公开(公告)号：US11135698B2

公开(公告)日：2021-10-05

申请号：US15181527

申请日：2016-06-14

Applicant: Tokyo Electron Limited

Inventor： Keigo Satake ,  Kenji Nakamizo ,  Yuichi Douki

IPC: B24B37/005 ,  B24B37/20

Abstract: Disclosed is a processing apparatus that includes a chamber accommodating a workpiece, a nozzle provided within the chamber, a measuring unit measuring the supply flow rate of the processing fluid supplied to the nozzle, an opening/closing unit performing opening/closing of the flow path of the processing fluid, and a controller. The controller sends an opening/closing operation signal that causes the opening/closing unit to perform an opening/closing operation according to recipe information that indicates processing contents. After sending the opening/closing operation signal to the opening/closing unit according to the recipe information, the controller starts the integration of the supply flow rate based on the measurement result of the measuring unit, monitors the rise of the supply flow rate based on the calculated integrated amount, and when supplying a specific flow rate, monitors the supply flow rate based on a value actually measured by the measuring unit.

公开(公告)号：US11043399B2

公开(公告)日：2021-06-22

申请号：US16728136

申请日：2019-12-27

Applicant: Tokyo Electron Limited

Inventor： Tomiyasu Maezono ,  Sadamichi Mori ,  Kouji Takuma ,  Chikara Nobukuni ,  Keigo Satake ,  Shinji Sugahara ,  Masahiro Yoshida

IPC: B08B3/08 ,  H01L21/67 ,  H01L21/687

Abstract: A plasma processing apparatus includes a storage; processors; a liquid supply which supplies, into the storage, at least a first liquid composed of a processing liquid or source liquids for composing the processing liquid; a detector which detects a value of a parameter indicating a state of the first liquid supplied into the storage or a state of the processing liquid in the storage; and a controller which controls the processors to perform a liquid processing in sequence. The controller determines, based on a detection result of the value of the parameter, whether it is possible to supply the processing liquid continuously into a preset number of processors concurrently under a condition requested by the processors, and, if not, the controller performs a simultaneous processing restricting control of reducing a number of processors which are supposed to perform the liquid processing concurrently to be lower than the preset number.

公开(公告)号：US20200211867A1

公开(公告)日：2020-07-02

申请号：US16728136

申请日：2019-12-27

Applicant: Tokyo Electron Limited

Inventor： Tomiyasu Maezono ,  Sadamichi Mori ,  Kouji Takuma ,  Chikara Nobukuni ,  Keigo Satake ,  Shinji Sugahara ,  Masahiro Yoshida

IPC: H01L21/67 ,  H01L21/687 ,  B08B3/08

Abstract: A plasma processing apparatus includes a storage; processors; a liquid supply which supplies, into the storage, at least a first liquid composed of a processing liquid or source liquids for composing the processing liquid; a detector which detects a value of a parameter indicating a state of the first liquid supplied into the storage or a state of the processing liquid in the storage; and a controller which controls the processors to perform a liquid processing in sequence. The controller determines, based on a detection result of the value of the parameter, whether it is possible to supply the processing liquid continuously into a preset number of processors concurrently under a condition requested by the processors, and, if not, the controller performs a simultaneous processing restricting control of reducing a number of processors which are supposed to perform the liquid processing concurrently to be lower than the preset number.

公开(公告)号：US20190079544A1

公开(公告)日：2019-03-14

申请号：US16188525

申请日：2018-11-13

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: G05D11/13

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.