公开(公告)号：US08961692B2

公开(公告)日：2015-02-24

申请号：US12659987

申请日：2010-03-26

申请人： Jae-Wan Park ,  You-Min Cha ,  Jae-Hong Ahn ,  Won-Seok Cho ,  Jae-Mork Park ,  Min-Jeong Hwang

发明人： Jae-Wan Park ,  You-Min Cha ,  Jae-Hong Ahn ,  Won-Seok Cho ,  Jae-Mork Park ,  Min-Jeong Hwang

IPC分类号： C23C16/00 ,  C23C14/24 ,  C23C14/04

CPC分类号： C23C14/243 ,  C23C14/044

摘要： Provided is an evaporating apparatus that deposits a deposition material onto a treatment object. The evaporating apparatus includes a base, a deposition source, and first and second correction units. The deposition source deposits the deposition material onto the treatment object. The base is disposed separately from the treatment object. The deposition source is placed on a surface of the base. The first and second correction units located between the deposition source and the treatment object. The first and second correction units are disposed on outer regions of the deposition source and face each other. Each of the first and second correction units rotates to control the thickness of a layer formed by the deposition material deposited on the treatment object.

摘要翻译： 提供了一种将沉积材料沉积到处理物体上的蒸发装置。 蒸发装置包括基座，沉积源以及第一和第二校正单元。 沉积源将沉积材料沉积到处理对象上。 基座与治疗对象分开设置。 沉积源放置在基底的表面上。 位于沉积源和处理对象之间的第一和第二校正单元。 第一和第二校正单元设置在沉积源的外部区域上并且彼此面对。 第一和第二校正单元中的每一个旋转以控制由沉积在处理对象上的沉积材料形成的层的厚度。

公开(公告)号：US20110073042A1

公开(公告)日：2011-03-31

申请号：US12881759

申请日：2010-09-14

申请人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

发明人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

IPC分类号： C23C16/458 ,  C23C16/00

CPC分类号： H01L21/682 ,  C23C14/042 ,  H01L51/001 ,  H01L51/56

摘要： A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit.

摘要翻译： 一种用于有机材料沉积系统的基板定心装置，包括：多个基板支撑保持器，其构造成可在有机材料沉积室内面向相反方向往复运动，并支撑由机器人装载的基板的两侧部分; 基板定心单元，其构造成在每个基板支撑保持器处可往复运动，并且通过引导基板的两个侧部对准基板; 以及多个基板夹持器，其构造成在每个基板支撑保持器处在垂直方向上往复运动，并且夹持由基板定心单元居中的基板。

公开(公告)号：US07875828B2

公开(公告)日：2011-01-25

申请号：US11583770

申请日：2006-10-20

申请人： Byoung-Hyun Jung ,  You-Min Cha ,  Won-Woong Jung ,  Youn-Goo Roh

发明人： Byoung-Hyun Jung ,  You-Min Cha ,  Won-Woong Jung ,  Youn-Goo Roh

IPC分类号： B23K26/10

CPC分类号： B23K26/0876 ,  B23K26/067 ,  B23K26/0676

摘要： A laser irradiation apparatus includes a plurality of laser heads from which a laser is irradiated, can adjust arranged intervals of the laser heads, and moves freely to irradiate the laser along a shape of a subject. A laser oscillator oscillates a laser. A plurality of laser heads linearly irradiate the laser oscillated by the laser oscillator. A first driving means adjusts arranged intervals of the laser heads, and moves the laser heads in an X direction. A second driving means moves the laser heads in a Y direction different from the X direction.

摘要翻译： 激光照射装置包括激光照射的多个激光头，可以调节激光头的排列间隔，并且沿着被摄体的形状自由移动以照射激光。 激光振荡器振荡激光器。 多个激光头线性照射由激光振荡器振荡的激光。 第一驱动装置调整激光头的排列间隔，并使激光头沿X方向移动。 第二驱动装置使激光头沿与X方向不同的Y方向移动。

公开(公告)号：US20130319597A1

公开(公告)日：2013-12-05

申请号：US13959270

申请日：2013-08-05

申请人： Sang-Young Park ,  You-Min Cha ,  Won-Woong Jung ,  Youn-Goo Roh ,  Ju-Eel Mun

发明人： Sang-Young Park ,  You-Min Cha ,  Won-Woong Jung ,  Youn-Goo Roh ,  Ju-Eel Mun

IPC分类号： H01L33/00

CPC分类号： H01L33/005 ,  B32B37/1009 ,  B32B41/00 ,  B32B2309/12 ,  B32B2457/206 ,  H01L51/56

摘要： A substrate bonding apparatus includes a vacuum chamber having a bonding space where a first substrate and a second substrates are bonded together, a first pump for sucking air of the bonding space at a first intensity, a second pump for sucking the air of the bonding space at a second intensity greater than the first intensity, a nitrogen supply for supplying nitrogen to the bonding space, a sensor for sensing the pressure of the bonding space; and a controller for controlling the first pump, the second pump, and the nitrogen supply.

