公开(公告)号：US08512473B2

公开(公告)日：2013-08-20

申请号：US12881759

申请日：2010-09-14

申请人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

发明人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

IPC分类号： C23C16/458 ,  H01L21/306 ,  C23F1/00 ,  C23C16/06 ,  C23C16/22

CPC分类号： H01L21/682 ,  C23C14/042 ,  H01L51/001 ,  H01L51/56

摘要： A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit.

摘要翻译： 一种用于有机材料沉积系统的基板定心装置，包括：多个基板支撑保持器，其构造成可在有机材料沉积室内面向相反方向往复运动，并支撑由机器人装载的基板的两侧部分; 基板定心单元，其构造成在每个基板支撑保持器处可往复运动，并且通过引导基板的两个侧部对准基板; 以及多个基板夹持器，其构造成在每个基板支撑保持器处在垂直方向上往复运动，并且夹持由基板定心单元居中的基板。

公开(公告)号：US08025735B2

公开(公告)日：2011-09-27

申请号：US11370033

申请日：2006-03-08

申请人： Sung Ho Lee ,  Su Hwan Kim ,  Min Jeong Hwang

发明人： Sung Ho Lee ,  Su Hwan Kim ,  Min Jeong Hwang

IPC分类号： C23C16/00

CPC分类号： C23C14/243 ,  C23C14/56

摘要： A multiple vacuum evaporation coating device and a method for controlling the same. The vacuum evaporation coating device includes a plurality of evaporation sources, a rotating part adapted to rotate the plurality of evaporation sources and a coating block plate adapted to block all but one of said plurality of evaporation sources at any time, each of the plurality of evaporation sources comprise a case, a melting pot arranged within said case, an evaporation material arranged within the melting pot, a heating device arranged outside the melting pot and adapted to heat and evaporate the evaporation material, and a cooling device adapted to block heat generated by the heating device from transferring to an outside.

摘要翻译： 一种多重真空蒸镀装置及其控制方法。 真空蒸发涂布装置包括多个蒸发源，适于使多个蒸发源旋转的旋转部分和适于在任何时间阻止所有多个蒸发源中的除所有多个蒸发源之外的所有蒸发源的涂层阻挡板，多个蒸发 源包括壳体，布置在所述壳体内的熔炉，布置在熔炉内的蒸发材料，布置在熔池外部并适于加热和蒸发蒸发材料的加热装置，以及适于阻挡由蒸发材料产生的热的冷却装置 加热装置转移到外部。

公开(公告)号：US08020692B2

公开(公告)日：2011-09-20

申请号：US11325465

申请日：2006-01-05

申请人： Sung Wha Jung ,  Min Jeong Hwang

发明人： Sung Wha Jung ,  Min Jeong Hwang

IPC分类号： B65G1/133

CPC分类号： H01L21/67751 ,  B65G1/133

摘要： An apparatus for transferring an upright tray at high speeds that can sense an entrance and discharge of the tray. The apparatus includes a transferring unit with pulleys driven by a driving source to form a transferring path. The pulleys contact a fixing member, which is attached to a lower edge of a substrate and mask fixed to the tray. The apparatus also includes a sensing unit with a sensor installed beneath the transferring path to detect the entrance and discharge of the tray. The apparatus may also include rollers disposed to contact both sides of the upper portion of the tray, and the rollers may be coupled with moveable members encased within rails along the transferring path so that the rollers can translate when a tray passes between two rollers. The rollers along both sides of the tray can be arranged symmetrically or alternately in a zigzag pattern.

