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    POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME
    11.
    发明申请
    POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME 有权
    抛光垫及其制造方法

    公开(公告)号：US20120279138A1

    公开(公告)日：2012-11-08

    申请号：US13552346

    申请日：2012-07-18

    申请人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    发明人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    IPC分类号： B24B37/24

    CPC分类号： B24B37/24 ,  B24D3/26 ,  B24D11/001

    摘要： A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.

    摘要翻译： 抛光层和基材层之间具有优异的耐久性和粘附性的抛光垫包括布置在基材层上的抛光层，其中抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至 300μm聚氨酯泡沫包括异氰酸酯组分和含活性氢的化合物作为原料组分，活性氢化合物包括30至85重量％的具有2至4个官能团的高分子量多元醇和 羟值为20〜100mg KOH / g。

    POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME
    13.
    发明申请
    POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME 有权
    抛光垫及其制造方法

    公开(公告)号：US20100029185A1

    公开(公告)日：2010-02-04

    申请号：US12519339

    申请日：2007-11-27

    申请人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    发明人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    IPC分类号： B24B37/00 ,  B24D11/00 ,  H01L21/304

    CPC分类号： B24B37/24 ,  B24D3/26 ,  B24D11/001

    摘要： An object of the invention is to provide a polishing pad excellent in durability and in the adhesiveness between a polishing layer and a base material layer. The first invention relates to a polishing pad comprising a polishing layer arranged on a base material layer, wherein the polishing layer comprises a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm, the polyurethane foam comprises an isocyanate component and an active hydrogen-containing compound as starting components, and the active hydrogen-containing compound comprises 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.

    摘要翻译： 本发明的目的是提供一种抛光层和基材层之间的耐久性和粘合性优异的抛光垫。 第一发明涉及一种抛光垫，其包括布置在基材层上的抛光层，其中所述抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至300μm的具有大致球形的互连孔，所述聚氨酯泡沫包含异氰酸酯 组分和含活性氢的化合物作为起始组分，并且所述活性含氢化合物包含30至85重量％的具有2-4个官能团和羟基值为20至100mg KOH的高分子量多元醇 /G。

    Polishing pad and a method for manufacturing the same
    14.
    发明授权
    Polishing pad and a method for manufacturing the same 有权
    抛光垫及其制造方法

    公开(公告)号：US08602846B2

    公开(公告)日：2013-12-10

    申请号：US13552346

    申请日：2012-07-18

    申请人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    发明人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    IPC分类号： B24B1/00

    CPC分类号： B24B37/24 ,  B24D3/26 ,  B24D11/001

    摘要： A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm. The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.

    摘要翻译： 抛光层和基材层之间具有优异的耐久性和粘附性的抛光垫包括布置在基材层上的抛光层，其中抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至 300个妈妈 聚氨酯泡沫包括异氰酸酯组分和含活性氢的化合物作为起始原料组分，并且含活性氢的化合物包括30至85重量％的具有2-4个官能团的高分子量多元醇和羟基 值为20〜100mg KOH / g。

    PROCESS FOR MANUFACTURING POLISHING PAD
    15.
    发明申请
    PROCESS FOR MANUFACTURING POLISHING PAD 有权
    制造抛光垫的工艺

    公开(公告)号：US20100162631A1

    公开(公告)日：2010-07-01

    申请号：US12601725

    申请日：2008-05-15

    申请人： Akinori Sato ,  Junji Hirose ,  Kenji Nakamura ,  Takeshi Fukuda ,  Masato Doura

    发明人： Akinori Sato ,  Junji Hirose ,  Kenji Nakamura ,  Takeshi Fukuda ,  Masato Doura

    IPC分类号： B24D3/32 ,  B24D11/00

    CPC分类号： B24D18/00 ,  B24B37/205 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24364

    摘要： A method for manufacturing a polishing pad that has a high level of optical detection accuracy and is prevented from causing slurry leak from between the polishing region and the light-transmitting region includes preparing a cell-dispersed urethane composition by a mechanical foaming method; placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, continuously discharging the cell-dispersed urethane composition onto a part of the face material or the belt conveyor where the light-transmitting region is not placed; placing another face material or belt conveyor on the discharged cell-dispersed urethane composition; curing the cell-dispersed urethane composition to form a polishing region including a polyurethane foam, so that a polishing sheet is prepared; applying a coating composition containing an aliphatic and/or alicyclic polyisocyanate to one side of the polishing sheet and curing the coating composition to form a water-impermeable film; and cutting the polishing sheet.

