Optical system and method for improving imaging properties thereof
    1.
    发明授权
    Optical system and method for improving imaging properties thereof 有权
    用于改善其成像特性的光学系统和方法

    公开(公告)号:US07605914B2

    公开(公告)日:2009-10-20

    申请号:US12348204

    申请日:2009-01-02

    IPC分类号: G01N21/00

    摘要: An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.

    摘要翻译: 光学系统具有至少两个可相对于彼此的空间关系的光学元件。 至少一个光学元件包括多个光学部件。 光学系统包括用于单独测量每个光学部件的图像缺陷的第一测量装置和用于计算多个光学部件的第一目标位置的第一计算装置,使得至少一个光学元件的整体图像缺陷低于 预定的阈值。 提供第二测量装置用于测量光学系统的整体图像缺陷,第二计算装置将所测量的整体图像缺陷表示为正交函数集的基本函数的线性组合。 第二计算装置计算用于至少两个光学元件的第二目标位置,以便减少整体图像缺陷。

    OPTICAL SYSTEM AND METHOD FOR IMPROVING IMAGING PROPERTIES THEREOF
    2.
    发明申请
    OPTICAL SYSTEM AND METHOD FOR IMPROVING IMAGING PROPERTIES THEREOF 有权
    用于改善其成像特性的光学系统和方法

    公开(公告)号:US20090225308A1

    公开(公告)日:2009-09-10

    申请号:US12348204

    申请日:2009-01-02

    IPC分类号: G01N21/958 G01N21/00

    摘要: An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.

    摘要翻译: 光学系统具有至少两个可相对于彼此的空间关系的光学元件。 至少一个光学元件包括多个光学部件。 光学系统包括用于单独测量每个光学部件的图像缺陷的第一测量装置和用于计算多个光学部件的第一目标位置的第一计算装置,使得至少一个光学元件的整体图像缺陷低于 预定的阈值。 提供第二测量装置用于测量光学系统的整体图像缺陷,第二计算装置将所测量的整体图像缺陷表示为正交函数集的基本函数的线性组合。 第二计算装置计算用于至少两个光学元件的第二目标位置,以便减少整体图像缺陷。

    Optical system and method for improving imaging properties thereof
    3.
    发明申请
    Optical system and method for improving imaging properties thereof 审中-公开
    用于改善其成像特性的光学系统和方法

    公开(公告)号:US20070071303A1

    公开(公告)日:2007-03-29

    申请号:US11238841

    申请日:2005-09-29

    IPC分类号: G06K9/00

    摘要: An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.

    摘要翻译: 光学系统具有至少两个可相对于彼此的空间关系的光学元件。 至少一个光学元件包括多个光学部件。 光学系统包括用于单独测量每个光学部件的图像缺陷的第一测量装置和用于计算多个光学部件的第一目标位置的第一计算装置,使得至少一个光学元件的整体图像缺陷低于 预定的阈值。 提供第二测量装置用于测量光学系统的整体图像缺陷,第二计算装置将所测量的整体图像缺陷表示为正交函数集的基本函数的线性组合。 第二计算装置计算用于至少两个光学元件的第二目标位置,以便减小整体图像缺陷。

    ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
    5.
    发明申请
    ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY 有权
    微观照明系统

    公开(公告)号:US20120019796A1

    公开(公告)日:2012-01-26

    申请号:US13186068

    申请日:2011-07-19

    IPC分类号: G03B27/54

    摘要: An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

    摘要翻译: 用于微光刻的照明系统用于利用一次光源的照明光照射照明场。 第一光栅布置具有束形成的第一光栅元件,其布置在照明系统的第一平面中或与该平面相邻。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将次级光源的照明光的叠加传输到照明场中。 传输光学器件具有第二光栅装置,其具有束形成第二光栅元件。 在每种情况下,第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一,用于引导整束照明光的部分束。 例如,第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件(I,II,III)。 两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型(I至III)被分配至少一个单独距离(&Dgr; I,&Dgr; II,&Dgr; III) 这种类型的第一光栅元素(I至III)和第二光栅布置的分配的第二光栅元素。 结果,获得允许特定照明参数受到影响的照明系统,使得最大程度地避免对其他照明参数的不期望的影响。

    Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements
    7.
    发明申请
    Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements 审中-公开
    用于优化至少两个光学元件的图像特性的方法以及用于优化至少三个光学元件的图像特性的方法

    公开(公告)号:US20080068599A1

    公开(公告)日:2008-03-20

    申请号:US11985674

    申请日:2007-11-16

    IPC分类号: G01N21/00

    摘要: In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.

