公开(公告)号：US4438557A

公开(公告)日：1984-03-27

申请号：US343023

申请日：1982-01-27

Applicant: Donald L. Parker ,  Wilbur A. Porter ,  Robert C. Rogers

Inventor： Donald L. Parker ,  Wilbur A. Porter ,  Robert C. Rogers

IPC: H01J1/13 ,  H01J29/46 ,  H01J31/12 ,  H01J37/06 ,  G01N23/00 ,  H01J37/00

CPC classification number: H01J1/13 ,  B82Y10/00 ,  B82Y40/00 ,  H01J29/46 ,  H01J31/128 ,  H01J37/06 ,  H01J37/3177 ,  H01J2237/061

Abstract: An areal array of tubular electron sources is disclosed for producing multiple directed electron beams. Sources (10) are located in a parallel array between a conductive back plate (12) at a closed end of the tubes and a conductive face plate (14) having holes therein aligned with the second open end of each of the electrode tubes (10). An electrical current source (30) is connected between the back plate (12) and face plate (14) to resistively heat each of the sources (10) to a temperature high enough for thermionic electron emission. Electron beams (34) are produced from within each of the tubular electrodes (10). Extraction means which may include a magnetic field from a coil (29) and an extraction lens (18) tends to withdraw the electrons from within the sources (10) in an intense, collimated beam (34). Beams (34) are accelerated toward a target (28) through a beam deflection unit (22) having holes (24) associated with each of the electron beams (34 ). Beam deflection plates (26) within each of the holes (24) deflect the electron beams (34) to impact selected points on a target (28).

Abstract translation: 公开了一种用于产生多个定向电子束的管状电子源的面阵列。 源（10）位于管的封闭端的导电背板（12）和导电面板（14）之间的平行阵列中，导电面板（14）具有与每个电极管（10）的第二开口端对准的孔 ）。 电流源（30）连接在背板（12）和面板（14）之间，以将每个源（10）电阻加热到足够高的热电子发射温度。 从每个管状电极（10）内产生电子束（34）。 可以包括来自线圈（29）和提取透镜（18）的磁场的提取装置倾向于在强烈的准直光束（34）中从源（10）内撤出电子。 光束（34）通过具有与每个电子束（34）相关联的孔（24）的光束偏转单元（22）朝向目标（28）加速。 每个孔（24）内的光束偏转板（26）使电子束（34）偏转以冲击目标（28）上的选定点。

公开(公告)号：US3467878A

公开(公告)日：1969-09-16

申请号：US3467878D

申请日：1966-06-27

Applicant: GEN ELECTRIC

Inventor： NEWBERRY STERLING P

IPC: H01J1/13 ,  H01J9/50 ,  H01J1/14 ,  H01J19/06

CPC classification number: H01J9/505 ,  H01J1/13 ,  Y02W30/828

公开(公告)号：US2935624A

公开(公告)日：1960-05-03

申请号：US53091555

申请日：1955-08-26

Applicant: RALPH FORMAN

Inventor： RALPH FORMAN

IPC: H01J1/13

CPC classification number: H01J1/13

公开(公告)号：US2129730A

公开(公告)日：1938-09-13

申请号：US2505235

申请日：1935-06-05

Applicant: DE KRAMOLIN LEON LADISLAS

Inventor： DE KRAMOLIN LEON LADISLAS

IPC: H01J1/13

CPC classification number: H01J1/13

公开(公告)号：US1757233A

公开(公告)日：1930-05-06

申请号：US74073824

申请日：1924-09-30

Applicant: RCA CORP

Inventor： CORNELIS BOL

IPC: H01J1/13 ,  H01J19/74

CPC classification number: H01J1/13 ,  H01J19/74

公开(公告)号：US1477868A

公开(公告)日：1923-12-18

申请号：US29589719

申请日：1919-05-09

Applicant: CONNECTICUT TELEPHONE & ELEC

Inventor： DONLE HAROLD P

IPC: H01J1/13

CPC classification number: H01J1/13

公开(公告)号：US08912505B2

公开(公告)日：2014-12-16

申请号：US13644890

申请日：2012-10-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chan Wook Baik ,  Anurag Srivastava ,  Jong Min Kim ,  Sun Il Kim ,  Young Mok Son ,  Gun Sik Park ,  Jin Kyu So

IPC: G21K5/04 ,  H01J1/46 ,  H01J1/13 ,  G21K1/087 ,  H01J1/30

CPC classification number: G21K1/087 ,  H01J1/13 ,  H01J1/30 ,  H01J1/46

Abstract: An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.

