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    Optical system and method for improving imaging properties thereof
    1.
    发明授权
    Optical system and method for improving imaging properties thereof 有权
    用于改善其成像特性的光学系统和方法

    公开(公告)号：US07605914B2

    公开(公告)日：2009-10-20

    申请号：US12348204

    申请日：2009-01-02

    Applicant: Thomas Stammler ,  Christian Wagner ,  Gerd Reisinger

    Inventor： Thomas Stammler ,  Christian Wagner ,  Gerd Reisinger

    IPC: G01N21/00

    CPC classification number: G03F7/70258 ,  G03F7/705 ,  G03F7/706

    Abstract: An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.

    Abstract translation: 光学系统具有至少两个可相对于彼此的空间关系的光学元件。 至少一个光学元件包括多个光学部件。 光学系统包括用于单独测量每个光学部件的图像缺陷的第一测量装置和用于计算多个光学部件的第一目标位置的第一计算装置，使得至少一个光学元件的整体图像缺陷低于 预定的阈值。 提供第二测量装置用于测量光学系统的整体图像缺陷，第二计算装置将所测量的整体图像缺陷表示为正交函数集的基本函数的线性组合。 第二计算装置计算用于至少两个光学元件的第二目标位置，以便减少整体图像缺陷。

    OPTICAL SYSTEM AND METHOD FOR IMPROVING IMAGING PROPERTIES THEREOF
    2.
    发明申请
    OPTICAL SYSTEM AND METHOD FOR IMPROVING IMAGING PROPERTIES THEREOF 有权
    用于改善其成像特性的光学系统和方法

    公开(公告)号：US20090225308A1

    公开(公告)日：2009-09-10

    申请号：US12348204

    申请日：2009-01-02

    Applicant: Thomas Stammler ,  Christian Wagner ,  Gerd Reisinger

    Inventor： Thomas Stammler ,  Christian Wagner ,  Gerd Reisinger

    IPC: G01N21/958 ,  G01N21/00

    CPC classification number: G03F7/70258 ,  G03F7/705 ,  G03F7/706

    Abstract: An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.

    Abstract translation: 光学系统具有至少两个可相对于彼此的空间关系的光学元件。 至少一个光学元件包括多个光学部件。 光学系统包括用于单独测量每个光学部件的图像缺陷的第一测量装置和用于计算多个光学部件的第一目标位置的第一计算装置，使得至少一个光学元件的整体图像缺陷低于 预定的阈值。 提供第二测量装置用于测量光学系统的整体图像缺陷，第二计算装置将所测量的整体图像缺陷表示为正交函数集的基本函数的线性组合。 第二计算装置计算用于至少两个光学元件的第二目标位置，以便减少整体图像缺陷。

    Optical system and method for improving imaging properties thereof
    3.
    发明申请
    Optical system and method for improving imaging properties thereof 审中-公开
    用于改善其成像特性的光学系统和方法

    公开(公告)号：US20070071303A1

    公开(公告)日：2007-03-29

    申请号：US11238841

    申请日：2005-09-29

    Applicant: Thomas Stammler ,  Christian Wagner ,  Gerd Reisinger

    Inventor： Thomas Stammler ,  Christian Wagner ,  Gerd Reisinger

    IPC: G06K9/00

    CPC classification number: G03F7/70258 ,  G03F7/705 ,  G03F7/706

    Abstract: An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.

