公开(公告)号：US06692890B2

公开(公告)日：2004-02-17

申请号：US09826315

申请日：2001-04-04

Applicant: Jen-Chi Huang ,  Xing-Fu Zhong ,  S. Peter Pappas ,  Shashikant Saraiya

Inventor： Jen-Chi Huang ,  Xing-Fu Zhong ,  S. Peter Pappas ,  Shashikant Saraiya

IPC: G03F700

CPC classification number: B41C1/1025 ,  B41C2201/04 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/10 ,  B41C2210/24 ,  B41C2210/262 ,  B41N3/03 ,  B41N3/038

Abstract: The present invention includes a radiation-imageable element for lithographic printing having a hydrophilic anodized aluminum base with a surface having pores and a image-forming layer having polymer particles coated on the aluminum base. The ratio of the average pore diameter to the average particle diameter is from 0.4:1 to 10:1. The present invention further includes a method of producing the imaged element. The method includes the steps of imagewise exposing the radiation-imageable element to radiation to produce exposed and unexposed regions and contacting the imagewise exposed radiation-imageable element and a developer to remove the exposed or the unexposed regions.

Abstract translation: 本发明包括用于平版印刷的可辐射成像元件，其具有具有孔的表面的亲水阳极化铝基底和具有涂覆在铝基底上的聚合物颗粒的图像形成层。 平均孔径与平均粒径之比为0.4:1〜10:1。 本发明还包括一种制造成像元件的方法。 该方法包括以下步骤：将可辐射成像元件成像曝光到辐射以产生曝光和未曝光区域，并使图像曝光的可辐射成像元件和显影剂接触以去除曝光或未曝光区域。

公开(公告)号：US20070176152A1

公开(公告)日：2007-08-02

申请号：US11550279

申请日：2006-10-17

Applicant: Xing-Fu Zhong

Inventor： Xing-Fu Zhong

IPC: H01B1/12

CPC classification number: H01B1/127 ,  H01L51/0037 ,  Y10T428/31507 ,  Y10T428/31645 ,  Y10T428/31855 ,  Y10T428/31909

Abstract: Photocurable, conductive, and transparent polymer coating compositions and methods of using the same are provided. The compositions include a photopolymer and an electrically conductive polymer dissolved or dispersed in a solvent system. Preferred photopolymers include water-miscible, multifunctional acrylates. Preferred electrically conductive polymers include poly(3,4-ethylenedioxythiophene)/poly(styrene sulfonate) (PEDOT-PSS). The compositions preferably also contain a photoinitiator and may contain a water-immiscible acrylate and/or a surfactant. The compositions are applied to substrates and exposed to actinic radiation such as ultraviolet (UV) light to form a cured, durable, conductive, and transparent coating.

Abstract translation: 提供光固化，导电和透明的聚合物涂料组合物及其使用方法。 组合物包括溶解或分散在溶剂体系中的光聚合物和导电聚合物。 优选的光聚合物包括水混溶性多官能丙烯酸酯。 优选的导电聚合物包括聚（3,4-亚乙基二氧噻吩）/聚（苯乙烯磺酸盐）（PEDOT-PSS）。 组合物优选还含有光引发剂并且可以含有不与水混溶的丙烯酸酯和/或表面活性剂。 将组合物施加到基底上并暴露于光化辐射如紫外（UV）光下以形成固化的，耐久的，导电的和透明的涂层。

公开(公告)号：US06720130B1

公开(公告)日：2004-04-13

申请号：US10266888

申请日：2002-10-08

Applicant: Xing-Fu Zhong ,  Shashikant Saraiya ,  S. Peter Pappas

Inventor： Xing-Fu Zhong ,  Shashikant Saraiya ,  S. Peter Pappas

IPC: G03F716

CPC classification number: B41C1/1016 ,  B41C2201/04 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/24 ,  G03F7/202 ,  Y10S430/165

Abstract: The present invention relates to a negative-working radiation imageable lithographic printing plate precursor, preferably having only two polymeric layers on a support. The first (bottom) layer is composed of oleophilic polymers and a photothermal converter which converts radiation to heat. The second polymeric layer (top) is composed of crosslinked hydrophilic polymers which absorb aqueous fountain solution and repel ink. The oleophilic polymers in the first layer contain functional groups are interlayer chemically bonded to the hydrophilic polymer in the second layer to provide interlayer adhesive bonding between the two layers. The plate is imagewise exposed to radiation, such as with an IR laser, resulting in non-ablative adhesion-weakening between the two layers so that the plate can be developed by fountain solution and/or ink on press whereby the top layer in the exposed area is removed on the press to reveal the ink-receptive image area. The top layer in the unexposed area remains as the non-image area.

