公开(公告)号：US5334468A

公开(公告)日：1994-08-02

申请号：US909320

申请日：1992-07-06

申请人： Yukio Yamasita ,  Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Yukio Yamasita ,  Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： G02F1/1335 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/2022 ,  G03F7/0007 ,  G02F1/133516

摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer provided on an outermost surface of a substrate having an alignment film, and exposing the photosensitive coating film to light in a first irradiation amount through a mask having a predetermined pattern of a certain light transmittance and at least once displacing the mask to another position on the photosensitive coating film and exposing the photosensitive coating film to light in a second irradiation amount different from the first irradiation amount through the mask; (B) developing and removing a photosensitive coating film portion exposed to light in one of smallest and largest irradiation amounts for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being repeated in sequence of difference in irradiation amounts to form different colored layers, respectively; and (A) transcribing the colored layers, the transparent electrically conductive layer and the alignment film onto another substrate.

摘要翻译： 制造滤色器的方法包括：（A）在设置在具有取向膜的基板的最外表面上的透明导电层上形成感光性涂膜，并使感光性涂膜以第一照射量曝光 掩模具有一定的透光率的预定图案，并且至少一次将掩模移位到感光涂膜上的另一位置，并且通过掩模以不同于第一照射量的第二照射量将感光涂层曝光; （B）以暴露于透明导电层的最小和最大照射量之一曝光的感光性涂膜部分显影和除去，并将暴露的导电层上的着色涂层电沉积在其上形成着色层，显影操作 并且除去感光性涂膜并使着色涂层电沉积重复，以分别照射量不同，形成不同的着色层; 和（A）将着色层，透明导电层和取向膜转印到另一基板上。

公开(公告)号：US5314769A

公开(公告)日：1994-05-24

申请号：US872612

申请日：1992-04-22

申请人： Yukio Yamasita ,  Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Yukio Yamasita ,  Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： G02F1/1335 ,  G03F1/00 ,  G03F7/00 ,  G03F9/00

CPC分类号： G02F1/133516 ,  G03F1/50 ,  G03F7/0007

摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer formed on a surface of a transparent substrate and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film region registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed transparent electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being repeated for the respective patterns of different degrees of light transmittances in sequence of difference in light transmittances to form different colored layers, respectively; and (C) selectively forming a metal layer on at least one exposed region of the transparent electrically conductive layer.

摘要翻译： 一种彩色滤光片的制造方法，其特征在于，（A）在透明导电层上形成感光性涂膜，所述透明导电层形成在透明基板的表面上，并通过具有至少三种不同透光度的图案的掩模曝光所述感光性涂膜 ; （B）显影和除去与最小和最大光透射率的图案之一配准的感光涂层区域，用于暴露透明导电层并将暴露的透明导电层上的着色涂层电沉积以在其上形成着色层 对光敏涂层的显影和除去的操作，并按照不同的透光度顺序对不同程度的透光率的各个图案重复着色的着色涂层，以分别形成不同的着色层; 和（C）在所述透明导电层的至少一个暴露区域上选择性地形成金属层。

公开(公告)号：US5214542A

公开(公告)日：1993-05-25

申请号：US846287

申请日：1992-03-03

申请人： Yukio Yamasita ,  Toru Nakamura ,  Haruyoshi Sato ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Yukio Yamasita ,  Toru Nakamura ,  Haruyoshi Sato ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： G03F7/00

CPC分类号： G03F7/0007 ,  Y10S359/90

摘要： A method for producing a color filter involves the steps of: (A) forming a photosensitive coating film on a transparent electrically conductive layer formed on a surface of a transparent substrate, and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer, and electrodepositing a colored coating on the exposed transparent electrically conductive layer for forming a colored layer thereon; and (C) repeating the step (B) for the respective patterns of different degrees of light transmittances in sequence of difference in transmittances for producing different colored layers, respectively.

公开(公告)号：US5718992A

公开(公告)日：1998-02-17

申请号：US743888

申请日：1996-11-06

申请人： Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki ,  Hiroyoshi Omika ,  Norikatsu Ono ,  Tadafumi Shindo

发明人： Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki ,  Hiroyoshi Omika ,  Norikatsu Ono ,  Tadafumi Shindo

IPC分类号： C09D5/44 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/00

CPC分类号： G02F1/133512 ,  G03F7/0007

摘要： A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.

