Field effect device with oxide semiconductor layer
    12.
    发明授权
    Field effect device with oxide semiconductor layer 有权
    具有氧化物半导体层的场效应器件

    公开(公告)号:US09196743B2

    公开(公告)日:2015-11-24

    申请号:US13860855

    申请日:2013-04-11

    IPC分类号: H01L29/10 H01L29/786

    CPC分类号: H01L29/7869

    摘要: Provided is a semiconductor device in which generation of a parasitic channel in an end region of an oxide semiconductor film is suppressed. The semiconductor device includes a gate electrode, an oxide semiconductor film, a source electrode and a drain electrode, and a channel region formed in the oxide semiconductor film. The channel region is formed between a first side surface of the source electrode and a second side surface of the drain electrode opposite to the first side surface. The oxide semiconductor film has an end region which does not overlap with the gate electrode. The end region which does not overlap with the gate electrode is positioned between a first region that is the nearest to one end of the first side surface and a second region that is the nearest to one end of the second side surface.

    摘要翻译: 提供了抑制氧化物半导体膜的端部区域中的寄生通道的产生的半导体装置。 半导体器件包括栅电极,氧化物半导体膜,源电极和漏极,以及形成在氧化物半导体膜中的沟道区。 沟道区形成在源电极的第一侧表面和与第一侧表面相对的漏电极的第二侧表面之间。 氧化物半导体膜具有不与栅电极重叠的端部区域。 不与栅电极重叠的端部区域位于最靠近第一侧表面的一端的第一区域和最靠近第二侧表面的一端的第二区域之间。

    Apparatus and method for treating waste gas from urea prilling tower
    14.
    发明授权
    Apparatus and method for treating waste gas from urea prilling tower 失效
    尿素造粒塔废气处理设备及方法

    公开(公告)号:US4104041A

    公开(公告)日:1978-08-01

    申请号:US748541

    申请日:1976-12-08

    IPC分类号: B01D47/06 B01D47/00

    CPC分类号: B01D47/06

    摘要: This invention relates to a process for treating the waste gas discharged from a urea prilling tower and an apparatus therefor. More particularly, this invention relates to a process for treating the waste gas discharged from a urea prilling tower and an apparatus therefor, characterized by that a continuous liquid or water film flow (hereinafter called merely a liquid film) of a scrubbing solution and/or an absorption liquid (hereinafter called merely a scrubbing solution) is formed so as to traverse across the whole passage of the waste gas within the scrubbing tower, and when the waste gas passes through such a liquid film the fumy minute particles (hereinafter called fumes) of urea, about 1 micron in size, which are contained in said waste gas, are removed by contacting with the scrubbing solution.

    摘要翻译: 本发明涉及一种处理从尿素造粒塔排出的废气的方法及其装置。 更具体地说,本发明涉及一种用于处理从尿素造粒塔排出的废气及其装置的方法,其特征在于,连续的液体或水膜流动(以下仅称为液膜)为洗涤液和/或 形成吸收液体(以下简称为洗涤液),以遍及洗涤塔内的废气的整个通道,当废气通过这样的液膜时,蒸馏微粒子(以下称为烟雾) 通过与洗涤溶液接触除去所述废气中所含的大约1微米尺寸的尿素。

    Liquid crystal display device and manufacturing method of liquid crystal display device
    16.
    发明授权
    Liquid crystal display device and manufacturing method of liquid crystal display device 有权
    液晶显示装置及液晶显示装置的制造方法

    公开(公告)号:US09261746B2

    公开(公告)日:2016-02-16

    申请号:US14234450

    申请日:2012-08-03

    摘要: In order to suppress crosstalk between a pixel electrode and a source line to reduce flicker, an LCD device includes: gate lines 102 and source lines 105 which are provided in a grid pattern; pixel electrodes 111 arranged in a matrix pattern so as to correspond to intersections of the gate lines and the source lines; a transparent auxiliary capacitor electrode 109; and switching elements 121 configured to apply an image signal voltage supplied from the source line 105 to the pixel electrode 111 according to a scanning signal applied from the gate line 102. The switching element 121 is formed by using an oxide semiconductor layer 104, and the transparent auxiliary capacitor electrode 109 is provided between the source line 105 and the pixel electrode 111.

    摘要翻译: 为了抑制像素电极和源极线之间的串扰以减少闪烁,LCD器件包括:栅极线102和栅极线105,其设置为栅格图案; 像素电极111,其以矩阵图案排列,以对应于栅极线和源极线的交点; 透明辅助电容电极109; 以及开关元件121,被配置为根据从栅极线102施加的扫描信号将从源极线105提供的图像信号电压施加到像素电极111.开关元件121通过使用氧化物半导体层104形成,并且 透明辅助电容电极109设置在源极线105和像素电极111之间。