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15 条记录 (耗时 0.024 秒)

    Manufacturing method of optically-active 1,2-diols
    11.
    发明授权
    Manufacturing method of optically-active 1,2-diols 失效
    光学活性1,2-二醇的制备方法

    公开(公告)号：US4981796A

    公开(公告)日：1991-01-01

    申请号：US275200

    申请日：1988-11-23

    申请人： Masahiro Ogura ,  Tadayoshi Shiraishi ,  Hideyuki Takahashi ,  Junzo Hasegawa

    发明人： Masahiro Ogura ,  Tadayoshi Shiraishi ,  Hideyuki Takahashi ,  Junzo Hasegawa

    IPC分类号： C12P7/18 ,  C12P41/00

    CPC分类号： C12P7/18 ,  C12P41/00 ,  Y10S435/911 ,  Y10S435/921 ,  Y10S435/938

    摘要： A process of manufacturing optically active (S)-1,2-diols, wherein (R)-1,2-diols represented by the general formula [I] ##STR1## (where: R represents a substituted or unsubstituted alkyl group, alkenyl group, aryl group or aralkyl group) or a mixture of diols of the general formula [I] and (S)-1,2-diols represented by the general formula [II] ##STR2## (Where: R represents the same as above) having an opposite configuration to the general formula [I] is subjected to the action of a microorganism capable of selectively metabolizing the diols of the general formula [I], or capable of converting the diols of the general formula [I] into the diols of the general formula [II], or having the both capabilities, and the formed and accumulated (S)-1,2-diols of the general formula [II] is collected. According to the present invention, optically active (S)-1,2-diols can be produced commercially and advantageously.

    Method of cleaning semiconductor substrate and apparatus for carrying out the same
    14.
    发明授权
    Method of cleaning semiconductor substrate and apparatus for carrying out the same 失效
    半导体基板的清洗方法及其实施方法

    公开(公告)号：US5326406A

    公开(公告)日：1994-07-05

    申请号：US921722

    申请日：1992-07-30

    申请人： Yoshio Kaneko ,  Munetaka Koda ,  Tadayoshi Shiraishi ,  Takehiro Murakami

    发明人： Yoshio Kaneko ,  Munetaka Koda ,  Tadayoshi Shiraishi ,  Takehiro Murakami

    IPC分类号： B08B7/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/306 ,  B08B3/12 ,  B44C1/22 ,  C03C15/00 ,  C03C25/06

    CPC分类号： H01L21/02054 ,  B08B7/0057 ,  H01L21/02046 ,  H01L21/67023

    摘要： A semiconductor wafer is placed in a reaction chamber and a cleaning gas is introduced into the reaction chamber. Then, the cleaning gas is excited by irradiation with light rays or heating to produce reactive radicals and a natural oxide film formed on the semiconductor wafer is first removed by the reactive radicals to expose a raw semiconductor wafer surface and then the exposed raw wafer surface is etched by the reactive radicals. Since the natural oxide film is first removed, the exposed raw surface of semiconductor wafer can be etched uniformly over the whole surface, and therefore the highly flat and perfectly crystalline surface can be obtained. It is preferable to introduce a chlorine fluoride series gas such as chlorine trifluoride gas in the cleaning gas. Then, the natural oxide film can be effectively removed by hydrogen fluorine radicals which are produced by irradiating the chloride fluoride series gas with ultraviolet rays.

    摘要翻译： 将半导体晶片放置在反应室中，并将清洁气体引入反应室。 然后，通过用光线照射或加热激发清洁气体以产生反应性基团，并且首先通过反应性基团除去形成在半导体晶片上的自然氧化物膜，以暴露原始半导体晶片表面，然后暴露的原始晶片表面为 被反应性基团蚀刻。 由于首先除去天然氧化物膜，所以可以在整个表面上均匀地蚀刻半导体晶片的暴露的原料表面，因此可以获得高度平坦和完美的晶体表面。 优选在清洗气体中引入氟化氯系气体，例如三氟化氯气体。 然后，可以通过用紫外线照射氯化物系列气体而产生的氢氟自由基有效地除去天然氧化物膜。

    Hydroxystyrene compounds having tyrosine kinase inhibiting activity
    15.
    发明授权
    Hydroxystyrene compounds having tyrosine kinase inhibiting activity 失效
    具有酪氨酸激酶抑制活性的羟基苯乙烯化合物