Abstract translation: 本发明涉及一种负性可辐射成像平版印刷版原版，优选在载体上仅具有两个聚合物层。 第一（底部）层由亲油聚合物和将辐射转化为热的光热转换器组成。 第二聚合物层（顶部）由吸收润版液并排斥油墨的交联亲水聚合物组成。 第一层中含有的亲油聚合物含有官能团，在第二层中与亲水性聚合物中间化学键合，以提供两层之间的层间粘合剂粘合。将该板成像曝光于辐射下，例如用IR激光， 在两层之间 - 消除粘合力弱化，使得板可以通过润版液和/或印刷机上的油墨显影，由此在印刷机上除去暴露区域中的顶层以露出吸墨图像区域。 未曝光区域中的顶层保持为非图像区域。

公开(公告)号：US5948596A

公开(公告)日：1999-09-07

申请号：US863770

申请日：1997-05-27

Applicant: Xing-Fu Zhong ,  Ken-ichi Shimazu ,  S. Peter Pappas ,  Tore Harms ,  Thi Do ,  Shashikant Saraiya ,  William P. Keaveney

Inventor： Xing-Fu Zhong ,  Ken-ichi Shimazu ,  S. Peter Pappas ,  Tore Harms ,  Thi Do ,  Shashikant Saraiya ,  William P. Keaveney

IPC: B41C1/10 ,  G03C1/73

CPC classification number: B41C1/1016 ,  B41C2201/04 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/16 ,  B41C2210/24

Abstract: Presensitized lithographic plates are prepared which permit direct formation of printable images on plates by digital computerization without the intervening formation of a photographic image with a quality that allows the plates to be used for high volume printing applications. The lithographic printing plate has a structure which contains a substrate; a positive or negative working photosensitive layer; and a thermally sensitive masking layer which is opaque to the actinic radiation but which is soluble in an aqueous medium. The masking layer contains a heat softenable disperse phase which is insoluble in the aqueous medium; a polymeric continuous phase which is soluble or swellable in the aqueous medium; and a colorant which strongly absorbs radiant energy and converts the radiant energy to heat. In use the masking layer is digitally exposed to a computer controlled laser image so that exposed image areas of the masking are insolublized in the aqueous medium; soluble areas of the mask layer are then removed to form an opaque image mask on the photosensitive layer which is then exposed to actinic radiation passing through the mask to solubilize or insolubilize exposed areas of the photosensitive layer; the photosensitive layer is then developed with the developer liquid to remove the soluble areas and any overlying mask areas to form the lithographic printing plate. Both wet and waterless lithographic printing plates may be digitally prepared in this manner.

Abstract translation: 制备预感光刻平板，其允许通过数字计算机化在板上直接形成可印刷图像，而不用介质形成摄影图像，其质量允许将板用于大容量印刷应用。 平版印刷版具有包含基板的结构; 正或负工作感光层; 以及对光化辐射不透明但可溶于水性介质的热敏屏蔽层。 掩蔽层含有不溶于水介质的可热软化分散相; 在水性介质中可溶或溶胀的聚合物连续相; 以及强烈吸收辐射能并将辐射能转化为热的着色剂。 在使用中，掩模层被数字地暴露于计算机控制的激光图像，使得掩蔽的曝光图像区域在水性介质中被分散; 然后去除掩模层的可溶性区域以在感光层上形成不透明图像掩模，然后将其暴露于通过掩模的光化辐射，以增溶或不溶化感光层的曝光区域; 然后用显影剂液体显影感光层以除去可溶性区域和任何覆盖的掩模区域以形成平版印刷版。 湿式和无水平版印刷版可以以这种方式数字地制备。

公开(公告)号：US08940104B2

公开(公告)日：2015-01-27

申请号：US13196679

申请日：2011-08-02

Applicant: Xing-Fu Zhong ,  John Moore

Inventor： Xing-Fu Zhong ,  John Moore

IPC: B08B3/04 ,  C11D1/22 ,  C11D3/20 ,  C11D3/43 ,  B08B3/02

CPC classification number: C11D3/2003 ,  B08B3/024 ,  B08B3/04 ,  B08B3/041 ,  C11D1/22 ,  C11D3/43 ,  C11D11/0047 ,  Y10T156/1116