摘要翻译： 制备具有遮光层的基板的方法包括在形成于透明基板上的透明导电层上形成感光性涂膜，通过具有透光性的掩模曝光感光性涂膜，除去和显影涂膜 暴露透明导电层并在暴露的透明导电层上电沉积暗色涂层以形成遮光层，并加热遮光层。 具有遮光层的基板具有1×102欧姆·厘米或更高的体积电阻率，并且可以用于结合在液晶显示装置中的TFT阵列基板的反电极基板。

公开(公告)号：US5527649A

公开(公告)日：1996-06-18

申请号：US249754

申请日：1994-05-26

申请人： Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki ,  Hiroyoshi Omika ,  Norikatsu Ono ,  Tadafumi Shindo

发明人： Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki ,  Hiroyoshi Omika ,  Norikatsu Ono ,  Tadafumi Shindo

IPC分类号： C09D5/44 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/00

CPC分类号： G02F1/133512 ,  G03F7/0007

摘要： A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.multidot.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.

摘要翻译： 制备具有遮光层的基板的方法包括在形成于透明基板上的透明导电层上形成感光性涂膜，通过具有透光性的掩模曝光感光性涂膜，除去和显影涂膜 暴露透明导电层并在暴露的透明导电层上电沉积暗色涂层以形成遮光层，并加热遮光层。 具有遮光层的基板的体积电阻率为1×102ohm×cm以上，可以用于配置在液晶显示装置中的TFT阵列基板的反电极基板。

公开(公告)号：US5399449A

公开(公告)日：1995-03-21

申请号：US123152

申请日：1993-09-02

申请人： Junichiro Tanimoto ,  Haruyoshi Sato ,  Yutaka Otsuki

发明人： Junichiro Tanimoto ,  Haruyoshi Sato ,  Yutaka Otsuki

IPC分类号： C09D5/44 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/00 ,  G03F9/00

CPC分类号： G03F7/0007 ,  G02F1/133516

摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on at least a transparent electrically conductive layer formed on an outermost surface of a transparent substrate and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film region corresponding to one of the patterns of the smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed transparent electrically conductive layer for forming a colored layer thereon. Operation of developing and removing the photosensitive coating film and electrodepositing the colored coating is repeated for the respective patterns of different degrees of light transmittances in sequence of difference in light transmittances to form different colored layers. The electrodepositing is in turn performed at each time in a decreasing voltage.

摘要翻译： 制造滤色器的方法包括：（A）在至少形成在透明基板的最外表面上的透明导电层上形成感光涂膜，并通过具有至少三个不同程度的图案的掩模曝光感光涂膜 的光透射率; （B）显影和除去与最小和最大光透射度的图案之一相对应的感光涂膜区域，用于曝光透明导电层，并将暴露的透明导电层上的着色涂层电沉积以形成着色层 上。 针对不同程度的透光率的各种图案重复对光敏涂层进行显影和除去和电沉积彩色涂层的操作，以形成不同的着色层。 电沉积依次在逐渐降低的电压下进行。

公开(公告)号：US5214541A

公开(公告)日：1993-05-25

申请号：US874064

申请日：1992-04-24

申请人： Yukio Yamasita ,  Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Yukio Yamasita ,  Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： G03F7/00

CPC分类号： G03F7/0007 ,  Y10S359/90

摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer provided on an outermost surface of a substrate having an alignment film, and exposing the photosensitive coating film to light through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being repeated for the respective patterns of different degrees of light transmittances in sequence of difference in light transmittances to form different colored layers, respectively; and (Z) transcribing the colored layers, the transparent electrically conductive layer and the alignment film onto another substrate.

公开(公告)号：US5096800A

公开(公告)日：1992-03-17

申请号：US618387

申请日：1990-11-27

申请人： Hitoshi Yuasa ,  Eiji Yoda ,  Haruyoshi Sato ,  Yutaka Otsuki

发明人： Hitoshi Yuasa ,  Eiji Yoda ,  Haruyoshi Sato ,  Yutaka Otsuki

IPC分类号： G03F7/027 ,  C08F2/48 ,  C08F290/00 ,  C08F299/00 ,  C08L47/00 ,  C09D4/00 ,  C09D147/00 ,  G03F7/033 ,  H05K3/28

CPC分类号： G03F7/033 ,  H05K3/287

摘要： A resin composition for forming a durable protection coating contains (A) an alkali-soluble resin which is a polymer of a conjugated diene and has a monoamidated succinic acid group represented by the following formula (I) of: ##STR1## wherein R.sup.1 and R.sup.2 each stand for a hydrogen atom, a halogen atom or an organic residue having 1 to 3 carbon atoms; and R.sup.3 stands for an organic residue having 1 to 16 carbon atoms; (B) a pre-polymer having a photosensitive ethylenic double bond; and (C) a photopolymerization initiator. The mixing ratio by weight of the alkali-soluble resin (A) to the pre-polymer (B) ranges from 1:4 to 4:1. A process for preparing the durable protection coating contains applying the resin composition on a substrate, and exposing the resin composition to ultraviolet ray through a circuit pattern mask to cure the resin composition followed by development and after-curing to form the protection coating.