    Abstract translation: 光学系统具有至少两个可相对于彼此的空间关系的光学元件。 至少一个光学元件包括多个光学部件。 光学系统包括用于单独测量每个光学部件的图像缺陷的第一测量装置和用于计算多个光学部件的第一目标位置的第一计算装置，使得至少一个光学元件的整体图像缺陷低于 预定的阈值。 提供第二测量装置用于测量光学系统的整体图像缺陷，第二计算装置将所测量的整体图像缺陷表示为正交函数集的基本函数的线性组合。 第二计算装置计算用于至少两个光学元件的第二目标位置，以便减小整体图像缺陷。

    RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
    4.
    发明申请
    RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
    辐射源和光刻设备

    公开(公告)号：US20140218706A1

    公开(公告)日：2014-08-07

    申请号：US14241370

    申请日：2012-07-27

    Applicant: Christian Wagner ,  Erik Roelof Loopstra

    Inventor： Christian Wagner ,  Erik Roelof Loopstra

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70058 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/08009 ,  H01S3/0804 ,  H01S3/08059 ,  H01S3/105 ,  H01S3/123 ,  H01S3/2232 ,  H05G2/006 ,  H05G2/008

    Abstract: A radiation source comprises a nozzle configured to direct a stream of fuel droplets (400) along a trajectory towards a plasma formation location and a laser configured to direct laser radiation to the plasma formation location to convert the fuel droplets at the plasma formation location into a plasma. The laser comprises an amplifier (310, 320) and an optical element (500) configured to define a divergent beam path for radiation passing through the amplifier.

    Abstract translation: 辐射源包括喷嘴，其构造成沿着等离子体形成位置的轨迹引导燃料液滴流（400），并且配置成将激光辐射引导到等离子体形成位置以将等离子体形成位置处的燃料液滴转换成等离子体形成位置 等离子体。 激光器包括放大器（310,320）和光学元件（500），其被配置为限定用于通过放大器的辐射的发散光束路径。

    Neck block cooling
    5.
    发明授权
    Neck block cooling 有权
    颈部冷却

    公开(公告)号：US08002540B2

    公开(公告)日：2011-08-23

    申请号：US12223565

    申请日：2006-11-28

    Applicant: Witold Neter ,  Marek Hoenisch ,  Klaus Wegmann ,  Stefan Schweininger ,  Christian Wagner

    Inventor： Witold Neter ,  Marek Hoenisch ,  Klaus Wegmann ,  Stefan Schweininger ,  Christian Wagner

    IPC: B29C45/73

    CPC classification number: B29C45/7312 ,  B29C33/04 ,  B29C45/33 ,  B29C2033/042 ,  B29K2105/253

    Abstract: A neck block of a molding tool for the production of a hollow body preform by means of injection molding, wherein the neck block has a main body with a shaping surface which is adapted to the external contour of a neck portion of the hollow body preform to be produced and is provided to come into contact in the injection molding operation with the neck portion of the hollow body preform, wherein furthermore there is provided at least one cooling passage for a cooling fluid which at least portion-wise extends substantially parallel to the shaping surface. The neck block is further provided with an inlet and an outlet and an inlet passage and an outlet passage which connect the inlet and the outlet respectively to the cooling passage. The cooling passage is arranged closer to the shaping surface than the inlet and the outlet. The cooling passage has at least one portion which extends substantially parallel to the shaping surface and which extends within the main body so that the walls thereof are formed by the main body, and a connecting portion which adjoins said portion and the walls of which are formed in part by the main body and in part by a closure element fitted onto the main body.

    Abstract translation: 一种用于通过注射成型生产中空体预制件的模制工具的颈部块，其中颈部块具有主体，该主体具有适于中空体预制件的颈部的外部轮廓的成形表面， 被制造并且在注射成型操作中与中空本体预制件的颈部接触，此外还设置有至少一个用于冷却流体的冷却通道，该冷却通道至少部分地基本上平行于成形 表面。 颈部还设置有入口和出口以及将入口和出口分别连接到冷却通道的入口通道和出口通道。 冷却通道布置成比入口和出口更靠近成形表面。 冷却通道具有至少一部分，其基本上平行于成形表面延伸并且在主体内延伸，使得其壁由主体形成，并且连接部分邻接所述部分和壁的形成 部分地由主体部分地由安装在主体上的封闭元件构成。