摘要翻译： 一种用于高速传送直立托盘的装置，其可感测托盘的进入和排出。 该装置包括一转印单元，该转印单元具有由驱动源驱动的带轮，以形成转印路径。 滑轮接触固定构件，固定构件附接到基板的下边缘并且掩模固定到托盘。 该装置还包括感测单元，其具有安装在传送路径下方的传感器，以检测托盘的进入和排出。 该设备还可以包括设置成接触托盘上部两侧的滚子，并且滚子可与沿着传送路径包围在轨道内的可移动部件联接，使得当托盘通过两个滚筒之间时，辊可以平移。 沿托盘两侧的辊可以以锯齿形图案对称地或交替地布置。

公开(公告)号：US07862855B2

公开(公告)日：2011-01-04

申请号：US11325558

申请日：2006-01-05

申请人： Min-Jeong Hwang ,  Kwan-Seop Song ,  Do-Geun Kim ,  Jae-Hong Ahn ,  Sung-Ho Lee

发明人： Min-Jeong Hwang ,  Kwan-Seop Song ,  Do-Geun Kim ,  Jae-Hong Ahn ,  Sung-Ho Lee

IPC分类号： C23C16/448

CPC分类号： C23C14/243 ,  C23C14/12

摘要： In a method of controlling an effusion cell in a deposition system, including a crucible, a guiding pathway and an injection nozzle, a guiding pathway and an injection nozzle are heated. The crucible is heated after heating the guiding pathway and the injection nozzle. In addition, in cooling the effusion cell including a crucible, a guiding pathway and an injection nozzle, the crucible is cooled. The guiding pathway and the injection nozzle are cooled after cooling the crucible. This method has an advantage of enhancing uniformity of the organic layer formed on the substrate by preventing the clogging of the injection nozzle by deposition material vaporized in the crucible or splashing.

摘要翻译： 在包括坩埚，引导通道和注射喷嘴，引导通道和注射喷嘴的沉积系统中控制渗出池的方法中， 在加热引导通道和注射喷嘴之后加热坩埚。 此外，在冷却包括坩埚，引导通道和注射喷嘴的积液池时，将坩埚冷却。 冷却坩埚后，引导通道和喷嘴被冷却。 该方法具有通过防止在坩埚中蒸发的沉积材料或喷溅而防止喷嘴堵塞而提高形成在基板上的有机层的均匀性的优点。

公开(公告)号：US20100304025A1

公开(公告)日：2010-12-02

申请号：US12770175

申请日：2010-04-29

申请人： Min-Jeong Hwang ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Mork Park ,  Jae-Wan Park ,  Jae-Hong Ahn

发明人： Min-Jeong Hwang ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Mork Park ,  Jae-Wan Park ,  Jae-Hong Ahn

IPC分类号： C23C16/44 ,  C23C16/00

CPC分类号： C23C16/54 ,  C23C14/568

摘要： A deposition apparatus including a plurality of reaction chambers, and a method of controlling the deposition apparatus. The deposition apparatus includes a first chamber to deposit a first deposition material onto a deposition body, a second chamber to deposit a second and different deposition material onto the deposition body, a third chamber to deposit the first deposition material onto the deposition body, a transfer chamber connected to the first through third chambers, the transfer chamber to transfer the deposition body to ones of the first through third chambers and a control unit to transport the deposition body from the transfer chamber to ones of the first through third chambers.

摘要翻译： 包括多个反应室的沉积设备以及控制该沉积设备的方法。 沉积装置包括：第一室，用于将第一沉积材料沉积到沉积体上;第二室，用于将第二和不同的沉积材料沉积到沉积体上;第三室，将第一沉积材料沉积到沉积体上， 连接到第一至第三腔室的传送室，传送室将沉积体转移到第一至第三腔室中的一个;以及控制单元，用于将沉积体从传送室输送到第一至第三腔室中的一个。

公开(公告)号：US20060147646A1

公开(公告)日：2006-07-06

申请号：US11324344

申请日：2006-01-04

申请人： Min-Jeong Hwang

发明人： Min-Jeong Hwang

IPC分类号： B05C5/00 ,  C23C14/00 ,  B05C11/00

CPC分类号： C23C14/542

摘要： A deposition system and its method of control cancels the influence of noise occurring during measuring of a deposition rate using a noise canceller in order to exactly control the deposition rate, and obtains a film of a desired thickness. The deposition system includes a deposition device. A deposition rate sensor measures a deposition rate of the deposition device. A noise canceller cancels a noise component of the measured deposition rate. A power supply unit adjusts power supplied to the deposition device according to an output of the noise canceller.

