公开(公告)号：US5665496A

公开(公告)日：1997-09-09

申请号：US489817

申请日：1995-06-13

申请人： Hiroyoshi Omika ,  Yutaka Otsuki ,  Hitoshi Yuasa ,  Eiji Yoda ,  Toru Nakamura ,  Masayuki Ando ,  Teruhisa Kuroki ,  Norikatsu Ono

发明人： Hiroyoshi Omika ,  Yutaka Otsuki ,  Hitoshi Yuasa ,  Eiji Yoda ,  Toru Nakamura ,  Masayuki Ando ,  Teruhisa Kuroki ,  Norikatsu Ono

IPC分类号： G03F7/00 ,  G03F9/00

CPC分类号： G03F7/0007

摘要： A method for producing a color filter involves (a) forming a positive photosensitive coating film on a transparent electrically conductive layer of a transparent substrate; (b) forming a light-irradiated region where a light irradiation amount is different in two steps; (c) developing a larger light-irradiated portion to lay-open the transparent electrically conductive layer followed by electrodepositing a light shielding layer thereon; (d) forming on the positive photosensitive coating film undeveloped in the step (c) a light-irradiated region where a light irradiation amount is different in two steps; (e) developing a larger light-irradiated portion of the photosensitive coating film to lay-open the transparent electrically conductive layer followed by electrodepositing a colored coating thereon; (f) forming on the positive photosensitive coating film undeveloped in the step (e) a light-irradiated region where a light irradiation amount is different in at least three steps; and (g) developing the photosensitive coating film to lay-open the transparent electrically conductive layer followed by electrodepositing a colored coating thereon, operation of the developing and electrodepositing being sequentially repeated at least twice in decreasing light irradiation amounts.

摘要翻译： 制造滤色器的方法包括：（a）在透明基板的透明导电层上形成正性感光性涂膜; （b）在两个步骤中形成光照射量不同的光照射区域; （c）显影较大的光照射部分以打开透明导电层，随后在其上电沉积遮光层; （d）在步骤（c）中未显影的正光敏涂层上形成两个光照射量不同的光照射区域; （e）显影感光性涂膜的较大的光照射部分，以打开透明导电层，然后在其上电沉积着色涂层; （f）在步骤（e）中未显影的正光敏涂层上形成至少三个步骤中光照射量不同的光照射区域; 和（g）显影感光涂膜以打开透明导电层，随后在其上电沉积着色涂层，显影和电沉积的操作在减少光照射量下依次重复至少两次。

公开(公告)号：US5718992A

公开(公告)日：1998-02-17

申请号：US743888

申请日：1996-11-06

申请人： Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki ,  Hiroyoshi Omika ,  Norikatsu Ono ,  Tadafumi Shindo

发明人： Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki ,  Hiroyoshi Omika ,  Norikatsu Ono ,  Tadafumi Shindo

IPC分类号： C09D5/44 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/00

CPC分类号： G02F1/133512 ,  G03F7/0007

摘要： A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.

摘要翻译： 制备具有遮光层的基板的方法包括在形成于透明基板上的透明导电层上形成感光性涂膜，通过具有透光性的掩模曝光感光性涂膜，除去和显影涂膜 暴露透明导电层并在暴露的透明导电层上电沉积暗色涂层以形成遮光层，并加热遮光层。 具有遮光层的基板具有1×102欧姆·厘米或更高的体积电阻率，并且可以用于结合在液晶显示装置中的TFT阵列基板的反电极基板。

公开(公告)号：US5527649A

公开(公告)日：1996-06-18

申请号：US249754

申请日：1994-05-26

申请人： Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki ,  Hiroyoshi Omika ,  Norikatsu Ono ,  Tadafumi Shindo

发明人： Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki ,  Hiroyoshi Omika ,  Norikatsu Ono ,  Tadafumi Shindo

IPC分类号： C09D5/44 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/00

CPC分类号： G02F1/133512 ,  G03F7/0007

摘要： A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.multidot.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.