    Neck Block Cooling
    6.
    发明申请
    Neck Block Cooling 有权
    颈部冷却

    公开(公告)号：US20090162473A1

    公开(公告)日：2009-06-25

    申请号：US12223565

    申请日：2006-11-28

    Applicant: Witold Neter ,  Marek Hoenisch ,  Klaus Wegmann ,  Stefan Schweininger ,  Christian Wagner

    Inventor： Witold Neter ,  Marek Hoenisch ,  Klaus Wegmann ,  Stefan Schweininger ,  Christian Wagner

    IPC: B29C45/17

    CPC classification number: B29C45/7312 ,  B29C33/04 ,  B29C45/33 ,  B29C2033/042 ,  B29K2105/253

    Abstract: A neck block of a moulding tool for the production of a hollow body preform by means of injection moulding, wherein the neck block has a main body with a shaping surface which is adapted to the external contour of a neck portion of the hollow body preform to be produced and is provided to come into contact in the injection moulding operation with the neck portion of the hollow body preform, wherein furthermore there is provided at least one cooling passage for a cooling fluid which at least portion-wise extends substantially parallel to the shaping surface. The neck block is further provided with an inlet and an outlet and an inlet passage and an outlet passage which connect the inlet and the outlet respectively to the cooling passage. The cooling passage is arranged closer to the shaping surface than the inlet and the outlet. The cooling passage has at least one portion which extends substantially parallel to the shaping surface and which extends within the main body so that the walls thereof are formed by the main body, and a connecting portion which adjoins said portion and the walls of which are formed in part by the main body and in part by a closure element fitted onto the main body.

    Abstract translation: 一种用于通过注射成型生产中空体预制件的模制工具的颈部块，其中颈部块具有主体，该主体具有适于中空体预制件的颈部的外部轮廓的成形表面， 被制造并且在注射成型操作中与中空本体预制件的颈部接触，此外还设置有至少一个用于冷却流体的冷却通道，该冷却通道至少部分地基本上平行于成形 表面。 颈部还设置有入口和出口以及将入口和出口分别连接到冷却通道的入口通道和出口通道。 冷却通道布置成比入口和出口更靠近成形表面。 冷却通道具有至少一部分，其基本上平行于成形表面延伸并且在主体内延伸，使得其壁由主体形成，并且连接部分邻接所述部分和壁的形成 部分地由主体部分地由安装在主体上的封闭元件构成。

    OPTICAL ARRANGEMENT AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH PASSIVE THERMAL COMPENSATION
    8.
    发明申请
    OPTICAL ARRANGEMENT AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH PASSIVE THERMAL COMPENSATION 审中-公开
    具有被动热补偿的微电脑的光学布置和投影曝光系统

    公开(公告)号：US20080212052A1

    公开(公告)日：2008-09-04

    申请号：US12119693

    申请日：2008-05-13

    Applicant: Christian Wagner ,  Michael Trunz ,  Ralf Hilgers

    Inventor： Christian Wagner ,  Michael Trunz ,  Ralf Hilgers

    IPC: G03B27/52

    CPC classification number: G03F7/70825 ,  G02B7/028 ,  G03F7/70108 ,  G03F7/70241 ,  G03F7/70358

    Abstract: An optical arrangement with a light source includes an optical element that is fastened in a mount. The light source emits radiation and the optical element is acted on thereby such that the heat that results lacks symmetry corresponding to the shape of the optical element. A connecting structure is provided between the optical element and the mount and has a symmetry that does not correspond to the shape of the optical element and effects an at least partial homogenization of the temperature distribution in the optical element.

    Abstract translation: 具有光源的光学装置包括紧固在安装座中的光学元件。 光源发射辐射，并且光学元件被作用在其上，使得导致对应于光学元件的形状的对称性的热量。 在光学元件和安装座之间提供了连接结构，并且具有与光学元件的形状不对应的对称性，并且使光学元件中的温度分布至少部分均匀化。

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