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    Catadioptric reduction objective having a polarization beamsplitter
    1.
    发明申请
    Catadioptric reduction objective having a polarization beamsplitter 审中-公开
    反折射减光物镜具有偏振分束器

    公开(公告)号：US20050243435A1

    公开(公告)日：2005-11-03

    申请号：US11061574

    申请日：2005-05-12

    申请人： Christoph Zaczek ,  Thomas Muelders

    发明人： Christoph Zaczek ,  Thomas Muelders

    IPC分类号： G02B17/08 ,  G02B27/28 ,  G03F7/20 ,  G02B3/00

    CPC分类号： G02B17/0892 ,  G02B17/08 ,  G02B27/283 ,  G03F7/70225

    摘要： A catadioptric projection objective having a catadioptric lens section and a dioptric lens section is disclosed. Its catadioptric lens section comprises a concave mirror and a beam-deflecting device, which, in the case of one embodiment, comprises a physical beamsplitter having a polarization-beamsplitting surface, followed by a deflecting mirror. The reflectance curve of that beamsplitting surface for s-polarized light, the transmittance, TPBS, of that beamsplitting surface for p-polarized light, and the reflectance of the deflecting mirror for light coming from the beamsplitter are adapted to suit one another such that large variations in that transmittance, TPBS, for incidence angles close to the beamsplitting coating's internal Brewster angle are compensated such that the total transmittance of the beam-deflecting device remains essentially constant over the entire utilized range of incidence angles. The resultant projection objective allows uniformly illuminating the image field, without incidence of apodization effects.

    摘要翻译： 公开了一种具有反射折射透镜部分和屈光透镜部分的反射折射投射物镜。 其反射折射透镜部分包括凹面镜和光束偏转装置，其在一个实施例的情况下包括具有偏振分束面的物理分束器，随后是偏转镜。 用于p偏振光的该分束表面的s偏振光的分束面的反射率曲线，透射率，以及偏转的反射率 用于来自分束器的光的反射镜适于彼此适应，使得该透射率的较大变化，以及接近分束涂层的内部布鲁斯特角的入射角 被补偿，使得光束偏转装置的总透射率在整个使用的入射角范围内保持基本恒定。 所得到的投影物镜允许均匀地照射图像场，而不会产生变迹效应。

    Method for making an optical system with coated optical components and optical system made by the method
    2.
    发明申请
    Method for making an optical system with coated optical components and optical system made by the method 审中-公开
    用该方法制造具有涂层光学部件和光学系统的光学系统的方法

    公开(公告)号：US20060132917A1

    公开(公告)日：2006-06-22

    申请号：US11274152

    申请日：2005-11-16

    申请人： Christoph Zaczek ,  Thomas Muelders ,  Toralf Gruner

    发明人： Christoph Zaczek ,  Thomas Muelders ,  Toralf Gruner

    IPC分类号： G02B27/28

    CPC分类号： G03F7/70958 ,  G02B27/0012 ,  G02B27/283 ,  G03F7/705

    摘要： In a method for making an optical system for imaging a radiation distribution from an input surface of the optical system into an output surface of the optical system, the optical system has a multiplicity of optical components which determine an imaging quality of the optical system, which are arranged along an optical axis of the optical system and comprise at least one optical component which has a substrate with a substrate surface which is provided for carrying an interference layer system having a layer construction that determines the optical properties of the optical component covered with the interference layer system. The method includes: predefining an optimization target for at least one imaging quality parameter that represents the imaging quality of the system; determining the imaging quality of the optical system while taking account of the layer construction of the interference layer system; and varying the layer construction for approximating the imaging quality parameter to the optimization target. In accordance with the method, the determination of the optimum layer construction is coupled directly with an assessment and of the imaging quality of the total system including the interference layer system to be optimized.

    摘要翻译： 在制造用于将从光学系统的输入表面的辐射分布成像到光学系统的输出表面的光学系统的方法中，光学系统具有多个光学部件，其确定光学系统的成像质量， 沿着光学系统的光轴布置并且包括至少一个光学部件，该光学部件具有衬底，该衬底具有衬底表面，衬底表面被提供用于承载具有层结构的干涉层系统，所述层结构决定了被覆盖的光学部件的光学特性 干涉层系统。 该方法包括：为表示系统的成像质量的至少一个成像质量参数预定义优化目标; 在考虑到干涉层系统的层结构的同时确定光学系统的成像质量; 并且改变用于将成像质量参数近似到优化目标的层结构。 根据该方法，最佳层结构的确定直接与包括要优化的干涉层系统的总体系统的评估和成像质量相耦合。