摘要翻译： 制备具有遮光层的基板的方法包括在形成于透明基板上的透明导电层上形成感光性涂膜，通过具有透光性的掩模曝光感光性涂膜，除去和显影涂膜 暴露透明导电层并在暴露的透明导电层上电沉积暗色涂层以形成遮光层，并加热遮光层。 具有遮光层的基板的体积电阻率为1×102ohm×cm以上，可以用于配置在液晶显示装置中的TFT阵列基板的反电极基板。

公开(公告)号：US6057900A

公开(公告)日：2000-05-02

申请号：US113999

申请日：1998-07-10

申请人： Norikatsu Ono ,  Masayuki Ando ,  Yutaka Otsuki ,  Hiroyoshi Omika

发明人： Norikatsu Ono ,  Masayuki Ando ,  Yutaka Otsuki ,  Hiroyoshi Omika

IPC分类号： G02F1/1335 ,  G02F1/1339 ,  G02F1/1333

CPC分类号： G02F1/1339 ,  G02F1/133514

摘要： A color liquid crystal display device contains a color filter substrate, a counterelectrode substrate disposed to oppose the color filter substrate via a sealing material disposed in contact with peripheral portions of the color filter substrate and the counterelectrode substrate, and a liquid crystal layer sealed between the color filter substrate and the counterelectrode substrate and surrounded by the sealing material. The color filter substrate contains a transparent substrate, a black matrix and a plurality of colored layers of plural colors, the black matrix and the colored layers being formed in a predetermined pattern in a first region on the transparent substrate, and a resin layer having substantially same thickness as that of the black matrix and formed in a second peripheral region on the transparent substrate positioned peripherally adjacent to the first region. The sealing material is in contact with the resin layer and a black matrix portion in periphery of the first region. A method for producing the color filter substrate involves the steps for forming the resin layer having substantially the same thickness as that of the black matrix.

摘要翻译： 彩色液晶显示装置包括滤色器基板，经由与滤色器基板和反电极基板的周边部分接触设置的密封材料与滤色器基板相对设置的反电极基板，以及密封在滤色器基板之间的液晶层 滤色器基板和反电极基板，并被密封材料包围。 滤色器基板包括透明基板，黑色矩阵和多个多色着色层，黑色矩阵和着色层在透明基板上的第一区域中以预定图案形成，并且具有基本上 形成在与第一区域周边相邻的透明基板上的第二周边区域中。 密封材料与第一区域的周围的树脂层和黑色矩阵部分接触。 用于制造滤色器基板的方法包括用于形成具有与黑矩阵基本上相同的厚度的树脂层的步骤。

公开(公告)号：US5527648A

公开(公告)日：1996-06-18

申请号：US352572

申请日：1994-12-09

申请人： Yutaka Otsuki ,  Hitoshi Yuasa ,  Hiroyoshi Omika ,  Masayuki Ando

发明人： Yutaka Otsuki ,  Hitoshi Yuasa ,  Hiroyoshi Omika ,  Masayuki Ando

IPC分类号： G02B5/20 ,  G02F1/1335 ,  G03F7/00 ,  G03F9/00

CPC分类号： G03F7/0007 ,  G02F1/133516

摘要： A method for producing a color filter involves (a) forming a positive photosensitive coating film on a transparent electrically conductive layer of a transparent substrate; (b) forming on the photosensitive coating film a first region where a light irradiation amount is different in two steps; (c) developing a light-irradiated portion of the first region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer; (d) forming on the remaining photosensitive coating film a second region where a light irradiation amount is different in two steps; (e) developing a light-irradiated portion of the second region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer; (f) removing the remaining photosensitive coating film not developed in the steps (c) and (e); (g) forming a positive or negative photosensitive coating film on the transparent substrate; (h) forming on the photosensitive coating film formed in the step (g) a third region where a light irradiation amount is different in at least three steps; and (i) developing the third region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer, the operation of the developing and electrodepositing being sequentially repeated in the order of decreasing or increasing light irradiation amounts to thereby form different colored layers.

摘要翻译： 制造滤色器的方法包括：（a）在透明基板的透明导电层上形成正性感光性涂膜; （b）在所述感光性涂膜上形成光照射量在两个步骤中不同的第一区域; （c）显影第一区域的光照射部分以打开透明导电层，随后在其上电沉积着色涂层以形成着色层; （d）在剩余的感光性涂膜上形成光照射量在两个步骤中不同的第二区域; （e）显影第二区域的光照射部分以打开透明导电层，随后在其上电沉积着色涂层以形成着色层; （f）除去步骤（c）和（e）中未显影的剩余光敏涂层膜; （g）在透明基板上形成正或负的感光涂膜; （h）在步骤（g）中形成的感光涂层上形成至少三个步骤中光照射量不同的第三区域; 和（i）显影第三区域以打开透明导电层，随后在其上电沉积着色涂层以形成着色层，显影和电沉积的操作依次重复以减少或增加光照射量的顺序 从而形成不同的着色层。