摘要翻译： 一种基板接合装置，包括具有第一基板和第二基板接合在一起的接合空间的真空室，以第一强度吸附接合空间的空气的第一泵，用于吸附接合空间的空气的第二泵 在大于第一强度的第二强度处，用于向粘合空间供应氮气的氮气供应，用于感测粘合空间的压力的传感器; 以及用于控制第一泵，第二泵和氮气供应的控制器。

公开(公告)号：US20130302134A1

公开(公告)日：2013-11-14

申请号：US13942514

申请日：2013-07-15

申请人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

发明人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

IPC分类号： H01L21/68

CPC分类号： H01L21/682 ,  C23C14/042 ,  H01L51/001 ,  H01L51/56

摘要： A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit.

摘要翻译： 一种用于有机材料沉积系统的基板定心装置，包括：多个基板支撑保持器，其构造成可在有机材料沉积室内面向相反方向往复运动，并支撑由机器人装载的基板的两侧部分; 基板定心单元，其构造成在每个基板支撑保持器处可往复运动，并且通过引导基板的两个侧部对准基板; 以及多个基板夹持器，其构造成在每个基板支撑保持器处在垂直方向上往复运动，并且夹持由基板定心单元居中的基板。

公开(公告)号：US20100279021A1

公开(公告)日：2010-11-04

申请号：US12762721

申请日：2010-04-19

申请人： Jae-Wan PARK ,  You-Min CHA ,  Won-Seok CHO ,  Jae-Mork PARK ,  Jae-Hong AHN ,  Min-Jeong HWANG ,  Tae-Wook KIM ,  Jong-Woo LEE ,  Tae-Seung KIM

发明人： Jae-Wan PARK ,  You-Min CHA ,  Won-Seok CHO ,  Jae-Mork PARK ,  Jae-Hong AHN ,  Min-Jeong HWANG ,  Tae-Wook KIM ,  Jong-Woo LEE ,  Tae-Seung KIM

IPC分类号： B05D1/02 ,  B05C5/00

CPC分类号： C23C14/12 ,  B05D1/02 ,  B05D1/60 ,  B05D3/0493 ,  C23C14/243 ,  C23C14/56 ,  H01L51/0008 ,  H01L51/56

摘要： An apparatus for depositing an organic material and a depositing method thereof, wherein a deposition process is performed with respect to a second substrate while transfer and alignment processes are performed with respect to a first substrate in a chamber, so that loss of an organic material wasted in the transfer and alignment processes can be reduced, thereby maximizing material efficiency and minimizing a processing tack time. The apparatus includes a chamber having an interior divided into a first substrate deposition area and a second substrate deposition area, an organic material deposition source transferred to within ones of the first and second substrate deposition areas to spray particles of an organic material onto respective ones of first and second substrates and a first transferring unit to rotate the organic material deposition source in a first direction from one of the first and second substrate deposition areas to an other of the first and second substrate deposition areas.

摘要翻译： 一种用于沉积有机材料的设备及其沉积方法，其中相对于第二衬底执行沉积工艺，同时相对于腔室中的第一衬底进行转移和取向处理，从而浪费有机材料的损失 可以减少转移和对准过程，从而最大化材料效率并最小化处理粘着时间。 该装置包括具有分为第一衬底沉积区域和第二衬底沉积区域的内部的腔室，被转移到第一和第二衬底沉积区域内的有机材料沉积源，以将有机材料的颗粒喷射到 第一和第二基板和第一转印单元，用于使有机材料沉积源沿第一方向从第一和第二基板沉积区域之一旋转到第一和第二基板沉积区域中的另一个。

公开(公告)号：US08512473B2

公开(公告)日：2013-08-20

申请号：US12881759

申请日：2010-09-14

申请人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

发明人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

IPC分类号： C23C16/458 ,  H01L21/306 ,  C23F1/00 ,  C23C16/06 ,  C23C16/22

CPC分类号： H01L21/682 ,  C23C14/042 ,  H01L51/001 ,  H01L51/56

摘要： A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit.

