公开(公告)号：US20190079544A1

公开(公告)日：2019-03-14

申请号：US16188525

申请日：2018-11-13

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: G05D11/13

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

公开(公告)号：US12300518B2

公开(公告)日：2025-05-13

申请号：US17808160

申请日：2022-06-22

Applicant: Tokyo Electron Limited

Inventor： Kazuki Kosai ,  Hideaki Udou ,  Seiya Fujimoto ,  Yudai Takanaga ,  Takahito Nakashoya ,  Shogo Fukui ,  Atsushi Anamoto ,  So Osada

IPC: H01L21/67 ,  B08B13/00

Abstract: An apparatus includes: a tank storing a processing liquid; a circulation line; a branch line; a processing part for supplying the processing liquid to a substrate at the branch line; a discharge part for reducing a storage amount of the processing liquid; a supply part for supplying a new processing liquid to the tank; and a controller including: a first determination part for determining whether the storage amount is less than a lower limit value; a first replenishment controller for replenishing the processing liquid to the tank when the storage amount is less than the lower limit value; a calculation part for calculating a replenishment amount of the processing liquid; and a second replenishment controller for reducing the storage amount and replenishing the processing liquid to the tank when a calculation value of the replenishment amount is less than a set value.

公开(公告)号：US10591935B2

公开(公告)日：2020-03-17

申请号：US16188525

申请日：2018-11-13

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: G05D11/13

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

公开(公告)号：US20180358240A1

公开(公告)日：2018-12-13

申请号：US15535882

申请日：2015-12-15

Applicant: Tokyo Electron Limited

Inventor： Hiroshi Komiya ,  Yasuhiro Takaki ,  Shinichi Umeno ,  Koji Tanaka ,  Takami Satoh ,  Atsushi Anamoto

IPC: H01L21/67 ,  B08B3/04

CPC classification number: H01L21/67023 ,  B08B3/04 ,  B08B2203/027 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/6719

Abstract: A substrate liquid processing apparatus includes a transfer section, a processing section, a reservoir and a liquid sending mechanism. The transfer section includes a transfer device configured to transfer a substrate. The processing section is provided adjacent to the transfer section in a horizontal direction, and includes a liquid processing unit configured to process the substrate by using a processing liquid. The reservoir is configured to store the processing liquid therein. The liquid sending mechanism is configured to send out the processing liquid stored in the reservoir into the liquid processing unit. The reservoir is disposed directly under the transfer section. Further, the liquid sending mechanism is disposed directly under the processing section. Space saving of the substrate liquid processing apparatus can be achieved.

公开(公告)号：US10573539B2

公开(公告)日：2020-02-25

申请号：US15535882

申请日：2015-12-15

Applicant: Tokyo Electron Limited

Inventor： Hiroshi Komiya ,  Yasuhiro Takaki ,  Shinichi Umeno ,  Koji Tanaka ,  Takami Satoh ,  Atsushi Anamoto

IPC: H01L21/67 ,  B08B3/04

Abstract: A substrate liquid processing apparatus includes a transfer section, a processing section, a reservoir and a liquid sending mechanism. The transfer section includes a transfer device configured to transfer a substrate. The processing section is provided adjacent to the transfer section in a horizontal direction, and includes a liquid processing unit configured to process the substrate by using a processing liquid. The reservoir is configured to store the processing liquid therein. The liquid sending mechanism is configured to send out the processing liquid stored in the reservoir into the liquid processing unit. The reservoir is disposed directly under the transfer section. Further, the liquid sending mechanism is disposed directly under the processing section. Space saving of the substrate liquid processing apparatus can be achieved.

公开(公告)号：US10162371B2

公开(公告)日：2018-12-25

申请号：US14536989

申请日：2014-11-10

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: B01F15/00 ,  B01F3/08 ,  G05D11/13

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

公开(公告)号：US20150131403A1

公开(公告)日：2015-05-14

申请号：US14536989

申请日：2014-11-10

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: B01F15/00 ,  B01F3/08

CPC classification number: G05D11/138

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

Abstract translation: 基板液体处理装置包括罐; 循环线 处理单元，其通过分支管线连接到循环管线，并且被配置为使用流过循环管线的处理液体在基板上进行液体处理; 处理液生成机构，其通过以受控混合比混合由各原料液源供给的至少两种原料液体来制造处理液; 浓度测量装置，被配置为测量流过所述循环管线的处理液体的浓度和流经所述处理液体供给管线的处理液体的浓度; 以及控制装置，其被配置为基于所测量的处理液体的浓度来控制处理液生成机构。