摘要翻译： 沉积系统及其控制方法使用噪声消除器来抵消在测量沉积速率期间发生的噪声的影响，以精确地控制沉积速率，并获得所需厚度的膜。 沉积系统包括沉积装置。 沉积速率传感器测量沉积装置的沉积速率。 噪声消除器消除所测量的沉积速率的噪声分量。 电源单元根据噪声消除器的输出来调整提供给沉积装置的功率。

公开(公告)号：US20060147628A1

公开(公告)日：2006-07-06

申请号：US11325558

申请日：2006-01-05

申请人： Min-Jeong Hwang ,  Kwan-Seop Song ,  Do-Geun Kim ,  Jae-Hong Ahn ,  Sung-Ho Lee

发明人： Min-Jeong Hwang ,  Kwan-Seop Song ,  Do-Geun Kim ,  Jae-Hong Ahn ,  Sung-Ho Lee

IPC分类号： C23C16/00 ,  B05C11/00

CPC分类号： C23C14/243 ,  C23C14/12

摘要： In a method of controlling an effusion cell in a deposition system, including a crucible, a guiding pathway and an injection nozzle, a guiding pathway and an injection nozzle are heated. The crucible is heated after heating the guiding pathway and the injection nozzle. In addition, in cooling the effusion cell including a crucible, a guiding pathway and an injection nozzle, the crucible is cooled. The guiding pathway and the injection nozzle are cooled after cooling the crucible. This method has an advantage of enhancing uniformity of the organic layer formed on the substrate by preventing the clogging of the injection nozzle by deposition material vaporized in the crucible or splashing.

摘要翻译： 在包括坩埚，引导通道和注射喷嘴，引导通道和注射喷嘴的沉积系统中控制渗出池的方法中， 在加热引导通道和注射喷嘴之后加热坩埚。 此外，在冷却包括坩埚，引导通道和注射喷嘴的积液池时，将坩埚冷却。 冷却坩埚后，引导通道和喷嘴被冷却。 该方法具有通过防止在坩埚中蒸发的沉积材料或喷溅而防止喷嘴堵塞而提高形成在基板上的有机层的均匀性的优点。

公开(公告)号：US08899174B2

公开(公告)日：2014-12-02

申请号：US12896496

申请日：2010-10-01

申请人： Won-Hyouk Jang ,  Eu-Gene Kang ,  Joo-Hwa Lee ,  Min-Jeong Hwang

发明人： Won-Hyouk Jang ,  Eu-Gene Kang ,  Joo-Hwa Lee ,  Min-Jeong Hwang

IPC分类号： C23C16/52 ,  C23C16/448 ,  C23C16/44 ,  C23C16/00 ,  B05C11/00

CPC分类号： C23C16/00 ,  B05C11/00 ,  C23C16/44 ,  C23C16/448 ,  C23C16/52

摘要： A device for manufacturing a display device includes a deposition source; a deposition thickness calculator for calculating a deposition thickness of a deposition material deposited on a substrate; and a controller for controlling a power of a heater which heats the deposition source by comparing the deposition thickness calculated with a reference thickness. The controller controls the power of the heater either at least one time for each substrate on which the thin film is to be deposited or at regular intervals while the deposition material is deposited. Influence of measurement noise that is included in a quartz crystal sensor for measuring a deposition speed may be minimized, and distribution of deposition thickness of an organic light emitting material may be reduced, thereby increasing the yield of the deposition process and producing quality display devices.