    公开(公告)号：US5202341A

    公开(公告)日：1993-04-13

    申请号：US735581

    申请日：1991-07-25

    申请人： Tadayoshi Shiraishi ,  Keiji Kameyama ,  Takeshi Domoto ,  Naohiro Imai ,  Yoshio Shimada ,  Yutaka Ariki ,  Kazunori Hosoe ,  Masaji Kawatsu ,  Ikuo Katsumi ,  Takayoshi Hidaka ,  Kiyoshi Watanabe

    发明人： Tadayoshi Shiraishi ,  Keiji Kameyama ,  Takeshi Domoto ,  Naohiro Imai ,  Yoshio Shimada ,  Yutaka Ariki ,  Kazunori Hosoe ,  Masaji Kawatsu ,  Ikuo Katsumi ,  Takayoshi Hidaka ,  Kiyoshi Watanabe

    IPC分类号： A61K31/26 ,  C07C255/34 ,  C07D207/38 ,  C07D209/34 ,  C07D231/36 ,  C07D277/20 ,  C07D277/36 ,  C07D277/54 ,  C07D279/16 ,  C07D307/58 ,  C07D417/12

    CPC分类号： C07D277/20 ,  C07C255/00 ,  C07C255/34 ,  C07D207/38 ,  C07D209/34 ,  C07D231/36 ,  C07D277/36 ,  C07D277/54 ,  C07D279/16 ,  C07D307/58 ,  C07D417/12

    摘要： A hydroxystyrene derivative represented by the formula (I): ##STR1## wherein when R.sup.1 and R.sup.2 : phenyl group, benzyl group or phenethyl group, or R.sup.1 : R.sup.5 O- (R.sup.5 : H, a C.sub.1 to C.sub.5 alkyl group or benzyl group) and R.sup.2 : benzyl group or PhSCH.sub.2, R.sup.3 and R.sup.4 are taken together to represent --CONH--CS--S--, ##STR2## (X.sup.1 : H, a halogen, methyl group, ethyl group, R.sup.7 O-- (R.sup.7 : methyl or ethyl group), nitro group, aminosulfonyl group or amino group, m.sup.1 : 1 or 2), pyridyl group, furyl group or thienyl group, n.sup.1 : an integer of 0 to 3); when R.sup.1 and R.sup.2 : phenyl group, benzyl group or phenethyl group, or R.sup.1 : R.sup.5 O-- (R.sup.5 : as defined above) and R.sup.2 : benzyl group, R.sup.3 : cyano group and R.sup.4 : a carbamoyl group, or R.sup.3 and R.sup.4 are taken together to represent --CO--Y--CH.sub.2 CH.sub.2 -- (Y: O or --NH--) or ##STR3## and when R.sup.1 and R.sup.2 : a C.sub.1 to C.sub.3 alkyl group, R.sup.3 and R.sup.4 are taken together to represent ##STR4## (n.sup.1, R.sup.6 : as defined above), or a salt thereof. The hydroxystyrene derivative or a salt thereof is a compound which is useful as an active ingredient of an antiallergic agent, a 5-lipoxygenase inhibiting agent, an antibacterial agent, a tyrosine kinase inhibiting agent, an ultraviolet absorber or a reverse transcriptase inhibiting agent, and also is useful as an intermediate for preparing various organic compounds.

    摘要翻译： 由式（I）表示的羟基苯乙烯衍生物：其中当R1和R2：苯基，苄基或苯乙基或R1：R5O-（R5：H，C1-C5烷基或苄基 基团）和R 2：苄基或PhSCH 2，R 3和R 4一起表示-CONH-CS-S-，或（X1：H，卤素，甲基，乙基，R7O-（ R7：甲基或乙基），硝基，氨基磺酰基或氨基，m1：1或2），吡啶基，呋喃基或噻吩基，n1：0〜3的整数）。 当R1和R2：苯基，苄基或苯乙基或R1：R5O-（R5：如上定义）和R2：苄基，R3：氰基和R4：氨基甲酰基，或R3和R4合在一起 表示-CO-Y-CH 2 CH 2 - （Y：O或-NH-）或，并且当R 1和R 2为C 1至C 3烷基时，R 3和R 4一起表示（n1，R6 ：如上所定义），或其盐。 羟基苯乙烯衍生物或其盐是可用作抗变应性剂的活性成分，5-脂氧合酶抑制剂，抗菌剂，酪氨酸激酶抑制剂，紫外线吸收剂或逆转录酶抑制剂的化合物，以及 也可用作制备各种有机化合物的中间体。