公开(公告)号：US20060257070A1

公开(公告)日：2006-11-16

申请号：US11413603

申请日：2006-04-28

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02B6/26

CPC classification number: G02B26/001

Abstract: An optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.

Abstract translation: 描述光学干涉显示单元。 第一电极和牺牲层依次形成在透明基板上，并且在第一电极和牺牲层中形成至少两个开口以限定光学干涉显示单元的位置。 在每个开口中形成绝缘的耐热无机支撑体。 在牺牲层和支撑体上形成第二电极。 最后，使用远程等离子体蚀刻工艺来去除牺牲层。

公开(公告)号：US20060082707A1

公开(公告)日：2006-04-20

申请号：US11296949

申请日：2005-12-07

Applicant: Wen-Chung Tang ,  Yao Peng ,  Hung-Huei Hsu ,  Wen-Jian Lin

Inventor： Wen-Chung Tang ,  Yao Peng ,  Hung-Huei Hsu ,  Wen-Jian Lin

IPC: G02F1/1335

CPC classification number: G02F1/133553 ,  G02F1/133555

Abstract: The method for fabricating reflector plate for a reflective liquid crystal display and the device is disclosed. The present invention includes the formation of a protection layer over the glass substrate having thin film transistors and a layer of transparent electrodes on top, followed by the formation of a layer of undulating resin over the protection layer. If the reflector plate to be produced is a semi-transmissive type, a light-transmitting region is created over the protection layer. Since the protection layer is created in advance of the undulating resin outgrowth, the present method can effectively prevent reflection from the exposure stage during the lithography process, thus the problem of abnormal pattern marks occurring on the reflective surface can be avoided, and the exposure time and the production yield are enhanced.

Abstract translation: 公开了用于制造反射型液晶显示器的反射板的方法及其装置。 本发明包括在具有薄膜晶体管的玻璃基板上形成保护层，在顶部形成一层透明电极，然后在保护层上形成起伏的树脂层。 如果要制造的反射板是半透射型的，则在保护层上形成透光区域。 由于保护层是在起伏的树脂生长之前产生的，所以本发明的方法可以有效地防止在光刻工艺期间从曝光阶段的反射，从而可以避免在反射表面上出现异常图案标记的问题，并且曝光时间 提高了产量。

公开(公告)号：US06999225B2

公开(公告)日：2006-02-14

申请号：US10807142

申请日：2004-03-24

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02B26/00

CPC classification number: G02B7/00 ,  G02B26/001

Abstract: An optical interference display panel is disclosed that has a substrate, an optical interference reflection structure, and a protection structure. The optical interference reflection structure has many color-changeable pixels and is formed on the substrate. The protection structure is adhered to the substrate with an adhesive and encloses the optical interference reflection structure between the substrate and the protection structure. The adhesive is used to hermetically isolate the optical interference reflection structure from water, dust and oxygen in the air. Moreover, the protection structure prevents the interference reflection structure from being damaged by an external force.

Abstract translation: 公开了具有基板，光学干涉反射结构和保护结构的光学干涉显示面板。 光学干涉反射结构具有许多可变色像素并形成在基板上。 保护结构用粘合剂粘附到基底上，并包围基片和保护结构之间的光学干涉反射结构。 粘合剂用于将光学干涉反射结构与空气中的水，灰尘和氧气密封隔离。 此外，保护结构防止干涉反射结构被外力损坏。

公开(公告)号：US06980350B2

公开(公告)日：2005-12-27

申请号：US10873014

申请日：2004-06-21

Applicant: Po-Chung Hung ,  Hsiung-Kuang Tsai ,  Wen-Jian Lin

Inventor： Po-Chung Hung ,  Hsiung-Kuang Tsai ,  Wen-Jian Lin

IPC: G02B26/00 ,  G02F1/03 ,  G02F1/1335 ,  G09G3/34 ,  H01L21/76

CPC classification number: G02B26/001 ,  G02F1/21 ,  G09G3/3466 ,  G09G2330/08

Abstract: An optical interference reflective element has a light-incident electrode and a light-reflective electrode, and each or both of the two electrodes are made of a display part and a wiring part which are electrically connected to each other with a connection part. A plurality of the interference reflective elements are connected to form an electrode line by the wiring parts, and the electrode line is used in an optical interference reflective structure formed by the optical interference reflective elements that is operated in a passive matrix mode.