公开(公告)号：US5422207A

公开(公告)日：1995-06-06

申请号：US96717

申请日：1993-07-23

申请人： Eiji Yoda ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Eiji Yoda ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： G02B5/20 ,  G02F1/1335 ,  G03F7/00 ,  G03F9/00

CPC分类号： G02B5/201 ,  G03F7/0007 ,  G02F1/133516

摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on at least a transparent electrically conductive layer of a first substrate having both the transparent electrically conductive layer and a light-intercepting layer on its surface or a second substrate having the transparent electrically conductive layer on its outermost surface and a light-intercepting layer between the second substrate and the transparent electrically conductive layer and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances, and (B) developing and removing a photosensitive coating film region corresponding to a pattern having smallest degree of light transmittance or a pattern having largest degree of light transmittance for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed transparent electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being sequentially repeated for the respective patterns having different degrees of light transmittances where the sequence of repetition is of increasing light transmittance or decreasing light transmittance.

摘要翻译： 制造滤色器的方法包括（A）在至少具有透明导电层的透明导电层上形成感光涂层的第一基板，其具有透明导电层和表面上的遮光层，或者具有第 透明导电层和在第二基板和透明导电层之间的遮光层，并且通过具有至少三个不同光透射度图案的掩模曝光感光涂层膜，以及（B）显影 并且除去与具有最小透光度的图案相对应的感光性涂膜区域或具有最大透光度的图案，以使透明导电层露出，并将露出的透明导电层上的着色涂层电沉积以形成着色层 对于具有不同程度的透光率的各种图案，其中重复次序增加透光率或降低透光率，顺序重复对感光涂膜进行显影和除去和着色涂层的电沉积操作。

公开(公告)号：US5876882A

公开(公告)日：1999-03-02

申请号：US759020

申请日：1996-12-02

申请人： Eiji Yoda ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Eiji Yoda ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： C09D5/44 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/0007 ,  G02F1/133516 ,  G03F7/2022

摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on at least a transparent electrically conductive layer of a substrate having both the transparent electrically conductive layer and a light-intercepting layer on its outermost surface, and exposing the photosensitive coating film to light in a first irradiation amount through a mask having a predetermined pattern of a certain light transmittance and at least once displacing the mask to another position on the photosensitive coating film and exposing the photosensitive coating film to light in a second irradiation amount different from the first irradiation amount through the mask; and (B) developing and removing a photosensitive coating film portion exposed to light in one of smallest and largest irradiation amounts for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being sequentially repeated for the respective irradiation amounts where the sequence of repetition is selected from the group consisting of increasing irradiation amount and decreasing irradiation amount to form different colored layers, respectively.

摘要翻译： 一种彩色滤光片的制造方法，其特征在于，（A）在至少具有透明导电层的透明导电层上形成感光性涂膜，在其最表面具有遮光层，并使感光性涂层 膜通过具有一定光透射率的预定图案的掩模以第一照射量进行点亮，并且至少一次将掩模移位到感光涂膜上的另一位置，并以不同于第二辐射量的第二照射量曝光光敏涂层膜 通过掩模的第一照射量; 和（B）显影和除去以最小和最大照射量中的最小和最大照射量曝光的感光涂膜部分，以暴露透明导电层，并在暴露的导电层上电沉积着色涂层以形成着色层，操作 显影和除去感光性涂膜，并对着色层依次重复进行着色涂层的电泳沉积，其中重复次序分别由增加照射量和减少照射量组成的组中选出，以形成不同的着色层。

公开(公告)号：US5411836A

公开(公告)日：1995-05-02

申请号：US742622

申请日：1991-08-08

申请人： Eiji Yoda ,  Haruyoshi Sato ,  Yukio Yamasita ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Eiji Yoda ,  Haruyoshi Sato ,  Yukio Yamasita ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： C08F8/46 ,  G03F7/023 ,  H01L21/027 ,  H01L21/30 ,  H05K3/00 ,  H05K3/06 ,  G03F7/021 ,  G03F7/30

CPC分类号： G03F7/0233

摘要： A positive type photoresist composition contains (a) 100 parts by weight of a resin which is a polymer compound (A) including carbon-carbon double bonds and having a molecular weight of 300 to 30,000 and an iodine value of to 500. To at least a part of the double bonds of the polymer compound (A), a group represented by the formula (I) is introduced ##STR1## wherein R.sup.1 denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and R.sup.2 denotes an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group or an aryl group, The composition further contains (b) 25 to 100 parts by weight of a compound containing a quinone diazide unit.

