公开(公告)号：US10974181B2

公开(公告)日：2021-04-13

申请号：US16580292

申请日：2019-09-24

Applicant: Tokyo Electron Limited

Inventor： Yuichi Yoshida ,  Ryouichirou Naitou ,  Arnaud Alain Jean Dauendorffer ,  Koji Takayanagi ,  Shinobu Miyazaki

IPC: B01D37/02 ,  H01L21/67 ,  B01D35/18

Abstract: In one embodiment, after a new filter unit is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

公开(公告)号：US09975073B2

公开(公告)日：2018-05-22

申请号：US14841794

申请日：2015-09-01

Applicant: Tokyo Electron Limited

Inventor： Yuichi Yoshida ,  Ryouichirou Naitou ,  Toshinobu Furusho

IPC: B01D36/00 ,  B01D19/00 ,  C02F1/20 ,  C02F103/34 ,  B01D37/04 ,  F04B53/20 ,  G03C1/74

CPC classification number: B01D36/001 ,  B01D19/0036 ,  B01D37/046 ,  B01D2201/202 ,  B01D2201/204 ,  B01D2221/14 ,  C02F1/20 ,  C02F2103/346 ,  C02F2209/03 ,  F04B53/20 ,  G03C2001/7437

Abstract: Disclosed are an apparatus and a method for reducing a processing liquid consumed for removing bubbles from a new filter unit, and shortening a start-up time when the filter unit is attached in a processing liquid supply passage. The method includes: filling the processing liquid into a new filter unit, decompressing inside of the filter unit into a first pressure atmosphere in order to remove bubbles from the filter unit, boosting a pressure of the inside of the filter unit, flowing the processing liquid into the filter unit from a primary side of the filter unit, and supplying the processing liquid flowing from the filter unit to an object to be processed through a nozzle thereby performing a liquid processing and quickly removing the bubbles.

公开(公告)号：US09817323B2

公开(公告)日：2017-11-14

申请号：US15040362

申请日：2016-02-10

Applicant: Tokyo Electron Limited

Inventor： Yuichi Yoshida ,  Kousuke Yoshihara

IPC: B05B13/04 ,  B05D1/02 ,  G03B27/32 ,  G03B27/52 ,  G03D5/00 ,  G03F7/20 ,  H01L21/02 ,  H01L21/67 ,  G03F7/16 ,  G03F7/30 ,  G03F7/32

CPC classification number: G03F7/70975 ,  G03F7/162 ,  G03F7/3021 ,  G03F7/325 ,  H01L21/02052 ,  H01L21/02104 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/6715

Abstract: A liquid treatment method includes: supplying a first organic solvent to a substrate with the substrate being held horizontally by a substrate holder; and thereafter supplying a second organic solvent to a substrate held by the substrate holder, the second solvent having a higher cleanliness than the first solvent.