    摘要翻译： 一种制造具有高水平的光学检测精度并且防止从抛光区域和透光区域之间的浆料泄漏的抛光垫的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在面材料或带式输送机上的预定位置放置透光区域，将细胞分散的聚氨酯组合物连续排出到未放置透光区域的面材或带式输送机的一部分上; 将另一种面材或带式输送机放置在排出的细胞分散的聚氨酯组合物上; 固化细胞分散的聚氨酯组合物以形成包括聚氨酯泡沫的抛光区域，从而制备抛光片; 将包含脂族和/或脂环族多异氰酸酯的涂料组合物施用到抛光片的一侧并固化涂料组合物以形成不透水膜; 并切割抛光片。

    Polishing pad and a method for manufacturing the same
    16.
    发明授权
    Polishing pad and a method for manufacturing the same 有权
    抛光垫及其制造方法

    公开(公告)号：US08257153B2

    公开(公告)日：2012-09-04

    申请号：US12519339

    申请日：2007-11-27

    申请人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    发明人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    IPC分类号： B24D11/00

    CPC分类号： B24B37/24 ,  B24D3/26 ,  B24D11/001

    摘要： A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.

    摘要翻译： 抛光层和基材层之间具有优异的耐久性和粘附性的抛光垫包括布置在基材层上的抛光层，其中抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至 300μm聚氨酯泡沫包括异氰酸酯组分和含活性氢的化合物作为原料组分，活性氢化合物包括30至85重量％的具有2至4个官能团的高分子量多元醇和 羟值为20〜100mg KOH / g。

    PROCESS FOR PRODUCING POLYURETHANE FOAM
    17.
    发明申请
    PROCESS FOR PRODUCING POLYURETHANE FOAM 有权
    生产聚氨酯泡沫的方法

    公开(公告)号：US20100120249A1

    公开(公告)日：2010-05-13

    申请号：US12593174

    申请日：2008-02-29

    申请人： Junji Hirose ,  Takeshi Fukuda ,  Masato Doura ,  Akinori Sato ,  Kenji Nakamura

    发明人： Junji Hirose ,  Takeshi Fukuda ,  Masato Doura ,  Akinori Sato ,  Kenji Nakamura

    IPC分类号： B24D11/00 ,  C08J9/30 ,  H01L21/304

    CPC分类号： B24B37/24 ,  B24D3/32 ,  B24D18/00 ,  C08J9/30 ,  C08J2375/04

    摘要： A method for manufacturing a polishing pad containing substantially spherical cells and having high thickness accuracy includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition from a single discharge port to a substantially central portion in the width direction of a face material A, while feeding the face material A; laminating a face material B on the cell-dispersed urethane composition; then uniformly adjusting the thickness of the cell-dispersed urethane composition by thickness adjusting means; curing the cell-dispersed urethane composition with the thickness adjusted in the preceding step without applying any additional load to the composition so that a polishing sheet including a polyurethane foam is formed; and cutting the polishing sheet.

    摘要翻译： 一种用于制造包含基本上球形的电池并且具有高厚度精度的抛光垫的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在单面排出口向面材A的宽度方向的大致中央部连续排出细胞分散型尿烷组合物，同时供给面材A; 将面料B层压在细胞分散的聚氨酯组合物上; 然后通过厚度调节装置均匀地调节细胞分散的聚氨酯组合物的厚度; 固化在前述步骤中调节的厚度的细胞分散的聚氨酯组合物，而不对组合物施加任何额外的负荷，使得形成包括聚氨酯泡沫的抛光片; 并切割抛光片。

    Polishing pad
    20.
    发明授权
    Polishing pad 有权
    抛光垫

    公开(公告)号：US08094456B2

    公开(公告)日：2012-01-10

    申请号：US12095859

    申请日：2007-01-09

    申请人： Takeshi Fukuda ,  Junji Hirose ,  Masato Doura

    发明人： Takeshi Fukuda ,  Junji Hirose ,  Masato Doura

    IPC分类号： H05K7/00 ,  H05K3/00 ,  B32B15/04 ,  B05D5/12 ,  B28B1/00

    CPC分类号： C08G18/10 ,  B24B37/24 ,  C08G18/61 ,  C08G2101/00 ,  C08G2101/0025 ,  Y10T29/49124 ,  Y10T428/31678 ,  C08G18/3814

    摘要： To provide a polishing pad which is insusceptible to clogging of groove with abrasive particles and grinding dusts during polishing, and leads to little decrease in polishing rate even after long-term continuous use. A polishing pad of the present invention has a polishing layer formed of polyurethane resin foam having fine-cells, and asperity structure formed in a polishing surface of the polishing layer, and is featured in that the polyurethane resin foam is a reaction cured product between isocyanate-terminated prepolymer containing high-molecular-weight polyol component and isocyanate component, and a chain extender, and contains a silicon-based surfactant having combustion residue of not less than 8 wt %.

    摘要翻译： 为了提供抛光垫，抛光垫不易于磨损颗粒堵塞槽和研磨粉尘，并且即使在长期连续使用后也几乎不降低抛光速率。 本发明的抛光垫具有由聚氨酯树脂发泡体形成的抛光层，其具有细小单元，并且在抛光层的研磨表面上形成凹凸结构，其特征在于，聚氨酯树脂泡沫是异氰酸酯之间的反应固化产物 含有高分子量多元醇成分和异氰酸酯成分的末端预聚物和扩链剂，含有不少于8重量％的燃烧残留物的硅系表面活性剂。