公开(公告)号：US20060256313A1

公开(公告)日：2006-11-16

申请号：US11405016

申请日：2006-04-17

申请人： Kerstin Renner ,  Christoph Nolscher ,  Thomas Muelders

发明人： Kerstin Renner ,  Christoph Nolscher ,  Thomas Muelders

IPC分类号： G03B27/54

CPC分类号： G03F7/70125

摘要： The imaging device has, in the illumination pupil region, an illumination distribution characterized by dipole-like light distributions along a straight line. The imaging device makes it possible to image different types of structures from a photomask simultaneously with a significantly better process window than conventional imaging devices.

摘要翻译： 在照明光瞳区域中，成像装置具有沿着直线以偶极子状的光分布为特征的照明分布。 成像装置使得可以以比传统成像装置更好的处理窗口同时将不同类型的结构与光掩模成像。

公开(公告)号：US20050243435A1

公开(公告)日：2005-11-03

申请号：US11061574

申请日：2005-05-12

申请人： Christoph Zaczek ,  Thomas Muelders

发明人： Christoph Zaczek ,  Thomas Muelders

IPC分类号： G02B17/08 ,  G02B27/28 ,  G03F7/20 ,  G02B3/00

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G02B27/283 ,  G03F7/70225

摘要： A catadioptric projection objective having a catadioptric lens section and a dioptric lens section is disclosed. Its catadioptric lens section comprises a concave mirror and a beam-deflecting device, which, in the case of one embodiment, comprises a physical beamsplitter having a polarization-beamsplitting surface, followed by a deflecting mirror. The reflectance curve of that beamsplitting surface for s-polarized light, the transmittance, TPBS, of that beamsplitting surface for p-polarized light, and the reflectance of the deflecting mirror for light coming from the beamsplitter are adapted to suit one another such that large variations in that transmittance, TPBS, for incidence angles close to the beamsplitting coating's internal Brewster angle are compensated such that the total transmittance of the beam-deflecting device remains essentially constant over the entire utilized range of incidence angles. The resultant projection objective allows uniformly illuminating the image field, without incidence of apodization effects.

摘要翻译： 公开了一种具有反射折射透镜部分和屈光透镜部分的反射折射投射物镜。 其反射折射透镜部分包括凹面镜和光束偏转装置，其在一个实施例的情况下包括具有偏振分束面的物理分束器，随后是偏转镜。 用于p偏振光的该分束表面的s偏振光的分束面的反射率曲线，透射率，以及偏转的反射率 用于来自分束器的光的反射镜适于彼此适应，使得该透射率的较大变化，以及接近分束涂层的内部布鲁斯特角的入射角 被补偿，使得光束偏转装置的总透射率在整个使用的入射角范围内保持基本恒定。 所得到的投影物镜允许均匀地照射图像场，而不会产生变迹效应。

公开(公告)号：US07855776B2

公开(公告)日：2010-12-21

申请号：US12056060

申请日：2008-03-26

申请人： Bernd Kuechler ,  Rainer Pforr ,  Thomas Muelders

发明人： Bernd Kuechler ,  Rainer Pforr ,  Thomas Muelders

IPC分类号： G03B27/68

CPC分类号： G03F7/70891 ,  G03F1/36 ,  G03F1/50 ,  G03F7/70433

摘要： Embodiments relate to compensating for lens heating, lithographic projection system and photo mask. Accordingly, lens heating is compensated by providing a layout pattern including a regular pattern being arranged substantially symmetrical in a first region and a sub-resolution pattern including a plurality of sub-resolution structural elements, wherein the sub-resolution pattern in a second region, so as to minimize non-homogenous lens heating of a projection apparatus in case of a lithographic projection.

摘要翻译： 实施例涉及补偿透镜加热，光刻投影系统和光掩模。 因此，通过提供包括在第一区域中基本对称布置的规则图案和包括多个子分辨率结构元件的子分辨率图案的布局图案来补偿透镜加热，其中在第二区域中的子分辨率图案， 以便在光刻投影的情况下使投影装置的非均匀透镜加热最小化。