摘要翻译： 正型光致抗蚀剂组合物含有（a）100重量份作为包含碳 - 碳双键且分子量为300〜30,000，碘值为500的高分子化合物（A）的树脂。至少 引入高分子化合物（A）的双键的一部分，由式（I）表示的基团，其中R1表示氢原子，卤素原子或具有1〜3个碳原子的烷基 原子，R 2表示具有1〜10个碳原子的烷基，环烷基或芳基。该组合物还含有（b）25〜100重量份含有醌二叠氮单元的化合物。

公开(公告)号：US5427888A

公开(公告)日：1995-06-27

申请号：US101176

申请日：1993-08-03

申请人： Eiji Yoda ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Eiji Yoda ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： C08K5/42 ,  C08K5/41 ,  C08L101/00 ,  G03F7/022 ,  G03F7/023 ,  G03F7/039 ,  H05K3/00 ,  H05K3/06 ,  G03F7/30

CPC分类号： G03F7/0233 ,  H05K3/0076 ,  H05K3/0094 ,  Y10S430/111

摘要： A positive photosensitive resin composition contains 50 to 95 parts by weight of a resin (a) composed of a high molecular compound (A) having a molecular weight of 300 to 30,000 and an iodine value of 50 to 500 and containing carbon-carbon double bonds and a group represented by the formula (I) ##STR1## wherein R.sub.1 denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and X denotes a hydrogen atom or a bond, on the proviso that if X denotes the bond, a carbon atom linked to R.sub.1 and a carbon atom linked to a hydrogen atom together form a portion of a main chain of the high molecular compound (A), and a group represented by the formula (II) ##STR2## wherein R.sub.1 and X denote the same as above, and R.sub.2 denotes an alkyl, cycloalkyl or aryl group, and 5 to 50 parts by weight of a compound (b) containing quinone diazide groups.

摘要翻译： 正型感光性树脂组合物含有50〜95重量份的由分子量为300〜30,000的高分子化合物（A）和碘值为50〜500的含有碳 - 碳双键的树脂（a） 和由式（I）表示的基团，其中R 1表示氢原子，卤素原子或具有1至3个碳原子的烷基，X表示氢原子或键，条件是 如果X表示键，则与R1连接的碳原子和与氢原子连接的碳原子一起形成高分子化合物（A）的主链的一部分，由式（II）表示的基团（II）其中R1和X表示与上述相同的含义，R2表示烷基，环烷基或芳基，以及5-50重量份含有醌二叠氮基的化合物（b）。

公开(公告)号：US5368977A

公开(公告)日：1994-11-29

申请号：US34357

申请日：1993-03-19

申请人： Eiji Yoda ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Eiji Yoda ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： G03F7/023

CPC分类号： G03F7/023

摘要： A positive type photosensitive resin composition contains (a) a quinone diazido phenolic resin represented by the formula: ##STR1## wherein R.sup.1 is an alkyl group having 1 to 4 carbon atoms, R.sup.2 is a bivalent hydrocarbon residue having 5 to 16 carbon atoms provided that groups bound to R.sup.2 do not bind with the same carbon atom of R.sup.2, D.sup.1, D.sup.2 and D.sup.3 and are the same or different groups and each represent a hydrogen atom or a quinone diazido unit represented by ##STR2## provided that a molar ratio of the hydrogen atom to the quinone diazido unit is 0 to 10, m is a number of 0 to 10, n is a number of 1 or 2, and l.sub.1, l.sub.2 and l.sub.3 are the same or different numbers and each represent a number of 1 to 3; and (b) an alkali-soluble resin.

摘要翻译： 正型型感光性树脂组合物含有（a）由式（Ⅰ）表示的醌二叠氮酚醛树脂，其中R1为碳原子数为1〜4的烷基，R2为碳原子数为5〜16的二价烃基 条件是与R2结合的基团不与R2，D1，D2和D3的相同碳原子结合，并且是相同或不同的基团，并且各自表示由 表示的氢原子或醌二叠氮基单元 氢原子与醌二叠氮基单元的摩尔比为0〜10，m为0〜10的数，n为1或2的数，l1，l2和l3分别相同或不同。 代表1到3的数字; 和（b）碱溶性树脂。