公开(公告)号：US5665496A

公开(公告)日：1997-09-09

申请号：US489817

申请日：1995-06-13

申请人： Hiroyoshi Omika ,  Yutaka Otsuki ,  Hitoshi Yuasa ,  Eiji Yoda ,  Toru Nakamura ,  Masayuki Ando ,  Teruhisa Kuroki ,  Norikatsu Ono

发明人： Hiroyoshi Omika ,  Yutaka Otsuki ,  Hitoshi Yuasa ,  Eiji Yoda ,  Toru Nakamura ,  Masayuki Ando ,  Teruhisa Kuroki ,  Norikatsu Ono

IPC分类号： G03F7/00 ,  G03F9/00

CPC分类号： G03F7/0007

摘要： A method for producing a color filter involves (a) forming a positive photosensitive coating film on a transparent electrically conductive layer of a transparent substrate; (b) forming a light-irradiated region where a light irradiation amount is different in two steps; (c) developing a larger light-irradiated portion to lay-open the transparent electrically conductive layer followed by electrodepositing a light shielding layer thereon; (d) forming on the positive photosensitive coating film undeveloped in the step (c) a light-irradiated region where a light irradiation amount is different in two steps; (e) developing a larger light-irradiated portion of the photosensitive coating film to lay-open the transparent electrically conductive layer followed by electrodepositing a colored coating thereon; (f) forming on the positive photosensitive coating film undeveloped in the step (e) a light-irradiated region where a light irradiation amount is different in at least three steps; and (g) developing the photosensitive coating film to lay-open the transparent electrically conductive layer followed by electrodepositing a colored coating thereon, operation of the developing and electrodepositing being sequentially repeated at least twice in decreasing light irradiation amounts.

摘要翻译： 制造滤色器的方法包括：（a）在透明基板的透明导电层上形成正性感光性涂膜; （b）在两个步骤中形成光照射量不同的光照射区域; （c）显影较大的光照射部分以打开透明导电层，随后在其上电沉积遮光层; （d）在步骤（c）中未显影的正光敏涂层上形成两个光照射量不同的光照射区域; （e）显影感光性涂膜的较大的光照射部分，以打开透明导电层，然后在其上电沉积着色涂层; （f）在步骤（e）中未显影的正光敏涂层上形成至少三个步骤中光照射量不同的光照射区域; 和（g）显影感光涂膜以打开透明导电层，随后在其上电沉积着色涂层，显影和电沉积的操作在减少光照射量下依次重复至少两次。

公开(公告)号：US5527648A

公开(公告)日：1996-06-18

申请号：US352572

申请日：1994-12-09

申请人： Yutaka Otsuki ,  Hitoshi Yuasa ,  Hiroyoshi Omika ,  Masayuki Ando

发明人： Yutaka Otsuki ,  Hitoshi Yuasa ,  Hiroyoshi Omika ,  Masayuki Ando

IPC分类号： G02B5/20 ,  G02F1/1335 ,  G03F7/00 ,  G03F9/00

CPC分类号： G03F7/0007 ,  G02F1/133516

摘要： A method for producing a color filter involves (a) forming a positive photosensitive coating film on a transparent electrically conductive layer of a transparent substrate; (b) forming on the photosensitive coating film a first region where a light irradiation amount is different in two steps; (c) developing a light-irradiated portion of the first region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer; (d) forming on the remaining photosensitive coating film a second region where a light irradiation amount is different in two steps; (e) developing a light-irradiated portion of the second region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer; (f) removing the remaining photosensitive coating film not developed in the steps (c) and (e); (g) forming a positive or negative photosensitive coating film on the transparent substrate; (h) forming on the photosensitive coating film formed in the step (g) a third region where a light irradiation amount is different in at least three steps; and (i) developing the third region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer, the operation of the developing and electrodepositing being sequentially repeated in the order of decreasing or increasing light irradiation amounts to thereby form different colored layers.

摘要翻译： 制造滤色器的方法包括：（a）在透明基板的透明导电层上形成正性感光性涂膜; （b）在所述感光性涂膜上形成光照射量在两个步骤中不同的第一区域; （c）显影第一区域的光照射部分以打开透明导电层，随后在其上电沉积着色涂层以形成着色层; （d）在剩余的感光性涂膜上形成光照射量在两个步骤中不同的第二区域; （e）显影第二区域的光照射部分以打开透明导电层，随后在其上电沉积着色涂层以形成着色层; （f）除去步骤（c）和（e）中未显影的剩余光敏涂层膜; （g）在透明基板上形成正或负的感光涂膜; （h）在步骤（g）中形成的感光涂层上形成至少三个步骤中光照射量不同的第三区域; 和（i）显影第三区域以打开透明导电层，随后在其上电沉积着色涂层以形成着色层，显影和电沉积的操作依次重复以减少或增加光照射量的顺序 从而形成不同的着色层。