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公开(公告)号：US20070071303A1
公开(公告)日：2007-03-29
申请号：US11238841
申请日：2005-09-29
IPC分类号： G06K9/00
CPC分类号： G03F7/70258 , G03F7/705 , G03F7/706
摘要： An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.
摘要翻译： 光学系统具有至少两个可相对于彼此的空间关系的光学元件。 至少一个光学元件包括多个光学部件。 光学系统包括用于单独测量每个光学部件的图像缺陷的第一测量装置和用于计算多个光学部件的第一目标位置的第一计算装置，使得至少一个光学元件的整体图像缺陷低于 预定的阈值。 提供第二测量装置用于测量光学系统的整体图像缺陷，第二计算装置将所测量的整体图像缺陷表示为正交函数集的基本函数的线性组合。 第二计算装置计算用于至少两个光学元件的第二目标位置，以便减小整体图像缺陷。
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公开(公告)号：US07570345B2
公开(公告)日：2009-08-04
申请号：US11808316
申请日：2007-06-08
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。
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公开(公告)号：US20080007706A1
公开(公告)日：2008-01-10
申请号：US11808316
申请日：2007-06-08
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。
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公开(公告)号：US20050237506A1
公开(公告)日：2005-10-27
申请号：US11102835
申请日：2005-04-11
IPC分类号： G03B27/52 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system comprises an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method comprises setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。
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15.发明授权公开(公告)号：US06936825B2
公开(公告)日：2005-08-30
申请号：US09754841
申请日：2001-01-03
申请人： Michael Gerhard , Nils Dieckmann , Christine Sieler , Marcus Zehetbauer , Martin Schriever , Gerd Reisinger
发明人： Michael Gerhard , Nils Dieckmann , Christine Sieler , Marcus Zehetbauer , Martin Schriever , Gerd Reisinger
IPC分类号： B08B7/00 , G03F7/20 , H01L21/027 , G01N21/01 , G01N21/51
CPC分类号： G03F7/70883 , B08B7/0057 , G03F7/7005 , G03F7/70925
摘要： UV light and a fluid are used in a process for the decontamination of microlithographic projection exposure devices with optical elements or portions thereof, in particular of the surfaces of optical elements. A second UV light source is directed for decontamination, in intervals between exposures, toward at least a portion of the optical elements.
摘要翻译： UV光和流体用于具有光学元件或其部分，特别是光学元件的表面的微光刻投影曝光装置的净化过程中。 第二UV光源被引导用于在曝光之间的间隔中朝向至少一部分光学元件的净化。
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