： B01D61/08 ,  B01D61/10 ,  B01D61/12 ,  C02F1/44

CPC分类号： B01D61/10 ,  B01D61/08 ,  B01D61/12 ,  Y10S210/90

摘要： A reverse osmosis system includes a sediment filter which cleans feed water from a source and from which that feed water is fed to a reverse osmosis membrane filter. Permeate from the latter is fed to a bladder within a storage tank. Concentrate from the membrane filter is fed to and used within the storage tank as squeeze water for the bladder. When a faucet that delivers permeate to the user is open, squeeze water is used to cause permeate to flow out of the storage tank through an impurity filter to supply the faucet. A valve unit is included to control the amount of squeeze water fed to the storage tank and to regulate permeate flow so that the water outletted from the faucet remains at a constant pressure and provides relief as against overpressure in the system. A proportioning valve within the valve unit serves to maintain at all times a constant ratio of concentrate to permeate flow through the membrane filter for adequate cleansing of the membrane. Also included are input-side and output-side flow monitors which provide signals to a processor that serves to indicate the status of filter conditions. There also is an advantageous faucet assembly for controlling the delivery of permeate to the user with flexibility and convenience.

公开(公告)号：US07935230B2

公开(公告)日：2011-05-03

申请号：US11608151

申请日：2006-12-07

申请人： Daniel J. Woodruff ,  Paul R. McHugh ,  Gregory J. Wilson ,  Kyle M. Hanson ,  Nigel Stewart ,  Erik Lund ,  Steven L. Peace

发明人： Daniel J. Woodruff ,  Paul R. McHugh ,  Gregory J. Wilson ,  Kyle M. Hanson ,  Nigel Stewart ,  Erik Lund ,  Steven L. Peace

IPC分类号： C25F7/00

CPC分类号： C25D17/001 ,  C25D17/004

摘要： A processor for making porous silicon or processing other substrates has first and second chamber assemblies. The first and second chamber assemblies include first and second seals for sealing against a wafer, and first and second electrodes, respectively. The first and/or second seal is moveable towards and away from a wafer in the processor, to move between a wafer load/unload position, and a wafer process position. The first electrode may move along with the first seal, and the second electrode may move along with the second seal. A light source shines light onto the first side of the wafer. The processor may be pivotable from a substantially horizontal orientation, for loading and unloading a wafer, to a substantially vertical orientation, for processing a wafer.

摘要翻译： 用于制造多孔硅或处理其它衬底的处理器具有第一和第二室组件。 第一和第二室组件包括分别用于密封晶片的第一和第二密封件以及第一和第二电极。 第一和/或第二密封件可朝向和远离处理器中的晶片移动，以在晶片装载/卸载位置与晶片工艺位置之间移动。 第一电极可以与第一密封件一起移动，并且第二电极可以与第二密封件一起移动。 光源将光照射到晶片的第一面上。 处理器可以从用于加载和卸载晶片的基本上水平的方向枢转到基本垂直的取向，用于处理晶片。

公开(公告)号：US06548411B2

公开(公告)日：2003-04-15

申请号：US09907484

申请日：2001-07-16

申请人： Paul Z. Wirth ,  Steven L. Peace ,  Erik Lund

发明人： Paul Z. Wirth ,  Steven L. Peace ,  Erik Lund

IPC分类号： H01L21311

CPC分类号： H01L21/6715 ,  B08B3/04 ,  H01L21/32134 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  H01L21/67086 ,  Y10S134/902 ,  Y10S438/906 ,  Y10S438/913

摘要： A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a liquid. The head is movable by the head lifter from a first position vertically above the bowl, to a second position where the workpiece is at least partially positioned in the bowl. The bowl has a contour section with a sidewall having a radius of curvature which increases adjacent to a drain outlet in the bowl, to help rapid draining of liquid from the bowl. The head has a load position, where the rotors are spaced apart by a first amount, and a process position, where the rotors are engaged and sealed against each other. For rapid evacuation of fluid, the head also has a fast drain position, where the rotors are moved apart sufficiently to create an annular drain gap. Fluid is rapid evacuated by spinning the rotors with the head rotors slightly apart and unsealed, causing the fluid to flow our quickly under centrifugal force.

公开(公告)号：US06544391B1

公开(公告)日：2003-04-08

申请号：US09690856

申请日：2000-10-17

申请人： Steven L. Peace

发明人： Steven L. Peace

IPC分类号： C25D1700

CPC分类号： C25D17/008 ,  C25D5/08 ,  C25D7/123 ,  C25D17/001 ,  C25D17/12

摘要： A reactor assembly for electrochemically processing a microelectronic workpiece is set forth. The reactor assembly includes a processing bowl having one or more fluid inlets through which a flow of processing fluid is received. An electrode assembly is located within the process bowl in a fluid flow path of the fluid provided through the one or more fluid inlets. The electrode assembly includes a mesh electrode and a diffuser disposed in the fluid flow path prior to the mesh electrode to tailor the flow of processing fluid received from the one or more fluid inlets through the mesh electrode in a predetermined manner.

摘要翻译： 阐述了用于电化学处理微电子工件的反应器组件。 反应器组件包括具有一个或多个流体入口的处理碗，通过该流体入口接收处理流体的流动。 电极组件位于通过一个或多个流体入口提供的流体的流体流动路径内的处理碗内。 电极组件包括网状电极和扩散器，其布置在网状电极之前的流体流动路径中，以按预定方式调整通过网状电极从一个或多个流体入口接收的处理流体的流动。

公开(公告)号：US06511914B2

公开(公告)日：2003-01-28

申请号：US09907524

申请日：2001-07-16

申请人： Paul Z. Wirth ,  Steven L. Peace

发明人： Paul Z. Wirth ,  Steven L. Peace

IPC分类号： H01L21311

CPC分类号： B08B3/04 ,  H01L21/32134 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/6715 ,  Y10S438/913

摘要： A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A sonic energy source, such as a megasonic transducer, provides sonic energy into a liquid in the bowl. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into the liquid. Sonic energy is provided to the workpiece through the liquid, optionally while the head spins the workpiece. The liquid may include de-ionized water and an etchant.