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公开(公告)号:US20100304025A1
公开(公告)日:2010-12-02
申请号:US12770175
申请日:2010-04-29
申请人: Min-Jeong Hwang , You-Min Cha , Won-Seok Cho , Jae-Mork Park , Jae-Wan Park , Jae-Hong Ahn
发明人: Min-Jeong Hwang , You-Min Cha , Won-Seok Cho , Jae-Mork Park , Jae-Wan Park , Jae-Hong Ahn
CPC分类号: C23C16/54 , C23C14/568
摘要: A deposition apparatus including a plurality of reaction chambers, and a method of controlling the deposition apparatus. The deposition apparatus includes a first chamber to deposit a first deposition material onto a deposition body, a second chamber to deposit a second and different deposition material onto the deposition body, a third chamber to deposit the first deposition material onto the deposition body, a transfer chamber connected to the first through third chambers, the transfer chamber to transfer the deposition body to ones of the first through third chambers and a control unit to transport the deposition body from the transfer chamber to ones of the first through third chambers.
摘要翻译: 包括多个反应室的沉积设备以及控制该沉积设备的方法。 沉积装置包括:第一室,用于将第一沉积材料沉积到沉积体上;第二室,用于将第二和不同的沉积材料沉积到沉积体上;第三室,将第一沉积材料沉积到沉积体上, 连接到第一至第三腔室的传送室,传送室将沉积体转移到第一至第三腔室中的一个;以及控制单元,用于将沉积体从传送室输送到第一至第三腔室中的一个。
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12.
公开(公告)号:US20060147646A1
公开(公告)日:2006-07-06
申请号:US11324344
申请日:2006-01-04
申请人: Min-Jeong Hwang
发明人: Min-Jeong Hwang
CPC分类号: C23C14/542
摘要: A deposition system and its method of control cancels the influence of noise occurring during measuring of a deposition rate using a noise canceller in order to exactly control the deposition rate, and obtains a film of a desired thickness. The deposition system includes a deposition device. A deposition rate sensor measures a deposition rate of the deposition device. A noise canceller cancels a noise component of the measured deposition rate. A power supply unit adjusts power supplied to the deposition device according to an output of the noise canceller.
摘要翻译: 沉积系统及其控制方法使用噪声消除器来抵消在测量沉积速率期间发生的噪声的影响,以精确地控制沉积速率,并获得所需厚度的膜。 沉积系统包括沉积装置。 沉积速率传感器测量沉积装置的沉积速率。 噪声消除器消除所测量的沉积速率的噪声分量。 电源单元根据噪声消除器的输出来调整提供给沉积装置的功率。
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公开(公告)号:US20060147628A1
公开(公告)日:2006-07-06
申请号:US11325558
申请日:2006-01-05
申请人: Min-Jeong Hwang , Kwan-Seop Song , Do-Geun Kim , Jae-Hong Ahn , Sung-Ho Lee
发明人: Min-Jeong Hwang , Kwan-Seop Song , Do-Geun Kim , Jae-Hong Ahn , Sung-Ho Lee
CPC分类号: C23C14/243 , C23C14/12
摘要: In a method of controlling an effusion cell in a deposition system, including a crucible, a guiding pathway and an injection nozzle, a guiding pathway and an injection nozzle are heated. The crucible is heated after heating the guiding pathway and the injection nozzle. In addition, in cooling the effusion cell including a crucible, a guiding pathway and an injection nozzle, the crucible is cooled. The guiding pathway and the injection nozzle are cooled after cooling the crucible. This method has an advantage of enhancing uniformity of the organic layer formed on the substrate by preventing the clogging of the injection nozzle by deposition material vaporized in the crucible or splashing.
摘要翻译: 在包括坩埚,引导通道和注射喷嘴,引导通道和注射喷嘴的沉积系统中控制渗出池的方法中, 在加热引导通道和注射喷嘴之后加热坩埚。 此外,在冷却包括坩埚,引导通道和注射喷嘴的积液池时,将坩埚冷却。 冷却坩埚后,引导通道和喷嘴被冷却。 该方法具有通过防止在坩埚中蒸发的沉积材料或喷溅而防止喷嘴堵塞而提高形成在基板上的有机层的均匀性的优点。
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