摘要翻译： 一种用于有机材料沉积系统的基板定心装置，包括：多个基板支撑保持器，其构造成可在有机材料沉积室内面向相反方向往复运动，并支撑由机器人装载的基板的两侧部分; 基板定心单元，其构造成在每个基板支撑保持器处可往复运动，并且通过引导基板的两个侧部对准基板; 以及多个基板夹持器，其构造成在每个基板支撑保持器处在垂直方向上往复运动，并且夹持由基板定心单元居中的基板。

公开(公告)号：US20110083788A1

公开(公告)日：2011-04-14

申请号：US12900451

申请日：2010-10-07

申请人： Sang-Young Park ,  You-Min Cha ,  Won-Woong Jung ,  Youn-Goo Roh ,  Ju-Eel Mun

发明人： Sang-Young Park ,  You-Min Cha ,  Won-Woong Jung ,  Youn-Goo Roh ,  Ju-Eel Mun

IPC分类号： B32B37/16

CPC分类号： H01L33/005 ,  B32B37/1009 ,  B32B41/00 ,  B32B2309/12 ,  B32B2457/206 ,  H01L51/56

摘要： A substrate bonding apparatus includes a vacuum chamber having a bonding space where a first substrate and a second substrates are bonded together, a first pump for sucking air of the bonding space at a first intensity, a second pump for sucking the air of the bonding space at a second intensity greater than the first intensity, a nitrogen supply for supplying nitrogen to the bonding space, a sensor for sensing the pressure of the bonding space; and a controller for controlling the first pump, the second pump, and the nitrogen supply.

摘要翻译： 一种基板接合装置，包括具有第一基板和第二基板接合在一起的接合空间的真空室，以第一强度吸附接合空间的空气的第一泵，用于吸附接合空间的空气的第二泵 在大于第一强度的第二强度处，用于向粘合空间供应氮气的氮气供应，用于感测粘合空间的压力的传感器; 以及用于控制第一泵，第二泵和氮气供应的控制器。

公开(公告)号：US20140037849A1

公开(公告)日：2014-02-06

申请号：US13953982

申请日：2013-07-30

申请人： Sung-Joong Joo ,  You-Min Cha ,  Seuk-Hwan Park

发明人： Sung-Joong Joo ,  You-Min Cha ,  Seuk-Hwan Park

IPC分类号： B05B12/00

CPC分类号： B05B12/00 ,  C23C14/04 ,  C23C14/545

摘要： A deposition apparatus may uniformly control deposited quantities of a plurality of depositing sources by efficiently determining an abnormal depositing source. The deposition apparatus may reduce loss of materials by exactly determining an abnormal depositing source. The deposition apparatus includes: a plurality of depositing sources spraying a deposition material; a substrate holder fixing a substrate to face the depositing source; a depositing source shutter disposed at one side of the depositing source and opening and closing an passage of each depositing source; and a main shutter disposed between the depositing source and the substrate fixed to the substrate holder and depositing a part of the deposition material on the substrate through the main shutter.

摘要翻译： 沉积设备可以通过有效地确定异常沉积源来均匀地控制多个沉积源的沉积量。 沉积装置可以通过精确地确定异常沉积源来减少材料损失。 沉积设备包括：多个沉积源喷涂沉积材料; 固定衬底以面对沉积源的衬底保持器; 设置在所述沉积源的一侧并且打开和关闭每个沉积源的通道的沉积源快门; 以及主快门，其设置在所述沉积源和固定到所述基板保持器的所述基板之间，并且通过所述主快门将所述沉积材料的一部分沉积在所述基板上。

公开(公告)号：US08325457B2

公开(公告)日：2012-12-04

申请号：US12585895

申请日：2009-09-28

申请人： Sang-Young Park ,  Ju-Eel Mun ,  You-Min Cha ,  Won-Woong Jung

发明人： Sang-Young Park ,  Ju-Eel Mun ,  You-Min Cha ,  Won-Woong Jung

IPC分类号： H01T23/00

CPC分类号： H01L21/6831

摘要： The present invention discloses an electrostatic chuck sucking and supporting a substrate with an electrostatic force and an OLED manufacturing apparatus having the same. The electrostatic chuck includes an insulating plate having at least one opening penetrating a center thereof, a pair of electrodes mounted on the insulating plate, a first controller applying a voltage to the pair of electrodes, and an electrostatic charge removing unit disposed near the insulating plate and emitting ions into the at least one opening to remove electrostatic charges distributed around a side of the insulating plate.

摘要翻译： 本发明公开了一种用静电力吸附和支撑衬底的静电吸盘和具有该静电力的OLED制造装置。 静电卡盘包括绝缘板，该绝缘板具有贯穿其中心的至少一个开口，安装在绝缘板上的一对电极，向该对电极施加电压的第一控制器和设置在绝缘板附近的静电电荷去除单元 并且将离子发射到所述至少一个开口中以除去分布在绝缘板侧面的静电荷。