Abstract: A cleaning composition for removing temporary wafer bonding material is provided. The cleaning composition comprises an alkylarylsulfonic acid and an aliphatic alcohol dispersed or dissolved in a hydrocarbon solvent system. Methods of separating bonded substrates and cleaning debonded substrates using the cleaning composition are also provided. The invention is particularly useful for temporary bonding materials and adhesives. The methods generally comprise contacting the bonding material with the cleaning solution for time periods sufficient to dissolve the desired amount of bonding material for separation and/or cleaning of the substrates.

Abstract translation: 提供一种用于去除临时晶片接合材料的清洁组合物。 清洁组合物包含分散或溶解在烃溶剂系统中的烷基芳基磺酸和脂族醇。 还提供了使用清洁组合物分离粘合的基材和清洁脱粘的基材的方法。 本发明对临时粘合材料和粘合剂特别有用。 所述方法通常包括使结合材料与清洁溶液接触足以溶解所需量的粘合材料以用于分离和/或清洁基底的时间。

公开(公告)号：US07695890B2

公开(公告)日：2010-04-13

申请号：US11470520

申请日：2006-09-06

Applicant: Xing-Fu Zhong ,  Jyoti K. Malhotra ,  Chenghong Li

Inventor： Xing-Fu Zhong ,  Jyoti K. Malhotra ,  Chenghong Li

IPC: G03F7/00 ,  G03F7/004

CPC classification number: G03F7/0382 ,  G03F7/0752 ,  H01L21/3081 ,  Y10S430/108 ,  Y10S430/115

Abstract: New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes copolymers prepared from styrene, acrylonitrile, and epoxy-containing monomers. The photoresist layer comprises a photoacid generator, and is preferably negative-acting.

Abstract translation: 提供了在制造半导体和MEMS器件期间使用的新型光致抗蚀剂。 底漆层优选包含溶解或分散在溶剂体系中的硅烷。 光致抗蚀剂层包括由苯乙烯，丙烯腈和含环氧基的单体制备的共聚物。 光致抗蚀剂层包括光致酸发生剂，并且优选为负性作用。

公开(公告)号：US20090270300A1

公开(公告)日：2009-10-29

申请号：US12289206

申请日：2008-10-22

Applicant: Hiroyuki Uehara ,  Kazuhiro Aoba ,  Gu Xu ,  Xing-Fu Zhong

Inventor： Hiroyuki Uehara ,  Kazuhiro Aoba ,  Gu Xu ,  Xing-Fu Zhong

IPC: C11D7/32

CPC classification number: C11D11/0047 ,  C11D7/08 ,  C11D7/5004 ,  G03F7/423 ,  G03F7/425

Abstract: There is provided a composition that can effectively remove a protective coating and a primer coating that have a resistance to etching solutions and are rendered unnecessary after wet-etching treatment in MEMS fabrication processes, and a method for removing the protective layer. The composition contains (A) at least one organic solvent selected from the group consisting of amides, lactones, pyrrolidones and ketones, (B) water, and (C) a fluoride, in an amount of 80.00 to 99.90 mass %, 0.05 to 12.00 mass %, and 0.05 to 8.00 mass %, respectively. The composition may further contain (D) phosphoric acid, phosphonic acid or phosphinic acid in an amount over 0 mass part to 5.5 mass parts, or (E) an organic amine in an amount over 0 mass part to 45 mass parts, based on 100 mass parts of the composition.

Abstract translation: 提供了一种可以有效地去除在MEMS制造工艺中在湿蚀刻处理之后具有耐蚀刻溶液并且不需要的保护涂层和底漆涂层的组合物，以及用于去除保护层的方法。 组合物含有（A）至少一种选自酰胺，内酯，吡咯烷酮和酮的有机溶剂，（B）水和（C）氟化物，其含量为80.00-99.90质量％，0.05至12.00 质量％，0.05〜8.00质量％。 组合物还可以含有（D）0质量份〜5.5质量份的磷酸，膦酸或次膦酸，或（E）0质量份〜45质量份的有机胺，基于100 大部分组成。