Abstract translation: 光干涉反射元件具有光入射电极和光反射电极，并且两个电极中的每一个或两个由显示部分和布线部分组成，所述显示部分和布线部分通过连接部分彼此电连接。 多个干涉反射元件被连接以通过布线部分形成电极线，并且电极线用于由以无源矩阵模式操作的光学干涉反射元件形成的光学干涉反射结构。

公开(公告)号：US20050195462A1

公开(公告)日：2005-09-08

申请号：US10884555

申请日：2004-07-02

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02B26/00 ,  G02B26/08 ,  G02F1/1345 ,  G09F9/30

CPC classification number: G02B26/001

Abstract: An optical interference display plate has a substrate, a protection structure, a plurality of color-changeable pixels and a plurality of supports. The color-changeable pixels are located on the substrate. The protection structure encloses the color-changeable pixels such that a gap is maintained between it and the substrate. The supports are located between the color-changeable pixels and the protection structure, and ends thereof are higher than the color-changeable pixels for preventing the color-changeable pixels from being damaged by a deformation of the protection structure.

Abstract translation: 光学干涉显示板具有基板，保护结构，多个可变色像素和多个支撑。 可变色像素位于基板上。 保护结构包围可变色像素，使得它与衬底之间保持间隙。 支撑件位于可变色像素和保护结构之间，其端部高于可变色像素，以防止可变色像素被保护结构的变形损坏。

公开(公告)号：US20050168849A1

公开(公告)日：2005-08-04

申请号：US11069938

申请日：2005-03-03

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02F1/1343 ,  B81B3/00 ,  B81C1/00 ,  G02B5/20 ,  G02B5/28 ,  G02B26/00 ,  G02B5/08 ,  G02B7/182

CPC classification number: G02B26/001 ,  B81B2201/047 ,  B81C1/00182 ,  G02B5/201 ,  G02B5/284

Abstract: An interference display unit with a first electrode, a second electrode and posts located between the two electrodes is provided. The characteristic of the interference display unit is that the second electrode's stress is released through a thermal process. The position of the second electrode is shifted and the distance between the first electrode and the second electrode is therefore defined. A method for fabricating the structure described as follow. A first electrode and a sacrificial layer are sequentially formed on a substrate and at least two openings are formed in the first electrode and the sacrificial layer. A supporter is formed in the opening and the supporter may have at least one arm on the top portion of the supporter. A second electrode is formed on the sacrificial layer and the supporter and a thermal process is performed. Finally, The sacrificial layer is removed.

Abstract translation: 提供具有位于两个电极之间的第一电极，第二电极和支柱的干涉显示单元。 干涉显示单元的特征是通过热处理释放第二电极的应力。 第二电极的位置偏移，因此限定第一电极和第二电极之间的距离。 一种制造如下结构的方法。 第一电极和牺牲层依次形成在基板上，并且在第一电极和牺牲层中形成至少两个开口。 支撑件形成在开口中，并且支撑件可以在支撑件的顶部上具有至少一个臂。 在牺牲层和支撑体上形成第二电极，并进行热处理。 最后，牺牲层被去除。

公开(公告)号：US06882458B2

公开(公告)日：2005-04-19

申请号：US10742062

申请日：2003-12-20

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02F1/1335 ,  G02B5/20 ,  G02B5/28 ,  G02B26/00 ,  G02F1/19 ,  G02F1/03

CPC classification number: G02B5/284 ,  B81B2201/047 ,  B81C1/00182 ,  G02B5/201 ,  G02B26/001

Abstract: A structure of an interference display cell is provided. The cell comprises a first plate and a second plate, wherein a support is located between the first plate and the second plate. The second plate is a deformable and reflective plate. An incident light from one side of the first plate is modulated and only specific frequency light reflects by the second plate. The frequency of the reflected light is related to the distance between the first plate and the second plate. The support has at least one arm. The arm's stress makes the arm hiking upward or downward. The distance between the first plate and the second plate is also changed. Therefore, the frequency of the reflected light is altered.

