摘要:
A method of attaching an object to be measured to a structure causing a diffraction phenomenon; irradiating the structure to which the object to be measured is attached and which causes the diffraction phenomenon with an electromagnetic wave; detecting the electromagnetic wave scattered by the structure causing the diffraction phenomenon; and measuring a characteristic of the object to be measured from the frequency characteristic of the detected electromagnetic wave. The object to be measured is attached directly to the surface of the structure causing the diffraction phenomenon. Thus, the method for measuring the characteristic of an object to be measured exhibits an improved measurement sensitivity and high reproducibility. A structure causing a diffraction phenomenon and used for the method, and a measuring device are provided.
摘要:
A piezoelectric transformer type high-voltage power source apparatus to control an output voltage from a piezoelectric transformer to a load, and an image forming apparatus including the same, the piezoelectric transformer type high-voltage power source apparatus including: an output voltage detection unit to compare the output voltage with an output control voltage, and to output a digital value according to the comparison; and a driving control unit to control a driving frequency and a duty rate of the piezoelectric transformer according to the digital value. Accordingly, the piezoelectric transformer type high-voltage power source apparatus can stably perform frequency and duty rate control without experiencing an abnormal oscillation or uncontrollable state due to a manufacturing irregularity of particular components and/or a change in temperature, and a high voltage can be output within a short rise time.
摘要:
A VCSEL includes a first conductivity-type first semiconductor mirror layer on a substrate, an active region thereon, a second conductivity-type second semiconductor mirror layer thereon, and a current confining layer in proximity to the active region. A mesa structure is formed such that at least a side surface of the current confining layer is exposed. The current confining layer includes a first semiconductor layer having an Al-composition and a second semiconductor layer having an Al-composition and being formed nearer to the active region than the first semiconductor layer does. Al concentration of the first semiconductor layer is higher than that of the second semiconductor layer. When oscillation wavelength of laser light is λ, optical thickness being sum of the thickness of the first and second semiconductor layers is λ/4. The first and second semiconductor layers are selectively oxidized from the side surface of the mesa structure.
摘要:
It is an object of the present invention to apply a novel method of preparing neural cells from ES cells. The method of the present invention is characterized by the electric pulse treatment of differentiating ES cells. Nerve cells obtained by the method of the present invention have the flexibility to differentiate into a variety of types of neurons in vivo preferably without the need for application of growth factors.
摘要:
A nose pad for camera includes a base plate, at least one projecting portion mounted to the base plate, and a sheet portion mounted to an edge of the base plate at an edge of the sheet portion and extending obliquely upwardly over the base plate and the sheet portion. The projecting portion has an arc shape so that the nose pad can fit a contour of a nose. The sheet portion is designed to have a reasonable space in between the sheet portion and the projecting portion, so that the nose of the user can softly touch the camera when the nose pad is used.
摘要:
A VCSEL includes a first distributed Bragg reflector (DBR) of a first conductivity type formed on a substrate and including at least one semiconductor layer to be oxidized, an active region having a column shaped structure and formed on the first DBR, and a second DBR of a second conductivity type. At least one hole starting from a surface of the first DBR and reaching the at least one semiconductor layer to be oxidized is formed in the first DBR outside of a column shaped structure of the second DBR. An oxidized region is formed in the semiconductor layer to be oxidized by selectively oxidizing from a side surface of the hole. In the first DBR, a first current path is formed by a conductive region surrounded by the oxidized region, and a second current path is formed by a conductive region not surrounded by the oxidized region.