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公开(公告)号：US07233386B2
公开(公告)日：2007-06-19
申请号：US11102835
申请日：2005-04-11
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。
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公开(公告)号：US07570345B2
公开(公告)日：2009-08-04
申请号：US11808316
申请日：2007-06-08
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。
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公开(公告)号：US20080036982A1
公开(公告)日：2008-02-14
申请号：US11547909
申请日：2005-04-11
申请人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
发明人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
CPC分类号： G03F7/70466 , G03F7/2022 , G03F7/70258 , G03F7/70266 , G03F7/706
摘要： 1. Method for patterning a substrate using multiple exposure.2.1. The invention relates to a method for patterning a substrate using exposure processes of an adjustable optical system, a multiple exposure being used for producing a structure image on the substrate.2.2. According to the invention, for at least one of the plurality of exposures, the imaging quality of the optical system is determined by means of a respective measurement step and at least one parameter of the optical system that influences the imaging quality is set depending on this.2.3. Use e.g. for the patterning of semiconductor wafers in microlithography projection exposure apparatuses.
摘要翻译： 1.使用多次曝光来图案化衬底的方法。 2.1。 本发明涉及使用可调节光学系统的曝光工艺对衬底进行图案化的方法，多次曝光用于在衬底上产生结构图像。 2.2。 根据本发明，对于多个曝光中的至少一个，通过相应的测量步骤确定光学系统的成像质量，并且根据这一点设置影响成像质量的光学系统的至少一个参数 。 2.3。 使用例如 用于微光刻投影曝光设备中的半导体晶片的图案化。
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公开(公告)号：US20080007706A1
公开(公告)日：2008-01-10
申请号：US11808316
申请日：2007-06-08
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。
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公开(公告)号：US20050237506A1
公开(公告)日：2005-10-27
申请号：US11102835
申请日：2005-04-11
IPC分类号： G03B27/52 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system comprises an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method comprises setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。
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6.发明授权Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus 失效一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性的方法公开(公告)号：US08237915B2
公开(公告)日：2012-08-07
申请号：US12203738
申请日：2008-09-03
申请人： Paul Graeupner
发明人： Paul Graeupner
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/706 , G03F7/70891
摘要： A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
摘要翻译： 公开了一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性，例如球面像差或焦距的方法。 首先，将浸没液体引入到投影物镜的感光表面和端面之间的间隙中。 然后，例如使用布置在投影物镜的像平面中的干涉仪或CCD传感器来确定投影物镜的成像特性。 将该成像特性与目标成像特性进行比较。 最后，改变浸没液的温度，直到所确定的成像特性尽可能接近于目标成像特性。
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7.发明授权Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus 有权一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性的方法公开(公告)号：US07227616B2
公开(公告)日：2007-06-05
申请号：US11149568
申请日：2005-06-10
申请人： Paul Graeupner
发明人： Paul Graeupner
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/706 , G03F7/70891
摘要： A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
摘要翻译： 公开了一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性，例如球面像差或焦距的方法。 首先，将浸没液体引入到投影物镜的感光表面和端面之间的间隙中。 然后，例如使用布置在投影物镜的像平面中的干涉仪或CCD传感器来确定投影物镜的成像特性。 将该成像特性与目标成像特性进行比较。 最后，改变浸没液的温度，直到所确定的成像特性尽可能接近于目标成像特性。
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公开(公告)号：US08917379B2
公开(公告)日：2014-12-23
申请号：US12483733
申请日：2009-06-12
申请人： Paul Graeupner
发明人： Paul Graeupner
CPC分类号： G03F7/70091 , G03F7/70066 , G03F7/70083 , G03F7/701 , G03F7/70108 , G03F7/70116 , G03F7/70125 , G03F7/70891
摘要： Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other. The poles of the dipolar intensity distribution can each have an azimuthal width defined by a pole angle θ, and a pole area APOLE according to: 0.6
摘要翻译： 公开了投影曝光方法，系统，子系统和组件。 方法可以包括对图案的第一子图案进行第一曝光以对图像进行成像，其中第一子图案包括沿第一方向延伸的多个第一特征，并且在第二方向上以主要周期性长度P基本上周期性地间隔开 垂直于第一方向。 可以使用多极照明模式来执行第一曝光，所述多极照明模式包括至少一个基本上是偶极子强度分布，其具有两个位于基本上平行于第二方向并且彼此间隔开的极取向轴上的照明极。 偶极子强度分布的极点可以各自具有由极角度和方位角定义的方位角宽度;以及根据下式的极点面积APOLE：0.6
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9.发明授权Illumination system for illuminating a mask in a microlithographic exposure apparatus 有权用于在微光刻曝光设备中照射掩模的照明系统公开(公告)号：US08416390B2
公开(公告)日：2013-04-09
申请号：US12533756
申请日：2009-07-31
CPC分类号： G03F7/70216 , G03F7/70116 , G03F7/70158
摘要： An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.
摘要翻译： 用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。 该系统可以包括反射或透明的束偏转元件阵列，例如反射镜。 每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件可以布置在第一平面中。 该系统还可以包括光栅元件，其包括多个微透镜和/或衍射结构。 可以布置在第一平面中的光束偏转元件）和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。 光学成像系统可以将第一平面与第二平面光学共轭。
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公开(公告)号：US07352435B2
公开(公告)日：2008-04-01
申请号：US10964816
申请日：2004-10-15
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
CPC分类号： G03F7/70341 , G03F7/70333
摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译： 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。
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