公开(公告)号：US20080261145A1

公开(公告)日：2008-10-23

申请号：US11736429

申请日：2007-04-17

Applicant: Xing-Fu Zhong ,  Tony D. Flaim ,  Jyoti Malhotra

Inventor： Xing-Fu Zhong ,  Tony D. Flaim ,  Jyoti Malhotra

IPC: G03C1/043 ,  G03C5/00

CPC classification number: G03F7/0752 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0751 ,  Y10S430/108 ,  Y10S430/115

Abstract: New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes a first polymer prepared from a styrene and an acrylonitrile, and a second polymer comprising epoxy-containing monomers (and preferably phenolic-containing monomers). The photoresist layer comprises a photoacid generator, and is preferably negative-acting.

Abstract translation: 提供了在制造半导体和MEMS器件期间使用的新型光致抗蚀剂。 底漆层优选包含溶解或分散在溶剂体系中的硅烷。 光致抗蚀剂层包括由苯乙烯和丙烯腈制备的第一聚合物，以及包含含环氧单体（优选含酚单体）的第二聚合物。 光致抗蚀剂层包括光致酸发生剂，并且优选为负性作用。

公开(公告)号：US06899992B2

公开(公告)日：2005-05-31

申请号：US10290623

申请日：2002-11-08

Applicant: Jianbing Huang ,  Shashikant Saraiya ,  Xing-Fu Zhong

Inventor： Jianbing Huang ,  Shashikant Saraiya ,  Xing-Fu Zhong

IPC: B41C1/10 ,  B41M5/36 ,  C07D239/46 ,  C07D487/04 ,  G03F7/027 ,  G03F7/035 ,  G03F7/038 ,  G03F7/004

CPC classification number: G03F7/0388 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  C07D239/47 ,  C07D487/04 ,  G03F7/027 ,  G03F7/035

Abstract: QHB-Modified free radical polymerizable compounds and free radical polymerizable compositions that comprise these compounds are disclosed. A QBH-modified free radical polymerizable compound has at least one moiety that comprises at least one free radical polymerizable group; a supporting backbone, and at least one and preferably at least two moieties capable of forming four or more, typically four, hydrogen bonds with similar or complementary units on other molecules or portions of molecules. Free radical polymerizable compositions that contain these compounds may be used in any of the well-known applications for free radical polymerizable compositions. They are especially useful for the formation of imageable elements useful as lithographic printing plate precursors.

Abstract translation: 公开了QHB改性的可自由基聚合的化合物和包含这些化合物的自由基可聚合组合物。 QBH改性的自由基聚合性化合物具有至少一个包含至少一个可自由基聚合基团的部分; 支链骨架，以及能与其他分子或分子部分上的相似或互补单元形成四个或更多，通常四个氢键的至少一个，优选至少两个部分。 含有这些化合物的自由基可聚合组合物可用于任何用于自由基可聚合组合物的众所周知的应用。 它们对于形成可用作平版印刷版前体的可成像元件特别有用。

公开(公告)号：US06821583B2

公开(公告)日：2004-11-23

申请号：US10189169

申请日：2002-07-03

Applicant: Grant Thomas Donald Shouldice ,  Shashikant Saraiya ,  Xing-Fu Zhong ,  Richard R. Durand, Jr. ,  Jianbing Huang ,  Patrick Friedman

Inventor： Grant Thomas Donald Shouldice ,  Shashikant Saraiya ,  Xing-Fu Zhong ,  Richard R. Durand, Jr. ,  Jianbing Huang ,  Patrick Friedman

IPC: B32B2730

CPC classification number: B41M5/506 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41M5/52 ,  B41M5/5227 ,  B41M2205/12 ,  B41M2205/38 ,  Y10T428/24802 ,  Y10T428/31699 ,  Y10T428/31855 ,  Y10T428/31928 ,  Y10T428/31935 ,  Y10T428/31938

Abstract: The present invention provides an imageable element, which includes: a substrate; a crosslinked layer disposed on the substrate; and an imageable ink-receptive layer disposed on the crosslinked layer, the imageable ink-receptive layer including an ablation free imageable composition. The present invention provides methods of producing the above imaged element.

Abstract translation: 本发明提供一种可成像元件，其包括：基板; 设置在所述基板上的交联层; 以及设置在所述交联层上的可成像的油墨接收层，所述可成像的墨接受层包括无消融成像的组合物。 本发明提供了制造上述成像元件的方法。