公开(公告)号：US20230414491A1

公开(公告)日：2023-12-28

申请号：US18334155

申请日：2023-06-13

申请人： Nanovis, LLC

发明人： David Alan DETWILER ,  Matthew HEDRICK

IPC分类号： A61K9/00 ,  A61K45/06

CPC分类号： A61K9/0024 ,  A61K45/06

摘要： The present disclosure relates to a kit for preventing, reducing, and/or treating surgical site infections, the kit comprising two or more antimicrobial components directed to two or more different post-surgical tissue depths in a subject. The present disclosure further relates to an antimicrobial surgical system, the system comprising two or more antimicrobial components directed to two or more different post-surgical tissue depths in a subject for preventing, reducing, and/or treating surgical site infections. The present disclosure further relates to a method of preventing, reducing, and/or treating one or more surgical site infections, the method comprising: providing an antimicrobial surgical system comprising: two or more antimicrobial components directed to two or more different post-surgical tissue depths in a subject; and applying said antimicrobial surgical system to a subject under conditions effective to prevent, reduce, and/or treat one or more surgical site infections. Also, disclosed is the method of assembling the kit.

公开(公告)号：US11123428B2

公开(公告)日：2021-09-21

申请号：US16991284

申请日：2020-08-12

申请人： Purdue Research Foundation ,  Nanovis, LLC

发明人： Allen Lawrence Garner ,  Ram Anand Vadlamani ,  David Alan Detwiler

IPC分类号： A61K31/496 ,  A61K31/341 ,  A61K31/575 ,  A61K31/702 ,  A61K31/5377 ,  A61K38/14 ,  A61K41/00 ,  A61K31/7048 ,  A61N1/32 ,  C12N13/00

摘要： Provided is a method of reducing a number of viable microbes, including contacting microbes with an antibiotic compound and applying pulses of electricity having a duration of between about 50 nanoseconds and about 900 nanoseconds. The pulses of electricity may have an intensity between about 20 kV/cm and about 40 kV/cm. The pulses of electricity may be applied at a frequency of between about 0.1 Hz and about 10 Hz. The microbes may be a gram-negative or a gram-positive strain of bacteria and the antibiotic may be applied at a concentration for a duration, wherein applying the antibiotic to the strain at the concentration for the duration does not reduce a viable number of bacteria of the strain as much, or at all, when the pulses of electricity are not also applied.

公开(公告)号：US20170007743A1

公开(公告)日：2017-01-12

申请号：US15276048

申请日：2016-09-26

申请人： NANOVIS, LLC

发明人： MATTHEW HEDRICK ,  CHANG YAO

IPC分类号： A61L27/54 ,  C25D11/26 ,  C04B35/622 ,  A61L27/30 ,  C09D5/14 ,  C04B35/447

CPC分类号： A61L27/54 ,  A61L27/04 ,  A61L27/306 ,  A61L2202/21 ,  A61L2300/102 ,  A61L2300/104 ,  A61L2300/404 ,  A61L2300/61 ,  A61L2400/12 ,  A61L2420/02 ,  C04B35/447 ,  C04B35/62222 ,  C04B2235/447 ,  C09D1/00 ,  C09D5/14 ,  C09D7/61 ,  C23C22/05 ,  C23C22/78 ,  C25D11/02 ,  C25D11/26 ,  C25D11/34

摘要： An antimicrobial medical device that includes a substrate having a metal surface that is made from a metal or metal alloy that may include stainless steel, cobalt, and titanium. Disposed on the metal surface is a first antimicrobial oxide layer that includes an antimicrobial metal that may include silver, copper, and zinc, and combinations thereof. The atoms of antimicrobial metal in the first antimicrobial oxide layer are of a first concentration. The first antimicrobial oxide layer is positioned in a direction opposite that of the metal surface. The device further includes a second antimicrobial oxide layer that includes an antimicrobial metal that may be silver, copper, and zinc, and combinations thereof. The atoms of the antimicrobial metal present in the second antimicrobial oxide layer are of a second concentration. The first concentration and the second concentration are not equal. Methods for making the antimicrobial medical device are also disclosed.

摘要翻译： 一种抗微生物医疗装置，其包括具有金属表面的基材，所述金属表面由可以包括不锈钢，钴和钛的金属或金属合金制成。 设置在金属表面上的是第一抗微生物氧化物层，其包括可包括银，铜和锌的抗微生物金属及其组合。 第一抗菌氧化物层中的抗微生物金属的原子是第一浓度。 第一抗微生物氧化物层位于与金属表面相反的方向上。 该装置还包括第二抗微生物氧化物层，其包括可以是银，铜和锌的抗微生物金属及其组合。 存在于第二抗微生物氧化物层中的抗微生物金属的原子具有第二浓度。 第一个浓度和第二个浓度不相等。 还公开了制备抗微生物医疗装置的方法。

公开(公告)号：USD718860S1

公开(公告)日：2014-12-02

申请号：US29418892

申请日：2012-04-23

申请人： Jeffrey Farris ,  Heidi Rorick ,  Matthew Hedrick ,  John Williams ,  Greg Hoffman ,  Alan McGee ,  Daniel Refai ,  John Gorup

设计人： Jeffrey Farris ,  Heidi Rorick ,  Matthew Hedrick ,  John Williams ,  Greg Hoffman ,  Alan McGee ,  Daniel Refai ,  John Gorup

公开(公告)号：USD681812S1

公开(公告)日：2013-05-07

申请号：US29418897

申请日：2012-04-23

申请人： Jeffrey Farris ,  John Williams ,  Greg Hoffman ,  Alan McGee ,  Daniel Refai ,  John Gorup