    Projection Exposure System and Projection Exposure Method
    8.
    发明申请
    Projection Exposure System and Projection Exposure Method 有权
    投影曝光系统和投影曝光方法

    公开(公告)号：US20130182234A1

    公开(公告)日：2013-07-18

    申请号：US13786134

    申请日：2013-03-05

    申请人： Paul Graupner ,  Olaf Conradi ,  Christoph Zaczek ,  Wilhelm Ulrich ,  Helmut Beierl ,  Toralf Gruner ,  Volker Graeschus

    发明人： Paul Graupner ,  Olaf Conradi ,  Christoph Zaczek ,  Wilhelm Ulrich ,  Helmut Beierl ,  Toralf Gruner ,  Volker Graeschus

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70191 ,  G03F7/70308

    摘要： A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.

    摘要翻译： 投影曝光系统包括被配置为用辐射照射掩模的照明系统。 投影曝光系统还包括被配置为将掩模的图案的图像投影到辐射敏感基板上的投影物镜。 投影曝光系统还包括在物镜表面光学下游的投影光束路径中布置在投影物镜的场表面处或其附近的角度选择滤光器装置。 角度选择滤波器装置可以根据角度选择滤波器功能对入射到滤波器装置上的辐射进行滤波。

    CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE
    9.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE 审中-公开
    反射光学元件和测量装置的目标投影目标

    公开(公告)号：US20120218536A1

    公开(公告)日：2012-08-30

    申请号：US13423344

    申请日：2012-03-19

    申请人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

    发明人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70258 ,  G02B13/143 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/706

    摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

    摘要翻译： 用于通过成像辐射将物体场映射到图像场上的反射折射投影物镜。 投影物镜包括至少一个反射光学部件和测量装置。 在投影物镜的操作期间，反射光学部件反射成像辐射的第一部分并透射成像辐射的第二部分。 成像辐射的反射的第一部分至少部分地有助于对象场的成像。 成像辐射的透射的第二部分至少部分地被馈送到测量装置。 这允许在成像辐射的图像位置处的感光层同时曝光并借助测量装置监测成像辐射。

    OPTICAL ELEMENT FOR REFLECTION OF UV RADIATION, METHOD FOR MANUFACTURING THE SAME AND PROJECTION EXPOSURE APPARATUS COMPRISING THE SAME
    10.
    发明申请
    OPTICAL ELEMENT FOR REFLECTION OF UV RADIATION, METHOD FOR MANUFACTURING THE SAME AND PROJECTION EXPOSURE APPARATUS COMPRISING THE SAME 有权
    用于反射紫外线辐射的光学元件，其制造方法和包括其的投影曝光装置

    公开(公告)号：US20100290021A1

    公开(公告)日：2010-11-18

    申请号：US12780035

    申请日：2010-05-14

    申请人： Alexandra PAZIDIS ,  Christoph Zaczek ,  Horst Feldermann ,  Peter Huber

    发明人： Alexandra PAZIDIS ,  Christoph Zaczek ,  Horst Feldermann ,  Peter Huber

    IPC分类号： G03B27/54 ,  G02B5/30 ,  B05D5/06 ,  C23C14/34 ,  C23C14/35 ,  C23C16/513

    CPC分类号： G02B5/0891 ,  G02B5/0833 ,  G03F7/70316 ,  G03F7/70958

    摘要： An optical element (1a, 1b) for reflecting UV radiation at an operating wavelength below 250 nm, preferably at 193 nm, which has a substrate (2a, 2b), a reflective layer (3a, 3b) made of aluminum superimposed on the substrate (2a, 2b). The reflective aluminum layer (3a, 3b) is not transparent to UV radiation and is (111)-plane oriented. The reflective optical element (1a, 1b) has a reflectivity of more than 85%, preferably of more than 88%, and even more preferably of more than 92%, in a range of incident angles of at least 10°, preferably of at least 15°, at the operating wavelength. Also disclosed is an optical element having a reflective layer made from a material having a melting point higher than that of aluminum, as well as methods for producing such optical elements, and optical arrangements incorporating such optical elements.

    摘要翻译： 一种用于在工作波长低于250nm（优选193nm）下反射UV辐射的光学元件（1a，1b），其具有衬底（2a，2b），叠加在衬底上的由铝制成的反射层（3a，3b） （2a，2b）。 反射铝层（3a，3b）对于紫外线辐射是不透明的，并且是（111）平面取向的。 反射光学元件（1a，1b）在入射角至少为10°的范围内具有大于85％，优选大于88％，甚至更优选大于92％的反射率，优选地为 至少15°，在工作波长。 还公开了具有由熔点高于铝的材料制成的反射层的光学元件，以及用于制造这种光学元件的方法，以及包括这种光学元件的光学装置。