    摘要翻译: 为了优化其中至少一个相对于至少一个固定光学元件移动的多个光学元件的图像特性,首先测量由所有光学元件的相互作用产生的整体图像缺陷。 这被表示为正交函数集的基函数的线性组合。 然后将可移动元件移动到新的测量位置,并再次测量整个图像缺陷。 在新的整体图像缺陷的线性组合表示之后,根据获得的数据计算可移动元件和静止元件的图像缺陷。 只有一个可移动光学元件可以直接计算和调整整个图像缺陷最小化的目标位置。 如果有多个可移动的光学元件可用,则给出用于有效确定各个目标位置的方法。

    Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements
    8.
    发明授权
    Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements 失效
    用于优化至少两个光学元件的图像特性的方法以及用于优化至少三个光学元件的图像特性的方法

    公开(公告)号:US07301622B2

    公开(公告)日:2007-11-27

    申请号:US11187730

    申请日:2005-07-22

    IPC分类号: G03B27/32

    摘要: In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.

    摘要翻译: 为了优化其中至少一个相对于至少一个固定光学元件移动的多个光学元件的图像特性,首先测量由所有光学元件的相互作用产生的整体图像缺陷。 这被表示为正交函数集的基函数的线性组合。 然后将可移动元件移动到新的测量位置,并再次测量整个图像缺陷。 在新的整体图像缺陷的线性组合表示之后,根据获得的数据计算可移动元件和静止元件的图像缺陷。 只有一个可移动光学元件可以直接计算和调整整个图像缺陷最小化的目标位置。 如果有多个可移动的光学元件可用,则给出用于有效确定各个目标位置的方法。

    Illumination system for microlithography
    9.
    发明授权
    Illumination system for microlithography 有权
    微光刻照明系统

    公开(公告)号:US08873023B2

    公开(公告)日:2014-10-28

    申请号:US13186068

    申请日:2011-07-19

    IPC分类号: G03B27/54 G03B27/42 G03F7/20

    摘要: An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

    摘要翻译: 用于微光刻的照明系统用于利用一次光源的照明光照射照明场。 第一光栅布置具有束形成的第一光栅元件,其布置在照明系统的第一平面中或与该平面相邻。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将次级光源的照明光的叠加传输到照明场中。 传输光学器件具有第二光栅装置,其具有束形成第二光栅元件。 在每种情况下,第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一,用于引导整束照明光的部分束。 例如,第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件(I,II,III)。 两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型(I至III)被分配至少一个单独距离(&Dgr; I,&Dgr; II,&Dgr; III) 这种类型的第一光栅元素(I至III)和第二光栅布置的分配的第二光栅元素。 结果,获得允许特定照明参数受到影响的照明系统,使得最大程度地避免对其他照明参数的不期望的影响。

    OPTICAL MEASUREMENT APPARATUS FOR A PROJECTION EXPOSURE SYSTEM
    10.
    发明申请
    OPTICAL MEASUREMENT APPARATUS FOR A PROJECTION EXPOSURE SYSTEM 审中-公开
    投影曝光系统的光学测量装置

    公开(公告)号:US20100079738A1

    公开(公告)日:2010-04-01

    申请号:US12569430

    申请日:2009-09-29

    IPC分类号: G03B27/54 G01J1/42

    CPC分类号: G03F7/70133 G03F7/706

    摘要: An optical measurement apparatus (50) for a projection exposure system (10) for microlithography includes an optical sensor (52) that measures a given property of exposure radiation (16) within the projection exposure system (10) and a data interface (66; 166) that transmits at least one value for the measured property in the form of measurement data (60) to a data receiver (72). The data receiver (72) is separated from the measurement apparatus (50) at least during the measuring operation, and is disposed outside of the measurement apparatus (50). The optical measurement apparatus has the outer form of a reticle.

    摘要翻译: 一种用于微光刻的投影曝光系统(10)的光学测量装置(50)包括测量投影曝光系统(10)内的曝光辐射(16)的给定特性的光学传感器(52)和数据接口(66; 166),其将测量数据(60)形式的测量属性的至少一个值发送到数据接收器(72)。 数据接收器(72)至少在测量操作期间与测量装置(50)分离,并且设置在测量装置(50)的外部。 光学测量装置具有光罩的外形。