设计人： Jeffrey Farris ,  John Williams ,  Greg Hoffman ,  Alan McGee ,  Daniel Refai ,  John Gorup

CPC分类号： A61F2/4465 ,  A61F2002/30171 ,  A61F2002/30777 ,  A61F2002/30787 ,  A61F2002/30904 ,  A61F2002/4475

公开(公告)号：USD681204S1

公开(公告)日：2013-04-30

申请号：US29418888

申请日：2012-04-23

申请人： Jeffrey Farris ,  Heidi Rorick ,  Matthew Hedrick ,  John Williams ,  Greg Hoffman ,  Alan McGee ,  Daniel Refai ,  John Gorup

设计人： Jeffrey Farris ,  Heidi Rorick ,  Matthew Hedrick ,  John Williams ,  Greg Hoffman ,  Alan McGee ,  Daniel Refai ,  John Gorup

CPC分类号： A61F2/447 ,  A61F2002/30774 ,  A61F2002/30904 ,  A61F2002/4475

公开(公告)号：US11844835B2

公开(公告)日：2023-12-19

申请号：US17461143

申请日：2021-08-30

申请人： Purdue Research Foundation ,  Nanovis, LLC

发明人： Allen Lawrence Garner ,  Ram Anand Vadlamani ,  David Alan Detwiler

IPC分类号： A61K41/00 ,  A61K31/341 ,  A61K31/496 ,  A61K31/5377 ,  A61K31/575 ,  A61K31/702 ,  A61K31/7048 ,  A61K38/14 ,  A61N1/32 ,  C12N13/00

CPC分类号： A61K41/0023 ,  A61K31/341 ,  A61K31/496 ,  A61K31/5377 ,  A61K31/575 ,  A61K31/702 ,  A61K31/7048 ,  A61K38/14 ,  A61N1/32 ,  C12N13/00

摘要： Provided is a method of reducing a number of viable microbes, including contacting microbes with an antibiotic compound and applying pulses of electricity having a duration of between about 50 nanoseconds and about 900 nanoseconds. The pulses of electricity may have an intensity between about 20 kV/cm and about 40 kV/cm. The pulses of electricity may be applied at a frequency of between about 0.1 Hz and about 10 Hz. The microbes may be a gram-negative or a gram-positive strain of bacteria and the antibiotic may be applied at a concentration for a duration, wherein applying the antibiotic to the strain at the concentration for the duration does not reduce a viable number of bacteria of the strain as much, or at all, when the pulses of electricity are not also applied.

公开(公告)号：US11779684B2

公开(公告)日：2023-10-10

申请号：US17459517

申请日：2021-08-27

申请人： NANOVIS, LLC

发明人： Matthew Hedrick ,  Chang Yao

IPC分类号： A61L27/54 ,  C23C22/05 ,  C25D11/02 ,  C23C22/78 ,  A61L27/04 ,  A61L27/30 ,  C25D11/26 ,  C25D11/34 ,  C09D1/00 ,  C09D7/61 ,  C04B35/447 ,  C04B35/622 ,  C09D5/14

CPC分类号： A61L27/54 ,  A61L27/04 ,  A61L27/306 ,  C04B35/447 ,  C04B35/62222 ,  C09D1/00 ,  C09D5/14 ,  C09D7/61 ,  C23C22/05 ,  C23C22/78 ,  C25D11/02 ,  C25D11/26 ,  C25D11/34 ,  A61L2202/21 ,  A61L2300/102 ,  A61L2300/104 ,  A61L2300/404 ,  A61L2300/61 ,  A61L2400/12 ,  A61L2420/02 ,  C04B2235/447

摘要： An antimicrobial medical device that includes a substrate having a metal surface that is made from a metal or metal alloy that may include stainless steel, cobalt, and titanium. Disposed on the metal surface is a first antimicrobial oxide layer that includes an antimicrobial metal that may include silver, copper, and zinc, and combinations thereof. The atoms of antimicrobial metal in the first antimicrobial oxide layer are of a first concentration. The first antimicrobial oxide layer is positioned in a direction opposite that of the metal surface. The device further includes a second antimicrobial oxide layer that includes an antimicrobial metal that may be silver, copper, and zinc, and combinations thereof. The atoms of the antimicrobial metal present in the second antimicrobial oxide layer are of a second concentration. The first concentration and the second concentration are not equal. Methods for making the antimicrobial medical device are also disclosed.

公开(公告)号：US20210340520A1

公开(公告)日：2021-11-04

申请号：US17369271

申请日：2021-07-07

申请人： NANOVIS, LLC ,  PURDUE RESEARCH FOUNDATION

发明人： Allen L. GARNER ,  Ram Anand VADLAMANI ,  David Alan DETWILER ,  Aginiprakash DHANABAL

IPC分类号： C12N13/00 ,  A61N1/32 ,  A61N1/36 ,  A61K35/32 ,  A61K35/34 ,  C12N5/077 ,  A61K45/06

摘要： The present disclosure relates to methods of stimulating cell proliferation, promoting differentiation of cells, regenerating cells, promoting nodule formation, and promoting myotube formation. The methods include applying one or more pulses of electricity to cells, each pulse of electricity having a duration of between about 10 nanoseconds and about 1,000 nanoseconds, wherein said pulses of electricity are applied under conditions effective to stimulate cell proliferation, promote differentiation of cells, regenerate cells, promote nodule formation, and promote myotube formation.