Abstract translation: 提供了一种干涉显示单元的结构。 电池包括第一板和第二板，其中支撑件位于第一板和第二板之间。 第二板是可变形和反射板。 来自第一板的一侧的入射光被调制，并且只有特定的频率光被第二板反射。 反射光的频率与第一板和第二板之间的距离有关。 支架至少有一只手臂。 手臂的压力使得手臂向上或向下移动。 第一板和第二板之间的距离也改变。 因此，反射光的频率被改变。

公开(公告)号：US06870654B2

公开(公告)日：2005-03-22

申请号：US10725585

申请日：2003-12-03

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02B26/02 ,  B81B3/00 ,  B81C1/00 ,  G02B26/00 ,  G02F1/03 ,  H01L21/8242

CPC classification number: G02B26/001

Abstract: A structure of a structure release and a manufacturing method are provided. The structure and manufacturing method are adapted for an interference display cell. The structure of the interference display cell includes a first electrode, a second electrode and at least one supporter. The second electrode has at least one hole and is arranged about parallel with the first electrode. The supporter is located between the first electrode and the second electrode and a cavity is formed. In the release etch process of manufacturing the structure, an etchant can pass through the hole to etch a sacrificial layer between the first and the second electrodes to form the cavity; therefore, the time needed for the process becomes shorter.

Abstract translation: 提供了结构释放的结构和制造方法。 该结构和制造方法适用于干涉显示单元。 干涉显示单元的结构包括第一电极，第二电极和至少一个支撑件。 第二电极具有至少一个孔并且与第一电极大致平行地布置。 支撑件位于第一电极和第二电极之间，并且形成空腔。 在制造结构的释放蚀刻工艺中，蚀刻剂可以穿过该孔以蚀刻第一和第二电极之间的牺牲层以形成空腔; 因此，该过程所需的时间变短。

公开(公告)号：US20050003667A1

公开(公告)日：2005-01-06

申请号：US10796997

申请日：2004-03-11

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: B81B7/00 ,  B81C1/00 ,  G02B26/00 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/461

CPC classification number: G02B26/001

Abstract: A method for fabricating an optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.

Abstract translation: 描述了制造光学干涉显示单元的方法。 第一电极和牺牲层依次形成在透明基板上，并且在第一电极和牺牲层中形成至少两个开口以限定光学干涉显示单元的位置。 在每个开口中形成绝缘的耐热无机支撑体。 在牺牲层和支撑体上形成第二电极。 最后，使用远程等离子体蚀刻工艺来去除牺牲层。

公开(公告)号：US06788363B2

公开(公告)日：2004-09-07

申请号：US10095144

申请日：2002-03-11

Applicant: Hong-Da Liu ,  Hung-Huei Hsu ,  Wen-Chung Tang ,  Wen-Jian Lin

Inventor： Hong-Da Liu ,  Hung-Huei Hsu ,  Wen-Chung Tang ,  Wen-Jian Lin

IPC: G02F11335

CPC classification number: G02F1/133553

Abstract: A reflector structure in a multi-domain liquid crystal display comprises an active matrix device structure having regions of various height levels, a diffusing layer, and a structure of multi-domain reflective layer. The diffusing layer is formed above the active matrix device structure with multiple extruded bumps of various film thickness and various heights and shapes. The reflector structure has various reflective angles and reflective effects to improve the quality of LCD panel. It can be used in the reflective layer of a reflective or semi-reflective TN, STN, TFT, or TFD. The reflector fabrication process uses conventional process for a metal or an insulation layer on a TFT substrate to form multiple domains within a pixel area. After forming the cell structure of the multi-domain reflective layer, liquid crystal cells form multiple domains within a pixel area.

Abstract translation: 多域液晶显示器中的反射器结构包括具有各种高度级别的区域的有源矩阵器件结构，漫射层和多畴反射层的结构。 扩散层形成在有源矩阵器件结构之上，具有各种膜厚度和各种高度和形状的多个挤压凸块。 反射器结构具有各种反射角度和反射效果，以提高LCD面板的质量。 它可用于反射或半反射TN，STN，TFT或TFD的反射层。 反射器制造方法使用常规方法在TFT基板上的金属或绝缘层，以在像素区域内形成多个畴。 在形成多畴反射层的单元结构之后，液晶单元在像素区域内形成多个畴。