摘要翻译： 一种用于制造显示装置的装置包括沉积源; 沉积厚度计算器，用于计算沉积在衬底上的沉积材料的沉积厚度; 以及控制器，用于通过比较用参考厚度计算的沉积厚度来控制加热沉积源的加热器的功率。 控制器对于要沉积薄膜的每个衬底至少一次控制加热器的功率，或者在沉积材料沉积时以规则的间隔控制加热器的功率。 包含在用于测量沉积速度的石英晶体传感器中的测量噪声的影响可以被最小化，并且可以减少有机发光材料的沉积厚度的分布，从而提高沉积工艺的产量并产生高质量的显示装置。

公开(公告)号：US08623455B2

公开(公告)日：2014-01-07

申请号：US13215434

申请日：2011-08-23

申请人： Sung-Ho Lee ,  Su-Hwan Kim ,  Min-Jeong Hwang

发明人： Sung-Ho Lee ,  Su-Hwan Kim ,  Min-Jeong Hwang

IPC分类号： C23C16/00

CPC分类号： C23C14/243 ,  C23C14/56

摘要： A multiple vacuum evaporation coating device and a method for controlling the same. The vacuum evaporation coating device includes a plurality of evaporation sources, a rotating part adapted to rotate the plurality of evaporation sources and a coating block plate adapted to block all but one of said plurality of evaporation sources at any time, each of the plurality of evaporation sources comprise a case, a melting pot arranged within said case, an evaporation material arranged within the melting pot, a heating device arranged outside the melting pot and adapted to heat and evaporate the evaporation material, and a cooling device adapted to block heat generated by the heating device from transferring to an outside.

摘要翻译： 多重真空蒸镀装置及其控制方法。 真空蒸发涂布装置包括多个蒸发源，适于使多个蒸发源旋转的旋转部分和适于在任何时间阻止所有多个蒸发源中的除所有多个蒸发源之外的所有蒸发源的涂层阻挡板，多个蒸发 源包括壳体，布置在所述壳体内的熔炉，布置在熔炉内的蒸发材料，布置在熔池外部并适于加热和蒸发蒸发材料的加热装置，以及适于阻挡由蒸发材料产生的热的冷却装置 加热装置转移到外部。

公开(公告)号：US20130309403A1

公开(公告)日：2013-11-21

申请号：US13944479

申请日：2013-07-17

申请人： Jae-Wan PARK ,  You-Min CHA ,  Won-Seok CHO ,  Jae-Mork PARK ,  Jae-Hong AHN ,  Min-Jeong HWANG ,  Tae-Wook KIM ,  Jong-Woo LEE ,  Tae-Seung KIM

发明人： Jae-Wan PARK ,  You-Min CHA ,  Won-Seok CHO ,  Jae-Mork PARK ,  Jae-Hong AHN ,  Min-Jeong HWANG ,  Tae-Wook KIM ,  Jong-Woo LEE ,  Tae-Seung KIM

IPC分类号： C23C14/12

CPC分类号： C23C14/12 ,  B05D1/02 ,  B05D1/60 ,  B05D3/0493 ,  C23C14/243 ,  C23C14/56 ,  H01L51/0008 ,  H01L51/56

摘要： An apparatus for depositing an organic material and a depositing method thereof, wherein a deposition process is performed with respect to a second substrate while transfer and alignment processes are performed with respect to a first substrate in a chamber, so that loss of an organic material wasted in the transfer and alignment processes can be reduced, thereby maximizing material efficiency and minimizing a processing tack time. The apparatus includes a chamber having an interior divided into a first substrate deposition area and a second substrate deposition area, an organic material deposition source transferred to within ones of the first and second substrate deposition areas to spray particles of an organic material onto respective ones of first and second substrates and a first transferring unit to rotate the organic material deposition source in a first direction from one of the first and second substrate deposition areas to an other of the first and second substrate deposition areas.

摘要翻译： 一种用于沉积有机材料的设备及其沉积方法，其中相对于第二衬底执行沉积工艺，同时相对于腔室中的第一衬底进行转移和取向处理，从而浪费有机材料的损失 可以减少转移和对准过程，从而最大化材料效率并最小化处理粘着时间。 该装置包括具有分为第一衬底沉积区域和第二衬底沉积区域的内部的腔室，被转移到第一和第二衬底沉积区域内的有机材料沉积源，以将有机材料的颗粒喷射到 第一和第二基板和第一转印单元，用于使有机材料沉积源沿第一方向从第一和第二基板沉积区域之一旋转到第一和第二基板沉积区域中的另一个。