Abstract:
A pixel structure including an active device, a pixel electrode connected with the active device, a bottom electrode disposed under the pixel electrode, upper electrodes disposed between the pixel electrode and the bottom electrode and connected with the pixel electrode, a first dielectric layer disposed between the bottom electrode and the upper electrodes and a second dielectric layer disposed between the upper electrodes and the pixel electrode is provided. The total area of the upper electrodes overlapping with the bottom electrode is A, and the overlapping portion of the pixel electrode and each upper electrode includes a contact region and a reserved region having total area B. The dielectric constant and thickness of the first dielectric layer is ∈1 and d1; and for second dielectric layer ∈2 and d2, wherein 0.5
Abstract:
A projection apparatus. A support pedestal is slidably disposed on a base. An optical engine is disposed on the support pedestal. An alignment mechanism is disposed on the base and connected to the support pedestal, adjusting the position of the optical engine with respect to the base. The alignment mechanism includes a fixed pedestal, an adjustment screw, a nut, and a resilient member. The fixed pedestal is fixed to the base. The nut is connected to the support pedestal and slidably disposed on the base. The adjustment screw is rotatably disposed in the fixed pedestal and nut and engages the nut. The resilient member is disposed between the fixed pedestal and the nut to provide resilience to the fixed pedestal and nut, such that the adjustment screw abuts the nut.
Abstract:
A fan fasten device is for fixing at least one fan. The fan fasten device includes a chassis and a fastener. At least one fixing portion is set on the chassis, and at least one end of the fastener is connected with the fixing portion.
Abstract:
A method and apparatus for improving a uniformity of a thermally grown silicon dioxide layer including thermally growing a layer over the exposed silicon portions including silicon dioxide according to a thermal oxide growing process; exposing the gas reactant feed lines to reactant gases during at least one of the step of thermally growing a layer and a cleaning process following the step of thermally growing a layer; and, purging the gas flow pathways to bypass the reactor chamber with at least one purge gas source including an inert gas to remove residual reactant gas contaminants to improve a subsequently thermally grown silicon dioxide layer.
Abstract:
An apparatus for measuring tension and stress, which is capable of adjusting an angle of measurement. The apparatus includes a base plate, a supporting member, and a body for measuring tension and stress. The supporting member is mounted on the base plate. The supporting member further includes a revolving spindle supported by a bearing so that the body for measuring tension and stress can be attached to the supporting member in a way that the body for measuring tension and stress is capable of turning on the revolving spindle. In this way, the user can adjust the angle between the body for measuring tension and stress and the base plate, fulfilling the purpose of doing measurement for an object in an arbitrary angle of measurement.
Abstract:
A pod for transporting a cassette containing semiconductor wafers includes a base and a cover removably carried on the base for protectively enclosing the cassette. A latching mechanism for latching the cover on the base is provided with an electrical sensor that senses when the cover is properly latched on the base and controls an electrical light on the base to provide a visual indication of latch status.
Abstract:
A processing chamber tube used in a semiconductor furnace is guided during its removal from the furnace by a plurality of circumferentially spaced guides. The guides are mounted for adjustable radial movement on a ring-shaped plate. The plate is secured on the base of the furnace. The guides are preferably in the form of rollers which engage and guide the tube during its removal from the furnace.
Abstract:
Novel use of small molecules, particularly indolyl and indolinyl hydroxamates is disclosed herein. The indolyl and indolinyl hydroxamates are useful as lead compounds for manufacturing a medicament or a pharmaceutical composition for treating a patient suffering from heart failure or neuronal injury.
Abstract:
Compounds represented by the formula (I) or pharmaceutically acceptable salts thereof: R2—Y—Z-Q-A-R1 Formula (I) wherein R1, R2, Y, Z, Q, and A are as defined. These compounds are inhibitors of tubulin polymerization by binding at colchicines binding site and are useful in the treatment of tumors or mitotic diseases such as cancers, gout, and other conditions associated with abnormal cell proliferation.
Abstract:
A display device includes a casing, a display panel assembled in the casing, and a front panel assembled at the casing to cover edges of the display panel. The front panel includes two first boards and two second boards. Each of the first boards includes a main portion and two auxiliary portions located at two sides of the main portion. The two second boards are stacked on the auxiliary portions. A method for assembling a display device is also disclosed.