Abstract translation: 电子束聚焦电极和使用该电子束的电子枪可以包括具有多边形通孔的板; 至少形成在所述通孔的至少一侧的突出部。 通过使用电子束聚焦电极，可以减小具有矩形横截面的电子束的扩展现象。 此外，电子枪的输出可能增加，并且电子束可能容易聚焦。

公开(公告)号：US20140117839A1

公开(公告)日：2014-05-01

申请号：US14064520

申请日：2013-10-28

Applicant: NuFlare Technology, Inc.

Inventor： Kenichi SAITO

IPC: G01R31/25 ,  H01J29/70

CPC classification number: H01J1/13

Abstract: A cathode selection method includes measuring, by using a cathode having an electron emission surface which is a flat surface and a emission area which is limited, a total emission emitted from the cathode; calculating, using a measured total emission value, work function by a Richardson Dash Man's formula; and determining whether or not the cathode has the work function equal to or under an acceptable value.

Abstract translation: 阴极选择方法包括通过使用具有平坦表面的电子发射表面和限制的发射区域的阴极来测量从阴极发射的总发射; 计算，使用测量的总排放值，工作功能由理查森·达什曼公式; 以及确定阴极是否具有等于或低于可接受值的功函数。

公开(公告)号：US20130105742A1

公开(公告)日：2013-05-02

申请号：US13340701

申请日：2011-12-30

Applicant: Jinshu Wang ,  Wei Liu ,  Fan Yang ,  Xiang Liu ,  Hongyi Li ,  Meiling Zhou ,  Tieyong Zuo

Inventor： Jinshu Wang ,  Wei Liu ,  Fan Yang ,  Xiang Liu ,  Hongyi Li ,  Meiling Zhou ,  Tieyong Zuo

IPC: H01B1/08 ,  B28B3/00 ,  B28B11/00 ,  B05D5/12

CPC classification number: H01J1/142 ,  H01J1/13 ,  H01J1/14 ,  H01J1/144 ,  H01J9/047 ,  H01J23/05

Abstract: Impregnated rare earth metal-containing barium-aluminum-scandate cathodes with a rare earth oxide doped tungsten matrix and methods for the fabrication thereof are described. In one aspect, an impregnated rare earth metal-containing barium-aluminum-scandate cathode comprises: a rare earth oxide doped tungsten matrix, and an impregnated active substance. The active substance comprises scandium oxide (Sc2O3), a second rare earth oxide, and barium calcium aluminate, wherein the molar ratio of Ba:Ca:Al is about 4:1:1.

Abstract translation: 描述了具有稀土氧化物掺杂钨基体的含浸稀土金属的钡 - 铝 - 钪酸盐阴极及其制造方法。 一方面，含浸稀土金属的钡 - 铝 - 钪酸盐阴极包括：掺杂稀土氧化物的钨基体和浸渍的活性物质。 活性物质包含氧化钪（Sc 2 O 3），第二稀土氧化物和铝酸钡钙，其中Ba:Ca:Al的摩尔比为约4:1:1。

公开(公告)号：US08040035B2

公开(公告)日：2011-10-18

申请号：US12495886

申请日：2009-07-01

Applicant: Sergio Lemaitre

Inventor： Sergio Lemaitre

IPC: H01J61/10

CPC classification number: H01J35/06 ,  H01J1/13 ,  H01J9/04 ,  Y10T29/49204

Abstract: A method of producing a cathode for use in an x-ray tube assembly is provided including machining an emission aperture into a cup emission surface portion of a cup structure. The cup structure is comprised of a cup base portion opposite the cup emissions surface portion. Electro-discharge machining is used to form an electro-discharge machining slot into the cup structure to provide access to the interior of the cup structure. Electro-discharge machining is used to form a transverse coil chamber within the interior by way of the electro-discharge machining slot such that the transverse coil chamber is formed between the cup base portion and the cup emissions surface portion while retaining an essentially contiguous emissions surface perimeter surrounding the emission aperture.

Abstract translation: 提供一种制造用于X射线管组件的阴极的方法，包括将排放孔加工到杯结构的杯排放表面部分中。 杯结构包括与杯排放表面部分相对的杯基部。 电放电加工用于在杯结构中形成放电加工槽以提供进入杯结构内部的通路。 电放电加工用于通过放电加工槽在内部形成横向线圈室，使得横向线圈室形成在杯基部和杯发射表面部分之间，同时保持基本上邻接的发射表面 围绕发射孔的周边。