公开(公告)号：US20190148204A1

公开(公告)日：2019-05-16

申请号：US16243756

申请日：2019-01-09

Applicant: TOTO LTD.

Inventor： Kosuke YAMAGUCHI ,  Hitoshi SASAKI ,  Kengo MAEHATA ,  Shumpei KONDO ,  Yuichi YOSHII

IPC: H01L21/683 ,  H01L21/67 ,  H05B1/02 ,  H05B3/03 ,  H05B3/26

Abstract: According to an aspect of the invention, an electrostatic chuck comprises: a ceramic dielectric substrate; a base plate; and a heater plate. The heater plate includes a first and a second support plates including a metal, a heater element provided between the first and the second support plates, a first resin layer provided between the first support plate and the heater element, and a second resin layer provided between the second support plate and the heater element. A surface of the first support plate on the second support plate side includes a first region and a second region, the first region overlapping the heater element when viewed along the stacking direction, the second region not overlapping the heater element when viewed along the stacking direction. In a cross section parallel to the stacking direction, the second region protrudes toward the second support plate side compared to the first region.

公开(公告)号：US20210074521A1

公开(公告)日：2021-03-11

申请号：US17009265

申请日：2020-09-01

Applicant: TOTO LTD.

Inventor： Yutaka MOMIYAMA ,  Minoru SUZUKI ,  Hitoshi SASAKI ,  Tsukasa SHIGEZUMI

IPC: H01J37/32 ,  H01L21/683

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The second electrode layer is provided between the first electrode layer and the first major surface. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. The third surface is positioned between the first surface and the second electrode layer. An electrical resistance of the first surface is less than an average electrical resistance of the first portion.

公开(公告)号：US20200303232A1

公开(公告)日：2020-09-24

申请号：US16825318

申请日：2020-03-20

Applicant: TOTO LTD.

Inventor： Hitoshi SASAKI ,  Yutaka MOMIYAMA

IPC: H01L21/683 ,  B23Q3/15 ,  H01J37/32

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first electrode layer. The ceramic dielectric substrate has first and second major surfaces. The first electrode layer is provided inside the ceramic dielectric substrate. The first electrode layer is connected to a high frequency power supply. The first electrode layer has a first surface at the first major surface side and a second surface at a side opposite to the first surface. The first electrode layer includes a first portion including the first surface. The first electrode layer includes a ceramic component and a metal component. A concentration of the metal component in the first portion is higher than an average concentration of the metal component in the first electrode layer.

公开(公告)号：US20180286732A1

公开(公告)日：2018-10-04

申请号：US15937126

申请日：2018-03-27

Applicant: TOTO LTD.

Inventor： Jumpei UEFUJI ,  Hitoshi SASAKI ,  Kosuke YAMAGUCHI ,  Kengo MAEHATA ,  Yuichi YOSHII ,  Tetsuro ITOYAMA

IPC: H01L21/683 ,  H01L21/67 ,  H05B3/28

CPC classification number: H01L21/6833 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68785 ,  H05B3/283

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, an electrode layer, a base plate, and a heater plate. The ceramic dielectric substrate has a first major surface where a processing object is placed. The electrode layer is provided in the ceramic dielectric substrate. The base plate supports the ceramic dielectric substrate. The heater plate is provided between the base plate and the first major surface. The heater plate includes a first heater element and a second heater element. The first heater element emits heat due to a current flowing. The second heater element emits heat due to a current flowing. When viewed along a direction perpendicular to the first major surface, bends of the first heater element is more than bends of the second heater element, and the first heater element includes a portion positioned at a gap of the second heater element.

公开(公告)号：US20170309510A1

公开(公告)日：2017-10-26

申请号：US15647369

申请日：2017-07-12

Applicant: TOTO LTD.

Inventor： Kengo MAEHATA ,  Shumpei KONDO ,  Hitoshi SASAKI ,  Kosuke YAMAGUCHI ,  Yuichi YOSHII

IPC: H01L21/683 ,  B23Q3/15 ,  H02N13/00

CPC classification number: H01L21/6833 ,  B23Q3/15 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/6831 ,  H01L21/68757 ,  H01L21/68785 ,  H02N13/00

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater plate. The ceramic dielectric substrate has a surface where a processing object is placed. The base plate supports the ceramic dielectric substrate. The heater plate is provided between the ceramic dielectric substrate and the base plate. The heater plate includes a first support plate including a metal, a second support plate including a metal, a heater element, a first resin layer, and a second resin layer. The heater element is provided between the first support plate and the second support plate. The heater element emits heat due to a current flowing. The first resin layer is provided between the first support plate and the heater element. The second resin layer is provided between the second support plate and the heater element.

公开(公告)号：US20200035469A1

公开(公告)日：2020-01-30

申请号：US16523745

申请日：2019-07-26

Applicant: TOTO LTD.

Inventor： Yutaka MOMIYAMA ,  Hitoshi SASAKI

IPC: H01J37/32 ,  H01L21/683

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first electrode layer. The ceramic dielectric substrate has a first major surface and a second major surface. The first electrode layer is provided inside the ceramic dielectric substrate and connected to a high frequency power supply. The first electrode layer is provided between the first major surface and the second major surface. The first electrode layer has a first surface and a second surface. A surface roughness of the second surface is larger than a surface roughness of the first surface.

公开(公告)号：US20190019715A1

公开(公告)日：2019-01-17

申请号：US16131245

申请日：2018-09-14

Applicant: TOTO LTD.

Inventor： Jumpei UEFUJI ,  Hitoshi SASAKI ,  Kosuke YAMAGUCHI ,  Kengo MAEHATA ,  Yuichi YOSHII

IPC: H01L21/683 ,  B32B18/00

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater plate. The heater plate is provided between the ceramic dielectric substrate and the base plate. The heater plate includes first and second support plates, first and second resin layers, and a heater element. Each of the first and second resin layers is provided between the first support plate and the second support plate. The heater element includes first and second electrically conductive portions. The first electrically conductive portion is provided between the first resin layer and the second resin layer. The second electrically conductive portion is separated from the first electrically conductive portion in an in-plane direction. The first resin layer contacts the second resin layer between the first electrically conductive portion and the second electrically conductive portion.